BE768355A - Masques photographiques transparents - Google Patents

Masques photographiques transparents

Info

Publication number
BE768355A
BE768355A BE768355A BE768355A BE768355A BE 768355 A BE768355 A BE 768355A BE 768355 A BE768355 A BE 768355A BE 768355 A BE768355 A BE 768355A BE 768355 A BE768355 A BE 768355A
Authority
BE
Belgium
Prior art keywords
transparent photographic
photographic masks
masks
transparent
photographic
Prior art date
Application number
BE768355A
Other languages
English (en)
Inventor
F J Loprest
D E Barr
Original Assignee
Gaf Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gaf Corp filed Critical Gaf Corp
Publication of BE768355A publication Critical patent/BE768355A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
BE768355A 1970-06-11 1971-06-10 Masques photographiques transparents BE768355A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US4559070A 1970-06-11 1970-06-11

Publications (1)

Publication Number Publication Date
BE768355A true BE768355A (fr) 1971-11-03

Family

ID=21938804

Family Applications (1)

Application Number Title Priority Date Filing Date
BE768355A BE768355A (fr) 1970-06-11 1971-06-10 Masques photographiques transparents

Country Status (13)

Country Link
US (1) US3744904A (fr)
JP (1) JPS5040008B1 (fr)
BE (1) BE768355A (fr)
CA (1) CA944203A (fr)
CH (1) CH558029A (fr)
DD (1) DD99866A5 (fr)
DE (2) DE2128654A1 (fr)
FR (1) FR2096224A5 (fr)
GB (1) GB1360637A (fr)
IL (1) IL36862A0 (fr)
IT (1) IT943583B (fr)
NL (1) NL7107987A (fr)
SE (2) SE380360B (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7201333A (fr) * 1972-02-02 1973-08-06
JPS50902A (fr) * 1973-05-04 1975-01-08
JPS5230848B2 (fr) * 1973-10-09 1977-08-11
JPS5065232A (fr) * 1973-10-09 1975-06-02
US3936301A (en) * 1974-04-01 1976-02-03 Bell Telephone Laboratories, Incorporated Process for contact photolithography utilizing a photomask having indented channels
US4126466A (en) * 1974-07-22 1978-11-21 E. I. Du Pont De Nemours And Company Composite, mask-forming, photohardenable elements
US4205989A (en) * 1976-04-14 1980-06-03 Kimoto & Co., Ltd. Dry system image producing element
US4374911A (en) * 1978-04-28 1983-02-22 International Business Machines Corporation Photo method of making tri-level density photomask
US4536240A (en) * 1981-12-02 1985-08-20 Advanced Semiconductor Products, Inc. Method of forming thin optical membranes
CA2019693A1 (fr) * 1989-07-07 1991-01-07 Karen Ann Graziano Resines photosensibles a durcissement a l'acide a sensibilite accrue
DE4107762B4 (de) * 1990-03-09 2006-07-13 Dai Nippon Printing Co., Ltd. Verfahren zum Herstellen von Master- und Arbeitsmusterplatten für den Ätzprozess
US5801833A (en) * 1991-03-08 1998-09-01 Dai Nippon Printing Co., Ltd. Method of producing master and working pattern plates for etching and photolithographic apparatus therefor
US6350555B1 (en) * 1998-01-14 2002-02-26 Precision Coatings, Inc. Direct write imaging medium
WO2010086850A2 (fr) 2009-01-29 2010-08-05 Digiflex Ltd. Procédé de production d'un photomasque sur une surface photopolymère
WO2011090355A2 (fr) * 2010-01-22 2011-07-28 (주)Lg화학 Film adhesif collant destine a etre utilise dans le procede d'alignement de couches de photoalignement

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3510371A (en) * 1967-01-25 1970-05-05 Itt Method of making an ultraviolet sensitive template
US3592649A (en) * 1967-04-21 1971-07-13 Mead Corp Color photographic process for producing visually transparent but photographically opaque photomasks
US3542612A (en) * 1967-08-11 1970-11-24 Western Electric Co Photolithographic masks and methods for their manufacture

Also Published As

Publication number Publication date
US3744904A (en) 1973-07-10
SE7500730L (fr) 1975-01-23
IL36862A0 (en) 1971-07-28
FR2096224A5 (fr) 1972-02-11
CH558029A (de) 1975-01-15
CA944203A (en) 1974-03-26
DE2128654A1 (de) 1971-12-16
DE2166726A1 (de) 1975-08-14
GB1360637A (en) 1974-07-17
SE403523B (sv) 1978-08-21
NL7107987A (fr) 1971-12-14
IT943583B (it) 1973-04-10
JPS5040008B1 (fr) 1975-12-20
SE380360B (sv) 1975-11-03
DD99866A5 (fr) 1973-08-20

Similar Documents

Publication Publication Date Title
CH535441A (de) Lichtempfindliches Farbphotographiematerial
CH520953A (de) Schirmfarbstoffe enthaltendes lichtempfindliches photographisches Material
BE772551A (nl) Fotografisch kopieerapparaat
BE764442A (nl) Fotografische kleurenontwikkelaar
CH527444A (fr) Composition photographique de blanchiment-fixage
AT322979B (de) Photographischer filmverband
CH554002A (de) Lichtempfindliches photographisches material.
BE768355A (fr) Masques photographiques transparents
DE1918886B2 (de) Photographischer selbstentwicklerfilmverband
BE777352A (nl) Lichtgevoelig fotografisch kleurenmateriaal
BE756085A (de) Spectraal gesensibiliseerd fotografisch materiaal
IT941195B (it) Pateriale fotografico sensibile d alogenuro d argento
BE772145A (fr) Materiels photographiques photosensibles
CH534897A (de) Fotografisches Kopiergerät
BE772717A (nl) Fotografisch kopieerapparaat
SE381520B (sv) Fotografisk filmenhet
AT315639B (de) Photographischer Filmverband
BE768367A (nl) Fotografisch kopieerapparaat
CH524834A (de) Photographisches lichtempfindliches Material
BE770912A (nl) Fotografische kleurontwikkeling
CH522899A (fr) Film photographique
BE749373A (de) Verbeterd fotografisch kleurenmateriaal
BE775218A (nl) Supergesensibiliseerd fotografisch materiaal
BE762920A (nl) Speciaal gesensibiliseerd lichtgevoelig materiaal
AT334651B (de) Photographisches objektiv