FR2636079B1 - Procede de revetement de substrats par depot en phase vapeur - Google Patents

Procede de revetement de substrats par depot en phase vapeur

Info

Publication number
FR2636079B1
FR2636079B1 FR8911675A FR8911675A FR2636079B1 FR 2636079 B1 FR2636079 B1 FR 2636079B1 FR 8911675 A FR8911675 A FR 8911675A FR 8911675 A FR8911675 A FR 8911675A FR 2636079 B1 FR2636079 B1 FR 2636079B1
Authority
FR
France
Prior art keywords
vapor deposition
coating substrates
substrates
coating
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR8911675A
Other languages
English (en)
Other versions
FR2636079A1 (fr
Inventor
Paquet Volker
Ackermann Ulrich
Etzkorn Heinz-W.
Th. Kersten Ralf
Ruetze Uwe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schott AG
Original Assignee
Schott Glaswerke AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schott Glaswerke AG filed Critical Schott Glaswerke AG
Publication of FR2636079A1 publication Critical patent/FR2636079A1/fr
Application granted granted Critical
Publication of FR2636079B1 publication Critical patent/FR2636079B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
FR8911675A 1988-09-06 1989-09-06 Procede de revetement de substrats par depot en phase vapeur Expired - Fee Related FR2636079B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3830249A DE3830249A1 (de) 1988-09-06 1988-09-06 Plasmaverfahren zum beschichten ebener substrate

Publications (2)

Publication Number Publication Date
FR2636079A1 FR2636079A1 (fr) 1990-03-09
FR2636079B1 true FR2636079B1 (fr) 1994-02-25

Family

ID=6362369

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8911675A Expired - Fee Related FR2636079B1 (fr) 1988-09-06 1989-09-06 Procede de revetement de substrats par depot en phase vapeur

Country Status (6)

Country Link
US (1) US5017404A (fr)
JP (1) JP2542438B2 (fr)
DE (1) DE3830249A1 (fr)
FR (1) FR2636079B1 (fr)
GB (1) GB2224289B (fr)
NL (1) NL194087C (fr)

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DE19634795C2 (de) * 1996-08-29 1999-11-04 Schott Glas Plasma-CVD-Anlage mit einem Array von Mikrowellen-Plasmaelektroden und Plasma-CVD-Verfahren
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EP1918967B1 (fr) * 2006-11-02 2013-12-25 Dow Corning Corporation Procédé de formation d'une couche par déposition à partir d'un plasma
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Also Published As

Publication number Publication date
DE3830249C2 (fr) 1990-07-12
DE3830249A1 (de) 1990-03-15
FR2636079A1 (fr) 1990-03-09
GB8920049D0 (en) 1989-10-18
US5017404A (en) 1991-05-21
GB2224289B (en) 1992-11-04
NL194087C (nl) 2001-06-05
JP2542438B2 (ja) 1996-10-09
NL194087B (nl) 2001-02-01
GB2224289A (en) 1990-05-02
NL8902089A (nl) 1990-04-02
JPH02107779A (ja) 1990-04-19

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Effective date: 20080531