EP2606164A1 - Electrolyte and process for the deposition of copper-tin alloy layers - Google Patents
Electrolyte and process for the deposition of copper-tin alloy layersInfo
- Publication number
- EP2606164A1 EP2606164A1 EP11749145.6A EP11749145A EP2606164A1 EP 2606164 A1 EP2606164 A1 EP 2606164A1 EP 11749145 A EP11749145 A EP 11749145A EP 2606164 A1 EP2606164 A1 EP 2606164A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- electrolyte
- acid
- copper
- tin
- metals
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000003792 electrolyte Substances 0.000 title claims abstract description 100
- 238000000034 method Methods 0.000 title claims abstract description 28
- 230000008021 deposition Effects 0.000 title claims abstract description 20
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical group [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 title claims description 27
- 238000000151 deposition Methods 0.000 claims abstract description 21
- 229910052751 metal Inorganic materials 0.000 claims abstract description 20
- 239000002184 metal Substances 0.000 claims abstract description 20
- 150000002739 metals Chemical class 0.000 claims abstract description 17
- 239000008139 complexing agent Substances 0.000 claims abstract description 13
- 239000000080 wetting agent Substances 0.000 claims abstract description 13
- 239000011135 tin Substances 0.000 claims description 23
- 239000010949 copper Substances 0.000 claims description 20
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 19
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 18
- 229910052802 copper Inorganic materials 0.000 claims description 18
- -1 sulfated aromatic alkyl aryl ether compound Chemical class 0.000 claims description 17
- 229910052718 tin Inorganic materials 0.000 claims description 17
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 16
- 239000002253 acid Substances 0.000 claims description 16
- 150000003839 salts Chemical class 0.000 claims description 13
- 150000007513 acids Chemical class 0.000 claims description 12
- 150000002500 ions Chemical class 0.000 claims description 11
- YODZTKMDCQEPHD-UHFFFAOYSA-N thiodiglycol Chemical compound OCCSCCO YODZTKMDCQEPHD-UHFFFAOYSA-N 0.000 claims description 10
- 150000003568 thioethers Chemical class 0.000 claims description 10
- 229940098779 methanesulfonic acid Drugs 0.000 claims description 8
- 229950006389 thiodiglycol Drugs 0.000 claims description 8
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 7
- FFEARJCKVFRZRR-UHFFFAOYSA-N methionine Chemical compound CSCCC(N)C(O)=O FFEARJCKVFRZRR-UHFFFAOYSA-N 0.000 claims description 7
- 229930182817 methionine Natural products 0.000 claims description 7
- 229910052725 zinc Inorganic materials 0.000 claims description 7
- 239000011701 zinc Substances 0.000 claims description 7
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 6
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims description 5
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 5
- 239000001630 malic acid Substances 0.000 claims description 5
- 235000011090 malic acid Nutrition 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 claims description 4
- 229910001297 Zn alloy Inorganic materials 0.000 claims description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 claims description 4
- 239000000470 constituent Substances 0.000 claims description 3
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 claims description 2
- IEORSVTYLWZQJQ-UHFFFAOYSA-N 2-(2-nonylphenoxy)ethanol Chemical compound CCCCCCCCCC1=CC=CC=C1OCCO IEORSVTYLWZQJQ-UHFFFAOYSA-N 0.000 claims description 2
- KSJBMDCFYZKAFH-UHFFFAOYSA-N 2-(2-sulfanylethylsulfanyl)ethanethiol Chemical compound SCCSCCS KSJBMDCFYZKAFH-UHFFFAOYSA-N 0.000 claims description 2
- VFBJXXJYHWLXRM-UHFFFAOYSA-N 2-[2-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]ethylsulfanyl]ethyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCCSCCOC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 VFBJXXJYHWLXRM-UHFFFAOYSA-N 0.000 claims description 2
- ODJQKYXPKWQWNK-UHFFFAOYSA-N 3,3'-Thiobispropanoic acid Chemical compound OC(=O)CCSCCC(O)=O ODJQKYXPKWQWNK-UHFFFAOYSA-N 0.000 claims description 2
- QRQVZZMTKYXEKC-UHFFFAOYSA-N 3-(3-hydroxypropylsulfanyl)propan-1-ol Chemical compound OCCCSCCCO QRQVZZMTKYXEKC-UHFFFAOYSA-N 0.000 claims description 2
- GZWIBBZCQMNKPK-UHFFFAOYSA-N 3-(3-sulfanylpropylsulfanyl)propane-1-thiol Chemical compound SCCCSCCCS GZWIBBZCQMNKPK-UHFFFAOYSA-N 0.000 claims description 2
- BQWRKNRBLGXYDF-UHFFFAOYSA-N 4-(4-hydroxybutylsulfanyl)butan-1-ol Chemical compound OCCCCSCCCCO BQWRKNRBLGXYDF-UHFFFAOYSA-N 0.000 claims description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 2
- GHKOFFNLGXMVNJ-UHFFFAOYSA-N Didodecyl thiobispropanoate Chemical compound CCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCC GHKOFFNLGXMVNJ-UHFFFAOYSA-N 0.000 claims description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 2
- PDYXSJSAMVACOH-UHFFFAOYSA-N [Cu].[Zn].[Sn] Chemical compound [Cu].[Zn].[Sn] PDYXSJSAMVACOH-UHFFFAOYSA-N 0.000 claims description 2
- 239000001361 adipic acid Substances 0.000 claims description 2
- 235000011037 adipic acid Nutrition 0.000 claims description 2
- 229910052783 alkali metal Inorganic materials 0.000 claims description 2
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 claims description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 2
- 235000015165 citric acid Nutrition 0.000 claims description 2
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 claims description 2
- TVYHCEXFDOSFIF-UHFFFAOYSA-N dodecyl 2-(2-dodecoxy-2-oxoethyl)sulfanylacetate Chemical compound CCCCCCCCCCCCOC(=O)CSCC(=O)OCCCCCCCCCCCC TVYHCEXFDOSFIF-UHFFFAOYSA-N 0.000 claims description 2
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 claims description 2
- TVCSSJHLVLMADJ-UHFFFAOYSA-N ethyl 2-(2-ethoxy-2-oxoethyl)sulfanylacetate Chemical compound CCOC(=O)CSCC(=O)OCC TVCSSJHLVLMADJ-UHFFFAOYSA-N 0.000 claims description 2
- VCXUFKFNLUTDAX-UHFFFAOYSA-N ethyl 3-(3-ethoxy-3-oxopropyl)sulfanylpropanoate Chemical compound CCOC(=O)CCSCCC(=O)OCC VCXUFKFNLUTDAX-UHFFFAOYSA-N 0.000 claims description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 2
- 239000011976 maleic acid Substances 0.000 claims description 2
- ZQUQLLPRRJVUES-UHFFFAOYSA-N methyl 2-(2-methoxy-2-oxoethyl)sulfanylacetate Chemical compound COC(=O)CSCC(=O)OC ZQUQLLPRRJVUES-UHFFFAOYSA-N 0.000 claims description 2
- 229920000847 nonoxynol Polymers 0.000 claims description 2
- PUUARXRJNUGOBB-UHFFFAOYSA-N octyl 2-(2-octoxy-2-oxoethyl)sulfanylacetate Chemical compound CCCCCCCCOC(=O)CSCC(=O)OCCCCCCCC PUUARXRJNUGOBB-UHFFFAOYSA-N 0.000 claims description 2
- QADJHAOXTKCYFT-UHFFFAOYSA-N octyl 3-(3-octoxy-3-oxopropyl)sulfanylpropanoate Chemical compound CCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCC QADJHAOXTKCYFT-UHFFFAOYSA-N 0.000 claims description 2
- 235000006408 oxalic acid Nutrition 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 239000011574 phosphorus Substances 0.000 claims description 2
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical compound CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 239000011975 tartaric acid Substances 0.000 claims description 2
- 235000002906 tartaric acid Nutrition 0.000 claims description 2
- UVZICZIVKIMRNE-UHFFFAOYSA-N thiodiacetic acid Chemical compound OC(=O)CSCC(O)=O UVZICZIVKIMRNE-UHFFFAOYSA-N 0.000 claims description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 2
- PWWSSIYVTQUJQQ-UHFFFAOYSA-N distearyl thiodipropionate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCCCCCC PWWSSIYVTQUJQQ-UHFFFAOYSA-N 0.000 claims 1
- 238000004070 electrodeposition Methods 0.000 claims 1
- MYWWWNVEZBAKHR-UHFFFAOYSA-N methyl 3-(3-methoxy-3-oxopropyl)sulfanylpropanoate Chemical compound COC(=O)CCSCCC(=O)OC MYWWWNVEZBAKHR-UHFFFAOYSA-N 0.000 claims 1
- 229910000906 Bronze Inorganic materials 0.000 abstract description 15
- 239000000654 additive Substances 0.000 abstract description 6
- 150000003464 sulfur compounds Chemical class 0.000 abstract description 3
- 230000008092 positive effect Effects 0.000 abstract description 2
- 238000007747 plating Methods 0.000 description 12
- 239000010974 bronze Substances 0.000 description 10
- 125000003118 aryl group Chemical group 0.000 description 9
- 239000003963 antioxidant agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 5
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 5
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- ODJQKYXPKWQWNK-UHFFFAOYSA-L 3-(2-carboxylatoethylsulfanyl)propanoate Chemical compound [O-]C(=O)CCSCCC([O-])=O ODJQKYXPKWQWNK-UHFFFAOYSA-L 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 150000005840 aryl radicals Chemical class 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 2
- 229910001431 copper ion Inorganic materials 0.000 description 2
- BSXVKCJAIJZTAV-UHFFFAOYSA-L copper;methanesulfonate Chemical compound [Cu+2].CS([O-])(=O)=O.CS([O-])(=O)=O BSXVKCJAIJZTAV-UHFFFAOYSA-L 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000002390 heteroarenes Chemical class 0.000 description 2
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- AICMYQIGFPHNCY-UHFFFAOYSA-J methanesulfonate;tin(4+) Chemical compound [Sn+4].CS([O-])(=O)=O.CS([O-])(=O)=O.CS([O-])(=O)=O.CS([O-])(=O)=O AICMYQIGFPHNCY-UHFFFAOYSA-J 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000006259 organic additive Substances 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229910001432 tin ion Inorganic materials 0.000 description 2
- WHOZNOZYMBRCBL-OUKQBFOZSA-N (2E)-2-Tetradecenal Chemical compound CCCCCCCCCCC\C=C\C=O WHOZNOZYMBRCBL-OUKQBFOZSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- BZOVBIIWPDQIHF-UHFFFAOYSA-N 3-hydroxy-2-methylbenzenesulfonic acid Chemical compound CC1=C(O)C=CC=C1S(O)(=O)=O BZOVBIIWPDQIHF-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- 229910017755 Cu-Sn Inorganic materials 0.000 description 1
- 229910017927 Cu—Sn Inorganic materials 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- MUWPITKDYNUQQC-UHFFFAOYSA-N [Sn].[Cu].CS(=O)(=O)O Chemical compound [Sn].[Cu].CS(=O)(=O)O MUWPITKDYNUQQC-UHFFFAOYSA-N 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 239000013566 allergen Substances 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 230000000711 cancerogenic effect Effects 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 231100000315 carcinogenic Toxicity 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010668 complexation reaction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 239000004312 hexamethylene tetramine Substances 0.000 description 1
- 235000010299 hexamethylene tetramine Nutrition 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 229960004011 methenamine Drugs 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229940044654 phenolsulfonic acid Drugs 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 229940005657 pyrophosphoric acid Drugs 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- RPACBEVZENYWOL-XFULWGLBSA-M sodium;(2r)-2-[6-(4-chlorophenoxy)hexyl]oxirane-2-carboxylate Chemical compound [Na+].C=1C=C(Cl)C=CC=1OCCCCCC[C@]1(C(=O)[O-])CO1 RPACBEVZENYWOL-XFULWGLBSA-M 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000005494 tarnishing Methods 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/16—Apparatus for electrolytic coating of small objects in bulk
Definitions
- the present invention relates to an electrolyte and a process for depositing bronze alloys on consumer goods and industrial articles.
- the electrolyte of the invention comprises, in addition to the metals to be deposited and additives such as wetting agents, complexing agents and brighteners, in particular thioether derivatives which have a positive effect in the corresponding process for the deposition of the bronzes .
- Consumer goods or consumer articles as are defined in the consumer articles regulations are upgraded by means of thin, oxidation-stable metal layers for decorative reasons and to prevent corrosion. These layers have to be mechanically stable and should also display no tarnishing or wear phenomena on prolonged use. Since 2001, the sale of consumer goods coated with nickel- containing upgrading alloys has no longer been permitted in Europe under EU guideline 94/27/EC or been possible only with observance of strict conditions since nickel and nickel-containing metal layers are contact allergens. Bronze alloys in particular have become established as a replacement for nickel- containing upgrading layers, and mass-produced consumer goods can be upgraded inexpensively in electrochemical barrel or rack plating processes to produce allergen- free, attractive products by means of these.
- the solderability of the resulting layer and if appropriate its mechanical adhesion are the critical properties of the layer to be produced.
- the appearance of the layers is generally less important than their functionality.
- the decorative effect (gloss and brightness) and durability of the resulting layer combined with an ideally unchanged appearance are the important target parameters .
- Known processes for producing bronze layers include the conventional processes using cyanide-containing and thus highly toxic, alkaline baths and also various electrochemical processes which can, according to the composition of their electrolytes, usually be assigned to one of two main groups observed in the prior art: processes using electrolytes based on organosulfonic acid or processes using baths based on diphosphoric acid (pyrophosphoric acid) .
- EP1111097A2 describes an electrolyte which contains an organosulfonic acid and ions of tin and of copper together with dispersants and brighteners and also optionally antioxidants.
- EP1146148A2 describes a cyanide-free copper-tin electrolyte which is based on diphosphoric acid and contains the reaction product of an amine and an epichlorohydrin in a molar ratio of 1:1 together with a cationic surfactant.
- the amine can be hexamethylene- tetramine. It is used in electrolytic deposition at current densities of 0.5, 1.5, 2.5 and 3.0 A/dm 2 .
- WO2004/005528 concerns a cyanide-free diphosphoric acid-copper-tin electrolyte which contains an additive composed of an amine derivative, an epichlorohydrin and a glycidyl ether compound in a molar ratio of 1:0.5-2:0.1-5. It was an object of this document to widen the current density range in which uniform deposition of the metals in a shiny layer can be achieved. It is explicitly stated that such deposition can only be achieved when the additive added is made up of all three of the abovementioned components. Cyanide-free acidic bronze electrolytes are likewise known. As such baths often contain one or more alkylsulfonic acids, usually in combination with further additives such as wetting agents, complexing agents, brighteners, etc.
- EP1408141 Al discloses a process for the electro ⁇ chemical deposition of bronzes, in which an acidic electrolyte containing tin and copper ions together with an alkylsulfonic acid and an aromatic, nonionic wetting agent is used.
- EP1874982A1 describes the deposition of bronzes from an electrolyte comprising copper and tin ions together with alkylsulfonic acids and a wetting agent. Sulfur compounds can advantageously also be present in the electrolyte proposed here. However, these are used here in combination with nonionic aromatic wetting agents.
- EP1325175B1 likewise advises the presence of particular sulfur compounds of the general formula -R-Z-R'- in acidic bronze electrolytes.
- the aim is to achieve equalization of the standard potentials of Cu(II) and Sn(II) ions by selective complexation of the copper.
- the addition of antioxidants appears to be indispensable in order to prevent damaging Sn(II) oxidation.
- Different coating processes are usually used in the electroplating industry as a function of the type and nature of the parts to be coated. The processes differ, inter alia, in respect of the current densities which can be employed. Mention may be made of essentially 3 different coating processes.
- medium working current densities are employed (order of magnitude: 0.2-5 A/dm 2 )
- the electrolyte comprises the following further constituents :
- an ionic wetting agent in the form of a salt of a sulfonated or sulfated aromatic alkyl aryl ether compound
- This electrolyte makes it possible to produce very uniform and extremely bright deposits of copper-tin bronzes on consumer goods and industrial articles, especially in the low current density range.
- the electrolyte used has good stability, in particular in respect of Sn(IV) precipitates. This leads, completely surprisingly, to the addition of further antioxidants to the electrolyte to be dispensed with. In a preferred embodiment, no further antioxidants, in particular hydroquinone, catechol, resorcinol, phenolsulfonic acid, cresolsulfonic acid, etc., are therefore present in the electrolyte of the invention. This would not have been expected by a person skilled in the art in the light of the prior art.
- the metals copper and tin or copper, tin and zinc to be deposited are present in solution as their ions.
- the metals are used as salts with anions which are either already present in the electrolyte or do not lead to any increase in the concentration of an anion constituent in the electrolyte by further introduction of the corresponding metal salt. They are therefore very preferably introduced in the form of water-soluble salts which are preferably selected from the group consisting of alkylsulfonates, carbonates, hydroxidecarbonates , hydrogencarbonates , hydroxides, oxidehydroxides , oxides or combinations thereof.
- the metals can also be introduced in the form of a soluble anode into the electrolyte in a preferred embodiment.
- the type and amount of salts introduced in the electrolytes can be decisive for the color of the resulting decorative bronze layers and can be set according to customer requirements.
- the metals to be deposited are, as indicated, present in ionically dissolved form in the electrolyte for the application of decorative bronze layers on consumer goods and industrial articles.
- the ion concentration of copper can be set in the range from 0.2 to 10 g/1 of electrolyte, preferably from 0.3 to 4 g/1 of electrolyte, the ion concentration of tin can be set in the range from 1.0 to 30 g/1 of electrolyte, preferably 2-20 g/1 of electrolyte, and, if present, the ion concentration of zinc can be set in the range from 0.5 to 20 g/1 of electrolyte, preferably 1-3 g/1 of electrolyte .
- the electrolyte of the invention is an acidic electrolyte based on one or more alkylsulfonic acids.
- concentration of the acids in the electrolyte can vary in the range 100-300 ml/1 of electrolyte, preferably 150-250 ml/1 and very particularly preferably about 200 ml/1.
- alkylsul fonic acids in the electrolyte it is possible to use those which would be considered by a person skilled in the art for such purposes.
- the term alkyl refers to a linear or any type of branched alkyl radical having from 1 to 10, preferably from 1 to 5 and very particularly preferably from 1 to 3, carbon atoms.
- alkylsulfonic acids selected from the group consisting of methanesulfonic acid, ethanesulfonic acid and n-propanesulfonic acid.
- the abovementioned metals to be deposited are advantageously used in the form of the water-soluble alkanesulfonate salts.
- very particular preference is given to introducing the metals to be deposited as salts of methanesulfonic acid in such a way that the resulting ion concentration is in the range from 0.3 to 4 gram of copper, from 2 to 20 gram of tin and from 0 to 3 gram of zinc, in each case per liter of electrolyte.
- the electrolyte used contains ionic wetting agents/brighteners .
- the wetting agents are formed from salts of a sulfonated or sulfated aromatic alkyl aryl ether compound. Such wetting agents are adequately known to those skilled in the art ("Die galvanische Abscheidung von Zinn und Zinnlegtechniken", Manfred Jordan, Eugen G. Leuze Verlag, Bad Saulgau) .
- the sulfonated or sulfated aromatic alkyl aryl ether compounds used contain an alkyl group joined via an oxygen bridge to an aryl radical.
- alkyl refers to a radical which in the present case contains a linear or a type of branched alkyl radical having from 1 to 10, preferably from 1 to 5 and very particularly preferably from 1 to 3, carbon atoms.
- aryl radicals it is possible for a person skilled in the art to select those which can be subsumed under the formulae (C7-C19) -alkylaryl, (C6-Ci 8 )- aryl, (C7-C19) -aralkyl, (C 3 -Ci 8 ) -heteroaryl, (C4-C19) - alkylheteroaryl , (C4-C19) -heteroaralkyl .
- alkyl aryl ether compound selected from the group consisting of aryl ethoxylates, in particular ⁇ -naphthol ethoxylate, nonylphenol ethoxylate.
- the sulfonated or sulfated position can be present either in the aromatic or in the aliphatic part of the compound. It is preferably present in the aromatic part of the compound.
- alkali metal salts or ammonium ions of the corresponding acids are particularly advantageously selected from the group consisting of sodium and potassium.
- This additive e.g. sodium salt of sulfonated or sulfated aryl ethoxylates, in particular Na salt of sulfonated and sulfated alkylphenol ethoxylates
- this brightener acts as wetting agent.
- the wetting agents mentioned are advantageously used in a concentration of 0.01-10 ml/1 of electrolyte, preferably 0.2-5 ml/1 of electrolyte and particularly preferably 0.5-1 ml/1 of electrolyte.
- a complexing agent should likewise be present in the electrolyte.
- the complexing agent has, inter alia, the task of preventing any Sn(IV) ions formed from being precipitated as tin dioxide. Without addition of complexing agents, the electrolyte becomes turbid due to the tin dioxide formed after only a short time. The bronze depositions become increasingly matt as a result. The turbidity caused by finely divided Sn0 2 significantly increases the consumption of other organic additives. The addition of the complexing agent greatly reduces the degree to which the electrolyte becomes turbid and the quality of the bronze layers remains constantly good (shiny and white) with increasing usage of the bath and the consumption of organic additives being minimized.
- complexing agents it is possible to select those compounds which would be considered for this purpose by a person skilled in the art.
- the preferred compounds are based on (hydroxy) dicarboxylic or tricarboxylic acids. Particular preference is given to using complexing agents selected from the group consisting of oxalic acid, malonic acid, succinic acid, tartaric acid, malic acid, citric acid, maleic acid, glutaric acid, adipic acid. Very particular preference is given to malic acid in this context.
- the complexing agents mentioned are advantageously used in a concentration of 1-300 g/1 of electrolyte, preferably 20-200 g/1 of electrolyte, particularly preferably 50-150 g/1 of electrolyte.
- the electrolyte of the invention is also admixed with one or more dialkyl thioether derivatives.
- dialkyl thioether derivatives e.g. thiodiglycol propoxylate or thiodiglycol ethoxylate
- alkyl radicals it is again possible to use those mentioned above.
- the alkyl radicals may be substituted by further functional groups. The latter can preferably be selected from the group consisting of hydroxy, carboxylic acid (ester), thiol, amino.
- dialkyl thioether derivatives are advantageously used in a concentration of 0.01-20 g/l of electrolyte, preferably 0.1-5 g/l of electrolyte, particularly preferably 0.3-1 g/l of electrolyte.
- the pH of the electrolyte is in the strongly acidic range because of the addition of the acids. It is set so that a range from -1 to 4, preferably a range from -0.5 to 2 and very particularly preferably a pH of about 1, results.
- the present invention proposes an electrolytic deposition process for the electrochemical application of bronze alloy layers to consumer goods and industrial articles, in which the substrates to be coated are dipped into an electrolyte according to the invention and an appropriate flow of current is provided.
- the preferred embodiments of the electrolyte which have been discussed above apply analogously to the process presented here.
- the electrolyte is preferably heated to a temperature in the range from 20 to 40°C, preferably about 30°C. It is possible to set a current density which is in the range from 0.01 to 100 Ampere per square decimeter [A/dm 2 ] and is dependent on the type of the plating facility. Thus, current densities in the range from 0.01 to 0.75 A/dm 2 are preferred, from 0.025 to 0.5 A/dm 2 are more preferred and about 0.1-0.3 A/dm 2 are very particularly preferred, in barrel plating processes.
- soluble anodes preference is given to using anodes composed of a material selected from the group consisting of electrolytic copper, phosphorus-containing copper, tin, copper-tin alloy, copper-zinc alloy and copper-tin-zinc alloy. Particular preference is given to combinations of different soluble anodes composed of these materials .
- the preferred anodes for the copper- tin electrolyte based on alkylsulfonic acid are copper- tin alloy anodes having a copper content of from ⁇ 90% by weight to >50% by weight and a tin content of from >10% by weight to ⁇ 50% by weight.
- the anodes more preferably comprise 85-60% by weight of copper and 40-15% by weight of tin.
- the copper content of the anode is very preferably about 4 times the tin content. This is also the case when other elements such as, preferably, zinc are optionally present in the soluble anode .
- the electrolyte also does not contain any materials which are harmful to health, which is a further advantage over other copper-tin electrolyte systems based on methanesulfonic acid.
- antioxidants inter alia, are normally used to prevent oxidation of tin.
- hydroquinone carcinogenic
- catechol catechol
- resorcinol both harmful to health
- (C6-Cis) -aryl is an aromatic system which is made up entirely of from 6 to 18 carbon atoms.
- such systems are selected from the group consisting of phenyl, naphthyl, anthracenyl, etc.
- (C7-C19) -Alkylaryl radicals are radicals which bear a (Ci-Cs) -alkyl radical on the (C6-Cis) -aryl radical.
- (C7-C19) -Aralkyl radicals are radicals which have a (C6-Cis) -aryl radical on a (Ci-C 8 ) -alkyl radical by which the radical is bound to the molecule concerned.
- (C 3 -Ci 8 ) -heteroaryl radicals are aromatic systems having at least three carbon atoms. Further heteroatoms are additionally present in the aromatic system. These are preferably nitrogen and/or sulfur. Such heteroaromatics may be found, for example, in the Bayer-Walter, Lehrbuch der Organischen Chemie, S. Hirzel Verlag, 22nd edition, p. 703 ff.
- (C4-C19) - alkylheteroaryl is a (C3-C18) -heteroaryl radical which is supplemented by a (Ci-C 8 ) -alkyl substituent. Bonding to the molecule concerned is via the heteroaromatics.
- (C4-C19) -Heteroaralkyl is a (C 3 -Ci 8 )- heteroaryl radical which is bound to the molecule concerned via a (Ci-C 8 ) -alkyl substituent.
- Electrolyte formulation according to the invention is a mixture of:
- the optimal current density range for barrel applications is from 0.1 to 0.3 A/dm 2 .
- the anodes for the copper-tin electrolyte based on methanesulfonic acid are copper-tin alloy anodes having a copper content of 80% by weight and a tin content of 20% by weight [commercially available from Goodfellow GmbH] .
- Density of the coating about 8.2 g/cm 3 (calculated)
- Anodes Cu-Sn 80/20 1 liter glass beaker/200 rpm/6 cm magnetic stirrer bar/ movement of goods
- the experimental depositions were carried out on 0.5 dm 2 brass plates at 0.2 A/dm 2 /10 min and 0.5 A/dm 2 /5 min.
- dialkyl thioether derivative was replaced by the following substances (see table) in these experiments.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102010034646 | 2010-08-17 | ||
| PCT/EP2011/063923 WO2012022689A1 (en) | 2010-08-17 | 2011-08-12 | Electrolyte and process for the deposition of copper-tin alloy layers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP2606164A1 true EP2606164A1 (en) | 2013-06-26 |
Family
ID=44514714
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP11749145.6A Withdrawn EP2606164A1 (en) | 2010-08-17 | 2011-08-12 | Electrolyte and process for the deposition of copper-tin alloy layers |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20130140185A1 (https=) |
| EP (1) | EP2606164A1 (https=) |
| JP (1) | JP2013534276A (https=) |
| KR (1) | KR20130098304A (https=) |
| CN (1) | CN103069054B (https=) |
| DE (1) | DE102011008836B4 (https=) |
| WO (1) | WO2012022689A1 (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE202021004169U1 (de) | 2021-07-02 | 2022-12-07 | Umicore Galvanotechnik Gmbh | Bronzeschicht als Edelmetallersatz in Smart Cards |
| WO2023275215A1 (de) | 2021-07-02 | 2023-01-05 | Umicore Galvanotechnik Gmbh | Bronzeschichten als edelmetallersatz |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102012008544A1 (de) | 2012-05-02 | 2013-11-07 | Umicore Galvanotechnik Gmbh | Verchromte Verbundwerkstoffe ohne Nickelschicht |
| EP2735627A1 (en) * | 2012-11-26 | 2014-05-28 | ATOTECH Deutschland GmbH | Copper plating bath composition |
| US20160298249A1 (en) * | 2014-09-30 | 2016-10-13 | Rohm And Haas Electronic Materials Llc | Cyanide-free electroplating baths for white bronze based on copper (i) ions |
| ES2762748T3 (es) | 2015-05-22 | 2020-05-25 | Basf Se | Beta-naftoletersulfonatos, procedimiento para su preparación y su uso como mejoradores de brillo |
| CN105220189A (zh) * | 2015-10-30 | 2016-01-06 | 无锡市嘉邦电力管道厂 | 一种钐-锡-铜合金电镀液及其电镀方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US20020104763A1 (en) * | 1998-11-05 | 2002-08-08 | Isamu Yanada | Tin - copper alloy electroplating bath and plating process therewith |
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| US3833486A (en) * | 1973-03-26 | 1974-09-03 | Lea Ronal Inc | Cyanide-free electroplating |
| US5730854A (en) * | 1996-05-30 | 1998-03-24 | Enthone-Omi, Inc. | Alkoxylated dimercaptans as copper additives and de-polarizing additives |
| US6251249B1 (en) * | 1996-09-20 | 2001-06-26 | Atofina Chemicals, Inc. | Precious metal deposition composition and process |
| JP3433291B2 (ja) * | 1999-09-27 | 2003-08-04 | 石原薬品株式会社 | スズ−銅含有合金メッキ浴、スズ−銅含有合金メッキ方法及びスズ−銅含有合金メッキ皮膜が形成された物品 |
| JP2001181889A (ja) * | 1999-12-22 | 2001-07-03 | Nippon Macdermid Kk | 光沢錫−銅合金電気めっき浴 |
| JP3455712B2 (ja) * | 2000-04-14 | 2003-10-14 | 日本ニュークローム株式会社 | 銅−スズ合金めっき用ピロリン酸浴 |
| DE10046600C2 (de) * | 2000-09-20 | 2003-02-20 | Schloetter Fa Dr Ing Max | Elektrolyt und Verfahren zur Abscheidung von Zinn-Kupfer-Legierungsschichten und Verwendung des Elektrolyten |
| JP2004510053A (ja) * | 2000-09-20 | 2004-04-02 | デーエル.−イーエヌゲー.マックス シュレッター ゲーエムベーハー ウント ツェーオー.カーゲー | 錫−銅合金層を析出させるための電解質及び方法 |
| DE60226196T2 (de) * | 2001-05-24 | 2009-05-14 | Shipley Co., L.L.C., Marlborough | Zinn-Plattieren |
| BR0211457A (pt) * | 2001-07-27 | 2004-08-17 | Pirelli | Processo eletrolìtico para depositar cobre sobre um cabo de aço, cabo de aço revestido com uma camada de latão, cordonel metálico e artigo feito de um material elastomérico vulcanizado |
| JP4698904B2 (ja) * | 2001-09-20 | 2011-06-08 | 株式会社大和化成研究所 | 錫又は錫系合金めっき浴、該めっき浴の建浴用又は維持・補給用の錫塩及び酸又は錯化剤溶液並びに該めっき浴を用いて製作した電気・電子部品 |
| JP3876383B2 (ja) * | 2002-06-03 | 2007-01-31 | 京都市 | 銅−錫合金めっき浴及び該めっき浴を用いた銅−錫合金めっき方法 |
| JP4249438B2 (ja) * | 2002-07-05 | 2009-04-02 | 日本ニュークローム株式会社 | 銅―錫合金めっき用ピロリン酸浴 |
| ES2531163T3 (es) * | 2002-10-11 | 2015-03-11 | Enthone | Procedimiento y electrolito para la deposición galvánica de bronces |
| JP4332667B2 (ja) * | 2003-10-16 | 2009-09-16 | 石原薬品株式会社 | スズ及びスズ合金メッキ浴 |
| TW200613586A (en) * | 2004-07-22 | 2006-05-01 | Rohm & Haas Elect Mat | Leveler compounds |
| US20060260948A2 (en) * | 2005-04-14 | 2006-11-23 | Enthone Inc. | Method for electrodeposition of bronzes |
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2011
- 2011-01-19 DE DE102011008836A patent/DE102011008836B4/de not_active Expired - Fee Related
- 2011-08-12 CN CN201180038728.8A patent/CN103069054B/zh not_active Expired - Fee Related
- 2011-08-12 WO PCT/EP2011/063923 patent/WO2012022689A1/en not_active Ceased
- 2011-08-12 US US13/816,623 patent/US20130140185A1/en not_active Abandoned
- 2011-08-12 JP JP2013524427A patent/JP2013534276A/ja active Pending
- 2011-08-12 KR KR1020137003759A patent/KR20130098304A/ko not_active Ceased
- 2011-08-12 EP EP11749145.6A patent/EP2606164A1/en not_active Withdrawn
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020104763A1 (en) * | 1998-11-05 | 2002-08-08 | Isamu Yanada | Tin - copper alloy electroplating bath and plating process therewith |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE202021004169U1 (de) | 2021-07-02 | 2022-12-07 | Umicore Galvanotechnik Gmbh | Bronzeschicht als Edelmetallersatz in Smart Cards |
| WO2023275215A1 (de) | 2021-07-02 | 2023-01-05 | Umicore Galvanotechnik Gmbh | Bronzeschichten als edelmetallersatz |
| DE102021117095A1 (de) | 2021-07-02 | 2023-01-05 | Umicore Galvanotechnik Gmbh | Bronzeschichten als Edelmetallersatz |
| US12195869B2 (en) | 2021-07-02 | 2025-01-14 | Umicore Galvanotechnik Gmbh | Bronze layers as noble metal substitutes |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2012022689A1 (en) | 2012-02-23 |
| US20130140185A1 (en) | 2013-06-06 |
| CN103069054A (zh) | 2013-04-24 |
| JP2013534276A (ja) | 2013-09-02 |
| KR20130098304A (ko) | 2013-09-04 |
| DE102011008836A1 (de) | 2012-02-23 |
| CN103069054B (zh) | 2016-08-10 |
| DE102011008836B4 (de) | 2013-01-10 |
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