NL7710996A - Masker voor optische belichting. - Google Patents

Masker voor optische belichting.

Info

Publication number
NL7710996A
NL7710996A NL7710996A NL7710996A NL7710996A NL 7710996 A NL7710996 A NL 7710996A NL 7710996 A NL7710996 A NL 7710996A NL 7710996 A NL7710996 A NL 7710996A NL 7710996 A NL7710996 A NL 7710996A
Authority
NL
Netherlands
Prior art keywords
supporting plate
transparent
mask
transparent supporting
optical lighting
Prior art date
Application number
NL7710996A
Other languages
English (en)
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP12060876A external-priority patent/JPS5345975A/ja
Priority claimed from JP12984876A external-priority patent/JPS5355203A/ja
Application filed by Sony Corp filed Critical Sony Corp
Publication of NL7710996A publication Critical patent/NL7710996A/nl

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
NL7710996A 1976-10-07 1977-10-06 Masker voor optische belichting. NL7710996A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP12060876A JPS5345975A (en) 1976-10-07 1976-10-07 Mask for exposure
JP12984876A JPS5355203A (en) 1976-10-28 1976-10-28 Mask for exposure

Publications (1)

Publication Number Publication Date
NL7710996A true NL7710996A (nl) 1978-04-11

Family

ID=26458153

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7710996A NL7710996A (nl) 1976-10-07 1977-10-06 Masker voor optische belichting.

Country Status (4)

Country Link
CA (1) CA1070855A (nl)
DE (1) DE2744837A1 (nl)
GB (1) GB1577479A (nl)
NL (1) NL7710996A (nl)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0002199A1 (de) * 1977-12-05 1979-06-13 International Business Machines Corporation Belichtungsmaske und Projektionsbelichtungssystem

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5676531A (en) * 1979-11-28 1981-06-24 Fujitsu Ltd Manufacture of semiconductor device
AT382040B (de) * 1983-03-01 1986-12-29 Guenther Stangl Verfahren zur herstellung von optisch strukturierten filtern fuer elektromagnetische strahlung und optisch strukturierter filter
DE3401856C2 (de) * 1984-01-20 1986-04-24 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Kontaktkopiereinrichtung
JPH04225360A (ja) * 1990-12-26 1992-08-14 Adotetsuku Eng:Kk プリント配線基板の製造におけるフィルムマスクの密着方法及びその装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0002199A1 (de) * 1977-12-05 1979-06-13 International Business Machines Corporation Belichtungsmaske und Projektionsbelichtungssystem

Also Published As

Publication number Publication date
CA1070855A (en) 1980-01-29
GB1577479A (en) 1980-10-22
DE2744837A1 (de) 1978-04-13

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Legal Events

Date Code Title Description
BV The patent application has lapsed