KR100816703B1 - 전극의 표면 품질 검사 방법 - Google Patents

전극의 표면 품질 검사 방법 Download PDF

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Publication number
KR100816703B1
KR100816703B1 KR1020027005949A KR20027005949A KR100816703B1 KR 100816703 B1 KR100816703 B1 KR 100816703B1 KR 1020027005949 A KR1020027005949 A KR 1020027005949A KR 20027005949 A KR20027005949 A KR 20027005949A KR 100816703 B1 KR100816703 B1 KR 100816703B1
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South Korea
Prior art keywords
cathode
light source
camera
plane
surface quality
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Expired - Fee Related
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KR1020027005949A
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English (en)
Korean (ko)
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KR20020053844A (ko
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마르띨라톰
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오또꿈뿌 오와이제이
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=8555574&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR100816703(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 오또꿈뿌 오와이제이 filed Critical 오또꿈뿌 오와이제이
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8829—Shadow projection or structured background, e.g. for deflectometry

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Mathematical Physics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
KR1020027005949A 1999-11-09 2000-10-27 전극의 표면 품질 검사 방법 Expired - Fee Related KR100816703B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FI992406A FI107192B (fi) 1999-11-09 1999-11-09 Menetelmä elektrodin pinnanlaadun tarkistamiseksi
FI19992406 1999-11-09
PCT/FI2000/000932 WO2001035083A1 (en) 1999-11-09 2000-10-27 Method for inspecting electrode surface quality

Publications (2)

Publication Number Publication Date
KR20020053844A KR20020053844A (ko) 2002-07-05
KR100816703B1 true KR100816703B1 (ko) 2008-03-27

Family

ID=8555574

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020027005949A Expired - Fee Related KR100816703B1 (ko) 1999-11-09 2000-10-27 전극의 표면 품질 검사 방법

Country Status (16)

Country Link
US (1) US6646733B1 (enExample)
EP (1) EP1228360A1 (enExample)
JP (1) JP2003514121A (enExample)
KR (1) KR100816703B1 (enExample)
CN (1) CN100409000C (enExample)
AU (1) AU778924B2 (enExample)
BG (1) BG64999B1 (enExample)
BR (1) BR0015345B1 (enExample)
CA (1) CA2390536C (enExample)
EA (1) EA008366B1 (enExample)
FI (1) FI107192B (enExample)
MX (1) MXPA02004567A (enExample)
PE (1) PE20010857A1 (enExample)
PL (1) PL356130A1 (enExample)
WO (1) WO2001035083A1 (enExample)
ZA (1) ZA200203247B (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI112383B (fi) * 2001-06-25 2003-11-28 Outokumpu Oy Menetelmä katodin laadun parantamiseksi elektrolyysissä
US8594417B2 (en) 2007-11-27 2013-11-26 Alcoa Inc. Systems and methods for inspecting anodes and smelting management relating to the same
KR101013612B1 (ko) * 2008-11-21 2011-02-10 엘에스니꼬동제련 주식회사 전해 정련된 금속석출판 표면 검사장치
FI20135688A7 (fi) * 2013-06-24 2014-12-25 Outotec Finland Oy Menetelmä ja järjestely metallien elektrolyyttistä raffinointia varten valettujen anodien valmistamiseksi elektrolyyttistä raffinointivaihetta varten
CN109103118A (zh) * 2017-06-21 2018-12-28 致茂电子(苏州)有限公司 太阳能电池的检测方法与检测系统
TWI639829B (zh) 2017-06-21 2018-11-01 致茂電子股份有限公司 太陽能電池的檢測方法與檢測系統
JP6876576B2 (ja) * 2017-08-17 2021-05-26 日本電子株式会社 三次元像構築方法
CN108335296B (zh) * 2018-02-28 2021-10-01 中际山河科技有限责任公司 一种极板识别装置及方法
CN110205653B (zh) * 2019-06-14 2020-10-16 中国环境科学研究院 一种铅基阳极表面阳极泥智能识别及无损干除方法及系统
CN112864034B (zh) * 2019-11-27 2023-09-01 上海先进半导体制造有限公司 铝腐蚀的处理方法及系统
KR20230056313A (ko) * 2021-10-20 2023-04-27 주식회사 엘지에너지솔루션 전극 표면 검사 장치
CN115165890A (zh) * 2022-06-06 2022-10-11 云南铜业股份有限公司西南铜业分公司 一种沉积阴极铜表面特征性缺陷检测装置及方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11148807A (ja) * 1997-07-29 1999-06-02 Toshiba Corp バンプ高さ測定方法及びバンプ高さ測定装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU482658A1 (ru) * 1972-05-03 1975-08-30 Институт электрохимии АН СССР Способ определени структурных параметров пористых электродов
US4498960A (en) * 1982-11-01 1985-02-12 General Electric Company Electrochemical method for visual detection of nonmetallic surface inclusions in metallic substrates
DE3431148A1 (de) 1984-08-24 1986-03-06 Klöckner-Humboldt-Deutz AG, 5000 Köln Verfahren und vorrichtung zum entfernen von badmaterialresten an anodenresten
DE3837290A1 (de) * 1988-11-03 1990-07-05 Heraeus Elektroden Pruefung von elektroden mit aktivierungsschichten
BE1003136A3 (nl) * 1990-03-23 1991-12-03 Icos Vision Systems Nv Werkwijze en inrichting voor het bepalen van een positie van ten minste een aansluitpen van een elektronische component.
EP0586702A4 (en) * 1991-04-29 1994-06-01 N Proizv Predprivatie Novatekh Electric arc evaporator of metals
JPH08313544A (ja) * 1995-05-24 1996-11-29 Hitachi Ltd 電子顕微鏡及びこれを用いた試料観察方法
US5614722A (en) * 1995-11-01 1997-03-25 University Of Louisville Research Foundation, Inc. Radiation detector based on charge amplification in a gaseous medium
US5774224A (en) * 1997-01-24 1998-06-30 International Business Machines Corporation Linear-scanning, oblique-viewing optical apparatus
JP3272998B2 (ja) * 1997-09-30 2002-04-08 イビデン株式会社 バンプ高さ良否判定装置
JPH11111174A (ja) * 1997-10-03 1999-04-23 Sony Corp 電子銃の位置ずれ検出方法及び検出装置
US5951372A (en) * 1997-11-14 1999-09-14 Lucent Technologies Inc. Method of roughing a metallic surface of a semiconductor deposition tool
JP3724949B2 (ja) * 1998-05-15 2005-12-07 株式会社東芝 基板検査装置およびこれを備えた基板検査システム並びに基板検査方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11148807A (ja) * 1997-07-29 1999-06-02 Toshiba Corp バンプ高さ測定方法及びバンプ高さ測定装置

Also Published As

Publication number Publication date
PE20010857A1 (es) 2001-08-21
FI107192B (fi) 2001-06-15
EA200200543A1 (ru) 2002-10-31
PL356130A1 (en) 2004-06-14
ZA200203247B (en) 2002-11-28
CA2390536C (en) 2009-09-15
BG64999B1 (bg) 2006-11-30
JP2003514121A (ja) 2003-04-15
BR0015345B1 (pt) 2011-01-25
CN100409000C (zh) 2008-08-06
MXPA02004567A (es) 2002-09-02
BG106643A (en) 2003-04-30
CN1531648A (zh) 2004-09-22
KR20020053844A (ko) 2002-07-05
EP1228360A1 (en) 2002-08-07
CA2390536A1 (en) 2001-05-17
EA008366B1 (ru) 2007-04-27
AU1148901A (en) 2001-06-06
BR0015345A (pt) 2002-06-25
AU778924B2 (en) 2004-12-23
WO2001035083A1 (en) 2001-05-17
US6646733B1 (en) 2003-11-11

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