CH558029A - Lichtempfindliche platte. - Google Patents

Lichtempfindliche platte.

Info

Publication number
CH558029A
CH558029A CH802171A CH802171A CH558029A CH 558029 A CH558029 A CH 558029A CH 802171 A CH802171 A CH 802171A CH 802171 A CH802171 A CH 802171A CH 558029 A CH558029 A CH 558029A
Authority
CH
Switzerland
Prior art keywords
light sensitive
sensitive plate
plate
light
sensitive
Prior art date
Application number
CH802171A
Other languages
English (en)
Original Assignee
Gaf Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gaf Corp filed Critical Gaf Corp
Publication of CH558029A publication Critical patent/CH558029A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CH802171A 1970-06-11 1971-06-02 Lichtempfindliche platte. CH558029A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US4559070A 1970-06-11 1970-06-11

Publications (1)

Publication Number Publication Date
CH558029A true CH558029A (de) 1975-01-15

Family

ID=21938804

Family Applications (1)

Application Number Title Priority Date Filing Date
CH802171A CH558029A (de) 1970-06-11 1971-06-02 Lichtempfindliche platte.

Country Status (13)

Country Link
US (1) US3744904A (de)
JP (1) JPS5040008B1 (de)
BE (1) BE768355A (de)
CA (1) CA944203A (de)
CH (1) CH558029A (de)
DD (1) DD99866A5 (de)
DE (2) DE2166726A1 (de)
FR (1) FR2096224A5 (de)
GB (1) GB1360637A (de)
IL (1) IL36862A0 (de)
IT (1) IT943583B (de)
NL (1) NL7107987A (de)
SE (2) SE380360B (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7201333A (de) * 1972-02-02 1973-08-06
JPS50902A (de) * 1973-05-04 1975-01-08
JPS5230848B2 (de) * 1973-10-09 1977-08-11
JPS5065232A (de) * 1973-10-09 1975-06-02
US3936301A (en) * 1974-04-01 1976-02-03 Bell Telephone Laboratories, Incorporated Process for contact photolithography utilizing a photomask having indented channels
US4126466A (en) * 1974-07-22 1978-11-21 E. I. Du Pont De Nemours And Company Composite, mask-forming, photohardenable elements
US4205989A (en) * 1976-04-14 1980-06-03 Kimoto & Co., Ltd. Dry system image producing element
US4374911A (en) * 1978-04-28 1983-02-22 International Business Machines Corporation Photo method of making tri-level density photomask
US4536240A (en) * 1981-12-02 1985-08-20 Advanced Semiconductor Products, Inc. Method of forming thin optical membranes
CA2019693A1 (en) * 1989-07-07 1991-01-07 Karen Ann Graziano Acid-hardening photoresists of improved sensitivity
DE4107762B4 (de) * 1990-03-09 2006-07-13 Dai Nippon Printing Co., Ltd. Verfahren zum Herstellen von Master- und Arbeitsmusterplatten für den Ätzprozess
US5801833A (en) * 1991-03-08 1998-09-01 Dai Nippon Printing Co., Ltd. Method of producing master and working pattern plates for etching and photolithographic apparatus therefor
US6350555B1 (en) * 1998-01-14 2002-02-26 Precision Coatings, Inc. Direct write imaging medium
EP2391924B1 (de) 2009-01-29 2013-07-24 Digiflex Ltd. Verfahren zur herstellung einer fotomaske auf einer fotopolymeroberfläche
WO2011090355A2 (ko) * 2010-01-22 2011-07-28 (주)Lg화학 광배향막 배향 처리용 점착 필름

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3510371A (en) * 1967-01-25 1970-05-05 Itt Method of making an ultraviolet sensitive template
US3592649A (en) * 1967-04-21 1971-07-13 Mead Corp Color photographic process for producing visually transparent but photographically opaque photomasks
US3542612A (en) * 1967-08-11 1970-11-24 Western Electric Co Photolithographic masks and methods for their manufacture

Also Published As

Publication number Publication date
FR2096224A5 (de) 1972-02-11
US3744904A (en) 1973-07-10
BE768355A (fr) 1971-11-03
SE7500730L (de) 1975-01-23
CA944203A (en) 1974-03-26
SE403523B (sv) 1978-08-21
NL7107987A (de) 1971-12-14
SE380360B (sv) 1975-11-03
JPS5040008B1 (de) 1975-12-20
IT943583B (it) 1973-04-10
DE2128654A1 (de) 1971-12-16
DE2166726A1 (de) 1975-08-14
GB1360637A (en) 1974-07-17
IL36862A0 (en) 1971-07-28
DD99866A5 (de) 1973-08-20

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Legal Events

Date Code Title Description
PL Patent ceased