EP1968071B1 - Speichersystem zur reduktion des stromverbrauchs und verfahren dafür - Google Patents

Speichersystem zur reduktion des stromverbrauchs und verfahren dafür Download PDF

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Publication number
EP1968071B1
EP1968071B1 EP06843204A EP06843204A EP1968071B1 EP 1968071 B1 EP1968071 B1 EP 1968071B1 EP 06843204 A EP06843204 A EP 06843204A EP 06843204 A EP06843204 A EP 06843204A EP 1968071 B1 EP1968071 B1 EP 1968071B1
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EP
European Patent Office
Prior art keywords
voltage
electrode
circuit
word line
low
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EP06843204A
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English (en)
French (fr)
Japanese (ja)
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EP1968071A1 (de
EP1968071A4 (de
Inventor
Toshio Sunaga
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International Business Machines Corp
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International Business Machines Corp
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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/4063—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing
    • G11C11/407—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing for memory cells of the field-effect type
    • G11C11/4074—Power supply or voltage generation circuits, e.g. bias voltage generators, substrate voltage generators, back-up power, power control circuits
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C5/00—Details of stores covered by group G11C11/00
    • G11C5/14—Power supply arrangements, e.g. power down, chip selection or deselection, layout of wirings or power grids, or multiple supply levels
    • G11C5/145—Applications of charge pumps; Boosted voltage circuits; Clamp circuits therefor
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C2207/00—Indexing scheme relating to arrangements for writing information into, or reading information out from, a digital store
    • G11C2207/22—Control and timing of internal memory operations
    • G11C2207/2227—Standby or low power modes
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C2211/00—Indexing scheme relating to digital stores characterized by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C2211/401—Indexing scheme relating to cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C2211/406—Refreshing of dynamic cells
    • G11C2211/4067—Refresh in standby or low power modes
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C2211/00—Indexing scheme relating to digital stores characterized by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C2211/401—Indexing scheme relating to cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C2211/406—Refreshing of dynamic cells
    • G11C2211/4068—Voltage or leakage in refresh operations

Definitions

  • the present invention relates generally to memory systems and, more specifically, it relates to a circuit and a method for generating a high-level voltage and a low-level voltage with high efficiency to reduce current consumption of a memory system in operation.
  • DRAMs dynamic random access memories
  • N-channel MOS field effect transistor FET
  • word line circuit that drives word lines connected to the gates of the cell transistors of the memory cells.
  • high-level values are written to the memory cells of such memories by applying a high-level voltage to bit lines (data lines) connected to the sources of the memory cells. Therefore, the high-level voltage (high voltage Vpp) of the word lines connected to the gates of the memory cells must be higher than the high-level voltage of the bit lines by at least the threshold voltage Vt of the cell transistors. Furthermore, in a state in which data is stored in the memory cells with the voltage of the word lines held at a low level, the threshold voltage Vt must be significantly high to keep the leak current between the drain and the source of each cell transistor below the order of f (femto: 1 ⁇ 10 15 ) A (ampere).
  • the voltage of the word lines (the gate voltage of the cell transistors) sufficient to write the full high-level value of the bit lines to the memory cells at high speed is considerably as high as 3.0 V or more, because this is a source follower (grounded drain) operation in a state in which the substrate is biased at the voltage Vt.
  • the high-level voltage Vpp of the word lines has recently been decreased to about 2.6 V to 2.8 V because of the necessity for decreasing the word line voltage as DRAMs become fmer. Therefore, the threshold voltage Vt of cell transistors must also be decreased. However, the decrease in threshold voltage Vt increases the leak current of memory cells.
  • negative voltages from -0.2 V to -0.5 V are used as the low-level voltage (low voltage Vnn) of word lines.
  • These high-level voltages from 2.6 V to 2.8 V of word lines and negative low-level voltages from -0.2 V to -0.5 V of word lines are generated from the internal voltage of DRAMs by the charge pump circuits in DRAM chips (referred to as a Vpp pump and a Vnn pump, respectively). Since such negative voltages are used as the low-level voltage of word lines, the high-level voltage is decreased to 2.6 V to 2.8 V. However, the internal voltage for generating it is also decreased to about 1.6 V, so that their voltage ratio remains large, and the current consumption is also high because of conversion loss due to the low efficiency of the charge pump circuits, to be described below.
  • a current of a value calculated by multiplying the current actually used in the circuit (word line circuit) of the memory by the reciprocal of efficiency expressed in percentages flows from the power supply. Accordingly, with an efficiency of 40%, a current 2.5 times as high as current used in an actual word line circuit is consumed in its memory chip.
  • a recent increase in memory capacity of DRAMs has increased word lines that must be activated at once.
  • all the banks are refreshed at the same time. This needs to activate word lines of a bank-number multiple (normally, four banks) of that of normal access, resulting in current consumption as high as 20 mA for 512-Mbit SDRAMs. This has become a significant obstacle to reduction in normal access current or refresh current.
  • the booster circuit is a circuit for boosting voltage using a capacitor and a switch using an N-channel MOS FET, which has a well-known structure used when DRAMs are not made of complementary metal oxide semiconductor (CMOS) currently used but are made of only N-type MOS (until the middle of 1980s when DRAMs earlier than 1-Mbit DRAMs are used).
  • CMOS complementary metal oxide semiconductor
  • Japanese Unexamined Patent Application Publication No. 6-139776 discloses an idea about enhancing the speed of this booster circuit. That is to say, there are various additional parasitic capacitors around a row address decoder.
  • the booster circuit must boost the nodes connected to those capacitors. Accordingly, if the capacitors have large capacitance, it takes much time to boost them, precluding high-speed operation. To solve this problem, the voltage to be applied to those nodes is raised to a predetermined level in advance through another route via a switch, and then the predetermined-level voltage is raised to a word-line voltage level higher than that using the booster circuit, without relying on the booster circuit for all the boosting, thereby reducing the total time to boost the voltage to the nodes.
  • An object of the invention is to provide a memory system for memories such as DRAMs having a voltage generating circuit, including a charge pump circuit, for generating a high-level and a low-level voltage to be supplied to word lines that drive the gates of memory cells.
  • the memory system is configured to reduce large current consumption in active and standby modes caused by low efficiency inherent to the voltage generating circuit by improving the efficiency of the voltage generating circuit and to speed up voltage supply.
  • Another object of the invention is to provide a method for achieve the low current consumption.
  • a memory system comprising: a memory cell array; a word line circuit that receives either of an access start request or an access end request for the memory cell array and controls access to the memory cell array; and a high-voltage-supply booster circuit for driving the word line circuit from a low voltage for memory access to a high voltage for memory access by supplying to the word line circuit an electric charge that is stored in a high-voltage boost capacitor, the high-voltage-supply booster circuit driving the word line circuit in response to the access start request, the high-voltage boost capacitor discharging the electric charge from a first-reference-voltage supply source to the supply source of the high voltage in the word line circuit in response to the access start request, the high-voltage-supply booster circuit comprising a first semiconductor switch (SW1), when charging, connecting a first electrode of the high-voltage boost capacitor to the first-reference-voltage supply source and, when discharging, connecting the first electrode to the high-
  • SW1 first semiconductor switch
  • a method for operating a memory system comprising: a memory cell array; a word line circuit that controls access to the memory cell array; a high-voltage-supply booster circuit having a high-voltage boost capacitor, a first semiconductor switch (SW1), a second semiconductor switch (SW2), and a third semiconductor switch (SW3); and, a high-voltage generating circuit; the method comprising: receiving at the word line circuit either of an access start request or an access end request; driving the word line circuit from a low voltage for memory access to a high voltage for memory access by the high-voltage-supply booster circuit supplying to the word line circuit, in response to the access start request, an electric charge that is stored in the high-voltage boost capacitor; discharging the electric charge from the high-voltage boost capacitor from a first-reference-voltage supply source to the supply source of the high voltage in the word line circuit in response to the access start request; connecting a first electrode of the high-voltage boost capacitor to the first
  • the invention can reduce current consumption of memory systems of DRAMs and other memories in active and standby modes.
  • Fig. 1 shows the structure of a related-art DRAM chip.
  • the DRAM chip has a row address decoder (RDEC) 100 in the center and memory cell arrays 104 and 106 on both sides thereof.
  • the memory cell arrays 104 and 106 each have memory cells 108 to 111 and so on, each of which is a memory unit of the DRAMs, arrayed vertically and horizontally.
  • one bit line (also referred to as a data line) 120 is connected to the sources 112, 114 and so on of the FETs that constitute the memory cells.
  • one word line 124 is connected to the gates 116, 117 and so on of the FETs that constitute the memory cells.
  • the bit lines and the word lines are driven to a high level or a low level at appropriate timing so that a high or low value is stored in a desired memory cell in the memory cell arrays 104 and 106, or the value stored in the desired memory cell can be read.
  • the row address decoder 100 is a block that decodes (not shown) row addresses input thereto and generates word lines to the memory cell arrays 104 and 106.
  • the row address decoder 100 has a word line circuit 102, for each memory cell array, which is a circuit block for generating word lines 124 to 126 and so on and for driving them to a high or low level.
  • Fig. 2 shows a detailed example of the word line circuit 102.
  • the example shows the word line circuit 102 in the row address decoder 100 that inputs a 10-bit row address to generate total 1,024 word lines.
  • the word line circuit 102 decodes 3 bits of the 10-bit row address to generate eight source drive signals (SDV) 200 and eight word-line reset signals (WLr) 204, and decodes the remaining 7 bits of the row address to generate 128 decoder output signals (RDout) 202.
  • SDV source drive signals
  • WLr word-line reset signals
  • the 1,024 word-line driver circuits 220 drive 1,024 word lines (WL) 230 and so on.
  • one source drive signal 206 is input to all of the 128 word-line driver circuits 220 to which the 128 decoder output signals 202 are input, respectively, and one decoder output signal 208 is input to all of the eight word-line driver circuits 220 to which the eight source drive signals 200 are input, respectively.
  • One of the word-line driver circuits 220 will be described.
  • the source drive signal 206 rises to the high level (Vpp) by the high-level supply voltage Vpp of a driver 230, and a word-line reset signal 210 falls to the low level (Vnn) by the low-level supply voltage Vnn of a driver 234.
  • the decoder output signal 208 falls to the low level (Vnn) by the low-level supply voltage Vnn of a driver 232.
  • the source of a P-channel MOS FET 222 in the word-line driver circuit 220 connected to the source drive signal 206 comes to the high level (Vpp), and the gate comes to the low level (Vnn). Therefore, the P-channel MOS FET 222 is turned on, and thus the voltage of the drain of the P-channel MOS FET 222 also comes to the high level (Vpp). Since the word-line reset signal 210 to the word-line driver circuit 220 is at the low level (Vnn), an N-channel MOS FET 224 is turned off. As a result, the word line 230 is driven to the high level (Vpp) to turn on the gates of the multiple cell transistors connected to the word line 230.
  • the word-line reset signal 210 comes to the high level (Vdd) by the high-level supply voltage Vdd of the driver 234, so that the N-channel MOS FET 224 is turned on.
  • the word line 230 is driven to the low level (Vnn), so that the gate of the cell transistor connected to the word line 230 remains off.
  • the high-level supply voltage Vpp for the drivers 230 and 232 and the low-level supply voltage Vnn for the drivers 230, 232, and 234 are supplied from a Vpp pump 130 and a Vnn pump 132 in Fig. 1 , respectively.
  • the Vpp pump 130 and the Vnn pump 132 are disposed at the outer periphery of the memory cell arrays 104 and 106.
  • the Vpp pump 130 is connected to the Vpp supply line in the row address decoder 100 through a metal wire 140.
  • the Vnn pump 132 is connected to the Vnn supply line in the row address decoder 100 through a metal wire 142.
  • the current consumed in the word line circuit 102 will be discussed.
  • the high-level supply voltage of the word line circuit 102 is Vpp, and the low-level supply voltage is Vnn. Therefore, the current (Iw) consumed by access to the memory cells flows from the Vpp pump 130 to the Vnn pump 132, as shown in Fig. 1 . Since the Vpp pump 130 and the Vnn pump 132 normally generate current from the internal power supply Vdd of the memory chip, the current Iw is also generated from the internal power supply Vdd.
  • the current expressed as [Ex. 1] flows from the power supply Vdd to the ground, which is the total current consumed in the word line circuit 102 of the memory chip.
  • Evp is the efficiency of the Vpp pump 130 expressed in percentages
  • Evn is the efficiency of the Vnn pump 132 expressed in percentages.
  • Their reciprocals are multiplied by Iw and the resultant values are added together. Since Evp and Evn are generally 0.5 or less, their reciprocals become 2 or more. Accordingly, the consumed current becomes several times as high as the current Iw which is actually necessary for the word line circuit 102.
  • the Vpp pump 130 and the Vnn pump 132 are generally disposed around the memory chip.
  • the word line circuit 102 that is actually driven by the voltage supplied from them is disposed in the row address decoder 100 in the center of the memory chip, which increases wiring resistance.
  • Fig. 1 shows the wiring resistance.
  • the pumps 130 and 132 must supply higher voltage in consideration of a decrease due to the wiring resistance, causing excess current consumption.
  • the invention focuses attention on the operation mode of the circuit driven by the Vpp pump 130 and the Vnn pump 132.
  • the Vpp pump 130 and the Vnn pump 132 are generally provided only for the word line circuit 102 and not used for other circuits at all. Both pumps 130 and 132 are used for two operations, raising the voltage level of a word line corresponding to a memory cell to be accessed to the high level (Vpp) and then returning to the low level (Vnn) and, when there is no access, the voltage level of the word line is kept at the low level (Vnn).
  • the pumps of the related art control the voltage using a feedback circuit in a manner similar to regulators.
  • the control circuit of the pump starts charging operation using a capacitor, and repeats the operation to return the voltage level that is decreased by current consumption to the original level.
  • the control circuit stops the charging operation by the capacitor.
  • the pumping operation of the capacitor is made with a relatively slow cycle of once per 25 to 30 ns. In this way, the voltage level Vpp is controlled to a desired average DC level with ripple that fluctuates between predetermined two levels. This is typical negative feedback control whereby results are corrected.
  • the timing at which large current is required for supplying the voltage level Vpp can be known well in advance.
  • the timing when large current is needed to supply the low voltage Vnn can also be known well in advance, because it is when the access ends and the voltage level of the word lines return to the low voltage Vnn.
  • An embodiment of the invention proposes a circuit configuration based on the above principle. Specifically, an embodiment of the invention is provided with the Vpp pump 130 and the Vnn pump 132 according to the related art because they are necessary to hold the voltage level of the word line 230 at Vnn when the memory cell is not accessed, and is further provided with an additional circuit for supplying a necessary amount of current locally and efficiently at necessary timing when the memory cell is accessed. Accordingly, the control circuit of the pumps does not detect fluctuations of voltage, and as a result, the low-efficient pumps are hardly operated, which remarkably reduces the operation current of the word line circuit 102 when access is made.
  • the above-described circuit for supplying necessary current at necessary timing when access is made is referred to as a local booster circuit, because it supplies the current by generating the high voltage (Vpp) and the negative voltage (Vnn) from the internal voltage of memory chips, so that it employs a boost system using a capacitor.
  • FIG. 3 shows the principle of charge transfer by the local booster circuit.
  • This circuit includes a boost capacitor 302 (capacitance: Cb) and switches SW1 and SW2 that connects their electrodes to various voltage levels.
  • the high-supply-voltage-side electrode of the word line circuit 102 that uses the voltage generated by the boost capacitor 302 is ERws 308.
  • the word line circuit 102 has a parasitic capacitor 310 (capacitance: Cw) due to the current flowing through the electrode ERws.
  • the parasitic capacitor 310 may include, in addition to the capacitance of the word line connected thereto, the capacitances of various lines and the junction capacitances of nodes.
  • ERsup 312 is an electrode (supply voltage level: Vsup) for charging the boost capacitor 302, which is normally the internal voltage (Vdd) of the chip.
  • ERpul 314 is an electrode (supply voltage level: Vpul) for raising the low-potential-side electrode of the boost capacitor 302.
  • the voltage level of the electrode ERws 308 of the word line circuit 102 is low, or 0 V for the purpose of brevity. Accordingly, the boost capacitor 302 accumulates electric charge Cb ⁇ Vsup, while the parasitic capacitor 310 has no electric charge.
  • the switch SW1 is connected to the electrode ERws 308 and the switch SW2 is connected to the electrode ERpul, so that the charge accumulated in the boost capacitor 302 is transferred to the parasitic capacitor 310 by charge sharing. Accordingly, the original charge Cb ⁇ Vsup is split into charge Cb(Vx-Vpul) accumulated in the boost capacitor 302 and charge Cw ⁇ Vx accumulated in the parasitic capacitor 310, where Vx is the voltage level of the electrode ERws 308 that has become the common node of the boost capacitor 302 and the parasitic capacitor 310.
  • the switch SW1 is opened and the switch SW2 is connected to the ground so as to reset the circuit, so that preparations for charging the boost capacitor 302 for the next access are made.
  • the next charging to the boost capacitor 302 is made by connecting the switch SW 1 to the electrode ERsup 312 again.
  • the electric charge transferred is Qtr, while electric charge that is necessary for the boosting operation by the boost capacitor 302 includes the electric charge Qin (equal to Qtr) to be given to the boost capacitor 302 and electric charge by circuit operation, whose main electric charge is one which raises the voltage level of the low-potential-side electrode of the boost capacitor 302 to Vpul. This is charging current for the capacitor between the low-potential-side electrode of the boost capacitor 302 and the ground.
  • the capacitance is lower than Cb but proportional to Cb. Therefore, the electric charge to be given is expressed as Rc ⁇ Cb ⁇ Vpul, where Rc is a proportionality constant smaller than 1.
  • Table 1 shows that the value K can be small and the higher approximate charge transfer efficiency becomes higher, as the voltage Vpul for raising the low-potential-side electrode of the boost capacitor 302 increases. That is to say, although an increase in Vpul may apparently increase the electric charge for raising the voltage level of the low-potential-side electrode of the boost capacitor 302 and decrease Qef, it actually offers the advantage of decreasing the value of K, thus decreasing the capacitance Cb. Thus, the value Qef increases as the voltage Vpul increases. This shows that, for efficient operation of the local booster circuit with small current, it is better to increase the voltage Vpul as much as possible. If the voltage Vpul is set at the same value 2.8 V as Vpp, the value of K becomes 1.7, so that Cb can be increased by about 70% of Cw.
  • Vpul is about 1.6 V which is the internal voltage of the memory chip
  • Fig. 4 shows the configuration of a memory system 410 according to an embodiment of the invention including a word line circuit 420 having a local booster circuit 400, a Vpp pump 404, and a Vnn pump 406.
  • the word line circuit 420 has a driver 428 for driving a source drive signal (SDV) 426 for supplying voltage to the source of a P-channel MOS FET 424 in a word-line driver circuit 422.
  • the driver 428 is connected to a high-supply-voltage supply line (electrode) ERws 430 (voltage level: Vws), to which the local booster circuit 400 is connected, with the switch SW1 in between.
  • the voltage level Vws of the electrode ERws 430 is low.
  • a total capacitance (corresponding to the parasitic capacitance in the above description) including the capacitances of the word lines in the word line circuit 420 from the electrode ERws 430 to the ground is referred to as Cw.
  • the supply voltage Vpp is applied to the same component as in the known art shown in Fig. 2 . That is, the high-level supply voltage Vpp to a driver 436 for driving a decoder output signal RDout 434 of the row address decoder is supplied from the Vpp pump 404.
  • the low-level supply voltage Vnn to the drivers 428, 436, and 438 is supplied from the Vnn pump 406.
  • the reason why the high-level supply voltage Vpp to the driver 436 may be supplied from the Vpp pump 404 is that, although the high-level supply line of the driver 436 drives great many decoder output signals (in the embodiment, 128 signals), only one output (for example, RDout 434) is brought from high to low in actual operation, and moreover, the output drives only the gates of the FETs (for example, the P-channel MOS FETs 424) in the small number of (in the embodiment, eight) word line driver circuit 422 connected thereto, so that even if the high-level supply voltage Vpp of the driver 436 is supplied from the Vpp pump 404, little current flows from the Vpp pump 404.
  • the source drive signal SDV is used to drive the word lines connected thereto from low to high. Since the word lines consume a large amount of current because they are connected to the gates of the cell transistors of great many memory cells in a memory cell array 452, the high-level supply voltage of the driver 428 for driving the source drive signal is supplied not from the low-efficient Vpp pump 404 but from the optimized-efficiency local booster circuit 400.
  • the voltage (Vpul in Fig. 3 ) to be supplied to the electrode for raising the voltage level of the low-potential-side electrode of the boost capacitor 442 (capacitance: Cb) is set to Vpp in this embodiment, because the higher, the better.
  • the embodiment of the invention employs the method of supplying the voltage Vpp generated from the Vpp pump 404, as in the related art, but using such low-efficiency pump 404 as little as possible and supplying most current using the local booster circuit 400.
  • the current from the Vpp pump 404 is generally used.
  • the capacitance between the low-potential-side electrode of the boost capacitor 442 and the ground is originally small since it is parallel capacitance of the capacitance of the diffusion layer of the N-channel MOS FET in which the source and drain are short-circuited and the capacitance of the depletion layer that is reverse-biased between it and a P-type substrate in the inverted N-type channel, and decreases more with increasing voltage.
  • a source follower (grounded drain type) composed of only N-channel MOS FETs is generally used.
  • the switch SW1 of the N-channel MOS FET type does not work well unless the gate voltage is extremely high, a voltage three times as high as Vdd must actually be applied to the gates.
  • the embodiment of the invention is advantageous because it can use, in place of the switch formed of only the N-channel MOS FETs, a P-type channel MOS FET in which the N-type substrate is held at the voltage from the Vpp pump 404 to permit low current because of charge transfer with low resistance, and is advantageous in view of reliability because the gates do not require a high voltage.
  • the local booster circuit 400 since the local booster circuit 400 is provided for each of the memory cell arrays 450 and 452 to be activated, and the portion that needs current, in other words, which local booster circuit 400 should be activated, can be known by decoding the row address given to the memory chip, the local booster circuit 400 can be ready for the above-described boosting operation. Moreover, since most of necessary current can be applied to necessary portions at necessary timing using the local booster circuit 400, the wiring resistance from the Vpp pump 404 and the Vnn pump 406 to the respective word line circuits 420 to be actually operated is insignificant, if present.
  • the value Cb of the boost capacitor 442 is determined from the total capacitance Cw including the capacitances of the word lines in an estimated word line circuit 420 so that necessary voltage Vpp can be obtained as the high-level voltage for the word lines.
  • some current is used from the Vpp, as described above, the values of Cb and other values are optimized so as to compensate the current. This prevents a decrease in the voltage level sensed by the control circuit of the Vpp pump 404, almost without the need for operating the Vpp pump. As a result, the current consumption of the word line circuit 420 can be remarkably reduced.
  • 128 word-line driver circuits are connected to one source drive signal 426.
  • the capacity of the word line circuit 420 per one source drive signal 426 is about 2 pF for 128 word lines. Therefore, assuming that the voltage Vpul is set to 2.8-V Vpp, the value Cb becomes 1.7 times as high as Cw from Table 1, which may be twice for allowance, so that the value Cb can be as low as 4 pF. Thus, necessary voltage and current can be supplied with low current and small area.
  • Figs. 5(a) to (c) show the operating steps of a Vpp local booster circuit 502 for a word line circuit 500 according to an embodiment of the invention.
  • Fig. 6(a) to (c) are timing charts showing changes in the voltage level of a word line 510 corresponding to Figs. 5(a) to (c) , respectively.
  • a switch SW1 is connected to an electrode ERsup 522, and a switch SW2 is connected to the ground, as shown in Fig. 5(a) , at a predetermined timing (at time T0 in Fig. 6(a) ) to charge a Vpp boost capacitor 524 (capacitance: Cb).
  • Vpp boost capacitor 524 capacitor capactance: Cb
  • the voltage level of an electrode ERws 512 is Vnn, so that the word line is also at a low level Vnn.
  • a signal RDout 514 is biased directly by the voltage Vpp generated by the Vpp pump 506.
  • the row address decoding is established by the row address decoder in response to the access start request, and a memory cell array to which the word line circuit 500 belongs is designated.
  • the switch SW 1 is connected to the electrode ERws 512 at a predetermined timing (at time T1 in Fig. 6(b) ), as shown in Fig. 5(b) , and then the switch SW2 is connected to the output of the Vpp pump 506 to thereby bring the voltage level to Vpp.
  • the Vpp boost capacitor 524 discharges electricity to the electrode ERws 512, so that the voltage of the electrode ERws 512 rises to a voltage level (slightly higher than Vpp) determined from the total capacitance Cw including the capacitances of the word lines in the word line circuit 500 and Cb, so that the word line 510, if selected by the row address decoder, can be raised to the same level as the voltage level, thus allowing the operation of reading data from the memory cell connecting to the word line 510.
  • the switch SW3 is closed and connected to the output of the Vpp pump 506 at a predetermined timing (at time T2 in Fig. 6(b) ) during the access to the memory cell.
  • a predetermined timing at time T2 in Fig. 6(b)
  • This is to make up for the electric charge lost from the Vpp pump 506 by the voltage that is set slightly higher in the Vpp local booster circuit 502 and, when the word line 510 should be kept at a high level as in a page mode, to prevent the voltage level from falling because of current leakage.
  • the amount of leakage current is generally small; therefore, if it is present, electric charge is supplied from the decoupling capacitor 520 with large capacitance Cdp, thus preventing a sharp drop in Vpp and a pump-up operation from starting.
  • the switch SW3 is opened at a predetermined timing (at time T3 in Fig. 6(c) ) before an access end request is given to the memory system, and then the switch SW1 is opened and the switch SW2 is grounded so that the low-potential-side electrode of the Vpp boost capacitor 524 is grounded.
  • the voltage at both electrodes of the Vpp boost capacitor 524 is initialized (reset) for the next charging to the Vpp boost capacitor 524. Since the electrode ERws 512 is not connected to any part and the word line 510 is kept at a high level, the electrode ERws 512 is kept charged at Vpp.
  • a Vnn local booster circuit 504 does not operate at the timing of Figs. 6(a) to (c) .
  • Figs. 7(a) to (c) show the operating steps of the Vnn local booster circuit 504 for the word line circuit 500 according to the embodiment of the invention.
  • Fig. 8(a) to (c) are timing charts showing changes in the voltage level of the word line 510 corresponding to Figs. 7(a) to (c) , respectively.
  • a switch SW4 is connected to the electrode ERws 512, and a switch SW5 is connected to the ground, as shown in Fig. 7(a) , at a predetermined timing (at time T4 in Fig. 8(a) ).
  • the electric charge stored in the total capacitance Cw including the capacitances of the word lines in the word line circuit 500 is charged in a Vnn boost capacitor 530 (capacitance: Cn).
  • decoupling capacitor 532 (capacitance: Cdn) between the ground and the output of a Vnn pump 508, which also has an extremely large capacitance of the order of nF.
  • the voltage level of the electrode ERws 512 begins to decrease from Vpp by the charge sharing between Cw and Cn generated by the charging from the electrode ERws 512 to the Vnn boost capacitor 530, and almost at the same time, the voltage level of the word line 510 begins to decrease, as shown in the timing chart of Fig. 8(a) , as the word line 510 is not selected in response to the access end request.
  • the switch W4 is grounded and the switch S5 is connected to the output of the Vnn pump 508, as shown in Fig. 7(b) , at a predetermined timing (at time T5 in Fig. 8(b) ) before the voltage of the non-selected word line 510 falls to a low level and the actual access ends, to thereby bring the voltage level of the low-potential-side electrode of the Vnn boost capacitor 530 to Vnn.
  • the electric charge accumulated in the Vnn boost capacitor 530 is supplied to the Vnn pump 508.
  • signals RDout 514 and WLr 518 rise to high level, and the voltage of the word line 510 is dropped to Vnn.
  • the electric charge necessary for the dropping operation is not the charging current from the power supply but is supplied by the boosting of the Vnn boost capacitor 530, and moreover, the electric charge stored in the Vnn boost capacitor 530 is the reuse of the electric charge accumulated in the electrode ERws 512, which allows high-efficiency operation.
  • the switch SW4 In response to the end of the actual access as the voltage of the non-selected word line falls to a low level (Vnn), the switch SW4 is opened and the switch SW5 is grounded, as shown in Fig. 7(c) , at a predetermined timing (at time T6 in Fig. 8(c) ) so that the voltage of the low-potential-side electrode of the Vnn boost capacitor 530 is grounded.
  • the voltage of both electrodes of the Vnn boost capacitor 530 is initialized (reset) to charge the Vnn boost capacitor 530 again.
  • the Vnn local booster circuit 504 supplies electric charge at necessary timing by reusing the electric charge generated in the Vpp local booster circuit 502, so that high efficiency is achieved. Moreover, most of the current for driving to Vpp and Vnn is not supplied from the Vpp pump 506 and the Vnn pump 508 but from the Vpp local booster circuit 502 and the Vnn local booster circuit 504, so that remarkable reduction of current consumption by the word line circuit 500 can be achieved.

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  • Engineering & Computer Science (AREA)
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Claims (7)

  1. Speichersystem, das Folgendes umfasst:
    eine Speicherzellenanordnung (104, 106);
    eine Wortleitungsschaltung (500), die eine Zugriffsstartanforderung oder eine Zugriffsendeanforderung für die Speicherzellenanordnung empfängt und den Zugriff auf die Speicherzellenanordnung steuert; und
    eine Booster-Schaltung für eine hohe Versorgungsspannung (high-voltage-supply booster circuit) (502), um eine niedrige Spannung der Wortleitungsschaltung für einen Speicherzugriff auf eine hohe Spannung für einen Speicherzugriff zu bringen, indem der Wortleitungsschaltung eine elektrische Ladung zugeführt wird, die in einem Booster-Kondensator für hohe Spannung (524) gespeichert ist, wobei die Booster-Schaltung für eine hohe Versorgungsspannung die Wortleitungsschaltung in Reaktion auf die Zugriffsstartanforderung ansteuert, der Booster-Kondensator für hohe Spannung die elektrische Ladung von einer Versorgungsquelle einer ersten Referenzspannung an die Versorgungsquelle hoher Spannung auf der Wortleitungsschaltung in Reaktion auf die Zugriffsstartanforderung entlädt, die Booster-Schaltung für eine hohe Versorgungsspannung einen ersten Halbleiterschalter (SW1) umfasst, der beim Laden eine erste Elektrode des Booster-Kondensators für hohe Spannung mit der Versorgungsquelle einer ersten Referenzspannung verbindet und beim Entladen die erste Elektrode mit der Versorgungsquelle hoher Spannung in der Wortleitungsschaltung verbindet und ansonsten die erste Elektrode elektrisch abtrennt, und einen zweiten Halbleiterschalter (SW2) umfasst, der beim Laden eine zweite Elektrode des Booster-Kondensators für hohe Spannung mit Masse verbindet und beim Entladen die zweite Elektrode mit einer Versorgungsquelle einer zweiten Referenzspannung verbindet und ansonsten die zweite Elektrode mit Masse verbindet;
    dadurch gekennzeichnet, dass das Speichersystem des Weiteren eine Schaltung zum Erzeugen einer hohen Spannung (560) aus einer Versorgungsspannung umfasst; wobei die Booster-Schaltung für eine hohe Versorgungsspannung des Weiteren einen dritten Halbleiterschalter (SW3) zum Verbinden der ersten Elektrode des Booster-Kondensators für hohe Spannung mit einer Versorgungsquelle hoher Spannung der Schaltung zum Erzeugen einer hohen Spannung umfasst, um der Schaltung zum Erzeugen einer hohen Spannung eine elektrische Ladung von der ersten Elektrode zuzuführen.
  2. Speichersystem nach Anspruch 1, das des Weiteren eine Booster-Schaltung für eine niedrige Versorgungsspannung (low-voltage-supply booster circuit) (504) zum Entladen überschüssiger elektrischer Ladung umfasst, wenn die Wortleitungsschaltung in Reaktion auf die Zugriffsendeanforderung von der hohen Spannung auf die niedrige Spannung geschaltet wird.
  3. Speichersystem nach Anspruch 2, das des Weiteren eine Schaltung (508) zum Erzeugen einer niedrigen Spannung zum Erzeugen der niedrigen Spannung aus einer Versorgungsspannung umfasst; wobei die Booster-Schaltung für eine niedrige Versorgungsspannung des Weiteren Folgendes umfasst:
    einen Booster-Kondensator für niedrige Spannung (532) zum Entladen elektrischer Ladung, die im Voraus gespeichert wurde, von der Versorgungsquelle hoher Spannung in der Wortleitungsschaltung durch eine Versorgungsquelle niedriger Spannung der Schaltung zum Erzeugen einer niedrigen Spannung in Reaktion auf die Zugriffsendeanforderung;
    einen vierten Halbleiterschalter (SW4), der beim Laden eine erste Elektrode des Booster-Kondensators für niedrige Spannung mit der Versorgungsquelle hoher Spannung der Wortleitungsschaltung verbindet und beim Entladen die erste Elektrode mit Masse verbindet und ansonsten die erste Elektrode elektrisch abtrennt; und
    einen fünften Halbleiterschalter (SW5), der beim Laden eine zweite Elektrode des Booster-Kondensators für niedrige Spannung mit Masse verbindet und beim Entladen die zweite Elektrode mit der Versorgungsquelle niedriger Spannung mit der Schaltung zum Erzeugen einer niedrigen Spannung verbindet und ansonsten die zweite Elektrode mit Masse verbindet.
  4. Speichersystem nach Anspruch 3, wobei es sich bei der Speicherzellenanordnung um eine Anordnung von DRAM-Zellen handelt, die durch N-Kanal-MOSFETs aufgebaut ist; und
    die Wortleitungsschaltung eine Vielzahl von Wortleitungen ansteuert, die mit den Gate-Elektroden von Zellentransistoren, die die Speicherzellenanordnung bilden, verbunden sind.
  5. Speichersystem nach Anspruch 3, wobei
    die erste Referenzspannung eine Versorgungsspannung beinhaltet;
    die zweite Referenzspannung die hohe Spannung beinhaltet; und
    die zweite Referenzspannung von der Versorgungsquelle der Schaltung zum Erzeugen einer hohen Spannung geliefert wird.
  6. Speichersystem nach Anspruch 3, wobei sowohl die Schaltung zum Erzeugen einer hohen Spannung als auch die Schaltung zum Erzeugen einer niedrigen Spannung Ladungspumpenschaltungen sind.
  7. Verfahren zum Betreiben eines Speichersystems, das Folgendes umfasst: eine Speicherzellenanordnung (104, 106); eine Wortleitungsschaltung (500), die den Zugriff auf die Speicherzellenanordnung steuert; eine Booster-Schaltung für eine hohe Versorgungsspannung (502) mit einem Booster-Kondensator für hohe Spannung (524), einem ersten Halbleiterschalter (SW1), einem zweiten Halbleiterschalter (SW2) und einem dritten Halbleiterschalter (SW3); und eine Schaltung zum Erzeugen einer hohen Spannung (506); wobei das Verfahren Folgendes umfasst:
    Empfangen einer Zugriffsstartanforderung oder einer Zugriffsendeanforderung an der Wortleitungsschaltung (500);
    Umsteuern der Wortleitungsschaltung von einer niedrigen Spannung für Speicherzugriff auf eine hohe Spannung für Speicherzugriff durch die Booster-Schaltung für eine hohe Versorgungsspannung, die in Reaktion auf die Zugriffsstartanforderung eine elektrische Ladung, die in dem Booster-Kondensator für hohe Spannung gespeichert ist, der Wortleitungsschaltung zuführt;
    Entladen der elektrischen Ladung von dem Booster-Kondensator für hohe Spannung von einer Versorgungsquelle für eine erste Referenzspannung in Reaktion auf die Zugriffsstartanforderung zur Versorgungsquelle der hohen Spannung in der Wortleitungsschaltung;
    Verbinden der ersten Elektrode des Booster-Kondensators für hohe Spannung über den ersten Halbleiterschalter mit der Versorgungsquelle für eine erste Referenzspannung beim Laden;
    Verbinden der ersten Elektrode über den ersten Halbleiterschalter mit der Versorgungsquelle hoher Spannung in der Wortleitungsschaltung beim Entladen;
    ansonsten Abtrennen der ersten Elektrode des Booster-Kondensators für hohe Spannung über den ersten Halbleiterschalter;
    Verbinden einer zweiten Elektrode des Booster-Kondensators für hohe Spannung mit Masse über den zweiten Halbleiterschalter beim Laden;
    Verbinden der zweiten Elektrode mit einer Versorgungsquelle für eine zweite Referenzspannung über den zweiten Halbleiterschalter beim Entladen;
    ansonsten Verbinden der zweiten Elektrode mit Masse über den zweiten Halbleiterschalter;
    Erzeugen der hohen Spannung aus einer Versorgungsspannung über die Schaltung zum Erzeugen einer hohen Spannung;
    Verbinden der ersten Elektrode des Booster-Kondensators für hohe Spannung über den dritten Halbleiterschalter mit einer Versorgungsquelle hoher der Schaltung zum Erzeugen einer hohen Spannung, um der Schaltung zum Erzeugen einer hohen Spannung elektrische Ladung zuzuführen
EP06843204A 2005-12-28 2006-12-25 Speichersystem zur reduktion des stromverbrauchs und verfahren dafür Not-in-force EP1968071B1 (de)

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PCT/JP2006/325820 WO2007077801A1 (ja) 2005-12-28 2006-12-25 電流消費低減化のためのメモリ・システムおよびその方法

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WO2007077801A1 (ja) 2007-07-12
CN101331552A (zh) 2008-12-24
CN101331552B (zh) 2012-03-28
US7859935B2 (en) 2010-12-28
KR101027178B1 (ko) 2011-04-05
KR20080080562A (ko) 2008-09-04
EP1968071A1 (de) 2008-09-10
US20090231941A1 (en) 2009-09-17
EP1968071A4 (de) 2009-06-03
JP5208519B2 (ja) 2013-06-12

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