FI107192B - Menetelmä elektrodin pinnanlaadun tarkistamiseksi - Google Patents

Menetelmä elektrodin pinnanlaadun tarkistamiseksi Download PDF

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Publication number
FI107192B
FI107192B FI992406A FI992406A FI107192B FI 107192 B FI107192 B FI 107192B FI 992406 A FI992406 A FI 992406A FI 992406 A FI992406 A FI 992406A FI 107192 B FI107192 B FI 107192B
Authority
FI
Finland
Prior art keywords
cathode
camera
light source
plane
image
Prior art date
Application number
FI992406A
Other languages
English (en)
Finnish (fi)
Swedish (sv)
Inventor
Tom Marttila
Original Assignee
Outokumpu Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=8555574&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=FI107192(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Outokumpu Oy filed Critical Outokumpu Oy
Priority to FI992406A priority Critical patent/FI107192B/fi
Priority to PE2000001130A priority patent/PE20010857A1/es
Priority to CA002390536A priority patent/CA2390536C/en
Priority to PCT/FI2000/000932 priority patent/WO2001035083A1/en
Priority to EA200200543A priority patent/EA008366B1/ru
Priority to CNB008154767A priority patent/CN100409000C/zh
Priority to JP2001536564A priority patent/JP2003514121A/ja
Priority to BRPI0015345-1A priority patent/BR0015345B1/pt
Priority to KR1020027005949A priority patent/KR100816703B1/ko
Priority to MXPA02004567A priority patent/MXPA02004567A/es
Priority to US10/129,869 priority patent/US6646733B1/en
Priority to AU11489/01A priority patent/AU778924B2/en
Priority to EP00972931A priority patent/EP1228360A1/en
Priority to PL00356130A priority patent/PL356130A1/xx
Publication of FI107192B publication Critical patent/FI107192B/fi
Application granted granted Critical
Priority to BG106643A priority patent/BG64999B1/bg
Priority to ZA200203247A priority patent/ZA200203247B/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8829—Shadow projection or structured background, e.g. for deflectometry

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Mathematical Physics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
FI992406A 1999-11-09 1999-11-09 Menetelmä elektrodin pinnanlaadun tarkistamiseksi FI107192B (fi)

Priority Applications (16)

Application Number Priority Date Filing Date Title
FI992406A FI107192B (fi) 1999-11-09 1999-11-09 Menetelmä elektrodin pinnanlaadun tarkistamiseksi
PE2000001130A PE20010857A1 (es) 1999-11-09 2000-10-20 Metodo para inspeccionar la calidad de la superficie de un electrodo
KR1020027005949A KR100816703B1 (ko) 1999-11-09 2000-10-27 전극의 표면 품질 검사 방법
MXPA02004567A MXPA02004567A (es) 1999-11-09 2000-10-27 Metodo para inspeccionar la calidad de la superficie de un electrodo.
EA200200543A EA008366B1 (ru) 1999-11-09 2000-10-27 Способ контроля качества поверхности электрода
CNB008154767A CN100409000C (zh) 1999-11-09 2000-10-27 检验电极表面质量的方法
JP2001536564A JP2003514121A (ja) 1999-11-09 2000-10-27 電極表面質の検査方法
BRPI0015345-1A BR0015345B1 (pt) 1999-11-09 2000-10-27 processo para inspecionar a qualidade superficial de um eletrodo.
CA002390536A CA2390536C (en) 1999-11-09 2000-10-27 Method for inspecting electrode surface quality
PCT/FI2000/000932 WO2001035083A1 (en) 1999-11-09 2000-10-27 Method for inspecting electrode surface quality
US10/129,869 US6646733B1 (en) 1999-11-09 2000-10-27 Method for inspecting electrode surface quality
AU11489/01A AU778924B2 (en) 1999-11-09 2000-10-27 Method for inspecting electrode surface quality
EP00972931A EP1228360A1 (en) 1999-11-09 2000-10-27 Method for inspecting electrode surface quality
PL00356130A PL356130A1 (en) 1999-11-09 2000-10-27 Method for inspecting electrode surface quality
BG106643A BG64999B1 (bg) 1999-11-09 2002-04-24 Метод за контролиране качеството на повърхността на електрода
ZA200203247A ZA200203247B (en) 1999-11-09 2002-04-24 Method for inspecting electrode surface quality.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI992406 1999-11-09
FI992406A FI107192B (fi) 1999-11-09 1999-11-09 Menetelmä elektrodin pinnanlaadun tarkistamiseksi

Publications (1)

Publication Number Publication Date
FI107192B true FI107192B (fi) 2001-06-15

Family

ID=8555574

Family Applications (1)

Application Number Title Priority Date Filing Date
FI992406A FI107192B (fi) 1999-11-09 1999-11-09 Menetelmä elektrodin pinnanlaadun tarkistamiseksi

Country Status (16)

Country Link
US (1) US6646733B1 (enExample)
EP (1) EP1228360A1 (enExample)
JP (1) JP2003514121A (enExample)
KR (1) KR100816703B1 (enExample)
CN (1) CN100409000C (enExample)
AU (1) AU778924B2 (enExample)
BG (1) BG64999B1 (enExample)
BR (1) BR0015345B1 (enExample)
CA (1) CA2390536C (enExample)
EA (1) EA008366B1 (enExample)
FI (1) FI107192B (enExample)
MX (1) MXPA02004567A (enExample)
PE (1) PE20010857A1 (enExample)
PL (1) PL356130A1 (enExample)
WO (1) WO2001035083A1 (enExample)
ZA (1) ZA200203247B (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI112383B (fi) * 2001-06-25 2003-11-28 Outokumpu Oy Menetelmä katodin laadun parantamiseksi elektrolyysissä
US8594417B2 (en) 2007-11-27 2013-11-26 Alcoa Inc. Systems and methods for inspecting anodes and smelting management relating to the same
KR101013612B1 (ko) * 2008-11-21 2011-02-10 엘에스니꼬동제련 주식회사 전해 정련된 금속석출판 표면 검사장치
FI20135688A7 (fi) * 2013-06-24 2014-12-25 Outotec Finland Oy Menetelmä ja järjestely metallien elektrolyyttistä raffinointia varten valettujen anodien valmistamiseksi elektrolyyttistä raffinointivaihetta varten
TWI639829B (zh) 2017-06-21 2018-11-01 致茂電子股份有限公司 太陽能電池的檢測方法與檢測系統
CN109103118A (zh) * 2017-06-21 2018-12-28 致茂电子(苏州)有限公司 太阳能电池的检测方法与检测系统
JP6876576B2 (ja) * 2017-08-17 2021-05-26 日本電子株式会社 三次元像構築方法
CN108335296B (zh) * 2018-02-28 2021-10-01 中际山河科技有限责任公司 一种极板识别装置及方法
CN110205653B (zh) * 2019-06-14 2020-10-16 中国环境科学研究院 一种铅基阳极表面阳极泥智能识别及无损干除方法及系统
CN112864034B (zh) * 2019-11-27 2023-09-01 上海先进半导体制造有限公司 铝腐蚀的处理方法及系统
KR20230056313A (ko) * 2021-10-20 2023-04-27 주식회사 엘지에너지솔루션 전극 표면 검사 장치
CN115165890A (zh) * 2022-06-06 2022-10-11 云南铜业股份有限公司西南铜业分公司 一种沉积阴极铜表面特征性缺陷检测装置及方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU482658A1 (ru) * 1972-05-03 1975-08-30 Институт электрохимии АН СССР Способ определени структурных параметров пористых электродов
US4498960A (en) * 1982-11-01 1985-02-12 General Electric Company Electrochemical method for visual detection of nonmetallic surface inclusions in metallic substrates
DE3431148A1 (de) 1984-08-24 1986-03-06 Klöckner-Humboldt-Deutz AG, 5000 Köln Verfahren und vorrichtung zum entfernen von badmaterialresten an anodenresten
DE3837290A1 (de) * 1988-11-03 1990-07-05 Heraeus Elektroden Pruefung von elektroden mit aktivierungsschichten
BE1003136A3 (nl) * 1990-03-23 1991-12-03 Icos Vision Systems Nv Werkwijze en inrichting voor het bepalen van een positie van ten minste een aansluitpen van een elektronische component.
EP0586702A4 (en) * 1991-04-29 1994-06-01 N Proizv Predprivatie Novatekh Electric arc evaporator of metals
JPH08313544A (ja) * 1995-05-24 1996-11-29 Hitachi Ltd 電子顕微鏡及びこれを用いた試料観察方法
US5614722A (en) * 1995-11-01 1997-03-25 University Of Louisville Research Foundation, Inc. Radiation detector based on charge amplification in a gaseous medium
US5774224A (en) * 1997-01-24 1998-06-30 International Business Machines Corporation Linear-scanning, oblique-viewing optical apparatus
JPH11148807A (ja) * 1997-07-29 1999-06-02 Toshiba Corp バンプ高さ測定方法及びバンプ高さ測定装置
JP3272998B2 (ja) * 1997-09-30 2002-04-08 イビデン株式会社 バンプ高さ良否判定装置
JPH11111174A (ja) * 1997-10-03 1999-04-23 Sony Corp 電子銃の位置ずれ検出方法及び検出装置
US5951372A (en) * 1997-11-14 1999-09-14 Lucent Technologies Inc. Method of roughing a metallic surface of a semiconductor deposition tool
JP3724949B2 (ja) * 1998-05-15 2005-12-07 株式会社東芝 基板検査装置およびこれを備えた基板検査システム並びに基板検査方法

Also Published As

Publication number Publication date
CA2390536C (en) 2009-09-15
AU778924B2 (en) 2004-12-23
EA008366B1 (ru) 2007-04-27
EP1228360A1 (en) 2002-08-07
EA200200543A1 (ru) 2002-10-31
JP2003514121A (ja) 2003-04-15
WO2001035083A1 (en) 2001-05-17
ZA200203247B (en) 2002-11-28
CN1531648A (zh) 2004-09-22
US6646733B1 (en) 2003-11-11
CN100409000C (zh) 2008-08-06
PE20010857A1 (es) 2001-08-21
PL356130A1 (en) 2004-06-14
MXPA02004567A (es) 2002-09-02
KR20020053844A (ko) 2002-07-05
CA2390536A1 (en) 2001-05-17
BG106643A (en) 2003-04-30
BR0015345A (pt) 2002-06-25
BG64999B1 (bg) 2006-11-30
KR100816703B1 (ko) 2008-03-27
BR0015345B1 (pt) 2011-01-25
AU1148901A (en) 2001-06-06

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