FI109054B - Menetelmä yksilöivän merkinnän tekemiseksi piirilevyyn - Google Patents

Menetelmä yksilöivän merkinnän tekemiseksi piirilevyyn Download PDF

Info

Publication number
FI109054B
FI109054B FI20001480A FI20001480A FI109054B FI 109054 B FI109054 B FI 109054B FI 20001480 A FI20001480 A FI 20001480A FI 20001480 A FI20001480 A FI 20001480A FI 109054 B FI109054 B FI 109054B
Authority
FI
Finland
Prior art keywords
circuit board
light
marking
exposure
pattern
Prior art date
Application number
FI20001480A
Other languages
English (en)
Finnish (fi)
Swedish (sv)
Other versions
FI20001480A0 (fi
FI20001480A (fi
Inventor
Rauno Salmi
Original Assignee
Rauno Salmi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rauno Salmi filed Critical Rauno Salmi
Publication of FI20001480A0 publication Critical patent/FI20001480A0/fi
Priority to FI20001480A priority Critical patent/FI109054B/fi
Priority to KR1020027017345A priority patent/KR20030025934A/ko
Priority to US10/312,203 priority patent/US20030175625A1/en
Priority to JP2002504532A priority patent/JP2004501518A/ja
Priority to AT01951725T priority patent/ATE382881T1/de
Priority to AU2001272581A priority patent/AU2001272581A1/en
Priority to CNB018113753A priority patent/CN1203371C/zh
Priority to EP01951725A priority patent/EP1297383B1/en
Priority to PCT/FI2001/000597 priority patent/WO2001098829A1/en
Priority to DE60132205T priority patent/DE60132205T2/de
Publication of FI20001480A publication Critical patent/FI20001480A/fi
Application granted granted Critical
Publication of FI109054B publication Critical patent/FI109054B/fi
Priority to HK03108917A priority patent/HK1056611A1/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C11/00Auxiliary processes in photography
    • G03C11/02Marking or applying text
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0266Marks, test patterns or identification means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67282Marking devices
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/09654Shape and layout details of conductors covering at least two types of conductors provided for in H05K2201/09218 - H05K2201/095
    • H05K2201/09781Dummy conductors, i.e. not used for normal transport of current; Dummy electrodes of components
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09818Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
    • H05K2201/09927Machine readable code, e.g. bar code
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05Patterning and lithography; Masks; Details of resist
    • H05K2203/0548Masks
    • H05K2203/0551Exposure mask directly printed on the PCB
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061Etching masks
    • H05K3/064Photoresists

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Surgical Instruments (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Glass Compositions (AREA)
  • Making Paper Articles (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
FI20001480A 2000-06-21 2000-06-21 Menetelmä yksilöivän merkinnän tekemiseksi piirilevyyn FI109054B (fi)

Priority Applications (11)

Application Number Priority Date Filing Date Title
FI20001480A FI109054B (fi) 2000-06-21 2000-06-21 Menetelmä yksilöivän merkinnän tekemiseksi piirilevyyn
CNB018113753A CN1203371C (zh) 2000-06-21 2001-06-21 用于给电路板做区别标记的方法
US10/312,203 US20030175625A1 (en) 2000-06-21 2001-06-21 Method for individualised marketing of circuit boards
JP2002504532A JP2004501518A (ja) 2000-06-21 2001-06-21 基盤を個別にマーキングするための方法
AT01951725T ATE382881T1 (de) 2000-06-21 2001-06-21 Individualisiertes markierungsverfahren für leiterplatten
AU2001272581A AU2001272581A1 (en) 2000-06-21 2001-06-21 A method for individualised marking of circuit boards
KR1020027017345A KR20030025934A (ko) 2000-06-21 2001-06-21 회로기판의 개별적 마킹방법
EP01951725A EP1297383B1 (en) 2000-06-21 2001-06-21 A method for individualised marking of circuit boards
PCT/FI2001/000597 WO2001098829A1 (en) 2000-06-21 2001-06-21 A method for individualised marking of circuit boards
DE60132205T DE60132205T2 (de) 2000-06-21 2001-06-21 Individualisiertes markierungsverfahren für leiterplatten
HK03108917A HK1056611A1 (en) 2000-06-21 2003-12-09 A method for individualised marking of circuit boards.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20001480 2000-06-21
FI20001480A FI109054B (fi) 2000-06-21 2000-06-21 Menetelmä yksilöivän merkinnän tekemiseksi piirilevyyn

Publications (3)

Publication Number Publication Date
FI20001480A0 FI20001480A0 (fi) 2000-06-21
FI20001480A FI20001480A (fi) 2001-12-22
FI109054B true FI109054B (fi) 2002-05-15

Family

ID=8558614

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20001480A FI109054B (fi) 2000-06-21 2000-06-21 Menetelmä yksilöivän merkinnän tekemiseksi piirilevyyn

Country Status (11)

Country Link
US (1) US20030175625A1 (zh)
EP (1) EP1297383B1 (zh)
JP (1) JP2004501518A (zh)
KR (1) KR20030025934A (zh)
CN (1) CN1203371C (zh)
AT (1) ATE382881T1 (zh)
AU (1) AU2001272581A1 (zh)
DE (1) DE60132205T2 (zh)
FI (1) FI109054B (zh)
HK (1) HK1056611A1 (zh)
WO (1) WO2001098829A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DK176229B1 (da) * 2002-06-18 2007-03-26 Photosolar Aps Optisk element til afskærmning af lys
JP4565916B2 (ja) * 2004-07-23 2010-10-20 三洋電機株式会社 光反応装置
US8492072B2 (en) * 2009-04-30 2013-07-23 Infineon Technologies Ag Method for marking objects
CN103324037B (zh) * 2013-07-04 2015-01-07 北京京东方光电科技有限公司 一种曝光装置及其曝光方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3694081A (en) * 1970-02-11 1972-09-26 Pek Inc Method and apparatus for contact printing
DE3147994A1 (de) * 1981-12-04 1983-06-16 Fa. Georg Rothkegel, 5140 Erkelenz "verfahren zur herstellung von ordnungs- oder organisationskennzeichen"
JPS6172216A (ja) * 1984-09-17 1986-04-14 Shinku Lab:Kk 露光方法
JPS6454455A (en) * 1987-08-25 1989-03-01 Mitsubishi Electric Corp Aligner
JPH0189771U (zh) * 1987-12-04 1989-06-13
US4853317A (en) * 1988-04-04 1989-08-01 Microfab Technologies, Inc. Method and apparatus for serializing printed circuit boards and flex circuits
JPH03239552A (ja) * 1990-02-15 1991-10-25 Matsushita Electric Works Ltd プリント配線板への印字方法
JPH04359588A (ja) * 1991-06-06 1992-12-11 Mitsubishi Electric Corp プリント配線板の製造方法
CA2075026A1 (en) * 1991-08-08 1993-02-09 William E. Nelson Method and apparatus for patterning an imaging member
JPH06255232A (ja) * 1991-09-11 1994-09-13 Cmk Corp プリント配線板の製造方法
JPH10112579A (ja) * 1996-10-07 1998-04-28 M S Tec:Kk レジスト露光方法及びその露光装置
JPH10230382A (ja) * 1997-02-21 1998-09-02 Fuji Print Kogyo Kk プリント基板のダイレクト描画方法
US6251550B1 (en) * 1998-07-10 2001-06-26 Ball Semiconductor, Inc. Maskless photolithography system that digitally shifts mask data responsive to alignment data

Also Published As

Publication number Publication date
ATE382881T1 (de) 2008-01-15
CN1437713A (zh) 2003-08-20
DE60132205T2 (de) 2008-12-18
HK1056611A1 (en) 2004-02-20
JP2004501518A (ja) 2004-01-15
EP1297383B1 (en) 2008-01-02
WO2001098829A1 (en) 2001-12-27
AU2001272581A1 (en) 2002-01-02
US20030175625A1 (en) 2003-09-18
EP1297383A1 (en) 2003-04-02
KR20030025934A (ko) 2003-03-29
FI20001480A0 (fi) 2000-06-21
DE60132205D1 (de) 2008-02-14
CN1203371C (zh) 2005-05-25
FI20001480A (fi) 2001-12-22

Similar Documents

Publication Publication Date Title
US5109153A (en) Flash imaging and voidable articles
EP1705520A3 (en) Exposure apparatus and exposing method and method of manufacturing a printed wiring board
US20040239750A1 (en) Method for the production of a dial and dial produced according to said method
DE60236637D1 (de) Belichtungsapparat, Belichtungsverfahren, Verwendung eines solchen Belichtungsapparats und Verfahren zur Herstellung von Vorrichtungen
BR0115293A (pt) Método para otimizar um processamento de imagem e processo de impressão
CN113330368A (zh) 用于柔性印版的持久标识的系统和方法以及用其标识的印版
FI109054B (fi) Menetelmä yksilöivän merkinnän tekemiseksi piirilevyyn
US5958628A (en) Formation of punch inspection masks and other devices using a laser
US4727014A (en) Process for the production of a standard calibration and test element, and a standard calibration and test element produced by the process
US7009630B1 (en) Method and apparatus for printing ink imprinted indicia
JPH09504892A (ja) 基板上に書き込まれた文字の識別方法及び識別装置
US20160140790A1 (en) Method and device for marking value labels
US5773576A (en) Coded thin layer chromatography support
EP3626468B1 (en) Method for printing calibration markers in inkjet printers
KR200482698Y1 (ko) 외부 광학 요소들을 이용한 차별적인 자외선 경화
JPS61283101A (ja) 電子部品への表示付与方法
JPH06142952A (ja) レーザマーキング加工方法
JPH0458013B2 (zh)
DE19600427B4 (de) Verfahren zum Ausrichten und Markieren eines Wafers
KR100451122B1 (ko) 광고판의 제조방법
GB2442016A (en) Substrate exposure method and tool
JPH07219209A (ja) フォトマスク
IT202100018818A1 (it) Metodo di marcatura e metodo di produzione di matrice di stampa, dispositivo di marcatura, sistema di produzione di matrici di stampa e matrice di stampa marcata
TW200500814A (en) Pattern writing apparatus
DD248667A1 (de) Verfahren zum beschriften von fotolackschichten