JPS56117235A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS56117235A
JPS56117235A JP2050180A JP2050180A JPS56117235A JP S56117235 A JPS56117235 A JP S56117235A JP 2050180 A JP2050180 A JP 2050180A JP 2050180 A JP2050180 A JP 2050180A JP S56117235 A JPS56117235 A JP S56117235A
Authority
JP
Japan
Prior art keywords
film
polyglycidyl methacrylate
substrate
forming method
desired pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2050180A
Other languages
Japanese (ja)
Other versions
JPS6360375B2 (en
Inventor
Morio Taniguchi
Tadao Kaneko
Michiaki Hashimoto
Ken Tsutsui
Toshio Nakano
Akira Sasano
Akiya Izumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2050180A priority Critical patent/JPS56117235A/en
Publication of JPS56117235A publication Critical patent/JPS56117235A/en
Publication of JPS6360375B2 publication Critical patent/JPS6360375B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To form a desired pattern by forming a film of polyglycidyl methacrylate on a substrate, irradiating the film with light in an oxygen atmosphere, and carrying out development to remove the irradiated part of the film. CONSTITUTION:A film of polyglycidyl methacrylate is formed on a substrate and exposed in an oxygen-contg. atmosphere such as air. In the exposure a mask is not brought into close contact with the sample to allow sufficient air to exist between them, e.g., to leave 50mum space. Thus, the conventional inferior removability of polyglycidyl methacrylate is improved. The light irradiated part of the film is then removed by development to form a desired pattern.
JP2050180A 1980-02-22 1980-02-22 Pattern forming method Granted JPS56117235A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2050180A JPS56117235A (en) 1980-02-22 1980-02-22 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2050180A JPS56117235A (en) 1980-02-22 1980-02-22 Pattern forming method

Publications (2)

Publication Number Publication Date
JPS56117235A true JPS56117235A (en) 1981-09-14
JPS6360375B2 JPS6360375B2 (en) 1988-11-24

Family

ID=12028902

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2050180A Granted JPS56117235A (en) 1980-02-22 1980-02-22 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS56117235A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0447574U (en) * 1990-08-24 1992-04-22

Also Published As

Publication number Publication date
JPS6360375B2 (en) 1988-11-24

Similar Documents

Publication Publication Date Title
DE3486187D1 (en) METHOD AND DEVICE FOR PRODUCING PROTECTIVE LACQUER IMAGES.
JPS56117235A (en) Pattern forming method
JPS561536A (en) Manufacture of resist pattern
JPS5226171A (en) Mask creation method
JPS5461931A (en) Forming method of photo resist patterns
JPS57124436A (en) Correction of pattern defect
JPS57112025A (en) Formation of pattern
JPS5215267A (en) Fine processing method
JPS56144539A (en) Formation of fine pattern
JPS5742043A (en) Photosensitive material
JPS55128832A (en) Method of making minute pattern
JPS53110379A (en) Optical filter and its manufacture
JPS56104334A (en) Photomask for contact exposure
JPS5414096A (en) Method and device for laser processing
JPS57200944A (en) Manufacture of magnetic disk
JPS5596681A (en) Method of fabricating semiconductor device
JPS5588057A (en) Production of photo mask
JPS5617348A (en) Exposing method
JPS56144536A (en) Pattern formation and p-n junction formation
JPS56107245A (en) Manufacture of photomask
JPS56107241A (en) Dry etching method
JPS5718326A (en) Pattern formation
JPS53114744A (en) Etching method
JPS5727031A (en) Formation of resist pattern
JPS55158635A (en) Mask