NL7710996A - Masker voor optische belichting. - Google Patents
Masker voor optische belichting.Info
- Publication number
- NL7710996A NL7710996A NL7710996A NL7710996A NL7710996A NL 7710996 A NL7710996 A NL 7710996A NL 7710996 A NL7710996 A NL 7710996A NL 7710996 A NL7710996 A NL 7710996A NL 7710996 A NL7710996 A NL 7710996A
- Authority
- NL
- Netherlands
- Prior art keywords
- supporting plate
- transparent
- mask
- transparent supporting
- optical lighting
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12060876A JPS5345975A (en) | 1976-10-07 | 1976-10-07 | Mask for exposure |
JP12984876A JPS5355203A (en) | 1976-10-28 | 1976-10-28 | Mask for exposure |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7710996A true NL7710996A (nl) | 1978-04-11 |
Family
ID=26458153
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7710996A NL7710996A (nl) | 1976-10-07 | 1977-10-06 | Masker voor optische belichting. |
Country Status (4)
Country | Link |
---|---|
CA (1) | CA1070855A (nl) |
DE (1) | DE2744837A1 (nl) |
GB (1) | GB1577479A (nl) |
NL (1) | NL7710996A (nl) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0002199A1 (de) * | 1977-12-05 | 1979-06-13 | International Business Machines Corporation | Belichtungsmaske und Projektionsbelichtungssystem |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5676531A (en) * | 1979-11-28 | 1981-06-24 | Fujitsu Ltd | Manufacture of semiconductor device |
AT382040B (de) * | 1983-03-01 | 1986-12-29 | Guenther Stangl | Verfahren zur herstellung von optisch strukturierten filtern fuer elektromagnetische strahlung und optisch strukturierter filter |
DE3401856C2 (de) * | 1984-01-20 | 1986-04-24 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | Kontaktkopiereinrichtung |
JPH04225360A (ja) * | 1990-12-26 | 1992-08-14 | Adotetsuku Eng:Kk | プリント配線基板の製造におけるフィルムマスクの密着方法及びその装置 |
-
1977
- 1977-09-26 CA CA287,526A patent/CA1070855A/en not_active Expired
- 1977-09-29 GB GB40537/77A patent/GB1577479A/en not_active Expired
- 1977-10-05 DE DE19772744837 patent/DE2744837A1/de not_active Withdrawn
- 1977-10-06 NL NL7710996A patent/NL7710996A/nl not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0002199A1 (de) * | 1977-12-05 | 1979-06-13 | International Business Machines Corporation | Belichtungsmaske und Projektionsbelichtungssystem |
Also Published As
Publication number | Publication date |
---|---|
CA1070855A (en) | 1980-01-29 |
GB1577479A (en) | 1980-10-22 |
DE2744837A1 (de) | 1978-04-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
BV | The patent application has lapsed |