EP2156912A1 - Oberflächenbeschichtetes schneidwerkzeug - Google Patents

Oberflächenbeschichtetes schneidwerkzeug Download PDF

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Publication number
EP2156912A1
EP2156912A1 EP08764563A EP08764563A EP2156912A1 EP 2156912 A1 EP2156912 A1 EP 2156912A1 EP 08764563 A EP08764563 A EP 08764563A EP 08764563 A EP08764563 A EP 08764563A EP 2156912 A1 EP2156912 A1 EP 2156912A1
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EP
European Patent Office
Prior art keywords
layer
thickness
super multi
film
coating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP08764563A
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English (en)
French (fr)
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EP2156912A4 (de
EP2156912B1 (de
Inventor
Akihiko Shibata
Haruyo Fukui
Shinya Imamura
Akira Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Hardmetal Corp
Original Assignee
Tokai Seimitsu Co Ltd
Sumitomo Electric Hardmetal Corp
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Publication of EP2156912A1 publication Critical patent/EP2156912A1/de
Publication of EP2156912A4 publication Critical patent/EP2156912A4/de
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B51/00—Tools for drilling machines
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23C—MILLING
    • B23C5/00—Milling-cutters
    • B23C5/16—Milling-cutters characterised by physical features other than shape
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0664—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
    • C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]
    • Y10T428/24967—Absolute thicknesses specified
    • Y10T428/24975—No layer or component greater than 5 mils thick
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Definitions

  • the present invention relates to a surface-coated cutting tool used for a cutting process or the like of a metal material.
  • Patent Document 1 Japanese Patent National Publication No. 2006-524748 (Patent Document 1)).
  • heat resistance or wear resistance can be improved to some extent, however, brittleness, which is a problem specific to such an AlCr-based coating film, is exhibited, which gives rise to a problem of fracture and peel-off of the coating film itself due to impact or the like during cutting.
  • Patent Document 3 Japanese Patent Laying-Open No. 2006-137982
  • the layer containing Al and/or Si intrinsically tends to exhibit brittleness and the problem of fracture or peel-off of the coating film has not yet sufficiently been solved.
  • the present invention was made in view of the present circumstances as above and an object of the present invention is to provide a surface-coated cutting tool having a coating film less likely to suffer brittleness while maintaining heat resistance and wear resistance.
  • a surface-coated cutting tool including a substrate and a coating film formed on the substrate is characterized in that the coating film includes a composite super multi-layer film obtained by alternately stacking one or more first super multi-layer film and one or more second super multi-layer film, the first super multi-layer film above is formed by alternately stacking one or more A1 layer and one or more B layer, the second super multi-layer film above is formed by alternately stacking one or more A2 layer and one or more C layer, each of the A1 layer above and the A2 layer above is composed of any of TiN, TiCN, TiAlN, and TiAlCN, the B layer above is composed of TiSiN or TiSiCN, and the C layer above is composed of AlCrN or AlCrCN.
  • each of the first super multi-layer film above and the second super multi-layer film above has a thickness not smaller than 0.1 ⁇ m and not greater than 0.5 ⁇ m and a ratio of thickness Y/X is not smaller than 0.5 and not greater than 4 where a thickness of the first super multi-layer film above is denoted by X and a thickness of the second super multi-layer film above is denoted by Y.
  • each of the A1 layer above, the A2 layer above, the B layer above, and the C layer above has a thickness not greater than 40nm
  • a ratio of thickness Xb/Xa is not smaller than 0.2 and not greater than 3 where a thickness of the A1 layer above is denoted by Xa and a thickness of the B layer above is denoted by Xb
  • a ratio of thickness Yc/Ya is not smaller than 0.2 and not greater than 3 where a thickness of the A2 layer above is denoted by Ya and a thickness of the C layer above is denoted by Yc.
  • the composite super multi-layer film above has a thickness not smaller than 1.0 ⁇ m and not greater than 8.0 ⁇ m.
  • the coating film above further includes an intermediate layer, and the intermediate layer is formed directly on the substrate above to a thickness not smaller than 0.1 ⁇ m and not greater than 1.0 ⁇ m and composed of any of TiN, TiCN, TiAlN, TiAlCN, TiSiN, TiSiCN, AlCrN, and AlCrCN.
  • the coating film above further includes a surface layer, and the surface layer is formed as an uppermost layer of the coating film above to a thickness not smaller than 0.1 ⁇ m and not greater than 2.0 ⁇ m.
  • a surface layer is preferably formed of the second super multi-layer film above.
  • such a surface layer is preferably composed of any of TiN, TiCN, TiAlN, TiAlCN, TiSiN, TiSiCN, AlCrN, and AlCrCN.
  • the coating film above is preferably formed with a physical vapor deposition method
  • the substrate above is preferably formed from any of cemented carbide, cermet, high-speed steel, ceramics, sintered cubic boron nitride, and sintered diamond.
  • the surface-coated cutting tool according to the present invention has the coating film less likely to suffer brittleness while maintaining heat resistance and wear resistance as a result of the above-described structure.
  • a thickness of a coating film is measured by using a scanning electron microscope (SEM) or a transmission electron microscope (TEM) and a composition of the coating film is determined by using an energy dispersive X-ray spectrometer (EDS).
  • SEM scanning electron microscope
  • TEM transmission electron microscope
  • EDS energy dispersive X-ray spectrometer
  • the surface-coated cutting tool according to the present invention includes the substrate and the coating film formed on the substrate.
  • the surface-coated cutting tool according to the present invention having such a basic structure is extremely useful as a drill, an end mill, a tip with replaceable edge for milling or turning, a metal saw, a gear cutting tool, a reamer, a tap, or a tip for crankshaft pin milling.
  • a conventionally known material for the substrate of such a cutting tool may be used as the substrate for the surface-coated cutting tool according to the present invention, without particularly limited.
  • a substrate include cemented carbide (for example, WC based cemented carbides composed of WC alone or combination ofWC and Co and/or carbonitride of Ti, Ta, Nb, or the like), cermet (mainly composed of TiC, TiN, TiCN, or the like), high-speed steel, ceramics (titanium carbide, silicon carbide, silicon nitride, aluminum nitride, aluminum oxide, a mixture thereof, and the like), sintered cubic boron nitride, sintered diamond, and the like.
  • the cemented carbide contains free carbon or an abnormal phase called ⁇ phase in its texture.
  • the surface of the substrate may be reformed.
  • a ⁇ -phase-removed layer may be formed on its surface, or in the case of the cermet, a surface-hardened layer may be formed. Even if the surface is reformed in such a manner, the effect of the present invention is still obtained
  • the coating film according to the present invention is characterized by including a composite super multi-layer film obtained by alternately stacking one or more first super multi-layer film and one or more second super multi-layer film.
  • the first super multi-layer film is formed by alternately stacking one or more A1 layer and one or more B layer
  • the second super multi-layer film is formed by alternately stacking one or more A2 layer and one or more C layer
  • each of the A1 layer above and the A2 layer above is composed of any of TiN, TiCN, TiAlN, and TiAlCN
  • the B layer above is composed of TiSiN or TiSiCN
  • the C layer above is composed of AlCrN or AlCrCN.
  • the A1 layer and the A2 layer above are stacked on the B layer and the C layer above excellent in heat resistance or wear resistance respectively, so that such a disadvantage as brittleness is successfully eliminated while maintaining suitable characteristics originally possessed by the B layer and the C layer, that is, excellent heat resistance or wear resistance.
  • the first super multi-layer film including the B layer and the second super multi-layer film including the C layer are alternately stacked, so that drastic improvement in the strength of the coating film has successfully been achieved as compared with an example where each super multi-layer film is formed alone. The reason may be because, if each super multi-layer film above is formed alone, brittleness is more likely as the thickness thereof is greater, whereas each super multi-layer film can be controlled to have a small thickness by alternately stacking these super multi-layer films.
  • the coating film according to the present invention also encompasses an example where the coating film covers the entire surface of the substrate, an example where the coating film is partially not formed, and an example where a manner of stack in the coating film is partially different.
  • the coating film according to the present invention may include a layer such as an intermediate layer or a surface layer as will be described later, other than the composite super multi-layer film above.
  • a coating film has a thickness (total thickness) preferably not smaller than 1 ⁇ m and not greater than 11 ⁇ m, more preferably the upper limit thereof being not greater than 9 ⁇ m and further preferably not greater than 7 ⁇ m and the lower limit thereof being not smaller than 1.2 ⁇ m and further preferably not smaller than 1.5 ⁇ m. If the thickness is less than 1 ⁇ m, heat resistance or wear resistance may not sufficiently be exhibited. If the thickness exceeds 11 ⁇ m, the strength is lowered, which may not be preferable.
  • a constituent unit forming the coating film is referred to as a "film” or a “layer”, however, this is for the sake of convenience and does not intend to clearly distinguish between the same.
  • the composite super multi-layer film according to the present invention has a structure obtained by alternately stacking one or more first super multi-layer film and one or more second super multi-layer film.
  • Such a composite super multi-layer film has a thickness preferably not smaller than 1.0 ⁇ m and not greater than 8.0 ⁇ m, more preferably the upper limit thereof being not greater than 7 ⁇ m and further preferably not greater than 6 ⁇ m and the lower limit thereof being not smaller than 1.2 ⁇ m and further preferably not smaller than 1.5 ⁇ m. If the thickness is less than 1.0 ⁇ m, heat resistance or wear resistance may not sufficiently be exhibited. If the thickness exceeds 8.0 ⁇ m, the strength is lowered, which may not be preferable.
  • the number of stacked first super multi-layer films and second super multi-layer films forming the composite super multi-layer film is not particularly limited, the number of stacked films is each preferably not smaller than 3 and not greater than 15 in terms of manufacturing efficiency.
  • the order of stacking the first super multi-layer film and the second super multi-layer film is not particularly limited either Namely, stacking may be started from any of the first super multi-layer film and the second super multi-layer film (that is, any of the first super multi-layer film and the second super multi-layer film may be located on the substrate side), or stacking may be ended with any of these (that is, any of the first super multi-layer film and the second super multi-layer film may also be located on the coating film surface side).
  • the first super multi-layer film according to the present invention has a structure obtained by alternately stacking one or more A1 layer and one or more B layer.
  • Such a first super multi-layer film has a thickness preferably not smaller than 0.1 ⁇ m and not greater than 0.5 ⁇ m, more preferably the upper limit thereof being not greater than 0.45 ⁇ m and further preferably not greater than 0.4 ⁇ m and the lower limit thereof being not smaller than 0.15 ⁇ m and further preferably not smaller than 0.2 ⁇ m. If the thickness is less than 0.1 ⁇ m, it is more likely that it is difficult to uniformly stack the A1 layer and the B layer, sufficient improvement in performance cannot be achieved, and quality is not uniform. Alternatively, if the thickness exceeds 0.5 ⁇ m, the strength is lowered and the coating film peels off, which may not be preferable.
  • the number of stacked A1 layers and B layers forming the first super multi-layer film is not particularly limited, the number of stacked layers is each preferably not smaller than 2 and not greater than 50 in terms of manufacturing efficiency.
  • the order of stacking the A1 layer and the B layer is not particularly limited either. Namely, stacking may be started from any of the A1 layer and the B layer (that is, any of the A1 layer and the B layer may be located on the substrate side), or stacking may be ended with any of these (that is, any of the A1 layer and the B layer may also be located on the coating film surface side).
  • respective first super multi-layer films forming the composite super multi-layer film are substantially identical in properties such as a composition, a thickness or the like (a composition, a thickness or the like of the A1 layer and the B layer), difference in properties depending on manufacturing conditions does not mean departure from the scope of the present invention.
  • the second super multi-layer film according to the present invention has a structure obtained by alternately stacking one or more A2 layer and one or more C layer.
  • Such a second super multi-layer film has a thickness preferably not smaller than 0.1 ⁇ m and not greater than 0.5 ⁇ m, more preferably the upper limit thereof being not greater than 0.45 ⁇ m and further preferably not greater than 0.4 ⁇ m and the lower limit thereof being not smaller than 0.1 ⁇ m and further preferably not smaller than 0.2 ⁇ m If the thickness is less than 0.1 ⁇ m, it is more likely that it is difficult to uniformly stack the A2 layer and the C layer, sufficient improvement in performance cannot be achieved, and quality is not uniform. Alternatively, if the thickness exceeds 0.5 ⁇ m, the strength is lowered and the coating film peels off, which may not be preferable.
  • the number of stacked A2 layers and C layers forming the second super multi-layer film is not particularly limited, the number of stacked layers is each preferably not smaller than 2 and not greater than 50 in terms of manufacturing efficiency
  • the order of stacking the A2 layer and the C layer is not particularly limited either. Namely, stacking may be started from any of the A2 layer and the C layer (that is, any of the A2 layer and the C layer may be located on the substrate side), or stacking may be ended with any of these (that is, any of the A2 layer and the C layer may also be located on the coating film surface side)
  • respective second super multi-layer films forming the composite super multi-layer film are substantially identical in properties such as a composition, a thickness or the like (a composition, a thickness or the like of the A2 layer and the C layer), difference in properties depending on manufacturing conditions does not mean departure from the scope of the present invention.
  • each of the first super multi-layer film above and the second super multi-layer film above has a thickness not smaller than 0.1 ⁇ m and not greater than 0.5 ⁇ m and a ratio of thickness Y/X is not smaller than 0.5 and not greater than 4 where a thickness of the first super multi-layer film is denoted by X and a thickness of the second super multi-layer film is denoted by Y.
  • the thickness ratio Y/X is more preferably not smaller than 0.8 and not greater than 3.5 and further preferably not smaller than 1 and not greater than 3.
  • ratio of thickness Y/X above is less than 0.5, the strength of the coating film may be lowered, which is not preferable. Alternatively, if ratio of thickness Y/X above exceeds 4, wear resistance may be lowered, which is not preferable.
  • ratio of thickness Y/X represents a ratio of thickness between any of the first super multi-layer films and any of the second super multi-layer films that form the composite super multi-layer film and a location where this ratio is to be found is not particularly limited, however, a ratio of thickness between adjacent films is preferably determined.
  • each of the A1 layer forming the first super multi-layer film and the A2 layer forming the second super multi-layer film is composed of any of TiN, TiCN, TiAlN, and TiAlCN.
  • the A1 layer and the A2 layer have such a chemical composition, so that brittleness exhibited by the B layer and the C layer which will be described later can extremely effectively be lowered. Namely, by alternately stacking the A1 layer and the A2 layer on the B layer and the C layer respectively, an excellent effect that brittleness is not exhibited while maintaining heat resistance and wear resistance as described above can be obtained.
  • the A1 layer and the A2 layer may be different in composition, preferably these layers are suitably identical in composition. This is because, when the A1 layer and the A2 layer are identical in composition, contact between the first super multi-layer film and the second super multi-layer film can particularly be improved.
  • chemical formulae used in the present invention do not particularly define an atomic ratio of elements and do not intend an equal atomic ratio of elements. Namely, it is assumed that the chemical formulae used in the present invention include all atomic ratios that have conventionally been known (if an equal ratio is known, that equal ratio is included). For example, a chemical formula TiN does not indicate an atomic ratio between Ti and N of 1:1 but it encompasses all conventionally known atomic ratios such as 2:1, 1:1, 1:0.95, 1:0.9, and the like (this is also the case with chemical formulae other than TiN unless otherwise specified).
  • each of the A1 layer and the A2 layer preferably has a thickness not greater than 40nm, more preferably not greater than 35nm, and further preferably not greater than 30nm.
  • the thickness is not particularly limited, if the thickness is less than 0.5nm, it may be difficult to uniformly stack these layers and to sufficiently exhibit brittleness improvement performance
  • the thickness exceeds 40nm, an effect to improve heat resistance or wear resistance by the B layer or the C layer may be lowered.
  • the B layer forming the first super multi-layer film is composed of TiSiN or TiSiCN.
  • the B layer has such a chemical composition, heat resistance and wear resistance of the coating film can be improved.
  • the B layer preferably has a thickness not greater than 40nm, more preferably not greater than 30nm, and further preferably not greater than 25nm.
  • the thickness is not particularly limited, if the thickness is less than 0.5nm, it may be difficult to uniformly stack the B layer and to sufficiently exhibit the effect as above. On the other hand, if the thickness exceeds 40nm, it may be difficult to lower brittleness.
  • the C layer forming the second super multi-layer film is composed of AlCrN or AlCrCN.
  • the C layer has such a chemical composition, heat resistance and wear resistance of the coating film can be improved and lubricating property can be improved.
  • the C layer preferably has a thickness not greater than 40nm, more preferably not greater than 35nm, and further preferably not greater than 30nm.
  • the thickness is not particularly limited, if the thickness is less than 0.5nm, it may be difficult to uniformly stack the C layer and to sufficiently exhibit the effect as above. On the other hand, if the thickness exceeds 40nm, it may be difficult to lower brittleness.
  • each of the A1 layer, the A2 layer, the B layer, and the C layer above has a thickness not greater than 40nm, a ratio of thickness Xb/Xa is not smaller than 0.2 and not greater than 3 where a thickness of the A1 layer above is denoted by Xa and a thickness of the B layer above is denoted by Xb, and a ratio of thickness Yc/Ya is not smaller than 0.2 and not greater than 3 where a thickness of the A2 layer above is denoted by Ya and a thickness of the C layer above is denoted by Yc.
  • the ratios of thickness Xb/Xa and Yc/Ya are more preferably not smaller than 0.3 and not greater than 2.5 and further preferably not smaller than 0.4 and not greater than 2.
  • the ratios of thickness Xb/Xa and Yc/Ya above are less than 0.2, heat resistance and wear resistance may be lowered, which is not preferable. On the other hand, if the ratios of thickness Xb/Xa and Yc/Ya above exceed 3, brittleness may be exhibited (embrittlement), which is not preferable.
  • ratio of thickness Xb/Xa above represents a ratio of thickness between any of the A1 layers and any of the B layers that form each first super multi-layer film and a location where this ratio is to be found is not particularly limited, however, a ratio of thickness between two adjacent layers is preferably determined.
  • ratio of thickness Yc/Ya above represents a ratio of thickness between any of the A2 layers and any of the C layers that form each second super multi-layer film and a location where this ratio is to be found is not particularly limited, however, a ratio of thickness between two adjacent layers is preferably determined.
  • the coating film according to the present invention may further include an intermediate layer other than the composite super multi-layer film above
  • the intermediate layer is formed directly on the substrate above to a thickness not smaller than 0.1 ⁇ m and not greater than 1.0 ⁇ m and composed of any of TiN, TiCN, TiAlN, TiAlCN, TiSiN, TiSiCN, AlCrN, and AlCrCN.
  • the thickness above is more preferably not smaller than 0.2 ⁇ m and not greater than 0.5 ⁇ m.
  • the coating film according to the present invention may further include a surface layer other than the composite super multi-layer film above.
  • the surface layer is formed as an uppermost layer of the coating film above to a thickness not smaller than 0.1 ⁇ m and not greater than 2.0 ⁇ m.
  • Such a surface layer may be formed of the second super multi-layer film above.
  • such a surface layer may be composed of any of TiN, TiCN, TiAlN, TiAlCN, TiSiN, TiSiCN, AlCrN, and AlCrCN,
  • the thickness above is more preferably not smaller than 0.3 ⁇ m and not greater than 1.5 ⁇ m. If the surface layer is formed of the second super multi-layer film, the thickness above is preferably not smaller than 0.6 ⁇ m and not greater than 1.5 ⁇ m.
  • a surface layer As the uppermost layer (preferably, forming the surface layer on the composite super multi-layer film), lubricating property of the coating film can be improved.
  • chipping involved with a work material of low hardness, with which adhesion at a cutting edge is likely, such as SS400 (rolled steel) or SCM415 (alloy steel) can be suppressed. If the thickness above is less than 0.1 ⁇ m, the effect of improvement in lubricating property above may not sufficiently be exhibited. On the other hand, if the thickness exceeds 2.0 ⁇ m, the strength of the coating film may be lowered.
  • the coating film according to the present invention may include both of such a surface layer and the intermediate layer above other than the composite super multi-layer film, or may include only any one of them.
  • the coating film according to the present invention is optimally formed with a physical vapor deposition method. Namely, the coating film according to the present invention is preferably formed with the physical vapor deposition method.
  • a sputtering method, an ion plating method and the like have been known as such a physical vapor deposition method, and any conventionally known physical vapor deposition method may be adopted.
  • an arc ion plating method high in a rate of ionization of a raw material element is particularly preferably adopted.
  • the surface of the substrate can be subjected to metal or gas ion bombardment treatment prior to formation of the coating film, so that contact of the coating film can drastically be improved.
  • the arc ion plating method is a preferred film deposition process in the present invention.
  • FIG. 1 A specific method for forming the composite super multi-layer film with the arc ion plating method will be illustrated hereinafter with reference to Fig. 1 . It is noted that the intermediate layer or the surface layer above can also be formed with the arc ion plating method by adopting conventionally known conditions.
  • Fig. 1 is a schematic diagram of an arc ion plating apparatus 10 with which the arc ion plating method is performed (schematic plan view, viewed from above).
  • target materials are set at evaporation sources 1 to 4.
  • a target material for forming the A1 layer that is, Ti or TiAl
  • a target material for forming the B layer that is, TiSi
  • a target material for forming the A2 layer that is, Ti or TiAl
  • a target material for forming the C layer that is, AlCr
  • a substrate 7 is set at a substrate holder 6 within a chamber 5, and the first super multi-layer film is formed with evaporation sources 1 and 2 and the second super multi-layer film is formed with evaporation sources 3 and 4 while substrate holder 6 is turned.
  • substrate holder 6 is turned once or a plurality of times while the target materials on evaporation sources 1 and 2 are evaporated and ionized, so that the first super multi-layer film is formed on the substrate. Then, substrate holder 6 is turned once or a plurality of times while the target materials on evaporation sources 3 and 4 are evaporated and ionized, so that the second super multi-layer film is formed on the first super multi-layer film.
  • the composite super multi-layer film obtained by stacking one first super multi-layer film and one second super multi-layer film, corresponding to the smallest number of stacks in the composite super multi-layer film of the present invention is formed.
  • the composite super multi-layer film obtained by alternately stacking one or more first super multi-layer film and one or more second super multi-layer film can be formed. More specific conditions are exemplified below.
  • substrate 7 is heated to 200 to 500°C by using a heater (not shown) provided in chamber 5. Thereafter, while an argon gas is introduced to maintain a pressure within chamber 5 at 1 to 3Pa, a bias voltage (-300 to -600V) is applied to the substrate, to thereby subject the surface of the substrate to cleaning treatment with argon ions for 30 to 60 minutes.
  • a bias voltage (-300 to -600V) is applied to the substrate, to thereby subject the surface of the substrate to cleaning treatment with argon ions for 30 to 60 minutes.
  • a nitrogen gas or a gas mixture of the nitrogen gas and a carbon source gas such as methane is introduced as a reaction gas to maintain the pressure within chamber 5 at 2 to 5Pa.
  • a bias voltage 20 to -100V
  • the target material set at evaporation source 1 and the target material set at evaporation source 2 are evaporated and ionized by arc discharge (arc current 100 to 150A), to thereby form the first super multi-layer film on the substrate.
  • the target material set at evaporation source 3 and the target material set at evaporation source 4 are evaporated and ionized under the conditions the same as above, to thereby form the second super multi-layer film on the first super multi-layer film.
  • the composite super multi-layer film can be formed.
  • any composition, any thickness, and any number of stacks of each layer can be set by controlling a type of a reaction gas, a film deposition time period, a rate of ionization of the target material, a speed of turning the substrate holder, and the like.
  • Example 1 shown in Table 1 A case where the coating film according to Example 1 shown in Table 1 is formed with the arc ion plating method by using arc ion plating apparatus 10 as shown in Fig. 1 is exemplified. As different substrates are used for three respective types of cutting tests which will be described later, the coating film was formed under the same conditions for these three types of substrates.
  • Ti was set at evaporation source 1 as the target material for forming the A1 layer
  • Ti was set at evaporation source 3 as the target material for forming the A2 layer
  • substrate 7 set at substrate holder 6 was heated to 500°C by using the heater provided in chamber 5. Thereafter, while the argon gas was introduced to maintain the pressure within chamber 5 at 3.0Pa, a bias voltage (-300V) was applied to the substrate, to thereby subject the surface of the substrate to cleaning treatment with argon ions for 30 minutes.
  • a bias voltage (-300V) was applied to the substrate, to thereby subject the surface of the substrate to cleaning treatment with argon ions for 30 minutes.
  • the nitrogen gas was introduced to maintain the pressure within chamber 5 at 5.0Pa.
  • a bias voltage 50V
  • the target material set at evaporation source 1 and the target material set at evaporation source 2 were evaporated and ionized by arc discharge (arc currents were set to 150A and 100A respectively), to thereby form the first super multi-layer film on the substrate to a thickness of 0.3 ⁇ m.
  • the target material set at evaporation source 3 and the target material set at evaporation source 4 were evaporated and ionized by arc discharge (arc currents were both set to 100A), to thereby form the second super multi-layer film on the first super multi-layer film formed as above to a thickness of 1.5 ⁇ m.
  • the thickness of the A2 layer and the thickness of the C layer were controlled to 50nm and 25nm respectively, A2 layer and C layer were alternately stacked 20 times in this order, to form the second super multi-layer film (thickness ratio Yc/Ya was 0.5).
  • the composite super multi-layer film having a thickness of 9 ⁇ m obtained by alternately stacking first super multi-layer film and second super multi-layer film five times was formed.
  • the coating films according to Examples 1 to 18 shown in Table 1 were formed.
  • a composition an atomic ratio is not limited but any conventionally known atomic ratio may be adopted
  • a thickness an atomic ratio is not limited but any conventionally known atomic ratio may be adopted
  • the number of stacks of each layer are controlled by controlling a type of a reaction gas, a film deposition time period, a rate of ionization of the target material, a speed of turning the substrate holder, and the like.
  • the coating film according to Example 5 can be formed in a manner the same as that for the coating film according to Example 1, by setting Ti at evaporation source 1 as the target material for forming the A1 layer, setting the TiSi alloy at evaporation source 2 as the target material for forming the B layer, setting the TiAl alloy at evaporation source 3 as the target material for forming the A2 layer, setting the AlCr alloy at evaporation source 4 as the target material for forming the C layer, employing the gas mixture of the nitrogen gas and the methane gas as the reaction gas for forming the first super multi-layer film, and employing the nitrogen gas as the reaction gas for forming the second super multi-layer film.
  • a layer other than the composite super multi-layer film can be formed by using each target material for forming the super multi-layer film having corresponding composition, without modification.
  • Comparative Examples 1 to 7 shown in Table 2 were also formed by adopting the conditions the same as above.
  • Comparative Examples 1 to 3 correspond to Examples 1, 13 and 16, respectively, and they are different from the examples in composition or combination of the A1 layer, the A2 layer, the B layer, and the C layer.
  • Comparative Example 4 corresponds to Example 14, in which the B layer alone forms the first super multi-layer film and the C layer alone forms the second super multi-layer film.
  • Comparative Example 5 corresponds to Example 15, in which only a simple super multi-layer film obtained by alternately stacking the B layer and the C layer is included as the coating film.
  • Comparative Example 6 corresponds to Example 8, in which only the first super multi-layer film is included as the coating film.
  • Comparative Example 7 corresponds to Example 17, in which only the second super multi-layer film is included as the coating film.
  • the number of stacks represents the number of stacks in each of the first super multi-layer film and the second super multi-layer film and the total thickness represents the total thickness of the entire coating film.
  • a blank field indicates that no such coating is formed. Therefore, in the example where the intermediate layer and the surface layer are not formed, it is indicated that only the composite super multi-layer film obtained by alternately stacking the first super multi-layer film and the second super multi-layer film is formed as the coating film on the substrate. In the example where the intermediate layer is formed, the intermediate layer is formed between the substrate and the composite super multi-layer film, and the surface layer is formed on the composite super multi-layer film.
  • SKD11 HRC53
  • the shoulder milling was performed at a cutting speed of 120m/min, a feed rate of 0.03mm/tooth, a depth of cut Ad of 8mm, and Rd of 0.4mm, with air blow.
  • Evaluation of cutting performance is shown as a distance of cut (m) at a time point when a wear width of an outer periphery of a cutting edge exceeds 0.1mm.
  • a longer distance indicates superior cutting performance (longer life of a tool, that is, excellent heat resistance and wear resistance and lower brittleness), and a shorter distance or chipping at an early stage of cutting (denoted as "chipping at early stage”) indicates poor cutting performance.
  • a drill made of cemented carbide (diameter (outer diameter) 10mm) was employed as the substrate.
  • S50C (HB220) was employed as the work material, and wet type drilling (through hole of 30mm depth) was performed at a cutting speed of 80m/min and a feed rate of 0.2mm/rev. with coolant.
  • Evaluation of cutting performance is shown as a distance of cut (unit m, the number of drilled holesx30mm) at a time point when a wear width of an outer peripheral portion at a tip end of a cutting edge exceeds 0.2mm.
  • a longer distance indicates superior cutting performance (longer life of a tool, that is, excellent heat resistance and wear resistance and lower brittleness), and a shorter distance or chipping at an early stage of cutting (denoted as "chipping at early stage”) indicates poor cutting performance.
  • An indexable insert for milling that is made of cemented carbide and comparable to JIS grade P30 (shape: SPG432), was employed as the substrate.
  • SCM435 was employed as the work material, and a cutting speed was set to 250m/min, a feed rate was set to 0.25mm/tooth, a depth of cut was set to 2mm, and cutting oil was not used (dry machining).
  • Evaluation of cutting performance is shown as a distance of cut (m) at a time point when a flank wear width exceeds 0.2mm.
  • a longer distance indicates superior cutting performance (longer life of a tool, that is, excellent heat resistance and wear resistance and lower brittleness), and a shorter distance or chipping at an early stage of cutting (denoted as "chipping at early stage”) indicates poor cutting performance.
  • SCM415 (HB 235) was employed as the work material, and wet type drilling (through hole of a hole depth of 40mm) was performed at a cutting speed of 80m/min and a feed rate of 0.25mm/rev. with coolant.
  • Example 7 As a result, in Comparative Example 7, breakage occurred at a cutting length of 10m. In contrast, in Example 17, the cutting process could be performed without breakage until a cutting length of 55m. In addition, in Example 18, the cutting process could be performed without breakage until a cutting length of 100m.
  • Example 18 In Comparative Example 7 where breakage occurred, the work material adhered to the outer cutting edge, which seems to be the cause of breakage. In contrast, in Example 18, as the second super multi-layer film is formed as the surface layer, adhesion of the work material at the cutting edge hardly occurred even after cutting by a distance of 100m. It was thus confirmed that Example 18 is superior in terms of lubricating property of the coating film.
  • the surface-coated cutting tool (that is, coating film) according to the examples of the present invention has a tool life significantly longer than the surface-coated cutting tool (that is, coating film) according to the comparative examples, namely, it is excellent in heat resistance and wear resistance and achieves lower brittleness.
  • the composite super multi-layer film obtained by alternately stacking one or more first super multi-layer film and one or more second super multi-layer film is included as the coating film formed on the substrate, the first super multi-layer film above is formed by alternately stacking one or more A1 layer and one or more B layer, the second super multi-layer film above is formed by alternately stacking one or more A2 layer and one or more C layer, each of the A1 layer above and the A2 layer above is composed of any of TiN, TiCN, TiAlN, and TiAlCN, the B layer above is composed of TiSiN or TiSiCN, and the C layer above is composed of AlCrN or AlCrCN, so that excellent cutting performance was exhibited.
  • the surface layer of the coating film above is formed of the second super multi-layer film, adhesion of the work material to the cutting edge can be prevented, which is superior in terms of lubricating property of the coating film

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WO2008146727A1 (ja) 2008-12-04
US7923130B2 (en) 2011-04-12
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EP2156912A4 (de) 2010-06-02
KR101150145B1 (ko) 2012-06-08
KR20100007925A (ko) 2010-01-22
US20100215951A1 (en) 2010-08-26
JP4576638B2 (ja) 2010-11-10
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CN101678466B (zh) 2012-05-30
EP2156912B1 (de) 2011-08-17

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