EP1293282B1 - Dispositif d'alimentation en liquide pour usinage par electro-erosion - Google Patents

Dispositif d'alimentation en liquide pour usinage par electro-erosion Download PDF

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Publication number
EP1293282B1
EP1293282B1 EP00993107A EP00993107A EP1293282B1 EP 1293282 B1 EP1293282 B1 EP 1293282B1 EP 00993107 A EP00993107 A EP 00993107A EP 00993107 A EP00993107 A EP 00993107A EP 1293282 B1 EP1293282 B1 EP 1293282B1
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EP
European Patent Office
Prior art keywords
dielectric fluid
pump
tank
pipeline
pipe line
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EP00993107A
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German (de)
English (en)
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EP1293282A1 (fr
EP1293282A4 (fr
Inventor
Akio Sodick Co. Ltd. HOSAKA
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Sodick Co Ltd
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Sodick Co Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H1/00—Electrical discharge machining, i.e. removing metal with a series of rapidly recurring electrical discharges between an electrode and a workpiece in the presence of a fluid dielectric
    • B23H1/10—Supply or regeneration of working media
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H7/00—Processes or apparatus applicable to both electrical discharge machining and electrochemical machining
    • B23H7/02—Wire-cutting
    • B23H7/08—Wire electrodes
    • B23H7/10—Supporting, winding or electrical connection of wire-electrode
    • B23H7/102—Automatic wire threading

Definitions

  • the present invention relates to a dielectric fluid system of an electric discharge machining apparatus, for collecting dielectric fluid from a work tank of the electric discharge machining apparatus, cleaning the fluid and re-supplying the fluid to the work tank.
  • Electric discharge machining is a method for machining a workpiece into a desired shape by intermittently applying a necessary electric discharge machining voltage across the workpiece and a tool electrode (hereafter referred to simply as an electrode) arranged opposite to each other with a specified electric discharge machining gap (hereafter referred to simply as the machining gap) to generate continuous electric discharge, and moving the workpiece and the tool electrode relative to each other.
  • electric discharge machining fluid hereafter referred to simply as dielectric fluid
  • dielectric fluid is supplied to the machining gap.
  • This dielectric fluid plays a few important roles as a machining medium for electric discharge machining.
  • a first role is to speedily remove sparked chips and debris generated as a result of electric discharge, and tar shaped products in which the machining fluid itself is deteriorated by heat due to the electric discharge, from the machining gap.
  • a second role is to cool the heat in the machining gap so as to carry out favorable electric discharge machining, and to suppress deformation in the workpiece due to thermal expansion.
  • a third role is to maintain isolation of the machining gap to continue favorable electric discharge machining. Particularly when an aqueous dielectric fluid is used, specific resistance of water is adjusted as will be described later.
  • dielectric fluid used for electric discharge machining in the work tank is filtered, cooled and subjected to specific resistance adjustment as required, while being re-supplied to the work tank after being collected in a dielectric fluid reservoir.
  • dielectric fluid is similarly supplied to a machining gap after being filtered.
  • the electric discharge machining apparatus is provided with a dielectric fluid system for supplying and controlling dielectric fluid.
  • This type of dielectric fluid system is generally provided with a dielectric fluid reservoir including a dirty dielectric fluid tank and a clean dielectric fluid tank. Dirty dielectric fluid that has been discharged from the work tank is temporarily collected in the dirty dielectric fluid tank, and sparked chips and debris having a comparatively heavy specific gravity precipitate here. Dielectric fluid in this dirty fluid tank is pumped to a filter apparatus by a pump, and sparked chips and debris in the fluid are removed from the fluid and the fluid is then stored in the clean dielectric fluid tank. Decontaminated dielectric fluid in the clean fluid tank is re-supplied to the work tank by a pump, and supplied to the machining gap for flushing, as required.
  • This type of dielectric fluid system is also provided with a dielectric fluid cooling apparatus, for keeping the dielectric fluid in the work tank at a specified temperature.
  • a dielectric fluid system of an electric discharge machining apparatus using water based dielectric fluid is provided with, for example, a specific resistance control apparatus including a deionizer using mixed-bed resin, which regulates so as to maintain the specific resistance value of the dielectric fluid inside a specified range.
  • the above described dielectric fluid system of an electric discharge machining apparatus mainly has need for improvement with respect to the following.
  • a first object is to reduce the time for supplying dielectric fluid to an empty work tank (hereafter referred to as rapid feed), namely to shorten the rapid feed time.
  • rapid feed namely to shorten the rapid feed time.
  • an apparatus has been proposed to previously supply dielectric fluid to the clean dielectric fluid tank having a large capacity matching the work tank, arranged at a position higher up than the work tank, thus supplying the dielectric fluid to the empty work tank in a reduced time. This is disclosed, for example, in Japanese Patent laid open No. Hei. 5-004117 and Japanese Patent laid-open no. Hei. 5-042424 .
  • a second object is to reduce the installation space occupied by an electric discharge machining apparatus.
  • an electric discharge machining apparatus having a workpiece submerged in a dielectric fluid for machining
  • the capacity of the dielectric fluid reservoir with both the dirty dielectric fluid tank and the clean dielectric fluid tank becomes from 2.5 to 3.0 times the capacity of the work tank, and there is a problem that the installation space required by the dielectric fluid system shares quite large compared to the overall installation space of the electric discharge machining apparatus.
  • the height of the storage tank is increased or the dirty dielectric fluid tank and the clean dielectric fluid tank are arranged so as to have a two-stage overlapping structure, to reduce the installation space of the storage tank. This is disclosed, for example, in Japanese Patent laid open No. Hei. 4-171123 .
  • a third object is to efficiently perform collection and filtration of some of the dielectric fluid in the work tank, and return to the work tank during electric discharge machining (hereafter referred to as circulation).
  • circulation electric discharge machining
  • JP-A-5004117 discloses in combination the features of the preamble of claim 1 and concerns a wire discharge machine having a filter tank disposed over a working tank.
  • a dielectric fluid system of an electric discharge machining apparatus for supplying dielectric fluid to a work tank with a workpiece filled in the dielectric fluid, comprises a dielectric fluid reservoir for storing dielectric fluid collected from the work tank, an auxiliary tank positioned higher up than the work tank and provided above the dielectric fluid reservoir, a filter device arranged between the dielectric fluid reservoir and the auxiliary tank, a main supply pipe line, connecting from the dielectric fluid reservoir to the auxiliary tank, and provided in series with a first pump, the filter device and a second pump, a circulating pipe line, connected to the main supply pipe line at an intake side of the first pump from the work tank, branching from the main supply pipeline at an outlet side of the second pump, and connecting to the work tank, a rapid feed pipeline, provided with a first drain valve, for connecting from the auxiliary tank to the work tank, a drain pipeline, provided with a second drain valve, for connecting from the work tank to the dielectric fluid reservoir, first and second control valves, positioned at an intake side of the first
  • dielectric fluid is pumped to the auxiliary tank arranged at a position higher than the work tank, and when the dielectric fluid is fed to the work tank the dielectric fluid falls quickly from the auxiliary tank to the work tank, and at the same time deficient dielectric fluid, to the extent of that in the auxiliary tank, is pumped from the dielectric fluid reservoir to the auxiliary tank, which means that the time for feeding dielectric fluid to the work tank is effectively only the time taken to pump the deficient dielectric fluid to the auxiliary tank, bringing about the effect of further reducing the feed time.
  • a dielectric fluid system of an electric discharge machining apparatus of the present invention is further provided with a flushing pipe line branching from the circulating pipe line at an outlet side of the second pump, connecting to a flushing device of the electric discharge machining apparatus, and provided with a third pump, and a fifth control valve group inside the flushing pipe line for selectively opening and closing the flushing pipe line.
  • a dielectric fluid system of an electric discharge machining apparatus of the present invention is further provided with a by-pass pipe line, branching from the main supply pipe line at an intake side of the first pump, combining with the flushing pipe line including the third pump at an intake side of the third pump, branching from the flushing pipe line at an outlet side of the third pump and connecting to the auxiliary tank, and a sixth control valve for selectively opening and closing the by-pass pipe line.
  • Either of the dielectric fluid systems for an electric discharge machining apparatus of the present invention as described above is further provided with a relief pipe line, including a relief valve, connecting an upstream side and a downstream side of the filter device and arranged in parallel with the filter device, and a regulating pipe line connecting to a branch point at an intake side of the first pump, and to a confluence point at an intake side of the second pump, being downstream of the filter device, and arranged in parallel with the first pump and the filter device.
  • a relief pipe line including a relief valve, connecting an upstream side and a downstream side of the filter device and arranged in parallel with the filter device, and a regulating pipe line connecting to a branch point at an intake side of the first pump, and to a confluence point at an intake side of the second pump, being downstream of the filter device, and arranged in parallel with the first pump and the filter device.
  • the dielectric fluid system has the relief pipe line in parallel with the filter device and the regulating pipe line in parallel with the first pump and the filter device, it goes without saying that there is no longer any need for the first and second pumps to have an extremely large discharge capacity, but in addition, even if there is clogging of the filter device the filter will not rupture, and even if there is a failure of one of the pumps there is no immediate pump failure.
  • FIG. 1 A preferred embodiment of an electric discharge machining apparatus of the present invention is shown in Fig. 1 , Fig. 2 and Fig. 3 .
  • the electric discharge machining apparatus shown in this embodiment is a wire cut electric discharge machining apparatus using a water based dielectric fluid.
  • the electric discharge machining apparatus is a die sinking electric discharge machining apparatus, it is basically the same and is provided with a similar fluid tank and flushing device.
  • the electric discharge machining apparatus comprises the electric discharge machining apparatus itself 1, a dielectric fluid system 2, and a power supply device and a numerical control device for electric discharge machining, although these are not shown in the drawing.
  • a table 11 is provided on a bed 3, and a work tank 12 formed of four wall members is arranged on the table 11.
  • the work tank 12 shown in Fig. 1 is shown in a state where a front door is removed.
  • a workpiece WP is fitted to a work stand, not shown, and contained in the work tank 12.
  • an upper guide assembly 13 including an upper nozzle UN for jetting dielectric fluid to the machining gap in a flushing operation, and an upper wire guide, not shown, for guiding a traveling wire electrode WE fed out from above, is attached to a work head 4 via an upper arm.
  • a lower guide assembly 14 including a lower nozzle LN for jetting dielectric fluid to the machining gap in a flushing operation, and an lower wire guide, not shown, for guiding the traveling wire electrode WE fed out from above, is attached to a lower arm provided on a column 5 passing through the wall of the work tank 12.
  • the column 5 is moveably provided on the bed 3 to the rear of the work tank 12, and comprises a lower unit 51 that can move in the X axis direction, and an upper unit 52 that can move in the Y axis direction orthogonal to the X axis direction.
  • the work head 4 is attached to this column 5.
  • the dielectric fluid system 2 is provided next to the electric discharge machining apparatus 1.
  • This dielectric fluid system 2 comprises a dielectric fluid reservoir 21R, an auxiliary tank 22 mounted on this dielectric fluid reservoir, a filter device 23 and a cooling device 24 (hereafter referred to as a cooler).
  • a first pump P1, a second pump P2 and a third pump P3, if required, are provided in this dielectric fluid system 2.
  • piping, various control valves and sensors etc. appropriately arranged along this piping are arranged as shown in Fig. 4 , and will be described later.
  • a dielectric fluid reservoir 21 is made up of only a dirty dielectric fluid tank.
  • the dielectric fluid reservoir 21 comprises a first tank 21L, being an auxiliary tank provided in a space in the bed 3, a second tank 21R being a main tank provided in a lower section of the main body of the dielectric fluid system, and a linking tube 21P.
  • These two sections of the dielectric fluid reservoir 21L and 21R are functionally the same fluid tank, but by dividing the dielectric fluid reservoir into two tanks the installation space of the fluid tank 21R is reduced to the extent of the installation area of the bed 3 side.
  • the fluid tank 21L is positioned directly underneath the work tank 12, which means that by simply providing a drain opening in the bottom of the work tank 12 it is possible to have an arrangement such that the comparatively large diameter drain tube 15 does not project to the outside of the electric discharge machining apparatus main body 1.
  • the dielectric fluid reservoir may not be divided and have only the second tank 21R. Dividing of the dielectric fluid reservoir 21 is not in any way related to the gist of the present invention.
  • the capacity of the dielectric fluid reservoir 21 is determined with reference to the maximum capacity of the work tank 12.
  • the maximum capacity of the dielectric fluid reservoir 21 is larger than that of the maximum capacity of the work tank 12, at least to the extent of dielectric fluid overflowing from the work tank 12 and circulating, and is around 1.2 times the maximum capacity of the work tank 12.
  • the dielectric fluid reservoir 21 is formed having a capacity of about 1.5 times that of the work tank 12. This is because water based dielectric fluid evaporates during repeated use of the device, and the amount of dielectric fluid initially supplied is reduced. Also, this is because an amount of dielectric fluid equivalent to that retained in the bottom of the dielectric fluid reservoir is not discharged.
  • the auxiliary tank 22 is provided on a platform of a frame 25 arranged directly above the dielectric fluid reservoir 21, so that the bottom surface of the auxiliary tank 22 is positioned higher up than the upper surface of the work tank 12. It is possible for the capacity of the auxiliary tank 22 to be about half the volume of the work tank 12, as will be described later. By doing this, the auxiliary tank 22 is mounted on the dielectric fluid reservoir 21R, together with the pumps P1, P2 and P3, the filter device 23 and the cooler 24.
  • the filter device 23 is mounted on a cover of the second tank 21R of the dielectric fluid reservoir 21, in a space enclosed by the frame 25. This filter device 23 filters dirty dielectric fluid into clean dielectric fluid, and supplies it downstream.
  • the filter device 23 is made up of a filter 23a, and a filter tank 23b for storing the filter 23a.
  • the filer 23a filters and cleans dirty dielectric fluid pumped from the dielectric fluid reservoir 21 and the work tank 12, and one or two filters are provided according to necessity.
  • an internal pressure type filter is adopted as the filter 23a. This is for preventing large force caused by pressure of dielectric fluid, which is reaching a maximum of 2kgf/cm 2 at the time of filter blockage, from acting directly on the tank walls of the filter tank 23b.
  • the filter tank 23b is a container for isolating filtered dielectric fluid from the outside in a fluid tight manner. Dielectric fluid from this container is quickly sucked in by the second pump 2, so it is acceptable for the filter tank 23b to be only a small container.
  • a core tube 23c is implanted in the center of the filter tank 23b, and dielectric fluid supplied from the first pump P is pumped through the inside of the core tube 23c, passes through minute holes in the core tube 23c, is pumped to the inside of the filter 23a, and is filtered by the filter 23a.
  • the filter tank 23b is fitted tilted and an outlet pipe opening 23d is fitted at a lowermost part of the filter tank 23b so that it is easy for the filtered dielectric fluid to be collected together in one place and be sucked out.
  • a rail 23e is attached to the inside of the filter tank 23b, with the filter 23a being mounted on this rail, so as to make it possible to easily change the filter 23a inside the filter tank.
  • Reference numeral 23f is an air purge, and when dielectric fluid is initially supplied after changing the filter 23a, the air purge 23f is opened so that air inside the filter tank 23b can escape. However, if the volume of the filter tank 23b is small, it is possible to do away with providing an air purge.
  • a drain hole is provided underneath the filter tank 23b, and when the filter is changed this drain hole is opened and dielectric fluid inside the filter tank 23b is taken out.
  • a cooler 24 for cooling the dielectric fluid to a specified temperature is one well known in the art, and is mounted in a platform 26 provided standing up to the rear of the frame 25 in Fig. 2 .
  • Fig. 4 shows the piping arrangement for the dielectric fluid system shown in Fig. 1 to Fig. 3 .
  • the state shown in this drawing, with dielectric fluid only retained in the dielectric fluid reservoir 21, is immediately after initial supply of dielectric fluid to the dielectric fluid reservoir 21, or when the electric discharge machining apparatus has no immediate machining plan and is stopped.
  • a liquid level sensor S2 provided in the auxiliary tank 22 detects that a necessary amount of dielectric fluid has been supplied to the auxiliary tank 22.
  • a liquid level sensor S1 attached to an upper guide assembly 13 detects the height of the liquid level of dielectric fluid when dielectric fluid is supplied during machining to set the height of the liquid level, and even if an upper nozzle UN moves vertically during machining the height of the liquid level of the dielectric fluid is set in accordance with this movement.
  • the baffle 12a described in Fig. 1 it is also possible for the baffle 12a described in Fig. 1 to set the fluid level height.
  • the pumps and control valves in the drawings are controlled by a control device, but this control device has been omitted from the drawings.
  • a pipeline A is a main supply pipe line, connecting from the dielectric fluid reservoir 21 to the auxiliary tank 22, and includes the first pump P1, the filter device 23, the second pump P2, and the cooler 24. Using this pipeline A, dielectric fluid is pumped from the dielectric fluid reservoir 21 to the auxiliary tank 22.
  • a pipeline B is a circulating pipeline, having the work tank 12 as a start point, connected to the main supply pipeline A at a confluence point J1 upstream of the first pump P1 of the main supply pipeline A, then branching from a branch point J8 downstream of an outlet of the cooler 24 to return to the work tank 12, and has large parts of the piping in common with the main supply pipeline A, sharing the pump P1, the pump P2 the filter device 23 and the cooler 24 etc.
  • dielectric fluid is pumped from the work tank 12, filtered, then cooled and circulated back to the work tank 12.
  • a pipeline D is a rapid feed pipeline formed from a comparatively large diameter pipe, for connecting from a drain opening of the auxiliary tank 22 to the work tank 12, and is used when dielectric fluid is fed rapidly to the work tank 12.
  • a pipeline E is a drain pipeline for draining dielectric fluid of the work tank to the dielectric fluid reservoir 21.
  • a pipeline C is a pipeline prepared in the event of the electric discharge machine being provided with a flushing device, and in this embodiment it is a flushing pipeline, including the third pump P3, branching from a branch point J6 between the pump P2 and the cooler 24 of the main supply pipeline A and connected to the upper nozzle UN and the lower nozzle LN, being flushing devices.
  • dielectric fluid for high pressure flushing is supplied to the upper nozzle UN and the lower nozzle LN.
  • the third pump P3 is a so-called high pressure pump, capable of discharging dielectric fluid at a comparatively high pressure.
  • a pipeline G is a by-pass pipeline branching from a branch point J3 upstream of the suction of the first pump P1 of the main supply pipeline A, connecting to the flushing pipeline C at a confluence point J9 at the inlet side of the third pump P3, branching at the branch point J10 at the outlet side of the third pump P3, and finally reaches the auxiliary tank 22.
  • This by-pass pipeline G is not required as a basic structural element of the present invention, but as one embodiment providing this pipeline will make it possible to obtain better results.
  • this pipeline G when dielectric fluid is pumped to the auxiliary tank 22 using the main supply pipeline A, dielectric fluid can also be pumped using this pipeline G, the pipeline upstream from the branch point J3 of the main supply pipeline A, and the third pump P3 of the flushing pipeline C.
  • the third pump P3 can obtain a reasonable discharge amount with low pressure discharge which makes it useful for the above described pumping operation.
  • the first pump P 1 is a main pump for pumping dielectric fluid from the work tank 12 or the dielectric fluid reservoir 21 and passing it through the filter device 23 for filtering. Accordingly, this pump requires sufficient discharge capability to pump a desired amount of dielectric fluid from the dielectric fluid reservoir 21 or the work tank 12, and convey it to the filter tank against the filter resistance of the filter 23a, but does not need to be able to force dielectric fluid up to the auxiliary tank 22.
  • This pump can be made smaller than a pump designed to draw up dielectric fluid to the auxiliary tank after it has been filtered.
  • the second pump P2 is provided on an outlet side of the filter device 23, and is arranged in series with the first pump P1 to assist the first pump P1.
  • This second pump requires the discharge capability to pump dielectric fluid filtered by the filter device 23, pass it through the cooler 24 and convey it to the auxiliary tank 22 or the work tank 12. Accordingly, since this pump P2 is only for assisting the first pump P1, its discharge capability is slightly smaller than that of the first pump P1, and a small pump is sufficient. Also, since this pump P2 sucks dielectric fluid from the filter device 23, the filtering efficiency of the filter 23a is improved. This improvement in the filtering efficiency of the filter device 23 makes a circulation operation more efficient for causing dirty dielectric fluid from the work tank 12 to pass directly through the filter device 23 and returning it directly to the work tank 12.
  • Control valves are provided in the above described pipelines, as will be described in the following.
  • Constant flow amount valves L1 and L2 are respectively provided at the outlet side of the first and second pumps P1 and P2. These valves respectively regulate a flow amount of dielectric fluid discharged from the pumps P1 and P2, and prevent unreasonable loads or negative pressure being imposed on the two pumps connected in series. Specifically, the flow amount of the constant flow amount valve L1 becomes somewhat larger than that of the constant flow amount valve L2, so that the discharge amount of the pump P1 does not become unreasonably large, or so that negative pressure does not occur at the inlet side of the pump P2. Obviously it is possible to adopt a flow amount control valve instead of the constant flow amount valve. In this case, this type of flow amount control is carried out using the flow amount control valve. Check valves with omitted reference numerals are respectively arranged at least at either a suction inlet side or a discharge outlet side of the pumps P1 and P2, and these check valves prevent reverse flow of dielectric fluid when there is no operation
  • a first control valve V 1 and a second control valve V2 are provided upstream of the confluence point J1, and a third control valve V3 and a fourth control valve V4 are provided downstream of the branch point J8.
  • the pipelines are opened and closed by these control valves, and the main supply pipeline A and the circulating pipeline B are changed over. Specifically, when dielectric fluid is pumped to the auxiliary tank 22, the control valves V1 and V3 in the main supply pipeline A are opened while the control valves V2 and V4 in the circulating pipeline B are closed, and the main supply pipeline A is used. Also, when dielectric fluid is circulated, the control valves V1 and V3 are closed while the control valves V2 and V4 are open and the circulating pipeline B is used.
  • a control valve V51 downstream of the branch point J6 a control valve V52 downstream of the branch point J10 required in case the by-pass pipeline G is added, and a control valve V53 downstream of the branch point J11 required in case a wire threader jet pipeline M, which will be described later, is added, as a fifth control valve group, and when these control valves are opened the flushing pipeline C is used.
  • the control valve V2 of the circulating path B is opened so that dielectric fluid is sucked from the work tank 12 using the first pump P1, filtered by the filter device 23 and sent further downstream by the second pump P2. Then clean dielectric fluid after filtration is conveyed to the flushing pipeline C, pressurized by the third pump P3, and finally supplied to the nozzles UN and LN, and supplied to a machining gap.
  • a first drain pipeline D1 is provided in the rapid feed pipeline D, which is opened when dielectric fluid in the auxiliary tank 22 positioned high up is supplied in a short period of time to the work tank 12 positioned low down.
  • a control valve namely a second drain valve D2 is provided in the pipeline E, which is opened when dielectric fluid in the work tank 12 is rapidly discharged to the dielectric fluid reservoir 21.
  • a control valve V6, being a sixth control valve, is provided downstream of the branch point J10 of the by-pass pipeline G.
  • the pipeline G is used with the control valve V52, one of the fifth control valve group of the flushing pipeline C, closed and with the control valve V6 opened.
  • the pipeline H is a regulating pipeline branching at the branch point J2 at the inlet side of the first pump P 1 to connect to the confluence point J5 between the filter device 23 and the second pump P2, and makes the pipeline passing through the first pump P1 and the filter device 23 shorter. Therefore, between the pump P1 and the pump P2 arranged in series with each other, the regulating pipeline H has the function of returning surplus dielectric fluid discharged from the pump P1 in excess of the amount for the pump P2, to the inlet side of the pump P1.
  • the regulating pipeline H also supplies or re-circulates deficient or surplus dielectric fluid when it becomes impossible to take out a consistent discharge amount between the pump P1 and the pump P2.
  • the regulating pipeline H supplies sufficient dielectric fluid directly to the second pump P2.
  • the regulating pipeline H re-circulates excess dielectric fluid to the inlet side of the first pump P1. This avoids the occurrence of serious irreversible damage, such as cavitation due to negative pressure of the second pump P2, seizure due to no load or overheating due to excess load of the first pump P1.
  • the occurrence of these drawbacks can be controlled by conventional means omitted from the drawings, such as sensing using pressure switches in the pipelines, or using thermal relays etc. to detect current overload of the pump motor and stop the motor, so that the pump is stopped quickly, but if the regulating pipeline H is provided, drawbacks continuing up until the pump is stopped due to the above described control will not cause serious damage.
  • the regulating pipeline H regulates the balance of fluid amount of the two pumps arranged in series across the filter device 23, there is also the effect of preventing it from overwork to feed fluid in the main supply pipeline A or the circulating pipeline B even if the filter device 23 positioned between the two pumps is a small vessel or a sealed vessel. This is because it does not required for filter device 23 to adjust or buffer imbalance in feed amounts between these pumps.
  • the pipeline K is a relief pipeline branching at the branch point J4 between the first pump P 1 and the filter device 23 to connect to the confluence point J5 between the filter device 23 and the second pump P2, and contains a relief valve RV.
  • this relief valve RV is opened to link to this pipeline K. If a link is established in the pipeline K, dielectric fluid discharged from the first pump P1 passes through the relief valve RV and is fed directly to the inlet side of the second pump P2. At this time, dielectric fluid that is fed from the first pump P1 and not sucked into the second pump P2 passes through the regulating pipeline H and is returned to the inlet side of the first pump P1, which has already been explained.
  • the relief pipeline K acting in cooperation with the regulating pipeline H, substantially isolates the filter device 23 from the main supply pipeline A when the filter 23a becomes clogged, thus preventing explosive damage to the filter device 23, cavitation of the pump P2, or overheating of the pump P1 and the pump P2.
  • the pipeline K achieves the important role of ensuring safety of the filter device 23 and pumps P1 and P2 when dielectric fluid is pumped to the auxiliary tank 22 or when dielectric fluid is caused to circulate for the work tank 12.
  • the pipeline K merges J5 at the confluence point of the main pipeline A and the pipeline H, but it is possible to have it merging at a position that is either upstream or downstream close to the confluence point J5 as long as there is merging between the filter device 23 and the second pump P2.
  • Pipeline Q is an overflow pipeline for collecting dielectric fluid that is in excess of a liquid level set at a required height by the baffle 12a of the work tank 12 and has overflowed, in the dielectric fluid reservoir 21.
  • pipeline R is an overflow pipeline for collecting dielectric fluid, that has reached a high fluid level of the auxiliary tank 22 and has overflowed, in the dielectric fluid reservoir 21.
  • the pipeline T is a drainage pipeline for draining dielectric fluid that has collected in the filter tank, when the filter 23a is replaced.
  • Pipeline N is a specific resistance management pipeline branching at the branch point J6 between the second pump P2 and the cooler 24 and connecting to the confluence point J7 at the outlet side of the cooler 24, and is provided with a deionizer 27, having an ion exchange resin, and a control valve V8.
  • a resistivity sensor is then provided in the main supply pipeline A.
  • This resistivity meter IM detects the specific resistance value of dielectric fluid passing through the main supply pipeline A, and when this value is output to a control device, not shown in the drawings, the control device compares the detected value with a previously set specific resistance value. When the detected value is lower than the specified set value, the control device opens the control valve V8 to pass dielectric fluid through the deionizer, to adjust the specific resistance of the dielectric fluid to make it higher.
  • a wire threader jet pipeline M for supplying dielectric fluid to an automatic wire threader 6 is also provided in this embodiment.
  • This pipeline M branches at a branch point J11 immediately upstream of a control valve 53 of the jet pipeline C, and connected to the automatic wire threader 6, and is provided with a control valve V7.
  • the control valve 53 is closed and the control valve V7 is opened to supply dielectric fluid to the automatic wire threader 6, and a jet stream for guiding the tip of the wire electrode in the insertion direction is produced.
  • the pressure of the dielectric fluid is increased by the pump P3, and this is the same as the case for flushing.
  • a manual valve not shown in Fig. 4 etc. are only used at the time of emergency or maintenance inspection, and the operation of these is omitted.
  • the above described control valves for automatically opening and closing the pipelines are electromagnetic valves or air pilot valves etc..
  • pipelines shown by a bold solid line are pipelines mainly used
  • pipelines shown by a bold dotted line are pipelines for auxiliary use
  • pipelines shown by a thin solid line are pipelines that are used as required or used for maintaining safety
  • pipelines shown by a dotted line are pipelines that are not used.
  • the control device causing operation of the control valves and the pumps, and the control wiring between the valves and pumps and the control device, have been omitted from the drawings.
  • a rapid feed preparation operation to pump dielectric fluid to the auxiliary tank 22 is carried out first of all.
  • Fig. 5 shows the state where this pumping operation is almost complete.
  • the control device outputs a rapid feed preparation command signal, then as shown in Fig. 5 the control valves V1 and V3 of the main supply pipeline A are opened and the first pump P1 and the second pump P2 are driven to pump dielectric fluid from the dielectric fluid reservoir 21, and the fluid is filtered by the filter device 23, cooled by the cooler 24 and pumped to the auxiliary tank 22.
  • control valves V51 and V52 selecting the flushing pipeline C, control valves V2 and V4 selecting the circulating pipeline B, and the drain valve D1 of the rapid feed pipeline D are obviously closed. Also, as long as blockage does not occur in the filter 23a the relief valve RV is closed and the relief pipeline K is closed. Dielectric fluid from the pump P1 side in excess of an amount pumped by the pump P2 circulates in the regulating pipeline H. As required, the control valve V8 is opened to pass dielectric fluid through the deionizer 27, to maintain the specific resistance of the dielectric fluid at a specified set value.
  • This rapid feed preparation operation has no relation to operations in the vicinity of the work tank 12, and so it is possible to perform it during setting up operations etc. In this case, the operator is virtually unaware of any wasted waiting time due to this rapid feed preparation operation.
  • Fig. 5 in the event that the by-pass pipeline G is also provided, in addition to the pumping using the main supply pipeline A described above, there is pumping of dielectric fluid using the by-pass pipeline G. Specifically, the control valve V6 is opened together with driving of the third pump P3, to pump dielectric fluid to the auxiliary tank 22 through the by-pass pipeline G. By doing this, the amount of time required for pumping can be reduced in accordance with the amount of dielectric fluid pumped by the third pump P3.
  • the drain valve D1 is immediately opened and dielectric fluid drops in one go from the rapid feed pipeline D utilizing the difference of elevation between the auxiliary tank 22 and the work tank 12.
  • the first and second pumps P1 and P2 of the main supply pipeline are normally continuously driven, and dielectric fluid pumped continuously in the auxiliary tank 22 drops down directly to the work tank.
  • the volume of the auxiliary tank 22 is preferably about half the volume of the work tank 21
  • the amount of fluid pumped in advance to the auxiliary tank 22 is generally less than the amount of dielectric fluid that is to be rapid fed to the work tank 12, which means that pumping for this insufficient amount is carried out continuously.
  • the rapid feed time is not the time taken to supply all of a desired amount of dielectric fluid to the work tank 12, but is the time taken to pump an insufficient amount of dielectric fluid, obtained by subtracting the amount of dielectric fluid held in advance in the auxiliary tank 22 from this total amount of dielectric fluid, to the auxiliary tank 22.
  • dielectric fluid is circulated in the regulating pipeline H according to a difference in discharge capability between the pump P1 and the pump P2.
  • the relief pipeline K is provided in a closed state in readiness for any abnormality. Pumping to the auxiliary tank 22, which utilizes the by-pass pipeline G and the third pump P3, is preferably supplemented.
  • the specific resistance management pipeline N is also opened as required.
  • the volume of the auxiliary tank 22 is preferably about half the maximum volume of the work tank 12, which means that if it is assumed that it is in fact exactly half, a desired rapid feed time, a volume of dielectric fluid to be supplied to the work tank 12, and the discharge capability of the two pumps P1 and P2 are selected, for example, as follows.
  • the maximum volume of the work tank 12 is selected at about 400 liters
  • the volume of the auxiliary tank 22 is selected as half the volume of the work tank 12, namely about 200 liters
  • the discharge capability of the pumps P1 and P2 is selected as about 40 liters per minute.
  • the volume of the filter tank 23b is preferably about 50 liters.
  • the time required for rapid feeding of the maximum volume of about 400 liters of dielectric fluid is slightly more than 5 minutes, which is the time to pump the deficient 200 liters of dielectric fluid to the auxiliary tank 22.
  • the amount of dielectric fluid that is deficient is only 100 liters, and so the final rapid feed time in this case will be slightly longer than two and a half minutes.
  • the rapid feed time is only the time taken for the dielectric fluid to fall down from the above described drain, which in this embodiment is about 20 seconds.
  • the rapid feed time becomes about 10 minutes.
  • the rapid feed time is reduced to less than half compared to the related art.
  • the dielectric fluid that is required to be rapidly fed is equal to the volume of the auxiliary tank 22, there is virtually no rapid feed time required.
  • pumping to the auxiliary tank 22 is carried out during setting up, as a rapid feed preparation operation, which means that any waiting time the operator is aware of until dielectric fluid supply to the work tank is completed is only this reduced rapid feed time.
  • the by-pass pipeline G in addition to the rapid feed operation described above, it is possible to perform pumping using the pump P3 of the pipeline G.
  • the pumping capability to the auxiliary tank 22 is doubled, and so the rapid feed time for supply of the 400 liters of dielectric fluid, being the maximum volume described above, is reduced to about two and a half minutes.
  • the feed time is reduced drastically to about one minute 15 seconds. In this way, by addition of the by-pass pipeline G and the pump P3 the rapid feed time is further reduced to less than a quarter.
  • the control device detects the dielectric fluid in the work tank 12 attaining a desired fluid amount, stops all of the first pump P1, the second pump P2 and the third pump P3, and closes respective control valves, thus completing the dielectric fluid rapid feed process.
  • control valves V2 and V4 are opened to form the circulating pipeline B, while at the same time the control valves V51, V52 and V53 are opened to form the flushing pipeline C.
  • the first pump P1 and the second pump P2 then feed dirty dielectric fluid from the work tank 12 to the filter device 23 and the cooler 24, the dielectric fluid is filtered to produce clean dielectric fluid and cooled to a specified temperature, then directly circulated from the circulating path B to the work tank 12.
  • control valve V1 When the dielectric fluid surface is lowered during machining, this is indicated by a detection signal from the liquid level sensor S1 attached close to the upper nozzle UN, the control valve V1 is opened and an appropriate amount of dielectric fluid is replenished in the circulating pipeline B from the dielectric fluid reservoir 21 until the liquid level sensor S1 generates the detection signal of liquid level again. Also, in the event that the flushing pipeline C is provided, dielectric fluid is pumped from the work tank 12 using the circulating pipeline B, filtered, pressurized by the third pump P3, and jetted to the machining gap from the nozzles UN and LN of the flushing pipeline C. When automatic wire threading is carried out, control valve V7 is opened to supply dielectric fluid to the automatic wire threader 6.
  • the amount of dielectric fluid filtered and supplied for circulation and flushing from the circulating pipeline B and the flushing pipeline C is suppressed to the minimum fluid amount , and filtration and cooling of circulated and flushed dielectric fluid is carried out effectively.
  • surplus dielectric fluid also circulates in the regulating pipeline H during the above described circulation and flushing operations, similarly to during the rapid feed preparation and rapid feed operation.
  • the relief pipeline K is provided in a closed state in readiness for any abnormality.
  • the specific resistance management pipeline N is also opened as required.
  • a drainage command is output from the control device to open the drain valve D2, and dielectric fluid in the work tank 12 flows out from the drainage pipeline E to the dielectric fluid reservoir 21.
  • a command indicating whether or not to resume pumping to the auxiliary tank 22 is input, depending on whether or not subsequent electric discharge machining is to be resumed, when electric discharge machining is not to be resumed immediately, dielectric fluid is not pumped to the auxiliary tank 22 and is only stored in the dielectric fluid reservoir 21, and the system is then in the state shown in Fig. 4 .
  • a rapid feed preparation command is output from the control device.
  • the control valves V 1 and V3 are opened, and the first and second pumps P1 and P2 are operated to filter and cool dielectric fluid stored in the dielectric fluid reservoir 21 and pump this filtered and cooled dielectric fluid to the auxiliary tank 22.
  • This state is the same as the above described state in Fig. 5 , and in Fig. 8 also, the rapid feed preparation state is shown in addition to the discharge state.
  • Use of the pipelines H, K, N and G as required is also the same. After that, the system stands-by with the dielectric remaining stored in a specified amount in the auxiliary tank 22, and supply to the work tank 12 starts upon the next rapid feed command , which has also been described.
  • a process for pumping cleaned dielectric fluid to the auxiliary tank 22 can be commenced during the discharge operation or immediately after the discharge operation, and upon completion of operations such as planning and preparation for carrying out the next machining etc., the system is placed in a state where cleaned dielectric fluid has been pumped to the auxiliary tank 22.
  • the important point of the invention disclosed in this embodiment is that by replacing the clean dielectric fluid tank of the related art with the compact filter device and the auxiliary tank, and by arranging the auxiliary tank above the dielectric fluid reservoir having only the dirty dielectric fluid tank, the installation space occupied by the dielectric fluid system is significantly reduced. Also, by arranging two pumps upstream and downstream of the filter device, and providing the relief pipeline K and the regulating pipeline H, highly efficient rapid feed and filtration are enabled even with a small filter device, and there is no danger of serious damage occurring straight away even if there is clogging of the filter or one of the pumps fails.
  • the time for rapid feed to the work tank is sufficiently reduced even if the auxiliary tank is not as large as the work tank. Also, since the circulation of the dielectric fluid is carried out using direct circulation from the work tank to the work tank via the filter device, it can be performed very efficiently with the minimum space. Further, in the case of auxiliary pumping of dielectric fluid to the auxiliary tank via the by-pass pipeline using the pump of the flushing pipeline, the time for this pumping can be drastically reduced, as a result of which the rapid feed time is shortened.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Claims (4)

  1. Système à fluide électrique pour un appareil d'usinage par électro-érosion, pour alimenter du fluide d'usinage par électro-érosion à un réservoir de travail avec une pièce à travailler immergée dans le fluide d'usinage par électro-érosion, comprenant :
    un réservoir de fluide diélectrique (21 R) pour stocker du fluide d'usinage par électro-érosion recueilli du réservoir de travail, caractérisé par :
    un réservoir auxiliaire (22) positionné plus haut que le réservoir de travail et prévu au-dessus du réservoir de fluide diélectrique,
    un dispositif filtre (23) disposé entre le réservoir de fluide diélectrique et le réservoir auxiliaire,
    une conduite d'alimentation principale (A) reliant le réservoir de fluide diélectrique au réservoir auxiliaire, et prévue en série avec une première pompe (P1), le dispositif filtre et une deuxième pompe (P2),
    une conduite de circulation (B), reliée à la conduite d'alimentation principale à un côté entrée de la première pompe depuis le réservoir de travail, bifurquant de la conduite d'alimentation principale à un côté sortie de la deuxième pompe, et reliant au réservoir de travail,
    une conduite d'alimentation rapide (D), reliant le réservoir de travail au réservoir auxiliaire et pourvue d'une deuxième soupape de vidange,
    une conduite de vidange (E), pourvue d'une deuxième soupape de vidange, pour relier le réservoir de travail au réservoir de fluide électrique,
    une première et une deuxième soupape de commande (V1, V2) positionnées à un côté entrée de la première pompe, pour l'utilisation sélective de la conduite d'alimentation principale et de la conduite de circulation, et
    une troisième et une quatrième soupape de commande positionnées à un côté sortie de la première pompe, pour l'utilisation sélective de la conduite d'alimentation principale et de la conduite de circulation.
  2. Système à fluide diélectrique (V3, V4) selon la revendication 1, comprenant
    une conduite de rinçage (c) bifurquant de la conduite de circulation à un côté sortie de la deuxième pompe, reliant à un dispositif de rinçage de l'appareil d'usinage par électro-érosion, et pourvue d'une troisième pompe, et
    un cinquième groupe de soupapes de commande (V51, V53) à l'intérieur de la conduite de rinçage pour ouvrir et fermer sélectivement la conduite de rinçage.
  3. Système à fluide diélectrique pour un appareil d'usinage par électro-érosion selon la revendication 2, comprenant en outre
    une conduite de dérivation (G), bifurquant de la conduite d'alimentation principale à un côté entrée de la première pompe, se combinant avec la conduite de rinçage comprenant la troisième pompe à un côté entrée de la troisième pompe, bifurquant de la conduite de rinçage à un côté sortie de la troisième pompe et reliant au réservoir auxiliaire, et
    une sixième soupape de commande (V6) pour ouvrir et fermer sélectivement la conduite de dérivation.
  4. Système à fluide diélectrique pour un appareil d'usinage par électro-érosion selon l'une quelconque des revendications 1 à 3, comprenant en outre
    une conduite de décharge (K) comprenant une soupape de décharge (RV), reliant un côté amont et un côté aval du dispositif filtre et prévue en parallèle au dispositif filtre, et
    une conduite de régulation (H), bifurquant à un côté amont de la première pompe, fusionnant entre le dispositif filtre et un côté entrée de la deuxième pompe, et disposée en parallèle à la première pompe et au dispositif filtre.
EP00993107A 1999-11-17 2000-09-13 Dispositif d'alimentation en liquide pour usinage par electro-erosion Expired - Lifetime EP1293282B1 (fr)

Applications Claiming Priority (3)

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JP32751599 1999-11-17
JP32751599 1999-11-17
PCT/JP2000/006296 WO2001036139A1 (fr) 1999-11-17 2000-09-13 Dispositif d'alimentation en liquide pour usinage par electro-erosion

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EP1293282A1 EP1293282A1 (fr) 2003-03-19
EP1293282A4 EP1293282A4 (fr) 2007-03-14
EP1293282B1 true EP1293282B1 (fr) 2009-01-21

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US (1) US6533927B1 (fr)
EP (1) EP1293282B1 (fr)
JP (1) JP3806032B2 (fr)
CN (1) CN1121295C (fr)
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WO (1) WO2001036139A1 (fr)

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CN101829818B (zh) * 2010-04-14 2011-06-08 东莞盈拓科技实业有限公司 一种自动切换加工液贮液箱
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JP5568117B2 (ja) * 2012-09-21 2014-08-06 ファナック株式会社 放電加工機の加工液供給装置
JP5661840B2 (ja) * 2013-03-19 2015-01-28 ファナック株式会社 加工槽内の状態を判別する機能を有するワイヤ放電加工機
JP5892705B2 (ja) * 2013-10-16 2016-03-23 株式会社ソディック 工作機械の加工液タンク
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JP6298025B2 (ja) * 2015-09-03 2018-03-20 ファナック株式会社 加工液追加手段を有する放電加工機
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CN108899292A (zh) * 2018-06-28 2018-11-27 武汉华星光电技术有限公司 一种液体传输装置及传输方法
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WO2001036139A1 (fr) 2001-05-25
US6533927B1 (en) 2003-03-18
DE60041461D1 (de) 2009-03-12
CN1121295C (zh) 2003-09-17
CN1336859A (zh) 2002-02-20
EP1293282A1 (fr) 2003-03-19
EP1293282A4 (fr) 2007-03-14
JP3806032B2 (ja) 2006-08-09

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