EP3400612B1 - Method of fabricating a flexible display substrate - Google Patents

Method of fabricating a flexible display substrate Download PDF

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Publication number
EP3400612B1
EP3400612B1 EP16871748.6A EP16871748A EP3400612B1 EP 3400612 B1 EP3400612 B1 EP 3400612B1 EP 16871748 A EP16871748 A EP 16871748A EP 3400612 B1 EP3400612 B1 EP 3400612B1
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EP
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Prior art keywords
substrate
flexible
motherboard
magnetic
flexible substrate
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German (de)
English (en)
French (fr)
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EP3400612A4 (en
EP3400612A1 (en
Inventor
Jing Yang
Peng Cai
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/80—Manufacture or treatment specially adapted for the organic devices covered by this subclass using temporary substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H10K77/111—Flexible substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/311—Flexible OLED
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/351—Thickness
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/131—Interconnections, e.g. wiring lines or terminals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/851—Division of substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present application concerns a method of fabricating a flexible display substrate.
  • a conventional process for fabricating a flexible display panel generally includes the following steps. First, coating a polyimide (PI) film as the flexible substrate on a rigid substrate, or adhering a flexible substrate on a rigid substrate using a heat-pressure-sensitive machine; then, forming a motherboard from the flexible substrate including multiple flexible display panels arranged in a matrix; next, releasing the motherboard to be separated from the rigid substrate; finally, cutting the motherboard to obtain multiple independent flexible display panels, and binding flexible printed circuit boards on each flexible display panel.
  • PI polyimide
  • the motherboard may prone to warping due to the flexibility, which may not only increase the difficulty of the cutting and binding processes, but also increase the possibility to damage the flexible display panel, thus affecting the performance of the flexible display panel.
  • the present invention concerns a method of fabricating a flexible display substrate.
  • the present invention is defined in independent claim 1.
  • the dependent claims define further aspects of the invention.
  • a motherboard is formed on a rigid substrate that is magnetisable.
  • the motherboard includes a magnetic first flexible substrate and a plurality of flexible display panels on the magnetic first flexible substrate.
  • the motherboard is cut to separate the plurality of flexible display panels from each other, followed by demagnetizing the rigid substrate.
  • the first flexible substrate is a cured polyimide gel doped with a magnetic material.
  • the motherboard is formed by: coating the magnetic first flexible substrate on the rigid substrate; and using the magnetic first flexible substrate as a base substrate to form the motherboard including the plurality of flexible display panels.
  • the method further includes: after forming the motherboard, and before cutting the motherboard to separate the plurality of flexible display panels, performing a release treatment to the first flexible substrate
  • the step of coating the magnetic first flexible substrate on the rigid substrate includes coating a first polyimide gel film that is doped with a magnetic material on the rigid substrate; and solidifying the first polyimide gel film that is doped with the magnetic material to form the magnetic first flexible substrate.
  • the motherboard is formed by: placing the magnetic first flexible substrate on the rigid substrate; and using the magnetic first flexible substrate as a base substrate to form the motherboard including the plurality of flexible display panels on the magnetic first flexible substrate.
  • the method further includes: coating a second polyimide gel film on the magnetic first flexible substrate; solidifying the second polyimide gel film to form a second flexible substrate; and using the magnetic first flexible substrate and the second flexible substrate as a base substrate to form the motherboard including the plurality of flexible display panels on the base substrate.
  • a thickness of the second flexible substrate is between 10 ⁇ m to 15 ⁇ m.
  • the method further includes: after forming the second flexible substrate and before forming the motherboard including the plurality of flexible display panels, forming a planarization layer by stacking a silicon nitride film and a silicon oxide film on the second flexible substrate.
  • the method further includes: after cutting the motherboard to separate the plurality of flexible display panels from each other, and before demagnetizing the rigid substrate, binding a flexible printed circuit board on each of the plurality of flexible display panels.
  • the rigid substrate is magnetized by charging the rigid substrate; and the rigid substrate is demagnetized by discharging the rigid substrate.
  • a thickness of the magnetic first flexible substrate is between 5 ⁇ m to 10 ⁇ m.
  • the magnetic material includes at least one of iron-chromium-cobalt particles, aluminum-nickel-cobalt particles, samarium-cobalt particles, rubidium-iron-boron particles, and neodymium-iron-boron particles.
  • a mass ratio of the magnetic material in the magnetic first flexible substrate is between 15 % and 25 %.
  • the flexible display substrate further includes: a second flexible substrate between the magnetic first flexible substrate and the plurality of display units.
  • the second flexible substrate is a polyimide gel film.
  • a thickness of the second flexible substrate is between 10 ⁇ m to 15 ⁇ m.
  • the flexible display substrate further includes: a planarization layer between the second flexible substrate and the plurality of display units.
  • the planarization layer includes a silicon nitride film and a silicon oxide film that are stacked sequentially on the second flexible substrate.
  • a motherboard is formed on a rigid substrate that is magnetisable.
  • the motherboard includes a magnetic first flexible substrate and a plurality of flexible display panels on the magnetic first flexible substrate.
  • the first flexible substrate is a cured polyimide gel doped with a magnetic material.
  • the motherboard is cut to separate the plurality of flexible display panels from each other, which is followed by demagnetizing the rigid substrate.
  • a motherboard including a magnetic first flexible substrate is formed on a rigid substrate that is magnetisable.
  • the rigid substrate that is magnetized generates a magnetic force to attract the magnetic first flexible substrate.
  • the motherboard including the magnetic first flexible substrate is attached to the rigid substrate. Therefore, the warping of the motherboard can be prevented during the cutting process, which may not only facilitate the cutting process, but also avoid potential damage to the flexible display panels, thereby improving the yield of the flexible display panels.
  • the motherboard and the rigid substrate are separated by demagnetizing the rigid substrate, which is simple and reliable.
  • FIG. 1A a flowchart of an exemplary method for fabricating a flexible display panel is shown in accordance with some embodiments of the disclosed subject matter. As illustrated, the method includes the following steps.
  • FIG. 1B illustrates an exemplary motherboard which includes a magnetic first flexible substrate 110 comprising a cured polyimide gel film doped with a magnetic material and a plurality of flexible display panels 120 on the magnetic first flexible substrate 110.
  • each of the flexible display panels 120 may include a plurality of display units corresponding to pixel units for display.
  • the motherboard may prone to warping due to the flexibility during the subsequent cutting and binding processes.
  • the disclosed method for fabricating the flexible display panels the cutting process is performed when the rigid substrate is magnetized.
  • the rigid substrate that is magnetized can attract the magnetic first flexible substrate of the motherboard.
  • the warping of the motherboard can be prevented during the cutting process, which may not only facilitates the cutting process, but also avoid potential damage to the flexible display panels, thereby improving the yield of the flexible display panels.
  • the motherboard and the rigid substrate can be separated by demagnetizing the rigid substrate, which is simple and reliable.
  • the first flexible substrate may be formed using a coating process, or a flexible substrate can be directly used.
  • a coating process or a flexible substrate can be directly used.
  • Step 101 for forming a motherboard comprising multiple flexible display panels on a rigid substrate that is magnetisable can include the following steps:
  • the flexible display panel can be a Liquid Crystal Display (LCD) panel, an Organic Electroluminescent Display (OLED) panel, a flexible electric paper, or any other suitable display panel.
  • LCD Liquid Crystal Display
  • OLED Organic Electroluminescent Display
  • any suitable components such as a thin film transistor, an anode, a cathode, a light emitting layer, etc. can be formed on the first flexible substrate sequentially.
  • the method can further include the following steps:
  • Step S203 performing a releasing process to the motherboard.
  • a laser irradiation can be used to release the motherboard.
  • a laser wavelength can be around 308 nm, and a laser energy range can be from about 180 mJ/cm 2 to about 240 mJ/cm 2 .
  • the releasing process is performed after cutting the motherboard into multiple separate flexible display panels, then the multiple flexible display panels need to be released one by one, which requires complicated operations.
  • the releasing treatment can be performed to the motherboard before the cutting process.
  • Step S102 can be performed subsequently.
  • the motherboard can be cut into multiple separate flexible display panels when the rigid substrate is magnetized.
  • the rigid substrate that is magnetized can attract the magnetic first flexible substrate of the motherboard.
  • the warping of the motherboard can be prevented during the cutting process, which may not only facilitate the cutting process, but also avoid potential damage to the flexible display panels, thereby improving the yield of the flexible display panels.
  • Step 103 can be performed to separate the motherboard and the rigid substrate by demagnetizing the rigid substrate. Therefore, the separation operation is simple and reliable.
  • the Step 201 for coating the magnetic first flexible substrate on a rigid substrate that is magnetisable can include the following steps, as illustrated in FIG. 3 .
  • Step S301 coating a first polyimide layer doped with a magnetic material on the rigid substrate that is magnetisable.
  • Step S302 performing a curing treatment to the first polyimide that is doped with a magnetic material to form a first flexible substrate that is magnetic.
  • a polyimide gel doped with a magnetic material can be cured to form a magnetic first flexible substrate.
  • a temperature range of the curing treatment can be set from 300°C to 400°C.
  • the magnetic material is doped in the first flexible substrate
  • the first flexible substrate can contain more magnetic material if the thickness of the first flexible substrate is larger, therefore the first flexible substrate can have more magnetism. That is, the thickness of the first flexible substrate is positively proportional to the magnetic magnitude of the first flexible substrate. Therefore, a first flexible substrate having a too small thickness may not have enough magnetic force to attract the rigid substrate, which may cause warping of the motherboard during the cutting process. On the other hand, a first flexible substrate having a too large thickness may increase the total thickness of the flexible display panels. Based on the above factors, in some embodiments, a thickness of the first flexible substrate can be in a range of 5 ⁇ m to 10 ⁇ m. However, the thickness of the first flexible substrate can be adjusted according to actual needs, and should not be limited herein.
  • the doped magnetic material can be any suitable material that can be magnetized.
  • Non-limiting examples of the doped magnetic material may include iron-chromium-cobalt, aluminum-nickel-cobalt, samarium-cobalt, rubidium-iron-boron, and neodymium-iron-boron.
  • Such magnetic material may include magnetic material particles, for example, having an average size of about 800 nm to about 1500 nm.
  • the magnetic material particles may be selected to provide sufficient small size such that a single particle contains a small number of magnetic domains.
  • a single particle may contain a single magnetic domain.
  • the magnetic material particle may be unlikely to have. magnetic anisotropy.
  • the magnetic particles can be rapidly magnetized and magnetically enhanced.
  • the rigid substrate may be a metallic substrate, for example, formed by iron, nickel, cobalt, or their alloys.
  • the rigid substrate may internally include a coil having a low resistance. The coil may be connected to a power supply.
  • a strong magnetic field may be produced to magnetize the magnetic material in the first flexible substrate to provide a large magnetism.
  • the first flexible substrate a polyimide (PI) film, doped with magnetic material particles, may be attracted on the rigid substrate to provide a flat first flexible substrate ready for any subsequent process(es). After those process(es), the power may be turned off, and the magnetism of the rigid substrate may be removed to allow the first flexible substrate to be separated from the rigid substrate.
  • PI polyimide
  • the doping ratio of the magnetic material in the first flexible substrate is positively proportional to the magnetic magnitude of the first flexible substrate,
  • the first flexible substrate can have more magnetism if the doping ratio of the magnetic material of the first flexible substrate is larger. Therefore, a first flexible substrate having a too small doping ratio of the magnetic material may not have enough magnetic force to attract the rigid substrate, which may cause warping of the motherboard during the cutting process.
  • a first flexible substrate having a too large doping ratio of the magnetic material may decrease the flexibility of the flexible display panels.
  • a mass ratio of the magnetic material in the first flexible substrate can be in a range of 15% to 25%.
  • the doping ratio of the magnetic material of the first flexible substrate can be adjusted according to actual needs, and should not be limited herein.
  • the Step 202 for forming a motherboard comprising multiple flexible display panels can further include the following steps, as illustrated in FIG. 3 .
  • Step S303 coating a second organic resin layer on the first flexible substrate.
  • the second organic resin layer can be a polyimide (PI) glue, or any other suitable organic resin material.
  • Step S304 performing a curing treatment to the second organic resin to form a second flexible substrate.
  • a polyimide (PI) glue can be cured to form a second flexible substrate.
  • a temperature range of the curing treatment can be set from 300°C to 400°C.
  • Step S305 using the first flexible substrate and the second flexible substrate as a base substrate to form a motherboard comprising multiple flexible display panels.
  • a too large thickness of the second flexible substrate may increase the total thickness of the flexible display panels, while a too small thickness of the second flexible substrate may not sufficiently alleviate the roughness of the first flexible substrate.
  • a thickness of the second flexible substrate can be in a range of 10 ⁇ m to 15 ⁇ m.
  • the disclosed method can further include the following step, as illustrated in FIG. 3 .
  • Step S306 forming a planarization layer by stacking a silicon nitride film and a silicon oxide film sequentially on the second flexible substrate.
  • the embodiment of the disclosed method is particularly useful for fabricating a flexible OLED.
  • the silicon nitride film and the silicon oxide film can be not only used as the planarization layer, but also as a barrier layer for preventing the oxygen and water in the external environment from entering the flexible OLED to cause damages to the flexible OLED.
  • planarization layer is not limited to the stacked silicon nitride film and silicon oxide film. Any other suitable film of similar material can be selected to form the planarization layer, which is not limited herein.
  • the disclosed method can also be applied to fabricate active driving flexible display panels. After performing Step S102 for cutting the motherboard into multiple separate flexible display panels, and before performing Step S103 for demagnetizing the rigid substrate, the method can further include the following step, as illustrated in FIG. 3 .
  • Step S307 binding a flexible printed circuit board on each flexible display panel.
  • the binding process can be performed when the rigid substrate is magnetized.
  • the rigid substrate that is magnetized can attract the magnetic first flexible substrate of the motherboard.
  • Step 103 can be performed to separate the motherboard from the rigid substrate by demagnetizing the rigid substrate. The separation operation is simple and reliable.
  • the rigid substrate that is magnetisable may be a rigid substrate capable of being charged and discharged.
  • the rigid substrate in the Step S102, the rigid substrate can be charged to have magnetism, and in the step S103, the rigid substrate can be discharged to revoke the magnetism.
  • the changing and discharging process can provide a quick and simple control of the generation and revocation of the magnetism of the rigid substrate.
  • any other suitable method can be used to generate or revoke the magnetism of the rigid substrate, and should not be limited herein.
  • a magnet can be placed on a side of the rigid substrate that is away from the first flexible substrate to make the rigid substrate to have magnetism. And the magnetism can be revoked by removing the magnet from the rigid substrate.
  • the disclosed method can further be suitable when the releasing process of the motherboard is performed after the cutting process.
  • the warping of the motherboard can be prevented during the cutting process because the first flexible substrate is attracted by and attached to the rigid substrate that is magnetized.
  • the bonding process should be performed after the releasing process in order to prevent damage to the bonded flexible printed circuit boards during the releasing process.
  • the bonding process can be performed when the rigid substrate is magnetized.
  • the rigid substrate that is magnetized can attract the magnetic first flexible substrate of the motherboard.
  • Step 103 can be performed to separate the motherboard from the rigid substrate by demagnetizing the rigid substrate. The separation operation is simple and reliable.
  • Step 101 for forming a motherboard comprising multiple flexible display panels on a rigid substrate that is magnetisable can include the following steps:
  • Step S401 placing a magnetic first flexible substrate on a rigid substrate that is magnetisable.
  • Step S402 using the first flexible substrate as a base substrate, and forming a motherboard comprising multiple flexible display panels.
  • the flexible display panel can be a Liquid Crystal Display (LCD) panel, an Organic Electroluminescent Display (OLED) panel, a flexible electric paper, or any other suitable display panel.
  • LCD Liquid Crystal Display
  • OLED Organic Electroluminescent Display
  • any suitable components such as a thin film transistor, an anode, a cathode, a light emitting layer, etc. can be formed on the first flexible substrate sequentially.
  • a magnetic first flexible substrate can be placed on a rigid substrate that is magnetisable. Since there is no adhesive force between the first flexible substrate and the rigid substrate, in order to prevent the warping of the motherboard in the subsequent processes, the motherboard comprising multiple flexible display panels can be formed when the rigid substrate is magnetized. The rigid substrate that is magnetized can generate a magnetic force to attract the magnetic first flexible substrate of the motherboard. Thus the motherboard can be attached on the rigid substrate, thereby preventing the warping of the motherboard during the fabricating process.
  • the disclosed method does not use a heat-pressure-sensitive machine to adhere the first flexible substrate on the rigid substrate, thereby can avoid introducing particles and generating bubbles.
  • Step S102 can be performed subsequently.
  • the motherboard can be cut into multiple separate flexible display panels when the rigid substrate has magnetism.
  • the rigid substrate that is magnetized can attract the magnetic first flexible substrate of the motherboard.
  • the warping of the motherboard can be prevented during the cutting process, which may not only facilitate the cutting process, but also avoid potential damage to the flexible display panels, thereby improving the yield of the flexible display panels.
  • Step 103 can be performed to separate the motherboard from the rigid substrate by demagnetizing the rigid substrate. Therefore, the separation operation is simple and reliable.
  • the Step 402 for forming a motherboard comprising multiple flexible display panels can further include the following steps, as illustrated in FIG. 5 .
  • Step S501 coating an organic resin layer on the first flexible substrate when the rigid substrate is magnetized.
  • the organic resin is a polyimide doped with a magnetic material
  • Step S502 performing a curing treatment to the organic resin to form a second flexible substrate.
  • a temperature range of the curing treatment can be set from 300°C to 400°C.
  • Step S503 using the first flexible substrate and the second flexible substrate as a base substrate to form a motherboard comprising multiple flexible display panels.
  • a too large thickness of the second flexible substrate may increase the total thickness of the flexible display panels, while a too small thickness of the second flexible substrate may not sufficiently alleviate the roughness of the first flexible substrate.
  • a thickness of the second flexible substrate can be in a range of 10 ⁇ m to 15 ⁇ m.
  • the disclosed method can further include the following step, as illustrated in FIG. 5 .
  • Step S504 forming a planarization layer by stacking a silicon nitride film and a silicon oxide film sequentially on the second flexible substrate.
  • the embodiment of the disclosed method is particularly useful for fabricating a flexible OLED.
  • the silicon nitride film and the silicon oxide film can be not only used as the planarization layer, but also as a barrier layer for preventing the oxygen and water in the external environment from entering the flexible OLED and from causing damage to the flexible OLED.
  • planarization layer is not limited to the stacked silicon nitride film and silicon oxide film. Any other suitable film of similar material can be selected to form the planarization layer, which is not limited herein.
  • the disclosed method can also be applied to fabricate active driving flexible display panels. After performing Step S102 for cutting the motherboard into multiple separate flexible display panels, and before performing Step S103 for demagnetizing the rigid substrate, the method can further include the following step, as illustrated in FIG. 5 .
  • Step S505 binding a flexible printed circuit board onto each flexible display panel.
  • the binding process can be performed when the rigid substrate is magnetized.
  • the rigid substrate that is magnetized can attract the magnetic first flexible substrate of the motherboard.
  • Step 103 can be performed to separate the motherboard from the rigid substrate by demagnetizing the rigid substrate. The separation operation is simple and reliable.
  • the rigid substrate that is magnetisable may be a rigid substrate capable of charging and discharging.
  • the rigid substrate in the Step S102, the rigid substrate can be charged to have magnetism, and in the step S103, the rigid substrate can be discharged to revoke the magnetism.
  • the changing and discharging process can provide a quick and simple control of the generation and revocation of the magnetism of the rigid substrate.
  • any other suitable method can be used to generate or revoke the magnetism of the rigid substrate, and should not be limited herein.
  • a magnet can be placed on a side of the rigid substrate that is away from the first flexible substrate to make the rigid substrate having magnetism. And the magnetism can be revoked by removing the magnet from the rigid substrate.
  • FIGS. 6 and 7 schematic structural diagrams of a flexible display substrate are shown.
  • the flexible display substrate can include a magnetic first flexible substrate 1 and multiple display units 2 on the first flexible substrate 1.
  • each display unit can be an organic electroluminescent structure including an anode, a light emitting layer, and a cathode.
  • the flexible display substrate include a magnetic first flexible substrate
  • the rigid substrate that is magnetized can attract the magnetic first flexible substrate of the motherboard.
  • the warping of the motherboard can be prevented during the cutting process, which may not only facilitate the cutting process, but also avoid potential damage to the flexible display panels, thereby improving the yield of the flexible display panels.
  • the first flexible substrate is a cured polyimide film that is doped by a magnetic material.
  • the magnetic material is doped in the first flexible substrate
  • the first flexible substrate can contain more magnetic material if the thickness of the first flexible substrate is larger, therefore the first flexible substrate can have more magnetism. That is, the thickness of the first flexible substrate is positively proportional to the magnetic magnitude of the first flexible substrate. Therefore, a first flexible substrate having a too small thickness may not have enough magnetic force to attract the rigid substrate, which may cause warping of the motherboard during the cutting process. On the other hand, a first flexible substrate having a too large thickness may increase the total thickness of the flexible display panels. Based on the above factors, in some embodiments, a thickness of the first flexible substrate can be in a range of 5 ⁇ m to 10 ⁇ m. However, the thickness of the first flexible substrate can be adjusted according to actual needs, and should not be limited herein.
  • the doped magnetic material can be any suitable material that can have magnetism, such as iron-chromium-cobalt particles, aluminum-nickel-cobalt particles, samarium-cobalt particles, neodymium-iron-boron particles, etc.
  • the doping ratio of the magnetic material in the first flexible substrate is positively proportional to the magnetic magnitude of the first flexible substrate, thus the first flexible substrate can have more magnetism if the doping ratio of the magnetic material of the first flexible substrate is larger. Therefore, a first flexible substrate having a too small doping ratio of the magnetic material may not have enough magnetic force to attract the rigid substrate, which may cause warping of the motherboard during the cutting process. On the other hand, a first flexible substrate having a too large doping ratio of the magnetic material may decrease the flexibility of the flexible display panels. Based on the above factors, in some embodiments, a mass ratio of the magnetic material in the first flexible substrate can be in a range of 15% to 25%. However, the doping ratio of the magnetic material of the first flexible substrate can be adjusted according to actual needs, and should not be limited herein.
  • the flexible display substrate can further include a second flexible substrate 3 between the first flexible substrate 1 and the display units 2.
  • the second flexible substrate 3 can alleviate the roughness of the first flexible substrate and provide a smooth substrate to the flexible display panels.
  • the material of the second flexible substrate 3 can be an organic resin layer film, such as a polyimide (PI) gel film, or any other suitable organic resin film.
  • a too large thickness of the second flexible substrate may increase the total thickness of the flexible display panels, while a too small thickness of the second flexible substrate may not sufficiently alleviate the roughness of the first flexible substrate.
  • a thickness of the second flexible substrate can be in a range of 10 ⁇ m to 15 ⁇ m.
  • the flexible display substrate can further include a planarization layer 4 between the second flexible substrate 3 and the display units 2.
  • the planarization layer 4 can further alleviate the roughness of the first flexible substrate and provide a more smooth substrate to the flexible display panels.
  • the planarization layer 4 can include a silicon nitride film 41 and a silicon oxide film 42 stacked sequentially on the second flexible substrate 3. It should be noted that, the silicon nitride film 41 can be located above or under the silicon oxide film 42. The embodiment of the disclosed method is particularly useful for fabricating a flexible OLED.
  • the silicon nitride film and the silicon oxide film can be not only used as the planarization layer, but also as a barrier layer for preventing the oxygen and water in the external environment to enter the flexible OLED to cause damage to the flexible OLED.
  • planarization layer is not limited to the stacked silicon nitride film and silicon oxide film. Any other suitable film of similar material can be selected to form the planarization layer, which is not limited herein.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Electroluminescent Light Sources (AREA)
EP16871748.6A 2016-01-05 2016-12-23 Method of fabricating a flexible display substrate Active EP3400612B1 (en)

Applications Claiming Priority (2)

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CN201610006102.3A CN105428393B (zh) 2016-01-05 2016-01-05 一种柔性显示基板、柔性显示面板的制作方法及相关装置
PCT/CN2016/111742 WO2017118302A1 (en) 2016-01-05 2016-12-23 Flexible display substrate, flexible display panel, and flexible display apparatus, and fabrication methods thereof

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US10128451B2 (en) 2018-11-13
EP3400612A4 (en) 2019-08-28
CN105428393B (zh) 2019-10-18
EP3400612A1 (en) 2018-11-14
CN105428393A (zh) 2016-03-23
WO2017118302A1 (en) 2017-07-13

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