FR2288160A1 - Procede de gravure ionique profonde utilisant successivement deux ions differents, et son application a la fabrication de dispositifs notamment en optique integree - Google Patents

Procede de gravure ionique profonde utilisant successivement deux ions differents, et son application a la fabrication de dispositifs notamment en optique integree

Info

Publication number
FR2288160A1
FR2288160A1 FR7435147A FR7435147A FR2288160A1 FR 2288160 A1 FR2288160 A1 FR 2288160A1 FR 7435147 A FR7435147 A FR 7435147A FR 7435147 A FR7435147 A FR 7435147A FR 2288160 A1 FR2288160 A1 FR 2288160A1
Authority
FR
France
Prior art keywords
mask
sample
silica
layer
integrated circuits
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7435147A
Other languages
English (en)
French (fr)
Other versions
FR2288160B1 (enExample
Inventor
Michel Cantagrelet Jac Lafleur
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7435147A priority Critical patent/FR2288160A1/fr
Publication of FR2288160A1 publication Critical patent/FR2288160A1/fr
Application granted granted Critical
Publication of FR2288160B1 publication Critical patent/FR2288160B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optical Integrated Circuits (AREA)
FR7435147A 1974-10-18 1974-10-18 Procede de gravure ionique profonde utilisant successivement deux ions differents, et son application a la fabrication de dispositifs notamment en optique integree Granted FR2288160A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7435147A FR2288160A1 (fr) 1974-10-18 1974-10-18 Procede de gravure ionique profonde utilisant successivement deux ions differents, et son application a la fabrication de dispositifs notamment en optique integree

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7435147A FR2288160A1 (fr) 1974-10-18 1974-10-18 Procede de gravure ionique profonde utilisant successivement deux ions differents, et son application a la fabrication de dispositifs notamment en optique integree

Publications (2)

Publication Number Publication Date
FR2288160A1 true FR2288160A1 (fr) 1976-05-14
FR2288160B1 FR2288160B1 (enExample) 1977-10-28

Family

ID=9144269

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7435147A Granted FR2288160A1 (fr) 1974-10-18 1974-10-18 Procede de gravure ionique profonde utilisant successivement deux ions differents, et son application a la fabrication de dispositifs notamment en optique integree

Country Status (1)

Country Link
FR (1) FR2288160A1 (enExample)

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NEANT *

Also Published As

Publication number Publication date
FR2288160B1 (enExample) 1977-10-28

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Legal Events

Date Code Title Description
ST Notification of lapse