EP2333590B1 - Film antireflet et son procédé de fabrication - Google Patents

Film antireflet et son procédé de fabrication Download PDF

Info

Publication number
EP2333590B1
EP2333590B1 EP09814455.3A EP09814455A EP2333590B1 EP 2333590 B1 EP2333590 B1 EP 2333590B1 EP 09814455 A EP09814455 A EP 09814455A EP 2333590 B1 EP2333590 B1 EP 2333590B1
Authority
EP
European Patent Office
Prior art keywords
reflective film
film
wavelength
visible light
wavelength dispersion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP09814455.3A
Other languages
German (de)
English (en)
Other versions
EP2333590A4 (fr
EP2333590A1 (fr
Inventor
Takao Imaoku
Tokio Taguchi
Akiyoshi Fujii
Kazuhiko Tsuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Publication of EP2333590A1 publication Critical patent/EP2333590A1/fr
Publication of EP2333590A4 publication Critical patent/EP2333590A4/fr
Application granted granted Critical
Publication of EP2333590B1 publication Critical patent/EP2333590B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/2457—Parallel ribs and/or grooves
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet

Definitions

  • the present invention relates to an anti-reflective film and a production method thereof. More particularly, it relates to an anti-reflective film, which reduces a reflectance of visible light reflected on a surface of a substrate by being mounted on the surface of the substrate of a display panel or the like and thereby conducts anti-reflection for images in a display; and a production method thereof.
  • Displays such as CRT (cathode ray tube) displays, LCDs (liquid crystal displays), PDPs (plasma display panels), EL (electroluminescent) displays are each required to have a display surface provided with various functions of scratch-proof, anti-reflection for images, soil-proof, and the like.
  • protective members such as a protective film are attached in some cases. As this protective film, one showing anti-reflection for images is used, thereby giving the needed functions to the display surface at one time.
  • the protective film is provided with AG (anti-glare) treatment or LR (low reflection) treatment.
  • AG treatment a pattern of fine grooves is formed on the protective film surface, and by utilizing light scattering effects, the anti-reflection for images is achieved.
  • LR treatment a film with a refractive index different from that of the protective film is applied on the protective film, and by utilizing the effect of interference of light reflected on the protective film surface and light reflected on the applied film surface, the reflection is reduced (see, for example, Patent Documents 1 and 2).
  • an uneven pattern such as AG treatment
  • the thin film is heated or light-radiated.
  • a method of light radiation there may be mentioned a method including forming a thin film of ultraviolet curing resin on a transparent substrate, forming an uneven pattern on the thin film by pressing a mold having the uneven pattern on the thin film, curing the thin film by ultraviolet radiation simultaneously, and forming a thin film with the reverse shape of the uneven pattern of the mold on the transparent substrate (see, for example, Patent Document 3).
  • moth-eye structures which provide great reflection preventing effect without using the light interference technique.
  • an uneven pattern at intervals of not more than a wavelength of visible light (for example, 400 nm or shorter), that is much finer than the uneven pattern to be formed by AG treatment is arranged without any space therebetween so that changes of the refractive index at the border between the outside (air) and the product surface are artificially made sequential.
  • the product with the moth-eye structure can transmit almost all light regardless of the refractive index interface so that almost all the light reflection on the surface of the object can be avoided (see, for example, Patent Document 4).
  • WO 2008/069164 describes an antireflection film formed on a substrate 450, the antireflection film comprising a plurality of pyramidal projections 451 made of a first material and covered with a film 452 made of a second material having a higher referactive index than the first material. Further, it is investigated the dependence of the reflectivity of light reflected on the surface of the antireflection film on the wavelength of the light and on height difference d between the tops of the pyramidal projections 451 and the film 452 or on the difference in refractive indices between the material of the pyramidal projections 451 and the material of the film 452. It is clearly shown that there is some wavelength dispersion caused by the antireflection film to the reflected light.
  • US 2003/0180476 describes a wavelength dispersion only with respect to reflected light, i.e. light reflected on the surface of an antireflective film.
  • the transfer rate refers to a rate of the actual shape of the pattern to the ideal shape, wherein the difference is caused by the production method of the pattern using a mold.
  • spectral characteristics of thin films are influenced by the refraction index of the materials of the films. It does not refer at all to other properties, i.e. absorbtion coefficient of the film, concentration of an absorbing medium in the film and thickness of the film, causing a wavelength dependence of transmittance through the film.
  • US 2008/0130122 describes an antireflection film formed on a surface of a substrate similar to WO 2008/062164 , that is, the antireflection film comprises a plurality of projections.
  • the dependence of reflectance of light upon the projections on the wavelength of the reflected light is shown, and the dependence of transmittance of light transmitting the projections is shown as well.
  • light with long wavelengths is reflected more than light with short wavelengths, whereas light transmits through the projections almost identical for all wavelength.
  • light visually observed by looking on the surface of the substrate, where the antireflection film is formed shows a wavelength dispersion.
  • JP 2005-031538 describes an antireflection film 1 having projections 3 on one surface.
  • the transmittance of the material of the antireflection film (without the projections) depending on the wavelength of the transmitting light and the reflectance of the projections depending on the wavelength of the reflected light are shown.
  • the wavelength dispersion of the material of the antireflection film to the transmitting light and the wavelength dispersion of the projections to the reflected light are not adjusted to each other in order to provide a flat wavelength dispersion to light visually observed by looking on the side of the antireflection film having the projections formed on.
  • JP 2008-209540 describes a reflection preventing article comprising a material 12 formed on a substrate 11, wherein heigths (projections) are formed in a surface of the material 12 opposite to the substrate 11. Dispersion of visible light may take place on the surface in which the projections are formed, if the pitch of the projections is larger than the wavelength of visible light.
  • the anti-reflective film can reduce a reflectance of light reflected on the substrate surface with the anti-reflective film mounted thereon.
  • the present inventors have found that the structure, material, and the like of the anti-reflective film satisfying specific conditions cause wavelength dispersion of light transmitted through the anti-reflective film; for example, the anti-reflective film is formed on the surface of the substrate of a display panel, and specific coloration different from a display color may be visually observed in the screen upon looking in the screen.
  • the present invention was made in view of the above problems and it is an object of the present invention to provide: an anti-reflective film that prevents wavelength dispersion from being applied to light transmitted through an anti-reflective film; and a production method thereof. This is achieved by the subject-matter of the independent claims.
  • the present inventors made various investigations on reasons for wavelength dispersion of light transmitting through an anti-reflective film, and focused on the structure and material of the anti-reflective film.
  • the present inventors have found that even if wavelength dispersion is applied to light transmitting through the anti-reflective film depending on the structure and material of the anti-reflective film, and the anti-reflective film is consequently formed on the surface of the substrate of a display panel to give low reflection effects, coloration is visually observed in a screen.
  • the present inventors have found that by adjusting the respective wavelength dispersion characteristics caused by the structure and material of the anti-reflective film to cancel each other, uneven wavelength dispersion caused by the structure and material is flattened, and thereby wavelength dispersion is less likely to be generated to light transmitted through the anti-reflective film. Further, even if the anti-reflective film is formed on the surface of the substrate of the display panel, the anti-reflective film itself is colorless, and specific coloration different from a display color is less likely to be visually observed. As a result, the above-mentioned problems have been admirably solved, leading to completion of the present invention.
  • the present invention relates to an anti-reflective film (hereinafter, also referred to as the first anti-reflective film of the present invention), which reduces reflection of visible light on a surface of a substrate by being mounted on the substrate, has a wavelength dispersion structure for applying first wavelength dispersion to visible light transmitting through the anti-reflective film, and contains a wavelength dispersion material for applying second wavelength dispersion to the visible light transmitting through the anti-reflective film, as defined in claim 1.
  • an anti-reflective film hereinafter, also referred to as the first anti-reflective film of the present invention
  • the transmitted light obtained upon entering the anti-reflective film with light of a standard light source D 65 is colorless (referred hereinafter as second anti-reflective film of the invention).
  • the anti-reflective film of the present invention is mounted on the substrate, and thereby reduces reflection of visible light on the substrate surface by applying a moth-eye film that has an uneven pattern whose pitch p between the adjacent tops is a visible light wavelength or shorter, whose changes of the refractive index at the border between the outside (air) and the substrate surface are artificially made sequential, and which transmits almost all light regardless of the refractive index interface.
  • the structure of the anti-reflective film may be a single-film structure or a multi-film structure.
  • visible light used herein means light in the wavelength range of 380 nm to 780 nm.
  • the anti-reflective film has a wavelength dispersion structure for applying first wavelength dispersion to visible light transmitting through the anti-reflective film, and contains a wavelength dispersion material for applying second wavelength dispersion to the visible light transmitting through the anti-reflective film. That is, the anti-reflective film has both characteristics that apply wavelength dispersion to visible light transmitting through the anti-reflective film caused by the structure of the anti-reflective film and characteristics that apply wavelength dispersion to visible light transmitting through the anti-reflective film caused by the material of the anti-reflective film.
  • the “wavelength dispersion” used herein refers to characteristics in which the fluctuations of the transmittance of light transmitting through the anti-reflective film are 0.5% or higher around the transmittance in a wavelength of 550 nm.
  • the wavelength dispersion to transmitting light based on the wavelength dispersion structure is the first wavelength dispersion
  • the wavelength dispersion to transmitting light based on the wavelength dispersion material is the second wavelength dispersion.
  • the fluctuations of at least one of the first wavelength dispersion and the second wavelength dispersion are preferably 1.0% or higher.
  • the anti-reflective film is formed on the surface of the substrate of the display panel, and coloration is more likely to be visually observed in a screen.
  • the fluctuations of the first wavelength dispersion and the second wavelength dispersion are more preferably 2.0% or higher.
  • the visible light transmitted through the anti-reflective film has flat transmission wavelength dispersion in a visible light range.
  • the expression "has flat transmission wavelength dispersion in a visible light range” means that the fluctuations of the transmittance of light transmitted through the anti-reflective film in a visible light region (a wavelength of 380 to 780 nm) is lower than 0.5% around the transmittance in a wavelength of 550 nm.
  • the first wavelength dispersion and the second the wavelength dispersion are mixed to give total wavelength dispersion characteristics.
  • the transmittance based on the first wavelength dispersion and the transmittance based on the second wavelength dispersion are added up to give the respective wavelength components a uniform transmittance in a visible light range as a whole.
  • the anti-reflective film is formed on the surface of the substrate of a display panel, for example, coloration in a screen based on the anti-reflective film is prevented, and the display quality improvement effect can be obtained.
  • the fluctuations of the transmittance in a visible light region are preferably lower than 0.2%, and more preferably lower than 0.1%. Thereby, the coloration preventing effect is markedly improved.
  • the configuration of the anti-reflective film of the present invention is not particularly limited as long as it essentially includes such components.
  • the anti-reflective film may or may not include other components.
  • the anti-reflective film for example, may partially have a structure without wavelength dispersion characteristics, and may partially contain a material without wavelength dispersion characteristics.
  • the light source of the display device is not limited to the standard light source D 65 , and may be an A light source, a C light source, or a backlight light source having wavelength dispersion characteristics such as a fluorescent light.
  • the anti-reflective film comprises: an uneven part including a plurality of projections; and a base part, wherein the uneven part is the wavelength dispersion structure.
  • the anti-reflective film has the plurality of projections, low reflection characteristics can be obtained effectively as in the aforementioned AG film or moth-eye film.
  • the anti-reflective film has the base part, an uneven part can be formed easily and precisely only by forming the uneven part on the surface of the flat film that is to be used as a base.
  • the uneven part is more likely to have first wavelength dispersion based on the wavelength dispersion structure, and the base part is more likely to have second wavelength dispersion based on the wavelength dispersion material.
  • the present invention enables the first wavelength dispersion and the second wavelength dispersion to cancel each other. Accordingly, even if the uneven part and the base part are formed in the anti-reflective film, display coloration based on the above structure can be prevented.
  • the uneven part is preferably formed on the surface of (outside) the anti-reflective film in terms of anti-reflection.
  • a pitch between tops of adjacent projections of the plurality of projections is a visible light wavelength or shorter. That is, the anti-reflective film of the present embodiment is a moth-eye film with a fine uneven pattern formed on the surface thereof.
  • the "visible light wavelength or shorter" used herein refers to a wavelength of 380 nm or shorter.
  • the moth-eye film can transmit almost all light incident from the outside. Therefore, according to the present embodiment, even if the moth-eye film is used on the substrate of the display panel, an anti-reflective film whose coloration in a screen is less likely to be visually observed and which shows anti-reflection for images based on light reflection can be obtained.
  • a rate of a height h from the top to the bottom point of a projection to the pitch p between the tops of adjacent projections of the plurality of projections is 0.5 ⁇ h/p ⁇ 2.0.
  • the aspect ratio (height h/pitch p) of one projection out of the plurality of projections forming the uneven part decreases, the transmittances of light (orange, red, and the like colors) on a longer wavelength side out of the transmittances of visible light transmitted through the anti-reflective film may fall. That is, an even part with such an aspect ratio tends to have the wavelength dispersion structure.
  • the first wavelength dispersion of the wavelength dispersion structure and the second wavelength dispersion of the wavelength dispersion material mainly forming a base part other than the uneven part are adjusted to cancel each other.
  • an uneven part with higher surface tolerance can be formed.
  • an anti-reflective film in which coloration is less likely to be visually observed in a screen can be obtained even when used on the substrate of the display panel.
  • the wavelength dispersion material is a visible light-curable material containing a visible light polymerizing agent having a transmittance that increases from the short wavelength side to the long wavelength side.
  • a visible light-curable material containing a visible light polymerizing agent having a transmittance that increases from the short wavelength side to the long wavelength side.
  • the material suitable for forming the anti-reflective film is resin. Resin curable under predetermined conditions is particularly preferable. By using such resin as a material, an uneven pattern is formed on the surface of the film that is to be used as a base, and then the uneven pattern is fixed by a curing treatment to easily produce an uneven pattern.
  • Such a molding means makes it possible to produce, with high definition, a fine uneven pattern in which a pitch between tops of adjacent projections of the plurality of projections is a visible light wavelength or shorter (nanometer size) as described above.
  • the resin curable under predetermined conditions include thermosetting resin and photo-curable resin.
  • Photo-curable resin can be treated at ordinary temperature.
  • various curable resin materials can be used as the material of the anti-reflective film, and in particular, visible light-curable material is preferably used.
  • the coloration a problem to be solved by the present invention, is coloration of light in a visible light wavelength region, and the visible light-curable component has both a light-transmitting wavelength region and a light absorbing wavelength region in a visible light wavelength region.
  • Examples of the visible light-curable material include monomers initiating polymerization by visible light absorption, and a mixture of monomers not initiating polymerization by visible light absorption alone but including a polymerization initiator that can become an active species by visible light absorption to initiate polymerization and the polymerization initiator.
  • Examples of the photo-polymerization reaction in this case include radical polymerization, ionic polymerization (e.g. anionic polymerization and cationic polymerization), and ring-opening polymerization.
  • the visible light-curable material includes a visible light polymerization initiator. It is possible to easily control wavelength dispersion characteristics with a material containing the visible light polymerization initiator as the wavelength dispersion material only by adjusting the kind, the amount (concentration), and the like of the visible light polymerization initiator. Thus, the coloration can be removed more easily and precisely.
  • the visible light polymerization initiator triggers a polymerization reaction, and provides more choices of materials of the anti-reflective film. Thereby, it is possible to choose a material suitable for controlling the anti-reflective film with a desired thickness, and the coloration is more easily removed.
  • an anti-reflective film (hereinafter, also referred to as the third anti-reflective film), which reduces reflection of visible light on a surface of a substrate by being mounted on the substrate, has a wavelength dispersion structure for applying third wavelength dispersion to visible light upon reflection on the surface of the anti-reflective film, and contains a wavelength dispersion material for applying second wavelength dispersion to visible light transmitting through the anti-reflective film, wherein light has flat wavelength dispersion in a visible light region, the light including visible light reflected on the surface of the anti-reflective film and visible light that is incident from a side of the substrate and transmitted through the anti-reflective film.
  • the wavelength dispersion applied to reflected light based on the structure of the anti-reflective film is defined as the third wavelength dispersion.
  • the third wavelength dispersion and the second wavelength dispersion are canceled with each other with a wavelength dispersion material that applies the second wavelength dispersion to visible light transmitting through the anti-reflective film on the same principle as described above.
  • the third wavelength dispersion and the second wavelength dispersion are canceled with each other thereby to give a uniform intensity of light in a visible light region, the light including light reflected on the surface of the anti-reflective film and light transmitted through the anti-reflective film.
  • Visible light reflected on the surface of the anti-reflective film is different in origin from visible light that is incident from a side of the substrate and transmitted through the anti-reflective film.
  • an anti-reflective film (hereinafter, also referred to as the fourth anti-reflective film), which reduces reflection of visible light on a surface of a substrate by being mounted on the substrate, has a wavelength dispersion structure for applying third wavelength dispersion to visible light upon reflection on the surface of the anti-reflective film and applying first wavelength dispersion to visible light transmitting through the anti-reflective film, and contains a wavelength dispersion material for applying second wavelength dispersion to the visible light transmitting through the anti-reflective film, wherein light has flat wavelength dispersion in a visible light range, the light including visible light reflected on the surface of the anti-reflective film and visible light that is incident from a side of the substrate and transmitted through the anti-reflective film.
  • the aforementioned first, second, and third wavelength dispersion may occur simultaneously, and coloration based on these wavelengths may occur in a display screen. That is, in the fourth anti-reflective film, the third wavelength dispersion, the first wavelength dispersion, and the second wavelength dispersion are canceled with each other on the same principle as described above thereby to give a uniform intensity of light in a visible light region, the light including light reflected on the surface of the anti-reflective film and light transmitted through the anti-reflective film. Visible light reflected on the surface of the anti-reflective film is different in origin from visible light incident from the side of the substrate and transmitted through the anti-reflective film.
  • the present invention further relates to a production method of an anti-reflective film, the method comprising: a first step of applying a visible light-curable resin on a substrate containing a UV-absorbing component to form a film; a second step of forming an uneven part on a surface of the film to form a film including a plurality of projections, a pitch between the tops of adjacent projections being a visible light wavelength or shorter; and a third step of irradiating the film with visible light from a side of a substrate and thereby curing the film having the uneven part to form an anti-reflective film, wherein the anti-reflective film reduces reflection of the visible light on a surface of the substrate by being mounted on the substrate.
  • the substrate containing an ultraviolet absorption component can prevent a polarizer made of PVA (Poly Vinyl Alcohol) or the like in the polarizing plate from being degraded by ultraviolet rays in the case where the substrate is a polarizing plate, for example.
  • a curing treatment cannot be performed by light radiation from the film surface side.
  • a film is hardened with visible light. Accordingly, even if the substrate contains the UV-absorbing component, the film can be hardened by light radiation from the back side (substrate side) of the film. Thereby, a curing treatment can be performed simultaneously upon formation of an uneven part, and therefore a structure with high precision can be formed even in an uneven pattern such as moth-eye in which the pitch between the tops of adjacent projections is a visible light wavelength or shorter.
  • wavelength dispersion of the structure itself of an anti-reflective film and wavelength dispersion of the material itself of the antireflective film are adjusted to cancel each other. Accordingly, when the anti-reflective film is formed on the surface of a substrate of a display panel, anti-reflection effects of the anti-reflective film can be obtained, and coloration in a display can be prevented.
  • Fig. 1 is a cross-sectional view schematically illustrating an anti-reflective film of Embodiment 1.
  • the anti-reflective film of Embodiment 1 is mounted on a TAC (Tri Acetyl Cellulose) film that serves as a substrate 1 forming the surface of a display panel, and reduces visible light reflection on the surface of a substrate 1.
  • An anti-reflective film 2 of Embodiment 1 comprises an uneven part (moth-eye) 2b including a plurality of projections formed on the surface side (outside); and a base part 2a forming a back side (substrate side).
  • the anti-reflective film 2 is attached to the substrate 1 with an adhesive layer 3 interposed therebetween.
  • the pitch p between tops of adjacent projections of the plurality of projections forming the uneven part 2b is 40 nm to 300 nm.
  • a height h from the top to the bottom point of one projection out of a plurality of projections forming the uneven part 2b is set in a range of 30 nm to 200 nm, and an aspect ratio of one projection is set in a range of 0.1 ⁇ h/p ⁇ 5.0.
  • the anti-reflective film 2 is composed of a UV-curable resin layer with a thickness of about 10 ⁇ m.
  • the adhesive layer 3 is composed of a primer resin layer with a thickness of 10 ⁇ m to 15 ⁇ m.
  • the uneven part 2b of the anti-reflective film 2 of Embodiment 1 has a wavelength dispersion structure, and applies predetermined wavelength dispersion (first wavelength dispersion) to light transmitting through the uneven part 2b.
  • the anti-reflective film 2 is made of a wavelength dispersion material, which applies predetermined wavelength dispersion (second wavelength dispersion) to light transmitting through the anti-reflective film 2.
  • the second wavelength dispersion has wavelength dispersion characteristics opposite to the first wavelength dispersion in order to cancel the first wavelength dispersion caused by the uneven part 2b formed on the surface of the anti-reflective film 2 with the second wavelength dispersion caused by the material of the anti-reflective film 2.
  • the first wavelength dispersion and second wavelength dispersion can be adjusted to cancel each other, so that the anti-reflective film has flat wavelength dispersion characteristics as a whole.
  • a moth-eye film is used as the anti-reflective film 2 of Embodiment 1, and an LR film and an AG film may be used instead of the moth-eye film.
  • an uneven part is formed, as described above, and therefore may have a wavelength dispersion structure, which applies predetermined wavelength dispersion to visible light transmitting through the uneven part, depending on the shape of the uneven part.
  • the LR film may form a wavelength dispersion structure because it may apply predetermined wavelength dispersion to visible light transmitting through the uneven part by formation of a plurality of layers with different refractive indices.
  • Figs. 2 to 5 are each an enlarged perspective view of an uneven part of the anti-reflective film of Embodiment 1.
  • Fig. 2 is the case where the unit structure of the projections is conical
  • Fig. 3 is the case where the unit structure of the projections is a quadrangular pyramid
  • Fig. 4 is the case where the unit structure of the projections is a dome (bell) that has outwardly-bowed side faces from the square base to the top
  • Fig. 5 is the case where the unit structure of the projections is a needle shape that has inwardly-bowed side faces from the square base to the top.
  • Figs. 1 is a moth-eye film
  • a tip of the projection is a top t and a point at which the adjacent projections contact each other is a bottom point b.
  • a pitch p between the adjacent tops of the projections is defined as a pitch between two points where perpendicular lines from the respective tops t come in contact with a single plane surface.
  • a height h from the top t to the bottom point b is defined as a distance from the top t of the projection to the plane surface having the bottom point b thereon. Namely, the aspect ratio of one projection is defined as h/p obtained by dividing the height by the pitch (pitch between the tops).
  • the pitch p between adjacent tops of the projections is 380 nm or less, preferably 300 nm or less, and more preferably 200 nm or less.
  • a cone and a quadrangular pyramid, a dome (bell), and a needle shape are illustrated as a unit structure of the projection.
  • the unit structure is not particularly limited as long as the anti-reflective film 2 of Embodiment 1 is a moth-eye film, and an uneven part has tops and bottom points formed, and the pitch is limited to the visible light wavelength or shorter.
  • the unit structure may include a shape in which the slanted surface of a cone has a stair step, for example.
  • Fig. 6 and Fig. 7 are each a view schematically showing the principle of how the moth-eye film achieves low reflection.
  • Fig. 6 illustrates a cross-sectional structure of the moth-eye film
  • Fig. 7 shows the refractive index of light that enters the moth-eye film.
  • the angle of refraction, and the like depend on the refractive index of the medium into which the light proceeds. For example, when the medium is air or a resin, the refractive index is about 1.0 or about 1.5, respectively.
  • the unit structure of the uneven part 3 formed on the surface of the moth-eye film has a drill shape, i.e., a shape in which the width gradually decreases toward the tip end.
  • the refractive index is considered to continuously and gradually increase from about 1.0 as the refractive index of air to the refractive index of the film forming material (about 1.5 in case of resin).
  • the amount of light reflection depends onto the difference between the refractive indices of those mediums, and thus most light passes through the moth-eye film by artificially creating a condition of substantial absence of the refractive interface as described earlier. As a result, the reflective index on the surface of the film is reduced significantly.
  • the TAC film forming the surface of the display panel is used as the substrate 1, and is not particularly limited as long as the anti-reflective film can be mounted thereon.
  • the TAC film serves as a member forming a polarizing plate, and particularly a protective member of a polarizer, for example.
  • the substrate on which the anti-reflective film is to be mounted include an acrylic protective plate, a hard coat layer disposed on the surface of the polarizing plate, and an AG layer disposed on the surface of the polarizing plate.
  • the transmittance of each wavelength component in the uneven part 2b needs to be measured.
  • the transmittance (%) was calculated by measuring the reflectance of each wavelength component in the uneven part 2b of the anti-reflective film 2, and then subtracting the reflectance (%) from the whole (100%).
  • the volume of the uneven part 2b (absorption region) is only a small fraction of the entire volume of the anti-reflective film 2 (absorption region), and the base part 2a is the main absorption region. Accordingly, if the absorbing component is ideally assumed to be 0, the following equation is obtained.
  • Reflectance (%) + transmittance (%) 100% Therefore, the transmittance can be calculated from the reflectance in the uneven part 2b of the anti-reflective film 2.
  • the change in reflectance resulting from the uneven part 2b shows a tendency contrary to the change in transmittance.
  • the anti-reflective film of Example 1 will be specifically produced as an example of Embodiment 1, and the measurement results of transmittance will be shown.
  • the reflectance of the uneven part of the anti-reflective film was measured with a spectral colorimetric meter (trade name: CM-2002, product of Konica Minolta Holdings, Inc.).
  • CM-2002 product of Konica Minolta Holdings, Inc.
  • SCE method spectrum reflection component removal
  • d/8 method diffused lighting, light receiving angle of 8°
  • the pitch p between the tops of adjacent projections of the plurality of projections was set to 200 nm, and the height h from the top to the bottom point of one projection was set to 90 nm. That is, the aspect ratio (h/p) of one projection of the uneven part on which reflected light was measured was 0.45.
  • Fig. 8 is a graph that shows wavelength dispersion characteristics of reflected light on the uneven part of the anti-reflective film (wavelength dispersion structure).
  • the reflectance based on the visible light reflected on the surface of the uneven part gradually increases from 380 nm (the lower limit of the wavelength in a visible light wavelength region) to 780 nm (the upper limit of the wavelength in the visible light wavelength region).
  • the reflectance of a 380-nm wavelength component was about 0.1%, and the reflectance of a 780-nm wavelength component was about 0.8%.
  • Fig. 9 is a graph that shows wavelength dispersion characteristics to the transmitted light based on the uneven part of the anti-reflective film (wavelength dispersion structure). As shown in Fig. 9 , the transmittance of the visible light transmitted through the uneven part gradually decreases from 380 nm (the lower limit of the wavelength in the visible light wavelength region) to 780 nm (the upper limit of the wavelength in the visible light wavelength region). The transmittance of the 380-nm wavelength component was about 99.9%, and the transmittance of the 780-nm wavelength component was about 99.2%.
  • the anti-reflective film In order to select the material of the anti-reflective film or adjust the material conditions for cancellation of the wavelength dispersion caused by the structure of the anti-reflective film, or in order to design the structure of the anti-reflective film for cancellation of the wavelength dispersion caused by the material of the anti-reflective film, it is ideally necessary to form spectral characteristics that show the wavelength dispersion in contrast to spectral characteristics that show the wavelength dispersion of the transmitted light shown in Fig. 9 , with respect to the wavelength axis (x axis). That is, the anti-reflective film has flat wavelength dispersion characteristics when the spectrum in contrast to the transmitted light spectrum of Fig.
  • the change rate of the transmittance of the light transmitted through the anti-reflective film is less than 0.5% around the transmittance in a wavelength of 550 nm in the visible light range (380 nm to 780 nm).
  • the balance that cancels wavelength dispersion characteristics with each other can be adjusted by Lambert-Beer Law.
  • the intensity of light that enters a light-absorbing medium and is emitted through the medium is represented by the following equation where the incident light intensity is lin ( ⁇ ), the outgoing light intensity is lout ( ⁇ ), the concentration of the light-absorbing medium is c, the absorption coefficient of the light-absorbing medium is ⁇ ( ⁇ ), and the thickness (light path length) of the medium is d.
  • lin ⁇ lin ⁇ ⁇ exp ⁇ ⁇ ⁇ ⁇ c ⁇ d If both sides of the above equation are divided by lin ( ⁇ ), the following equation is obtained.
  • the left side represents a transmittance.
  • T ( ⁇ ) exp ⁇ ⁇ ⁇ ⁇ c ⁇ d
  • T ⁇ exp ⁇ ⁇ ⁇ ⁇ c ⁇ d
  • the anti-reflective film 2 of Embodiment 1 is formed of the uneven part 2b, which serves as the main reflective region.
  • the base part 2a is the main absorption region.
  • the reflected component is ideally assumed to be 0, the following equation is obtained.
  • Absorption rate % + transmittance % 100 % Accordingly, the change in transmittance caused by the base part of the anti-reflective film depends on light absorption characteristics and transmittance characteristics of the material of the anti-reflective film.
  • the anti-reflective film is formed with the material having transmittance characteristics in which the transmittance of visible light transmitted through the uneven part gradually increases from the short wavelength side to the long wavelength side, as shown in Fig. 8 , to give flat wavelength dispersion as a whole.
  • the absorption rate and the transmittance show opposite tendencies.
  • the material whose absorption characteristics gradually decrease from the short wavelength side to the long wavelength side is used.
  • Embodiment 1 coloration based on the design of the uneven part (moth-eye) is removed by adjusting the concentration of the wavelength dispersion material in the material of the anti-reflective film and/or the thickness of the anti-reflective film. On the contrary, with respect to coloration based on the wavelength dispersion characteristics of the material of the anti-reflective film, the design of the uneven part (moth-eye) may be adjusted.
  • Fig. 10 is a graph that shows absorption characteristics of the material (wavelength dispersion material) of the anti-reflective film of Embodiment 1.
  • the anti-reflective film is made of a visible light curable material and specifically comprises a visible light polymerization initiator (trade name: IRGACURE784, product of Ciba Specialty Chemicals Inc.).
  • the following chemical formula (1) is the chemical formula of IRGACURE784.
  • IRGACURE784 is a titanocene photopolymerization initiator and has a molecular weight of 534.4.
  • Fig. 10 shows absorption characteristics of IRGACURE784 in an acetonitrile solution. Each curve shows a sample with a different concentration.
  • the concentration of each curve is 0.001%, 0.01%, and 0.1% from the left.
  • Each concentration is % by weight of IRGACURE784 in the acetonitrile solution.
  • the wavelength dispersion changes with the concentration.
  • the wavelength dispersion based on the material of the anti-reflective film can be effectively adjusted in a range of 0.3 to 10% by weight based on the material of the anti-reflective film.
  • Fig. 11 is a graph that shows transmittance characteristics of the material (wavelength dispersion material) of the anti-reflective film of Embodiment 1. That is, Fig. 11 is a graph that shows wavelength dispersion characteristics applied to light transmitting through the anti-reflective film of Embodiment 1.
  • Each curve shows a sample with a different concentration. Specifically, the thickness of the anti-reflective film shown by each curve is 0.001 m, 0.01 m, and 0.1 m from the left. As shown in Fig. 11 , the wavelength dispersion changes with the thickness.
  • the visible light polymerizing agent such as IRGACURE784 having a transmittance that gradually increases from the short wavelength side to the long wavelength side
  • the wavelength dispersion to transmitting light based on the structure of the anti-reflective film cancels the wavelength dispersion to transmitting light based on the material of the anti-reflective film to give flat wavelength dispersion as a whole.
  • the entire balance can be adjusted by optimizing the concentration c of IRGACURE784 in the UV-curable resin layer and the thickness of the UV-curable resin layer forming the base part of the anti-reflective film.
  • the aspect ratio is a value other than 0.45 mentioned above
  • the wavelength dispersion characteristics (transmitted light spectrum) based on the aspect ratio is first determined, and each parameter (concentration and thickness) that specifies the wavelength dispersion characteristics of the visible light polymerizing agent is distributed so as to give flat wavelength dispersion of light transmitted through the anti-reflective film.
  • the visible light polymerizing agent contained in the UV-curable resin layer is not limited to IRGACURE784.
  • the visible light polymerizing agent may be any material as long as it has a transmittance that gradually increases from the short wavelength side to the long wavelength side and the wavelength dispersion based on the uneven part and the wavelength dispersion based on the material cancel each other to finally give flat transmission wavelength dispersion.
  • the wavelength dispersion caused by the uneven part gradually increases from the short wavelength side to the long wavelength side
  • the transmittance may randomly increase or decrease, and it is sufficient that the cancellation of the mutual wavelength dispersion finally gives flat transmission wavelength dispersion.
  • Fig. 12 is a graph that shows the reflectance of each wavelength component in the uneven part in which a plurality of projections with heights of the conditions 1 to 7 is formed.
  • Fig. 13 is a graph that shows the transmittance of each wavelength component in the uneven part in which the plurality of projections with heights of the conditions 1 to 7 is formed.
  • the transmittance is calculated from the reflectance in the uneven part that forms the upper part of the anti-reflective film.
  • the curve of the reflectance in Fig. 12 is symmetrical to the curve of the transmittance in Fig. 13 , with the x axis being a symmetric axis.
  • the standard light D 65 is used as a light source in each sample that has projections with heights of the conditions 1 to 7.
  • the object color of each sample is defined based on transmittance characteristics to the weight value coefficient of the XYZ color system of the standard light D 65 .
  • the Y value, x and y values, color temperature, and a* and b* values of the transmitted light were measured.
  • coloration of each sample was visually observed.
  • As a method of visual observation there was employed a method of attaching the anti-reflective film (moth-eye film) to a transparent acrylic plate with a roller and observing coloration to transmitted light.
  • the conditions were set by using the standard light D 65 as a reference. Table 1 shows measurement results.
  • the fluctuations were less than 0.5% around the transmittance in a wavelength of 550 nm under each of the conditions 2 to 6, not the condition 1.
  • the fluctuations were about 0.6% around the transmittance in a wavelength of 550 nm.
  • blue was visually observed in the anti-reflective film having a height of the condition 1. This shows that the fluctuations of the transmittance of each wavelength component were 0.5% or larger around the transmittance in a wavelength of 550 nm. Namely, this shows that in the case where transmission wavelength dispersion is not flat, coloration of the display caused by the anti-reflective film is visually observed.
  • the fluctuations were less than 0.5% around the transmittance in a wavelength of 550 nm, and light yellow green was visually observed. However, the coloration of light yellow green did not have significant effects on the display quality. Under the condition 7, the fluctuations were about 0.2% around the transmittance in a wavelength of 550 nm. Under the condition 2 in which the fluctuations were similarly about 0.2% around the transmittance in a wavelength of 550 nm, favorable display with no coloration was obtained. This shows that even if the fluctuations are about 0.2% around the transmittance in a wavelength of 550 nm, the transmitted light may be colorless under a predetermined condition and lightly colored under other conditions.
  • the difference between the condition 2 and the condition 7 is that the fluctuations were observed on the longer wavelength side ( Fig. 13 ) under the condition 2, and on the shorter wavelength side ( Fig. 13 ) under the condition 7. Under each of the conditions 3 to 6, no coloration was observed, and favorable display was obtained. Under any of the conditions 3 to 6, the fluctuations were less than 0.1% around the transmittance in a wavelength of 550 nm. This shows that in the case where the graph was obtained in which the fluctuations were less than 0.1% around the transmittance in a wavelength of 550 nm, remarkable effects were exerted in removal of coloration.
  • the fluctuations of the transmittances are at least less than 0.5%, preferably less than 0.2%, and more preferably less than 0.1%.
  • Fig. 14 is a graph that shows an x value and a y value of each sample having heights of the conditions 1 to 7 on the xy chromaticity diagram. As illustrated in Fig. 14 , the samples under the conditions 2 to 7 were plotted close to each other, but the sample under the condition 1 was plotted far from the samples under the conditions 2 to 7. Fig. 14 and Table 1 show that if the following equations are satisfied on the xy chromaticity diagram, favorable display with little coloration is obtained.
  • x 0.3127 ⁇ 0.0003 0.3124 ⁇ x ⁇ 0.3130
  • y 0.329 ⁇ 0.0003 0.3287 ⁇ y ⁇ 0.3293
  • the conditions that satisfy the ranges of x and y are the conditions 2 to 6.
  • the conditions that satisfy the ranges of x and y are the conditions 2 to 4.
  • Fig. 15 is a graph that shows an a* value and a b* value of each sample having heights of the conditions 1 to 7 on an a*b* chromaticity diagram. As illustrated in Fig. 15 , the samples under the conditions 2 to 7 were plotted close to each other, but the sample under the condition 1 was plotted far from the samples under the conditions 2 to 7. Fig. 15 and Table 1 show that if the following equations are satisfied on the a*b* chromaticity diagram, favorable display with little coloration is obtained.
  • the conditions that satisfy the ranges of a* and b* are the conditions 2 to 6.
  • the coloration can be removed by adjusting the respective conditions of the material of the anti-reflective film. More specifically, by adjusting the absorption coefficient ⁇ ( ⁇ ) of the light-absorbing medium based on the material of the anti-reflective film, the concentration c of the light-absorbing medium (wavelength dispersion material), and the thickness (light path length) d of the light-absorbing medium forming the base part of the anti-reflective film, the second wavelength dispersion of the material of the anti-reflective film cancels the first wavelength dispersion caused by the structure of the uneven part.
  • the wavelength dispersion of transmitted light based on the aspect ratio is first determined, each parameter that specifies the wavelength dispersion of transmitting light based on the material of the anti-reflective film (wavelength dispersion material) is distributed so as to give flat wavelength dispersion. Then, the Y value, values of x and y, color temperature, and a* and b* values of the transmitted light are set in the range of the above conditions, and thereby favorable display with no coloration can be obtained.
  • the aspect ratio can be calculated by cutting out an evaluation sample, observing the sample with an SEM (Scanning Electron Microscope), and determining the height and pitch of the projection.
  • a spectrum ellipsomter may be used to determine the thickness of the anti-reflective film.
  • the optical spectrum of the reflectance in a visible light range (380 to 780 nm) is determined with the spectral colorimetric meter such as CM-2002, and then the transmittance is calculated.
  • the structure information of the uneven part e.g. the height and pitch
  • the transmittance caused by the optical spectrum are very different from general structure information and transmittance
  • the anti-reflective film is expected to have a wavelength dispersion structure or contain a wavelength dispersion material.
  • Examples of the method for analyzing the material of the anti-reflective film include XPS (X-Ray Photoelectron Spectroscopy), MASS (mass spectrometry), Auger electron spectroscopy, and SIMS (Secondary Ion-microprobe Mass Spectrometer).
  • XPS X-Ray Photoelectron Spectroscopy
  • MASS mass spectrometry
  • Auger electron spectroscopy Auger electron spectroscopy
  • SIMS Secondary Ion-microprobe Mass Spectrometer
  • Fig. 16 is a view schematically illustrating the production process of the anti-reflective film of Embodiment 1.
  • a substrate on which an anti-reflective film is to be mounted is prepared first.
  • the substrate corresponds to a polarizing plate 20 used in LCD devices and the like.
  • the polarizing plate (substrate) 20 has a film structure including three films: a PVA film, which is a polarizer, and a pair of TAC films, which sandwiches the polarizer.
  • the PVA film is stretched in the longitudinal and/or transverse directions and iodine is adsorbed to the PVA film surface and oriented in the stretching direction.
  • At least one of the pair of TAC films contains a UV-absorbing agent.
  • both of the pair of TAC films contain a UV-absorbing agent.
  • UV-absorbing agent examples include: organic compounds such as benzophenone compounds, benzotriazole compounds, benzoate compounds, and triazine compounds; and metal oxides such as silicon oxide, titanium oxide, and tin oxide.
  • organic compounds such as benzophenone compounds, benzotriazole compounds, benzoate compounds, and triazine compounds
  • metal oxides such as silicon oxide, titanium oxide, and tin oxide.
  • Such UV-absorbing agents can exist in the TAC film in the form of fine particles, for example.
  • the polarizing plate 20 is wound to form a substrate film roll 11, and this roll 11 is rotated to feed the polarizing plate 20.
  • the substrate film roll 11 is rotated to feed the substrate film 20 in the form of a belt in the direction shown by the arrow in Fig. 16 . Then the substrate film 20 is coated with a resin material with a die coater 12, thereby forming a film 30.
  • Slit coater, gravure coater, and the like may be employed instead of the die coater.
  • the coated resin material is composed of a resin curable under visible light irradiation (a resin having a visible light-curing property). Used may be monomers initiating polymerization by visible light absorption, monomers not initiating polymerization by visible light absorption alone but including a polymerization initiator that can become an active species by visible light absorption to initiate polymerization. Examples of the photopolymerization reaction in this case include radical polymerization, cationic polymerization, and the like.
  • radical polymerization for example, monofunctional (meth)acrylates and/or polyfunctional (meth)acrylates are used as a polymerizable monomer component, and visible light polymerization initiators initiate radical reaction.
  • Examples of the visible light polymerization initiator include camphorquinone, benzyl, diacetyl, acetylbenzoyl, ⁇ -naphthyl, p,p'-dimethoxybenzyl, 2,3-pentadione, 1,2-phenanthrenequinone, 3,4-phenanthrenequinone, 1,4-phenanthrenequinone, 3,4-phenanthrenequinone, 9,10-phenanthrenequinone, naphthoquinone, trimethylbenzoyl diphenylphosphine oxide, methylxanthone, 10-butyl-2-chloroacridone, and dicyclopentadienyltitanium-di(pentafluorophenyl).
  • Example of the visible light polymerization initiator having a complex system include organic peroxide/dye system, diphenyliodonium salt/dye, imidazole/keto compound, hexaarylbiimidazole compound/hydrogen donor compound, mercaptobenzothiazole/thiopyrylium salt, metal arene/cyanine dye, and hexaarylbiimidazole/radical generator.
  • Examples thereof further include at least one radical generator selected from the group consisting of titanocene, an iron arene complex, organic peroxide, hexaarylbiimidazole, N-phenylglycine, and diaryliodonium salt, and optionally, sensitizing dyes such as 3-substituted coumarin, cyanine dye, merocyanine dye, thiazole dye, and pyrylium dye.
  • at least one radical generator selected from the group consisting of titanocene, an iron arene complex, organic peroxide, hexaarylbiimidazole, N-phenylglycine, and diaryliodonium salt, and optionally, sensitizing dyes such as 3-substituted coumarin, cyanine dye, merocyanine dye, thiazole dye, and pyrylium dye.
  • the substrate film 20 passes through a pinch roller 14 and then moves halfway around a cylindrical mold roller 15 along its outer circumference surface. At this time, the film 30 on the substrate film 20 is in contact with the outer circumference surface of the mold roller.
  • the mold roller 15 may be a cylindrical body having an outer circumference surface on which a plurality of depressions are formed.
  • the uneven part has a substantially cone or pyramid shape, where a pitch between tops of adjacent bottom points is 50 nm to 500 nm and a depth of a depression is 50 nm to 500 nm.
  • the cylindrical body has 250 mm in inner diameter, 260 mm in outer diameter, and 400 mm in length.
  • Such a mold roller 15 can be prepared by cut-polishing a cylindrical aluminum tube formed by extruding, and alternately repeating several times aluminum anodization and etching for the cut-polished flat surface.
  • the mold roller 15 has seamless nanostructures because the anodization and the etching are performed in the same process for the outer circumference surface of the cylindrical aluminum tube. Use of this mold roller allows a seamless nanosized pattern of an uneven part to be continuously imprinted on the film 30.
  • a cylindrical pinch roller 16 is arranged to face the outer circumference surface of the mold roller 15 at the position where the substrate film 20 is in contact with the outer circumference surface of the mold roller 15. At this position, the pinch roller 16 presses the film 30 to the mold roller 15, and as a result, the film 30 is embossed with the surface shape of the mold roller 15. Thus, a film 40 with an uneven part formed on its surface is obtained.
  • the substrate film 20 has a width smaller than the length of the mold roller 15 and the pinch roller 16 so that the mold roller 15 and the pinch roller 16 uniformly sandwich the substrate film 20.
  • the pinch roller 16 is a rubber roller. After the uneven part is imprinted on the film 30 surface, the substrate film 20 moves along the outer circumference surface of the mold roller 15 and then passes through the pinch roller 17 to undergo the next step.
  • the film 40 with the uneven part undergoes a curing treatment.
  • visible light irradiation is employed as the curing treatment.
  • the irradiation amount of the visible light in the curing treatment needs to be appropriately determined depending on a material to be irradiated with the visible light, but in a range of 300 to 3000 (mJ/cm 2 ), for example.
  • Examples of the light source for the visible light irradiation include a fluorescent lamp, an incandescent lamp, a metal halide lamp, a xenon lamp, a sodium lamp, a halogen lamp, a mercury lamp, a near-infrared lamp, and sunlight. Examples thereof further include visible light lasers such as argon ion laser (488 nm) and FD-Nd/YAG laser.
  • the substrate film 20 has a UV-absorbing property but visible light transmits through the substrate film 20. Accordingly, the curing treatment can be performed from the back side of the film 40 having the uneven part, i.e., the side of the substrate film 20.
  • the film 40 with the uneven part can undergo the curing treatment at the same time when the uneven pattern are formed on the film 30.
  • an anaerobic material is used for the film 40, it is preferable that the irradiation of the visible light is performed under nitrogen atmosphere. As a result of the curing of the film 40, the uneven part formed on the surface can be fixed. Thus, formation of the anti-reflective film is completed.
  • a lamination film 50 is unwounded from a lamination roll 51 and pressed to the film 40 by a pinch roller 52, and then attached to the top-side surface of the film 40. Finally, a laminate sheet composed of the substrate film 20, the anti-reflective film, and the lamination film 50 is rolled up to produce a laminate sheet roll 53.
  • the lamination film 50 can protect the sheet surface against dust and damages.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Laminated Bodies (AREA)

Claims (3)

  1. Film antireflet (2) comprenant une partie irrégulière (2b) qui contient un ensemble de saillies et une partie de base (2a),
    qui réduit la réflexion de la lumière visible sur une surface d'un substrat (1) en étant monté sur le substrat (1), qui présente une structure de dispersion des longueurs d'ondes pour appliquer une première dispersion des longueurs d'ondes à la lumière visible qui traverse le film antireflet (2), et qui contient un matériau de dispersion des longueurs d'ondes pour appliquer une deuxième dispersion des longueurs d'ondes à la lumière visible qui traverse le film antireflet (2) ; caractérisé en ce que
    la partie irrégulière (2b) est la structure de dispersion des longueurs d'ondes,
    un écartement p entre les sommets de saillies voisines, dans ledit ensemble de saillies, est une longueur d'ondes de lumière visible ou plus court,
    un rapport d'une hauteur h du point supérieur jusqu'au point inférieur d'une saillie sur l'écartement p entre les sommets de saillies voisines, dans l'ensemble de saillies, est 0,5 < h/p < 2,0, une transmittance de la lumière visible qui traverse le film antireflet (2) présente une fluctuation inférieure à 0,5 % quand la fluctuation est définie comme une différence entre une transmittance dans n'importe quelle longueur d'ondes de 380 à 780 nm et une transmittance dans une longueur d'ondes de 550 nm, et
    le matériau de dispersion des longueurs d'ondes est un matériau durcissable à la lumière visible qui contient un agent de polymérisation à la lumière visible présentant une transmittance qui augmente du côté des longueurs d'ondes courtes jusqu'au côté des longueurs d'ondes longues.
  2. Film antireflet selon la revendication 1,
    dans lequel la lumière transmise obtenue lors de l'entrée de lumière d'une source de lumière standard D65 dans le film antireflet (2) est incolore.
  3. Procédé de production d'un film antireflet (2), le procédé comprenant :
    une première étape qui applique une résine durcissable à la lumière visible sur un substrat (20) contenant un composant absorbant les UV, pour former un film (30) ;
    une deuxième étape qui forme une partie irrégulière (2b) sur une surface du film (30), pour former un film (40) contenant un ensemble de saillies, un écartement p entre les sommets de saillies voisines étant une longueur d'ondes de lumière visible ou plus court ; et
    une troisième étape qui expose le film (40) à une lumière visible à partir d'un côté d'un substrat (20), et qui durcit ainsi le film (40) présentant la partie irrégulière (2b), pour former un film antireflet (2),
    le film antireflet (2) réduisant la réflexion de la lumière visible sur une surface du substrat (2a) en étant monté sur le substrat (20),
    caractérisé en ce que la partie irrégulière (2b) est une structure de dispersion des longueurs d'ondes du film antireflet (2),
    un rapport d'une hauteur h du point supérieur jusqu'au point inférieur d'une saillie sur l'écartement p entre les sommets de saillies voisines, dans l'ensemble de saillies, est 0,5 < h/p < 2,0, et
    une transmittance de la lumière visible qui traverse le film antireflet (2) présente une fluctuation inférieure à 0,5 % quand la fluctuation est définie comme une différence entre une transmittance dans n'importe quelle longueur d'ondes de 380 à 780 nm et une transmittance dans une longueur d'ondes de 550 nm, et
    le matériau de dispersion des longueurs d'ondes est un matériau durcissable à la lumière visible qui contient un agent de polymérisation à la lumière visible présentant une transmittance qui augmente du côté des longueurs d'ondes courtes jusqu'au côté des longueurs d'ondes longues.
EP09814455.3A 2008-09-17 2009-09-01 Film antireflet et son procédé de fabrication Active EP2333590B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008238051 2008-09-17
PCT/JP2009/065271 WO2010032610A1 (fr) 2008-09-17 2009-09-01 Film antireflet et son procédé de fabrication

Publications (3)

Publication Number Publication Date
EP2333590A1 EP2333590A1 (fr) 2011-06-15
EP2333590A4 EP2333590A4 (fr) 2011-09-07
EP2333590B1 true EP2333590B1 (fr) 2017-06-21

Family

ID=42039444

Family Applications (1)

Application Number Title Priority Date Filing Date
EP09814455.3A Active EP2333590B1 (fr) 2008-09-17 2009-09-01 Film antireflet et son procédé de fabrication

Country Status (7)

Country Link
US (1) US8747994B2 (fr)
EP (1) EP2333590B1 (fr)
JP (1) JP5148712B2 (fr)
CN (1) CN102066987B (fr)
BR (1) BRPI0918511A2 (fr)
RU (1) RU2480796C2 (fr)
WO (1) WO2010032610A1 (fr)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007051752B4 (de) * 2007-10-30 2010-01-28 X-Fab Semiconductor Foundries Ag Licht blockierende Schichtenfolge und Verfahren zu deren Herstellung
JP5511313B2 (ja) * 2008-11-07 2014-06-04 キヤノン株式会社 光学素子成形用金型、光学素子成形用金型の製造方法、光学素子、および光学素子の製造方法
KR20100064215A (ko) * 2008-12-04 2010-06-14 삼성전자주식회사 표시 장치
KR20130129887A (ko) * 2010-07-12 2013-11-29 데쿠세리아루즈 가부시키가이샤 원반의 제조 방법, 배향막의 제조 방법, 위상차판의 제조 방법 및 표시 장치의 제조 방법
US20130177277A1 (en) * 2010-10-01 2013-07-11 Sumitomo Bakelite Co. Ltd. Optical waveguide, method for producing optical waveguide, optical waveguide module, method for producing optical waveguide module, and electronic apparatus
US20130309452A1 (en) * 2011-02-01 2013-11-21 Sharp Kabushiki Kaisha Laminate and method for producing laminate
WO2012157706A1 (fr) * 2011-05-17 2012-11-22 キヤノン電子株式会社 Filtre optique, dispositif optique, dispositif électronique et complexe antireflet
JP2012252224A (ja) * 2011-06-03 2012-12-20 Dainippon Printing Co Ltd 反射防止フィルム
TWI525229B (zh) * 2011-11-18 2016-03-11 財團法人工業技術研究院 氧化鋅抗反射層與其製法
JP5903943B2 (ja) * 2012-03-13 2016-04-13 大日本印刷株式会社 反射防止フィルムの製造方法、賦型用金型の製造方法及び反射防止フィルム
JP2013254130A (ja) * 2012-06-08 2013-12-19 Dexerials Corp 光学素子およびその製造方法、表示素子、ならびに投射型画像表示装置
JP6386700B2 (ja) 2012-07-04 2018-09-05 キヤノン株式会社 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法
TWI490574B (zh) * 2013-04-03 2015-07-01 聚森股份有限公司 發電模組及其導光膜
TWI547378B (zh) * 2013-04-05 2016-09-01 三菱麗陽股份有限公司 積層結構體及其製造方法、物品
JP6167005B2 (ja) * 2013-10-04 2017-07-19 富士フイルム株式会社 反射防止フィルム、偏光板、カバーガラス、及び画像表示装置
US10254169B2 (en) * 2014-09-09 2019-04-09 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Optical detector based on an antireflective structured dielectric surface and a metal absorber
CN106796310B (zh) * 2014-10-07 2018-11-30 夏普株式会社 透明膜和透明膜的制造方法
JP6495625B2 (ja) * 2014-11-11 2019-04-03 株式会社ジャパンディスプレイ 表示装置
EP3257054B1 (fr) * 2015-02-10 2019-10-16 Carl Zeiss SMT GmbH Miroir multicouche à euv, système optique comprenant un miroir multicouche et procédé de fabrication d'un miroir multicouche
JP6730803B2 (ja) * 2015-12-18 2020-07-29 デクセリアルズ株式会社 反射防止光学体の形成方法、ディスプレイパネルおよび光学フィルム
JP6623058B2 (ja) * 2015-12-18 2019-12-18 デクセリアルズ株式会社 反射防止光学体の形成方法およびディスプレイパネル
US10877181B2 (en) * 2016-11-11 2020-12-29 AGC Inc. Substrate with low-reflection property and manufacturing method thereof
CN107065041A (zh) * 2017-05-10 2017-08-18 武汉华星光电技术有限公司 一种偏光片的制备方法、偏光片及显示装置
JP7025892B2 (ja) * 2017-11-07 2022-02-25 デクセリアルズ株式会社 積層体、反射防止構造体及びカメラモジュール搭載装置
CN108445564A (zh) * 2018-05-17 2018-08-24 浙江彩丞照明科技有限公司 一种具有非直线棱角锥微结构的防眩光板
JP7208765B2 (ja) * 2018-11-08 2023-01-19 デクセリアルズ株式会社 積層体、積層体の製造方法、光学体の形成方法及びカメラモジュール搭載装置
CN113905556A (zh) * 2021-09-27 2022-01-07 Oppo广东移动通信有限公司 壳体及其制作方法、电子设备
US11951406B2 (en) * 2022-05-08 2024-04-09 Bagira Systems Ltd. Portable gaming console

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4253862B2 (ja) 1998-04-22 2009-04-15 株式会社ブリヂストン 反射防止フィルム
JP4281137B2 (ja) * 1999-01-14 2009-06-17 住友化学株式会社 反射防止膜
JP4197100B2 (ja) 2002-02-20 2008-12-17 大日本印刷株式会社 反射防止物品
JP2003240903A (ja) * 2002-02-20 2003-08-27 Dainippon Printing Co Ltd 反射防止物品
JP2003279705A (ja) 2002-03-25 2003-10-02 Sanyo Electric Co Ltd 反射防止部材
JP2003344855A (ja) * 2002-05-30 2003-12-03 Mitsubishi Chemicals Corp フロントライト用導光板
JP2004205990A (ja) 2002-12-26 2004-07-22 Dainippon Printing Co Ltd 反射防止性能を有する微細凹凸パターンの作製方法及び反射防止物品
JP4270968B2 (ja) 2003-07-10 2009-06-03 オリンパス株式会社 反射防止面付光学素子を持つ光学系を備えた光学機器
JP2006018062A (ja) * 2004-07-02 2006-01-19 Konica Minolta Opto Inc 反射防止フィルム、偏光板及び表示装置
JP2007079392A (ja) 2005-09-16 2007-03-29 Fujifilm Corp 光学フィルム、表示装置、偏向板
JP2007196397A (ja) 2006-01-23 2007-08-09 Fujifilm Corp 凹凸状シートの製造方法及び装置
US7633045B2 (en) 2006-08-21 2009-12-15 Sony Corporation Optical device, method for producing master for use in producing optical device, and photoelectric conversion apparatus
WO2008069223A1 (fr) 2006-12-05 2008-06-12 Semiconductor Energy Laboratory Co., Ltd. Film antireflet et dispositif afficheur
WO2008069164A1 (fr) * 2006-12-05 2008-06-12 Semiconductor Energy Laboratory Co., Ltd. Film antireflet et dispositif d'affichage
JP2008194977A (ja) 2007-02-14 2008-08-28 Hitachi Maxell Ltd 成形体の製造方法及び製造装置
JP2008209540A (ja) * 2007-02-26 2008-09-11 Mitsubishi Rayon Co Ltd 反射防止物品
JP5050605B2 (ja) 2007-03-27 2012-10-17 栗田工業株式会社 有機物処理方法及び有機物処理装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
None *

Also Published As

Publication number Publication date
EP2333590A4 (fr) 2011-09-07
WO2010032610A1 (fr) 2010-03-25
US8747994B2 (en) 2014-06-10
BRPI0918511A2 (pt) 2015-12-01
EP2333590A1 (fr) 2011-06-15
RU2480796C2 (ru) 2013-04-27
RU2011107603A (ru) 2012-10-27
CN102066987B (zh) 2016-06-22
CN102066987A (zh) 2011-05-18
JP5148712B2 (ja) 2013-02-20
US20110123777A1 (en) 2011-05-26
JPWO2010032610A1 (ja) 2012-02-09

Similar Documents

Publication Publication Date Title
EP2333590B1 (fr) Film antireflet et son procédé de fabrication
US8384862B2 (en) Production method of nanoimprint film, display device, and liquid crystal display device
RU2468397C2 (ru) Пленка для предотвращения отражения и дисплейное устройство
JP6339053B2 (ja) 波長変換部材及びそれを備えたバックライトユニット、液晶表示装置
DE60020609T2 (de) Korrosionsresistentes lichtsteuerndes element
DE60035561T2 (de) Blendschutz- und Antireflexionsschicht, Polarisator und Bildanzeigevorrichtung
JP4887612B2 (ja) 減反射材及びそれを用いた電子画像表示装置
EP1754994A1 (fr) Procédé de préparation d&#39;une couche antiréfléchissante
JP5008734B2 (ja) 防眩性フィルム、防眩性フィルムの製造方法、偏光板及び画像表示装置
US9541682B2 (en) Display device
JP6419960B2 (ja) 組成物とポリマー成形用組成物、及びそれを用いて得られた波長変換体、波長変換部材、バックライトユニット、液晶表示装置
JP2010020211A (ja) 光拡散性反射型偏光板、積層偏光板、偏光光源装置及び液晶表示装置
US20160327697A1 (en) Process for production of anisotropic optical film
JP2009204837A (ja) 防眩フィルム、防眩性偏光板および画像表示装置
KR20200084862A (ko) 하드 코트 필름, 광학 적층체 및 화상 표시 장치
JP6716870B2 (ja) 量子ドットシート、バックライト及び液晶表示装置
KR20130117785A (ko) 방현성 필름, 방현성 필름의 제조 방법, 편광판 및 화상 표시 장치
JP6586805B2 (ja) エッジライト型バックライト及び液晶表示装置
WO2010122890A1 (fr) Particule fine pour couche à fonction optique, élément optique pour affichage, et couche à fonction de filtre anti-éblouissement
EP2994590B1 (fr) Dispositif d&#39;éclairage transparent composite
JP2006062240A (ja) 防眩性反射防止フィルムの製造方法及び防眩性反射防止フィルム
EP2078969B1 (fr) Produit moule et procede de production de celui-ci
JP2008036461A (ja) 薄膜コートフィルムの製造方法
JP2017019971A (ja) 量子ドットシート、バックライト及び液晶表示装置
WO2016051760A1 (fr) Élément de conversion de longueur d&#39;onde, unité de rétroéclairage le comportant, et dispositif d&#39;affichage à cristaux liquides

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20110404

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR

AX Request for extension of the european patent

Extension state: AL BA RS

RIC1 Information provided on ipc code assigned before grant

Ipc: B32B 7/02 20060101ALI20110728BHEP

Ipc: B32B 3/30 20060101ALI20110728BHEP

Ipc: G02B 1/11 20060101AFI20110728BHEP

RIN1 Information on inventor provided before grant (corrected)

Inventor name: TSUDA, KAZUHIKO

Inventor name: FUJII, AKIYOSHI

Inventor name: IMAOKU, TAKAO

Inventor name: TAGUCHI, TOKIO

A4 Supplementary search report drawn up and despatched

Effective date: 20110805

DAX Request for extension of the european patent (deleted)
17Q First examination report despatched

Effective date: 20140331

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

REG Reference to a national code

Ref country code: DE

Ref legal event code: R079

Ref document number: 602009046781

Country of ref document: DE

Free format text: PREVIOUS MAIN CLASS: G02B0001110000

Ipc: G02B0001118000

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

INTG Intention to grant announced

Effective date: 20161215

RIC1 Information provided on ipc code assigned before grant

Ipc: G02B 1/118 20150101AFI20161207BHEP

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAJ Information related to disapproval of communication of intention to grant by the applicant or resumption of examination proceedings by the epo deleted

Free format text: ORIGINAL CODE: EPIDOSDIGR1

GRAL Information related to payment of fee for publishing/printing deleted

Free format text: ORIGINAL CODE: EPIDOSDIGR3

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

GRAR Information related to intention to grant a patent recorded

Free format text: ORIGINAL CODE: EPIDOSNIGR71

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

RIN1 Information on inventor provided before grant (corrected)

Inventor name: TAGUCHI, TOKIO

Inventor name: IMAOKU, TAKAO

Inventor name: FUJII, AKIYOSHI

Inventor name: TSUDA, KAZUHIKO

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

INTC Intention to grant announced (deleted)
AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR

INTG Intention to grant announced

Effective date: 20170512

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 903439

Country of ref document: AT

Kind code of ref document: T

Effective date: 20170715

REG Reference to a national code

Ref country code: NL

Ref legal event code: FP

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602009046781

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170922

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170921

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG4D

REG Reference to a national code

Ref country code: AT

Ref legal event code: MK05

Ref document number: 903439

Country of ref document: AT

Kind code of ref document: T

Effective date: 20170621

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170921

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20171021

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602009046781

Country of ref document: DE

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

26N No opposition filed

Effective date: 20180322

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

REG Reference to a national code

Ref country code: IE

Ref legal event code: MM4A

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20170930

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170901

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

Effective date: 20180531

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170930

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170901

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170930

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20171002

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170930

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170901

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20090901

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170621

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170621

REG Reference to a national code

Ref country code: DE

Ref legal event code: R081

Ref document number: 602009046781

Country of ref document: DE

Owner name: SHARP KABUSHIKI KAISHA, SAKAI CITY, JP

Free format text: FORMER OWNER: SHARP KABUSHIKI KAISHA, OSAKA-SHI, JP

P01 Opt-out of the competence of the unified patent court (upc) registered

Effective date: 20230524

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 20230920

Year of fee payment: 15

Ref country code: GB

Payment date: 20230920

Year of fee payment: 15

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20230920

Year of fee payment: 15