JP4565916B2 - 光反応装置 - Google Patents
光反応装置 Download PDFInfo
- Publication number
- JP4565916B2 JP4565916B2 JP2004215552A JP2004215552A JP4565916B2 JP 4565916 B2 JP4565916 B2 JP 4565916B2 JP 2004215552 A JP2004215552 A JP 2004215552A JP 2004215552 A JP2004215552 A JP 2004215552A JP 4565916 B2 JP4565916 B2 JP 4565916B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- adjustment unit
- projection
- image
- adjustment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C67/00—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Micromachines (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
Description
2 フレーム筐体
3 LCDプロジェクタ
4 ズーム調整機構
7 LCDパネル
11 第1調整ベース(第1調整部)
12 第2調整ベース(第2調整部)
13 縮小投写レンズ
16 試料設置ステージ
18 スコープ
19 試料
21 ビームスプリッタ
PC パソコン
Claims (4)
- フレーム筐体と、
該フレーム筐体に構成された一対の取付レールに渡って固定され、入力画像を表示するLCDパネルに光を照射することによって前記画像を投写するLCDプロジェクタと、
前記取付レールに移動可能に取り付けられた第1調整部、及び、該第1調整部に移動可能に取り付けられた第2調整部とから構成されたズーム調整機構と、
前記第2調整部に取り付けられ、光反応性の試料を設置する試料設置ステージと、
前記第1調整部に取り付けられ、前記LCDプロジェクタからの投写光を縮小して前記試料上に結像させる縮小投写レンズと、
前記LCDパネルから前記縮小投写レンズにまで渡る伸縮鏡筒とを備え、
前記フレーム筐体と第1調整部には、1pixel当たりの投写画素サイズをマイクロメートル単位で調整するための数字がそれぞれ記載され、前記第1調整部と第2調整部には印がそれぞれ記載されており、
前記ズーム調整機構は、前記第1調整部を移動させて当該第1調整部に記載された印を前記フレーム筐体に記載された数字のうちの所定の投写画素サイズの数字に合わせることで、当該数字の投写画素サイズに合った前記LCDパネルと前記縮小投写レンズ間の距離が調整され、前記第2調整部を移動させて当該第2調整部に記載された印を前記第1調整部に記載された数字のうちの前記所定の投写画素サイズの数字に合わせることで、当該数字の投写画素サイズに合った前記縮小投写レンズと前記試料間の距離が調整されて、前記試料に結像される画像の投写倍率を調整可能とされていることを特徴とする光反応装置。 - 前記LCDプロジェクタから前記試料までの投写経路への外部からの入射光を遮断するための暗幕を設けたことを特徴とする請求項1の光反応装置。
- 前記試料上に結像される画像のフォーカスを確認するためのスコープを備えたことを特徴とする請求項1又は請求項2の光反応装置。
- 前記LCDプロジェクタに入力される動画に同期して前記試料を移動させる移動機構を設けたことを特徴とする請求項1乃至請求項3の光反応装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004215552A JP4565916B2 (ja) | 2004-07-23 | 2004-07-23 | 光反応装置 |
KR1020050036998A KR100680092B1 (ko) | 2004-07-23 | 2005-05-03 | 광반응 장치 |
CNB2005100765042A CN100498539C (zh) | 2004-07-23 | 2005-06-06 | 光反应装置 |
US11/181,022 US20060018004A1 (en) | 2004-07-23 | 2005-07-14 | Photoreaction apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004215552A JP4565916B2 (ja) | 2004-07-23 | 2004-07-23 | 光反応装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006039010A JP2006039010A (ja) | 2006-02-09 |
JP4565916B2 true JP4565916B2 (ja) | 2010-10-20 |
Family
ID=35656843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004215552A Expired - Fee Related JP4565916B2 (ja) | 2004-07-23 | 2004-07-23 | 光反応装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20060018004A1 (ja) |
JP (1) | JP4565916B2 (ja) |
KR (1) | KR100680092B1 (ja) |
CN (1) | CN100498539C (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100919820B1 (ko) * | 2007-11-26 | 2009-10-01 | 한국전자통신연구원 | 광화학 합성 장치 |
US8062864B2 (en) | 2007-05-21 | 2011-11-22 | Alderbio Holdings Llc | Nucleic acids encoding antibodies to IL-6, and recombinant production of anti-IL-6 antibodies |
US8743340B2 (en) | 2008-12-31 | 2014-06-03 | Rolls-Royce Corporation | System and method for imaging apparatus calibration |
JP6202621B2 (ja) | 2011-11-20 | 2017-09-27 | 学校法人東京女子医科大学 | 細胞培養用基材及びその製造方法 |
CN111421814B (zh) * | 2020-02-29 | 2022-05-06 | 湖南大学 | 一种多材料光固化3d打印设备 |
CN111421813B (zh) * | 2020-02-29 | 2022-05-20 | 湖南大学 | 一种多材料光固化3d打印装置及方法 |
CN115503232A (zh) * | 2022-09-28 | 2022-12-23 | 上海交通大学 | 一种六自由度光固化3d打印装置及3d打印方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10210327A (ja) * | 1997-01-21 | 1998-08-07 | Sony Corp | カメラ装置 |
US6312134B1 (en) * | 1996-07-25 | 2001-11-06 | Anvik Corporation | Seamless, maskless lithography system using spatial light modulator |
JP2002510969A (ja) * | 1997-05-14 | 2002-04-09 | ザ ジェネラル ホスピタル コーポレーション | マイクロパターン化形態における細胞の共培養 |
WO2002039189A1 (fr) * | 2000-11-10 | 2002-05-16 | National Institute Of Advanced Industrial Science And Technology | Dispositif de transfert de motif comportant un projecteur pour circuits imprimes |
JP2004501518A (ja) * | 2000-06-21 | 2004-01-15 | ラウノ サルミ | 基盤を個別にマーキングするための方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3377814D1 (en) * | 1982-06-05 | 1988-09-29 | Olympus Optical Co | An optical system focus-state detector |
JPH0722101B2 (ja) * | 1985-08-29 | 1995-03-08 | 株式会社ニコン | 投影型露光装置用遮風装置 |
JPH03105911A (ja) * | 1989-09-20 | 1991-05-02 | Hitachi Ltd | 微細パターン転写方法およびその装置 |
JP3047983B2 (ja) * | 1990-03-30 | 2000-06-05 | 株式会社日立製作所 | 微細パターン転写方法およびその装置 |
JPH0430416A (ja) * | 1990-05-25 | 1992-02-03 | Dainippon Printing Co Ltd | 微細パターンの加工方法 |
US6235438B1 (en) * | 1997-10-07 | 2001-05-22 | Nikon Corporation | Projection exposure method and apparatus |
JP3427350B2 (ja) | 1999-11-22 | 2003-07-14 | 関西ティー・エル・オー株式会社 | 光反応加工方法ならびに光反応加工装置 |
US20040158300A1 (en) * | 2001-06-26 | 2004-08-12 | Allan Gardiner | Multiple wavelength illuminator having multiple clocked sources |
JP4141674B2 (ja) * | 2001-10-22 | 2008-08-27 | セイコーエプソン株式会社 | 液滴吐出ヘッド、その拭取り方法およびこれを備えた電子機器 |
EP1467253A1 (en) * | 2003-04-07 | 2004-10-13 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2004
- 2004-07-23 JP JP2004215552A patent/JP4565916B2/ja not_active Expired - Fee Related
-
2005
- 2005-05-03 KR KR1020050036998A patent/KR100680092B1/ko not_active IP Right Cessation
- 2005-06-06 CN CNB2005100765042A patent/CN100498539C/zh not_active Expired - Fee Related
- 2005-07-14 US US11/181,022 patent/US20060018004A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6312134B1 (en) * | 1996-07-25 | 2001-11-06 | Anvik Corporation | Seamless, maskless lithography system using spatial light modulator |
JPH10210327A (ja) * | 1997-01-21 | 1998-08-07 | Sony Corp | カメラ装置 |
JP2002510969A (ja) * | 1997-05-14 | 2002-04-09 | ザ ジェネラル ホスピタル コーポレーション | マイクロパターン化形態における細胞の共培養 |
JP2004501518A (ja) * | 2000-06-21 | 2004-01-15 | ラウノ サルミ | 基盤を個別にマーキングするための方法 |
WO2002039189A1 (fr) * | 2000-11-10 | 2002-05-16 | National Institute Of Advanced Industrial Science And Technology | Dispositif de transfert de motif comportant un projecteur pour circuits imprimes |
Also Published As
Publication number | Publication date |
---|---|
JP2006039010A (ja) | 2006-02-09 |
KR100680092B1 (ko) | 2007-02-09 |
CN1725108A (zh) | 2006-01-25 |
KR20060045886A (ko) | 2006-05-17 |
US20060018004A1 (en) | 2006-01-26 |
CN100498539C (zh) | 2009-06-10 |
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