ES2070343T3 - Metodo para revestir sustratos con compuestos a base de silicio. - Google Patents

Metodo para revestir sustratos con compuestos a base de silicio.

Info

Publication number
ES2070343T3
ES2070343T3 ES90917735T ES90917735T ES2070343T3 ES 2070343 T3 ES2070343 T3 ES 2070343T3 ES 90917735 T ES90917735 T ES 90917735T ES 90917735 T ES90917735 T ES 90917735T ES 2070343 T3 ES2070343 T3 ES 2070343T3
Authority
ES
Spain
Prior art keywords
silicon
based compounds
coating substrates
sputtering
troublesome
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES90917735T
Other languages
English (en)
Inventor
Jesse D Wolfe
Carolynn Boehmler
James J Hofmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Linde LLC
Original Assignee
BOC Group Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOC Group Inc filed Critical BOC Group Inc
Application granted granted Critical
Publication of ES2070343T3 publication Critical patent/ES2070343T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

UN METODO PARA DEPOSITAR PELICULAS FINAS DE COMPUESTOS CON BASE DE SILICIO, PARTICULARMENTE DIOXIDO DE SILICIO, MEDIANTE PULVERIZACION CATODO REACTIVA, QUE UTILIZA UN MAGNETRON CILINDRICO ROTATORIO (20) IMPULSADO POR UN POTENCIAL DE C.A. (30). EL RESULTADO ES UNA TECNICA DE FORMACION DE UNA PELICULA UNIFORME EN SUSTRATOS GRANDES (12) CON VELOCIDADES ALTAS DE DEPOSICION. LA FORMACION DE CHISPAS NORMALMENTE ASOCIADA CON LA PULVERIZACION DIFICULTOSA EN RECUBRIMIENTOS DIELECTRICOS TALES COMO OXIDOS DE SILICIO, SE ELIMINA SUSTANCIALMENTE.
ES90917735T 1989-11-08 1990-11-07 Metodo para revestir sustratos con compuestos a base de silicio. Expired - Lifetime ES2070343T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/433,690 US5047131A (en) 1989-11-08 1989-11-08 Method for coating substrates with silicon based compounds

Publications (1)

Publication Number Publication Date
ES2070343T3 true ES2070343T3 (es) 1995-06-01

Family

ID=23721176

Family Applications (1)

Application Number Title Priority Date Filing Date
ES90917735T Expired - Lifetime ES2070343T3 (es) 1989-11-08 1990-11-07 Metodo para revestir sustratos con compuestos a base de silicio.

Country Status (11)

Country Link
US (1) US5047131A (es)
EP (1) EP0502068B1 (es)
JP (1) JP3164364B2 (es)
KR (1) KR100199663B1 (es)
AT (1) ATE120806T1 (es)
AU (1) AU631710B2 (es)
CA (1) CA2069329C (es)
DE (1) DE69018479T2 (es)
DK (1) DK0502068T3 (es)
ES (1) ES2070343T3 (es)
WO (1) WO1991007519A1 (es)

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Also Published As

Publication number Publication date
WO1991007519A1 (en) 1991-05-30
US5047131A (en) 1991-09-10
DE69018479D1 (de) 1995-05-11
KR100199663B1 (ko) 1999-06-15
DE69018479T2 (de) 1995-12-14
AU631710B2 (en) 1992-12-03
JPH05501587A (ja) 1993-03-25
ATE120806T1 (de) 1995-04-15
DK0502068T3 (da) 1995-06-19
EP0502068A1 (en) 1992-09-09
AU6873091A (en) 1991-06-13
CA2069329C (en) 2001-01-09
EP0502068A4 (en) 1993-04-28
JP3164364B2 (ja) 2001-05-08
EP0502068B1 (en) 1995-04-05
CA2069329A1 (en) 1991-05-09

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