CN1725108A - 光反应装置 - Google Patents
光反应装置 Download PDFInfo
- Publication number
- CN1725108A CN1725108A CNA2005100765042A CN200510076504A CN1725108A CN 1725108 A CN1725108 A CN 1725108A CN A2005100765042 A CNA2005100765042 A CN A2005100765042A CN 200510076504 A CN200510076504 A CN 200510076504A CN 1725108 A CN1725108 A CN 1725108A
- Authority
- CN
- China
- Prior art keywords
- sample
- image
- photoreaction
- projection lens
- lcd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C67/00—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Micromachines (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
Abstract
Description
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004215552 | 2004-07-23 | ||
JP2004215552A JP4565916B2 (ja) | 2004-07-23 | 2004-07-23 | 光反応装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1725108A true CN1725108A (zh) | 2006-01-25 |
CN100498539C CN100498539C (zh) | 2009-06-10 |
Family
ID=35656843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005100765042A Expired - Fee Related CN100498539C (zh) | 2004-07-23 | 2005-06-06 | 光反应装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20060018004A1 (zh) |
JP (1) | JP4565916B2 (zh) |
KR (1) | KR100680092B1 (zh) |
CN (1) | CN100498539C (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100919820B1 (ko) * | 2007-11-26 | 2009-10-01 | 한국전자통신연구원 | 광화학 합성 장치 |
US8062864B2 (en) | 2007-05-21 | 2011-11-22 | Alderbio Holdings Llc | Nucleic acids encoding antibodies to IL-6, and recombinant production of anti-IL-6 antibodies |
US8743340B2 (en) * | 2008-12-31 | 2014-06-03 | Rolls-Royce Corporation | System and method for imaging apparatus calibration |
US20140335610A1 (en) | 2011-11-20 | 2014-11-13 | Tokyo Women's Medical University | Cell culture substrate, and method for manufacturing same |
CN111421814B (zh) * | 2020-02-29 | 2022-05-06 | 湖南大学 | 一种多材料光固化3d打印设备 |
CN111421813B (zh) * | 2020-02-29 | 2022-05-20 | 湖南大学 | 一种多材料光固化3d打印装置及方法 |
CN115503232A (zh) * | 2022-09-28 | 2022-12-23 | 上海交通大学 | 一种六自由度光固化3d打印装置及3d打印方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0096570B1 (en) * | 1982-06-05 | 1988-08-24 | Olympus Optical Co., Ltd. | An optical system focus-state detector |
JPH0722101B2 (ja) * | 1985-08-29 | 1995-03-08 | 株式会社ニコン | 投影型露光装置用遮風装置 |
JPH03105911A (ja) * | 1989-09-20 | 1991-05-02 | Hitachi Ltd | 微細パターン転写方法およびその装置 |
JP3047983B2 (ja) * | 1990-03-30 | 2000-06-05 | 株式会社日立製作所 | 微細パターン転写方法およびその装置 |
JPH0430416A (ja) * | 1990-05-25 | 1992-02-03 | Dainippon Printing Co Ltd | 微細パターンの加工方法 |
US6312134B1 (en) * | 1996-07-25 | 2001-11-06 | Anvik Corporation | Seamless, maskless lithography system using spatial light modulator |
JPH10210327A (ja) * | 1997-01-21 | 1998-08-07 | Sony Corp | カメラ装置 |
WO1998051785A1 (en) * | 1997-05-14 | 1998-11-19 | The General Hospital Corporation | Co-cultivation of cells in a micropatterned configuration |
US6235438B1 (en) * | 1997-10-07 | 2001-05-22 | Nikon Corporation | Projection exposure method and apparatus |
JP3427350B2 (ja) | 1999-11-22 | 2003-07-14 | 関西ティー・エル・オー株式会社 | 光反応加工方法ならびに光反応加工装置 |
FI109054B (fi) * | 2000-06-21 | 2002-05-15 | Rauno Salmi | Menetelmä yksilöivän merkinnän tekemiseksi piirilevyyn |
KR100727009B1 (ko) * | 2000-11-10 | 2007-06-14 | 도꾸리쯔교세이호진 상교기쥬쯔 소고겡뀨죠 | 투영 노광 방법 |
US20040158300A1 (en) * | 2001-06-26 | 2004-08-12 | Allan Gardiner | Multiple wavelength illuminator having multiple clocked sources |
JP4141674B2 (ja) * | 2001-10-22 | 2008-08-27 | セイコーエプソン株式会社 | 液滴吐出ヘッド、その拭取り方法およびこれを備えた電子機器 |
EP1467253A1 (en) * | 2003-04-07 | 2004-10-13 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2004
- 2004-07-23 JP JP2004215552A patent/JP4565916B2/ja not_active Expired - Fee Related
-
2005
- 2005-05-03 KR KR1020050036998A patent/KR100680092B1/ko not_active IP Right Cessation
- 2005-06-06 CN CNB2005100765042A patent/CN100498539C/zh not_active Expired - Fee Related
- 2005-07-14 US US11/181,022 patent/US20060018004A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
KR20060045886A (ko) | 2006-05-17 |
US20060018004A1 (en) | 2006-01-26 |
JP4565916B2 (ja) | 2010-10-20 |
KR100680092B1 (ko) | 2007-02-09 |
JP2006039010A (ja) | 2006-02-09 |
CN100498539C (zh) | 2009-06-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: PANASONIC HEALTHCARE + MEDICAL EQUIPMENT CO., LTD. Free format text: FORMER OWNER: SANYO ELECTRIC CO., LTD. Effective date: 20120911 Free format text: FORMER OWNER: SANYO ELECTRIC BIOMEDICAL CO., LTD. Effective date: 20120911 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20120911 Address after: Japan Ehime Prefecture Patentee after: PANASONIC Corp. Address before: Japan Osaka Patentee before: Sanyo Electric Co.,Ltd. Effective date of registration: 20120911 Address after: Japan Osaka Patentee after: Sanyo Electric Co.,Ltd. Address before: Japan Osaka Patentee before: Sanyo Electric Co.,Ltd. Patentee before: Sanyo Electric Biomed Co.,Ltd. |
|
ASS | Succession or assignment of patent right |
Owner name: PANASONIC HEALTHCARE HOLDINGS CO., LTD. Free format text: FORMER OWNER: PANASONIC HEALTHCARE + MEDICAL EQUIPMENT CO., LTD. Effective date: 20150407 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20150407 Address after: Tokyo, Japan Patentee after: PANASONIC HEALTHCARE HOLDINGS CO.,LTD. Address before: Japan Ehime Prefecture Patentee before: PANASONIC Corp. |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090610 Termination date: 20160606 |
|
CF01 | Termination of patent right due to non-payment of annual fee |