EP1006395B1 - Liquid crystal display devices and processes for producing the same - Google Patents

Liquid crystal display devices and processes for producing the same Download PDF

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Publication number
EP1006395B1
EP1006395B1 EP99123954.2A EP99123954A EP1006395B1 EP 1006395 B1 EP1006395 B1 EP 1006395B1 EP 99123954 A EP99123954 A EP 99123954A EP 1006395 B1 EP1006395 B1 EP 1006395B1
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liquid crystal
formula
units represented
constituent units
mole
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German (de)
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EP1006395A1 (en
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Satoshi Dai Nippon Printing Co. Ltd. Shioda
Mikiko Dai Nippon Printing Co. Ltd. Hojo
Kenji Dai Nippon Printing Co. LTD. Ueda
Shunsuke Dai Nippon Printing Co. Ltd. Sega
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13392—Gaskets; Spacers; Sealing of cells spacers dispersed on the cell substrate, e.g. spherical particles, microfibres
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C09K2323/05—Bonding or intermediate layer characterised by chemical composition, e.g. sealant or spacer

Definitions

  • the present invention relates to color liquid crystal display devices. More particularly, the present invention relates to liquid crystal display devices, with a liquid crystal being sandwiched and supported between substrates, which can maintain a predetermined substrate-substrate spacing, and processes for producing the same.
  • Liquid crystal display devices have a structure comprising: two transparent substrates, of glass or the like, each having a transparent electrode provided while leaving a gap of about 1 to 10 ⁇ m between the two substrates; and a liquid crystal material filled into the gap.
  • a voltage is applied across the electrodes to align the liquid crystal in a given direction to create transparent portions and opaque portions, thereby displaying images.
  • a color filter composed of colored layers of three colors corresponding to the three primary colors of light, red (R), green (G), and blue (B), and a black matrix layer (Bk) suitably disposed among the three colored layers is provided on any transparent electrode substrate, and the three primary colors are added by shutter operation of the liquid crystal to display desired colors.
  • the color filter for color liquid crystal display devices comprises a transparent substrate, colored layers, a protective layer, and a transparent conductive layer stacked in that order on top of one another.
  • the gap between the color filter and the transparent substrate having thereon electrodes or thin-film transistors provided so as to face the positions of R, G, B, and Bk is maintained at several ⁇ m, and a liquid crystal material is filled into the gap to form a liquid crystal display device.
  • Color liquid crystal display devices are classified into a simple matrix system and an active matrix system according to the drive method of the liquid crystal.
  • the active matrix system has become adopted for display devices for personal computers and the like.
  • a thin-film transistor (TFT) device is provided on a glass substrate for each pixel, and the shutter operation of the liquid crystal in each pixel is controlled by the switching operation of each TFT device.
  • a uniform transparent electrode film as a counter electrode is provided so as to face these TFT devices.
  • Tin oxide, indium oxide, or a composite oxide of these oxides called "ITO" is used in the transparent electrode film.
  • the transparent electrode film may be formed by various methods, such as vapor deposition, ion plating, and sputtering. Since, however, the protective layer as a layer underlying the transparent electrode for color filters is formed of a synthetic resin, the transparent electrode should be formed at a relatively low temperature from the viewpoint of the heat resistance of the protective layer. For this reason, sputtering has been extensively used for the production of transparent electrodes for color filters.
  • Fig. 4 is a cross-sectional view of a liquid crystal display device using TFT.
  • the construction of a liquid crystal display device 41 is such that a color filter 42 disposed so as to face an opposed substrate 43, with TFT formed thereon, while leaving a predetermined spacing between the color filter 42 and the TFT substrate 43 and the color filter is joined to the TFT substrate with the aid of a sealant 44 comprising reinforcing fibers incorporated into an epoxy resin or the like.
  • the space defined by the color filter and the TFT substrate is filled with a liquid crystal 45.
  • This thickness difference causes a difference in optical rotatory power in the liquid crystal, leading to unfavorable phenomena, such as coloration of the liquid crystal, or unsatisfactory color display due to color shading.
  • unfavorable phenomena such as coloration of the liquid crystal, or unsatisfactory color display due to color shading.
  • an attempt to accurately maintain the spacing between the color filter and the TFT substrate has been made by incorporating a large number of synthetic resin, glass, alumina, or other material particles or rods having a size of 3 to 10 ⁇ m, called "spacer" 46, into the liquid crystal, or by using a spacer formed of a patterned photocured resin layer or the like.
  • Liquid crystal display devices comprising synthetic-resin spacers are known from, for instance, US-A-5,781,259 and EP-A0 850 984
  • the particles or rods are used as the spacer, they are incorporated, in a large amount of about 100 particles or rods/mm 2 , into the liquid crystal. Therefore, filling of a mixture of the spacer particles or rods with a highly viscous liquid crystal into the space between the color filter and the TFT substrate sometimes poses a problem that the spacer particles or rods are not homogeneously dispersed in the liquid crystal and are localized in part of the liquid crystal. This phenomenon deteriorates the display quality in a portion where the spacer is localized, and, in addition, poses an additional problem associated with accurately maintaining the spacing between the color filter and the TFT substrate.
  • Previously spreading a spacer on the color filter by a wet or dry process requires a special device for attaining even spacer density distribution at the time of spreading and, at the same time, requires a device for preventing the spacer from moving at the time of filling of the liquid crystal.
  • the spacer formed of a patterned cured resin layer or the like should satisfy the following requirements. Specifically, in the preparation of liquid crystal cells, sealing is performed at a temperature of 120 to 180°C. Regarding this heat contact bonding, ensuring a desired cell gap is required. Further, after the preparation of the liquid crystal cells, in consideration of a fluctuation in optical properties or liquid crystal layer thickness due to a temperature change of the liquid crystal layer at the time of a reliability test or during the operation of the liquid crystal display device, the liquid crystal display device should cope with an increase in cell thickness at high temperatures and can inhibit a low-temperature foaming phenomenon in the liquid crystal layer at low temperatures.
  • the first to third liquid crystal display devices and the processes for producing the first to third liquid crystal display devices according to the present invention are characterized by spacers.
  • a photosensitive resin composition comprising a photopolymerizable acrylate oligomer and, added to the oligomer, a bifunctional or higher polyfunctional photopolymerizable acrylate monomer or oligomer, an epoxy resin, and a photopolymerization initiator is used as a material for spacers in order to impart the specified storage modulus, loss tangent, Young's modulus, and dynamic hardness to the spacers.
  • Preferred photopolymerizable acrylate oligomers include those having a molecular weight of about 1000 to 2000, for example, polyester acrylates, epoxy acrylates, such as phenol novolak epoxy acrylates and o-cresol novolak epoxy acrylates, polyurethane acrylates, polyether acrylates, oligomer acrylates, alkyd acrylates, polyol acrylates, and melamine acrylates. More specific examples of preferred photopolymerizable acrylate oligomers are the following specific copolymer resins.
  • the use of the following specific copolymer resins can impart the specified storage modulus, loss tangent, Young's modulus, and dynamic hardness to the spacers, and, in addition, can regulate the content of radically polymerizable groups, such as alkali-soluble groups and (meth)acryloyl groups and can realize a photosensitive resin composition possessing excellent curability, alkali solubility, and coatability.
  • the specific copolymer resin basically contains constituent units comprising (meth)acryloyl groups introduced into constituent units represented by formula (1) and constituent units comprising (meth)acryloyl groups introduced into constituent units represented by formula (2). If necessary, the copolymer resin may further contain constituent units represented by formula (3) and constituent units represented by formula (4).
  • the term "(meth)acryloyl group” refers to a methacryloyl group or an acryloyl group
  • (meth)acrylic acid refers to methacrylic acid or acrylic acid.
  • R represents hydrogen or an alkyl group having 1 to 5 carbon atoms.
  • alkyl groups usable herein include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, and n-pentyl groups.
  • the constituent units represented by formula (1) contribute to alkali developability.
  • Monomers usable for introducing the constituent units represented by formula (1) include, for example, acrylic acid, methacrylic acid, 2-carboxy-1-butene, 2-carboxy-1-pentene, 2-carboxy-1-hexene, and 2-carboxy-1-heptene.
  • the content of the constituent units represented by formula (1) is regulated according to the level of alkali solubility required of the copolymer resin and is generally 5 to 55% by mole, preferably 10 to 25% by mole.
  • the constituent units represented by formula (2) are basically those in which (meth)acryloyl groups are introduced.
  • R 1 include ethylene, propylene, and butylene groups.
  • Monomers usable for introducing the constituent units represented by formula (2) include 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 4-hydroxybutyl acrylate, and 4-hydroxybutyl methacrylate.
  • the constituent units represented by formula (2) have been partially reacted through hydroxyl groups thereof with the (meth)acryloylalkyl isocyanate compound to introduce (meth)acryloyl groups therein.
  • the content of the constituent units represented by formula (2) is regulated according to the level of photopolymerizability required of the copolymer resin and is generally 5 to 95% by mole, preferably 10 to 50% by mole.
  • the constituent units represented by formula (3) when the copolymer resin is used in the formation of a coating, function to impart coatability to the copolymer resin.
  • R 2 usable herein include aromatic rings such as phenyl and naphthyl groups.
  • Monomers usable for introducing the constituent units represented by formula (3) include styrene and ⁇ -methylstyrene.
  • the aromatic ring may be substituted by a halogen atom, such as chlorine or bromine, an alkyl group, such as a methyl or ethyl group, an amino group, such as an amino or dialkylamino group, a cyano group, a carboxyl group, a sulfonic acid group, phosphoric acid group or the like.
  • the content of the constituent units represented by formula (3) is 0 to 75% by mole, preferably 5 to 50% by mole.
  • R 3 usable herein include alkyl groups having 1 to 12 carbon atoms and aralkyl groups, such as benzyl and phenylethyl groups.
  • Monomers usable for introducing the constituent units represented by formula (4) include (meth)acrylic esters, such as methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, phenyl (meth)acrylate, cyclohexyl (meth)acrylate, dicyclopentanyl (meth)acrylate, dicyclopentanyloxyethyl (meth)acrylate, isobornyl (meth)acrylate, benzyl (meth)acrylate, and phenylethyl (meth)acrylate.
  • the content of the constituent units represented by formula (4) is 0 to 75% by mole, preferably 5 to 50% by mole.
  • the monomers exemplified above respectively for these constituent units may be used alone or as a mixture of two or more.
  • Preferred polymerization solvents usable for the production of a specific polymer comprising constituent units represented by formulae (1) to (4) include solvents free from active hydrogen, such as hydroxyl and amino groups.
  • solvents free from active hydrogen such as hydroxyl and amino groups.
  • examples thereof include: ethers, such as tetrahydrofuran; glycol ethers, such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether; cellosolve esters, such as methyl cellosolve acetate; propylene glycol monomethyl ether acetate; and 3-methoxybutyl acetate.
  • Aromatic hydrocarbons, ketones, esters and the like are also usable.
  • Polymerization initiators commonly known as radical polymerization initiators may be used. Specific examples thereof include: azo compounds, such as 2,2'-azobisisobutylonitrile, 2,2'-azobis-(2,4-dimethylvaleronitrile), 2,2'-azobis-(4-methoxy-2,4-dimethylvaleronitrile); organic peroxides, such as benzoyl peroxide, lauroyl peroxide, tert-butyl peroxypivalate, and 1,1'-bis-(tert-butylperoxy)cyclohexane; and hydrogen peroxide.
  • the peroxide may be used in combination with a reducing agent for use as a redox type polymerization initiator.
  • molecular weight modifiers may be used to modify the weight average molecular weight.
  • molecular weight modifiers usable herein include: halogenated hydrocarbons, such as chloroform and carbon tetrabromide; marcaptans, such as n-hexylmercaptan, n-octylmercaptan, n-dodecylmercaptan, tert-dodecylmercaptan, and thioglycollic acid; xanthogens, such as dimethylxanthogen disulfide and diisopropylxanthogen disulfide; terpinolene; and ⁇ - methylstyrene dimer.
  • the specific polymer comprising constituent units represented by formulae (1) to (4) may be a random or block copolymer of monomers for the constituent units represented by formulae (1) to (4).
  • the random copolymer may be produced by adding dropwise a composition comprising monomers and a catalyst to a polymerizer containing a solvent at a temperature of 80 to 110°C over a period of 2 to 5 hr, followed by ripening.
  • the specific polymer comprising the constituent units represented by formulae (1) to (4) has a weight average molecular weight, as determined using polystyrene as the standard (hereinafter referred to simply as "weight average molecular weight” or "Mw”), in the range of 10,000 to 1,000,000, an acid value of 5 to 400 mg KOH/g, and a hydroxyl value of 5 to 400 mg KOH/g.
  • Mw weight average molecular weight
  • the specific copolymer resin is obtained by reacting the specific polymer comprising constituent units represented by formulae (1) to (4) with a (meth)acryloyl-containing isocyanate compound.
  • the (meth)acryloylalkyl isocyanate compounds usable herein is one wherein a (meth)acryloyl group is bonded to an isocyanate group (-NCO) through an alkylene group having 2 to 6 carbon atoms.
  • a (meth)acryloyl group is bonded to an isocyanate group (-NCO) through an alkylene group having 2 to 6 carbon atoms.
  • Specific examples thereof include 2-acryloylethyl isocyanate and 2-methacryloylethyl isocyanate.
  • 2-Methacryloylethyl isocyanate is commercially available from Showa Denko K.K. under the designation of "Karenz MOI" and the like.
  • the reaction of the copolymer comprising the constituent units represented by formulae (1) to (4) with the (meth)acryloylalkyl isocyanate compound may be carried out by adding dropwise the isocyanate compound to a solution of the copolymer in the presence of a minor amount of a catalyst.
  • Catalysts usable herein include dibutyltin laurate.
  • polymerization inhibitors such as p-methoxyphenol, hydroquinone, naphthylamine, tert-butyl catechol, and 2,3-di-tert-butyl p-cresol, may be used according to need.
  • the (meth)acryloylalkyl isocyanate compound is added and bonded to the constituent units represented by formula (2) in the specific polymer comprising the constituent units represented by formulae (1) to (4) through a urethane bond, and bonded to a part of the constituent units represented by formula (1) in the specific copolymer through an amido bond with evolution of carbon dioxide gas.
  • a product obtained by a reaction between the copolymer comprising the constituent units represented by formulae (1) and (2) and the (meth)acryloylalkyl isocyanate compound is represented by formula (5): wherein R and R 1 each are as defined above in connection with formulae (1) to (4), R' represents an alkylene group having 2 to 6 carbon atoms, a 1 + a 2 is a defined in formula (1), and b 1 + b 2 is b defined in formula (2).
  • the rate of the reaction of the (meth)acryloylalkyl isocyanate compound with hydroxyl groups in the constituent units represented by formula (2) is about 20 times higher than that of the reaction of the (meth)acryloylalkyl isocyanate compound with carboxyl groups in the constituent units represented by formula (1). Therefore, the (meth)acryloyl group is mainly introduced into the constituent units represented by formula (2), and, in the constituent units represented by formula (1), most of the carboxyl groups remains unreacted even though the (meth)acryloyl group is introduced into a part of the carboxyl groups.
  • the proportion of units with an index b 1 in the copolymer resin may be 0 to 10% by mole, and the proportion of units with an index b2 in the copolymer resin may be 5 to 95% by mole, provided that the total of the proportion of units with an index b 1 and the proportion of units with an index b 2 is 5 to 95% by mole, while regarding the portion derived from formula (1), the proportion of units with an index a 1 in the copolymer resin may be 5 to 55% by mole, and the proportion of units with an index a 2 in the copolymer resin may be 0 to 10% by mole, provided that the total of the proportion of units with an index a 1 and the proportion of units with an index a 2 is 5 to 55% by mole.
  • the amount of the (meth)acryloyl group introduced can be regulated.
  • the weight average molecular weight of the copolymer resin is generally 10,000 to 1,000,000, preferably 20,000 to 100,000.
  • the weight average molecular weight is smaller than 10,000, the developability is excessively good. This makes it difficult to control pattern shapes at the time of pattern-wise exposure. Even though patterns could be formed, a problem occurs such as a reduction in final coating thickness.
  • the weight average molecular weight exceeds 1,000,000, the viscosity of the copolymer resin in the form of a resist is so high that the coatability is lowered. Further, in this case, the developability is deteriorated. This makes it difficult to form sharp patterns.
  • the amount of the (meth)acryloyl group introduced is generally 5 to 95% by mole, preferably 10 to 50% by mole. When the amount is less than 5% by mole, the photocurability is low and the effect of improving coating adhesion and resist properties is small.
  • the acid value of the copolymer resin is generally 5 to 400 mg KOH/g, preferably 10 to 200 mg KOH/g.
  • the acid value correlates with the alkali developability. Specifically, an acid value below the lower limit of the above range leads to problems such as poor developability and poor adhesion to the substrate and the color filter resin. On the other hand, an acid value above the upper limit of the above range provides excessively good developability, posing problems including the difficulty of regulating pattern shapes at the time of pattern-wise exposure.
  • the hydroxyl group in the constituent units represented by formula (2) is not always required to be left, and the hydroxyl value may be 0 to 200 mg KOH/g. However, the hydroxyl group may be left to effectively regulate the solubility of the copolymer resin in the solvent.
  • the constituent units represented by formula (1) are derived from 2-hydroxyethyl methacrylate (HEMA) as a monomer
  • the constituent units represented by formula (2) are derived from acrylic acid (AA) as a monomer.
  • the constituent units represented by formula (1) have been partially reacted, through carboxyl groups thereof, with 2-methacryloylethyl isocyanate (Karenz MOI, manufactured by Showa Denko K.K.), and the constituent units represented by formula (2) have been partially reacted, through hydroxyl groups thereof, with 2-methacryloylethyl isocyanate (Karenz MOI, manufactured by Showa Denko K.K.).
  • the constituent units represented by formula (3) are derived from styrene (St) as the monomer, and the constituent units represented by formula (4) are derived from benzyl methacrylate (BzMA) as the monomer.
  • the chemical composition (% by mole) is shown in Table 1, and the acryloyl group content (% by mole), the acid value (mg KOH/g), and the weight average molecular weight (Mw) as determined using polystyrene as the standard are shown in Table 2.
  • the content of the photopolymerizable acrylate oligomer and the content of the copolymer resin is generally 5 to 80% by weight, preferably 10 to 50% by weight, on a solid basis.
  • the viscosity of the composition is excessively high, leading to lowered fluidity. This poses a problem of coatability.
  • the content of the oligomer and the content of the copolymer resin are less than 5% by weight, the viscosity of the composition is excessively low, leading to unsatisfactory stability of a coating of the composition after coating and drying. This poses problems such as deteriorated suitability for exposure and development.
  • Bifunctional or higher polyfunctional polymerizable acrylate monomers and oligomers usable herein include: ethylene oxide (3 mol) adducts, ethylene oxide (6 mol) adducts, propylene oxide (3 mol) adducts, and propylene oxide (6 mol) adducts of dipentaerythritol hexaacrylate (DPHA), dipentaerythritol pentaacrylate (DPPA), pentaerythritol triacrylate (PETTA), trimethylolpropane triacrylate (TMPTA), or trimethylolpropane triacrylate (TMPTA); 1,4-butanediol diacrylate; diethylene glycol diacrylate; and neopentyl glycol diacrylate.
  • DPHA dipentaerythritol hexaacrylate
  • DPPA dipentaerythritol pentaacrylate
  • PETTA pentaerythritol
  • the content of the bifunctional or higher polyfunctional polymerizable acrylate monomer in the photosensitive resin composition is generally 3 to 50% by weight, preferably 5 to 20% by weight, on a solid basis.
  • the bifunctional or higher polyfunctional polymerizable acrylate monomer content is more than 50% by weight, the viscosity of the composition is excessively low, leading to unsatisfactory stability of a coating of the composition after coating and drying. This poses problems such as deteriorated suitability for exposure and development.
  • a bifunctional or higher polyfunctional polymerizable acrylate monomer content of less than 3% by weight poses problems including that unexposed proportions cannot be fully removed in the development.
  • Epoxy resins usable herein include o-cresol novolak type, bisphenol A novolak type, phenol novolak type, and bisphenol A type epoxy resins, and cresol novolak type epoxy resins.
  • phenol novolak type epoxy resins and cresol novolak type epoxy resins include those represented by formulae 6 and 7:
  • the content of the epoxy resin in the photosensitive resin composition is generally 1 to 20% by weight, preferably 3 to 15% by weight, on a solid basis.
  • the epoxy resin content is less than 1% by weight, satisfactory alkali resistance cannot be imparted to the spacers.
  • the epoxy resin content is more than 20% by weight, the amount of the epoxy resin not involved in photocuring is excessively large. This unfavorably results in deteriorated storage stability and suitability for development of the photosensitive resin composition.
  • the epoxy resin is effective in removing the tack of the dried coating of the photosensitive resin composition.
  • the addition of the epoxy resin in an amount of about 3% by weight suffices for attaining this effect.
  • the epoxy resin contained in the photosensitive resin composition does not react with acid groups remaining in the spacers even after the exposure and the alkali development. However, heat treatment causes this reaction to impart excellent alkali resistance to the spacers.
  • Initiators usable herein include 2-methyl-1-[(4-methylthio)phenyl]-2-morpholinopropanone-1,2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1,2,2'-bis(o-chlorophenyl)-4,5,4',5'-tetraphenyl-1,2'-biimidazole, 2,4-diethylthioxanthone, and 4,4-bisdiethylaminobenzophenone.
  • Irgacure 184 examples thereof include Irgacure 184, Irgacure 907, Irgacure 651, and Irgacure 369 (all the above products being tradenames of Ciba Specialty Chemicals, K.K.), and Darocur (tradename, Merck). They may be contained alone or as a mixture of two or more preferably in an amount of 0.1 to 20% by weight, on a solid basis in the photosensitive resin composition.
  • surfactants and silane coupling agents described below may be added to the photosensitive resin composition.
  • diethylene glycol dimethyl ether, 3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, 3-methyl-3-methoxybutanol and the like may be used as a solvent to give a concentration of 5 to 50% by weight on a solid basis.
  • the photosensitive resin composition is cured to form spacers.
  • sealing is carried at a temperature of 120 to 180 °C (typically 150 °C) under pressure.
  • the present inventors have noted that creation of plastic deformation, to such an extent that the desired size of the cell gap cannot be maintained, is unfavorable and the minimized displacement also in the elastically deformable component facilitates the regulation of the cell gap to the target value. This has led to finding that the spacers can be specified by the viscoelasticity thereof.
  • the Young's modulus derived from a stress-strain curve should be not less than the specified value at 150°C.
  • the properties required of the spacer are those of liquid crystal devices required in the temperature range of -40°C to 80°C, that is, in such a temperature range that reliability is generally required of the liquid crystal devices.
  • the storage modulus as determined by dynamic viscoelasticity measurement should be not more than the specified value in the above temperature range, provided that the storage modulus should be not less than a certain value from the viewpoint of avoiding dynamic instability.
  • the Young's modulus derived from a stress-strain curve should be not more than the specified value at 25 °C , provided that the Young's modulus should be not less than a certain value from the viewpoint of avoiding dynamic instability.
  • the hardness of the photocured resin layer constituting the spacers is specified by dynamic storage modulus, loss modulus, and loss tangent.
  • a photosensitive resin composition was coated onto a PET film in its surface.
  • the coating was prebaked at 90 °C for 3 min.
  • the prebaked coating was then pattern-wise exposed to ultraviolet light at 500 mJ/cm 2 , and dipped for one min in a developing solution composed of a 1 wt% aqueous caustic soda solution to perform development, followed by post-baking at 200°C for 30 min.
  • a photocured resin film having a size of 50 ⁇ m in thickness, 5 mm in width, and 12 mm in length was prepared.
  • Solid viscoelastic analyzer RSA-II manufactured by Rheometrix Corp.
  • a sample is set in a fixture for a film tensile test.
  • the temperature dependency at 6.28 rad/sec in the temperature range of -50°C to 250°C is measured.
  • the modulus of the photocured resin layer constituting the spacers is specified by the Young's modulus derived from a stress-strain curve obtained by the tensile test of the photocured resin film.
  • the Young's modulus at 25°C is not more than 10,000 MPa, preferably 500 to 2000 MPa
  • the Young's modulus at 150°C is not less than 10 MPa, preferably not less than 30 MPa.
  • a photosensitive resin composition was coated onto a PET film in its surface. The coating was prebaked at 90°C for 3 min. The prebaked coating was then pattern-wise exposed to ultraviolet light at 500 mJ/cm 2 , and dipped for one min in a developing solution composed of a 1 wt% aqueous caustic soda solution to perform development, followed by post-baking at 200°C for 30 min. Thus, a photocured resin film having a size of 50 ⁇ m in thickness, 5 mm in width, and 12 mm in length was prepared.
  • the Young's modulus at 25°C is determined by the following measuring device and method.
  • Measuring method A sample is set in a fixture for a film tensile test, and the, tensile modulus in the vertical direction is then measured.
  • the Young's modulus at 150°C is determined by the following measuring device and method.
  • Solid viscoelastic analyzer RSA-II manufactured by Rheometrix Corp.
  • a sample is set in a fixture for a film tensile test, and the tensile modulus in the vertical direction is then measured.
  • the modulus of the photocured resin layer constituting the spacers is specified by dynamic hardness (DH).
  • DH dynamic hardness
  • the dynamic hardness is characterized in that the dynamic hardness at the time of loading (DH1) is 30 to 60, preferably 40 to 50.
  • the following measuring device and method are adopted.
  • a photosensitive resin composition was coated onto a glass in its surface. The coating was prebaked at 90 °C for 3 min. The prebaked coating was then pattern-wise exposed to ultraviolet light at 500 mJ/cm 2 , and dipped for one min in a developing solution composed of a 1 wt% aqueous caustic soda solution to perform development, followed by post-baking at 200°C for 30 min. Thus, a photocured resin film having a thickness of 5 ⁇ m was prepared.
  • Dynamic microhardness meter DUH-201S manufactured by Shimadzu Seisakusho Ltd.
  • a load is increased to the following set value at the following rate.
  • the load is then held for the following holding time, followed by unloading to determine the indentation displacement depth at the time of loading (D1) and the displacement depth at the time of unloading (D2).
  • the dynamic hardness at the time of loading (DH1) and the dynamic hardness at the time of unloading (DH2) are determined by the above equation.
  • Large dynamic hardness at the time of loading (DH1) means small indentation displacement depth D, indicating that elastic portion including the plastically deformable portion has high hardness.
  • the dynamic hardness at the time of unloading (DH2) is a value indicating the degree of the plastic deformation, and complete return gives an infinity. Therefore, the larger the DH2 value, the smaller the degree of the plastic deformation. This permits the ratio of the plastically deformable component to the elastically deformable component to be expressed by DH2/DH1.
  • the formation of the spacer coating having the lowest possible DH2/DH1 value is preferable.
  • the spacer by the viscoelasticity as described above leads to advantages including that the deformation of the spacer in the step of cell assembling is small, can maintain a desired cell gap, and the difference in the coefficient of thermal expansion between the liquid crystal and the resin constituting the spacers can be absorbed also by the viscoelasticity of the spacers to suppress the foaming phenomenon at low temperatures.
  • FIG. 1 is a partial cross-sectional view showing one embodiment of the liquid crystal display device having a color filter provided with spacers.
  • a liquid crystal display device 1 comprises a color filter 2 and an opposed substrate 3, such as TFT, which is disposed so as to face the color filter 2.
  • the color filter 2 comprises: a glass substrate 4; a black matrix 5 provided on the glass substrate 4, the black matrix 5 being formed of a metal, such as chromium, or an oxide thereof or formed of a resin black matrix comprising a resin and a light-shielding agent; and colored layers 6 formed of three primary colors of R (red), G (green), and B (blue) with a black matrix 5 being used as the boundary.
  • a protective layer 7 formed of a transparent synthetic resin is provided on the colored layers, and a transparent electrode layer 8 formed of ITO or the like is provided on the protective layer 7. Spacers 9 formed of a photocured resin layer are provided on the transparent electrode layer 8.
  • An aligning film 12 is provided on the color filter and the opposed substrate in their surface in contact with a liquid crystal. The color filter and the opposed substrate are joined to each other by means of a sealant 10, such as an epoxy resin. A liquid crystal 11 is filled into between the color filter and the opposed substrate.
  • Fig. 2 is a plan view showing color pixels constituting a part of the color filter.
  • Color pixels 22 in the color filter 21 are partitioned by a black matrix 23.
  • Spacers 24 may be provided in portions, which are not effective for display, present around the color pixels.
  • the size of the color pixel may vary according to the size of the screen and the standards of image quality. The size, however, is generally as small as about several 10 ⁇ m to several 100 ⁇ m x several 10 ⁇ m to several 100 ⁇ m, for example, about 100 ⁇ m x 300 ⁇ m.
  • regions for making elements provided, for example, on the opposed TFT substrate invisible from the display surface are provided on a part of the color pixels. The provision of spacers in such regions is not any obstacle to display.
  • Figs. 3A to 3C show spacer formation processes utilizing a colored layer in a color filter.
  • color pixels formed of three colors of red, green, and blue constituting a colored layer may be first formed on the substrate for the color filter 31 as follows. As shown in the drawing, a first color pixel 32, a red color pixel, is formed, and a second color pixel 33, a green color pixel, is formed by exposure using a photomask that provides a green pixel which partially covers the red color pixel.
  • a third color pixel 34 a blue color pixel, is formed also on spacer-forming portions by using a photomask for a blue color pixel which provides a blue color pixel also on the spacer-forming portions.
  • a transparent electrode layer 35 such as an ITO layer, is then formed.
  • spacers 36 may be formed. According to this formation process, since the height of the spacer can be ensured by stacking color pixels on top of one another, the height of the spacer formed on the transparent electrode layer may be small.
  • black masks Bk are first formed by using chromium on a substrate for a color filter 31. Color pixels B, G, and R are then formed in such a manner that the color pixels partially overlap the black masks Bk. Spacers 36 are formed between pixels. According to the formation process shown in Fig. 3C , black masks Bk formed of a resin are formed together with color pixels B, G, and R on the substrate for the color filter 31, and spacers 36 are formed on the black masks Bk. In Figs. 3B and 3C , the transparent electrode layer is not shown.
  • the spacer may be disposed in a proper density, such as a density of one spacer per four pixels or one spacer per one pixel.
  • the spacer density in terms of volume density is generally 0.1 to 5%, preferably 0.3 to 2%, from the viewpoint of the function of the spacer.
  • the volume density of the spacer exceeds the upper limit of the above density range, the pouring efficiency in the step of pouring a liquid crystal is unfavorably lowered.
  • a smaller volume density than the lower limit of the above volume density range is causative of the deformation of the spacer at the time of cell assembling.
  • the surface area density of the spacer is generally 50 to 2,000 ⁇ m 2 /mm 2 , preferably 500 to 1,000 ⁇ m 2 /mm 2 .
  • a surface area density smaller than the lower limit of the above surface area density range is causative of the deformation of the spacer at the time of cell assembling, while when the surface area density exceeds the above surface area density range, the pouring efficiency in the step of pouring the liquid crystal is unfavorably lowered.
  • the shape of the spacer formed by development may be, for example, a trapezoid having a height of 2 to 10 ⁇ m, and the edge of the spacer may be in a round spherical form or an angular rectangular form.
  • the spherical form is effective from the viewpoint of reducing the influence on orientation or the like in the step of rubbing after the formation of an aligning film.
  • spacers When one spacer is provided for each size of 100 ⁇ m x 300 ⁇ m in color pixel, about 33 spacers can be formed in 1 mm 2 . This value is smaller than 100 spacers/mm 2 , the number of spacers per mm 2 in the case of the conventional technique where spacers are mixed with a liquid crystal. Since, however, the spacers are homogeneously arranged over the whole display surface, the above number of spacers suffice for attaining the contemplated object.
  • the liquid crystal display device of the present invention can be prepared in such a state that spacers having a desired size are fixed on desired positions, so that image quality and the like are excellent.
  • the formation of spacers on black matrixes partitioning the colored layers does not influence the display quality and hence is preferred.
  • the spacers are preferably formed of a photocured transparent resin layer.
  • the spacers are not limited to the transparent resin layer, and may also be a colored photocured resin layer.
  • a colored layer is first provided on a transparent substrate.
  • a photosensitive resin composition is then coated onto the colored layer by any coating method, such as spin coating, roll coating, spray coating, or screen printing.
  • Ultraviolet light is then applied with a predetermined photomask provided on the coating, thereby curing necessary portions.
  • the photocurable resin in its portions remaining uncured due to unexposure to the ultraviolet light is dissolved in and removed by an aqueous alkali solution as a solvent to form a protective layer.
  • An ITO layer having electric resistance and other excellent properties is formed by DC magnetron sputtering onto the protective layer over the whole surface of the color filter.
  • the photosensitive resin composition of the present invention is then coated onto the ITO layer by any coating method, such as spin coating, roll coating, spray coating, or screen printing, to a thickness corresponding to the sandwich/support distance of the liquid crystal layer.
  • a predetermined photomask is provided on the coating, followed by ultraviolet irradiation to cure spacer-forming portions.
  • the photosensitive resin composition coating in its uncured portions, that is, portions unexposed to ultraviolet light, are dissolved in and removed by an aqueous alkali solution as a solvent. Thus, spacers are formed.
  • a silane coupling agent or the like may be coated onto the ITO layer to enhance the adhesion.
  • Silane coupling agents usable herein include, for example, vinylsilane, acrylsilane, epoxysilane, and aminosilane. More specifically, examples of vinylsilanes usable herein include vinyltrichlorosilane, vinyltris( ⁇ -methoxyethoxy)silane, vinyltriethoxysilane, and vinyltrimethoxysilane. Examples of acrylsilanes usable herein include ⁇ -methacryloxypropyltrimethoxysilane, and ⁇ -methacryloxypropylmethyldimethoxysilane.
  • epoxysilanes usable herein include ⁇ -(3,4-epoxycyclohexyl)ethyltrimethoxysilane, ⁇ -glycidoxypropyltrimethoxysilane, and ⁇ -glycidoxypropylmethyldiethoxysilane.
  • aminosilanes usable herein include N- ⁇ - (aminoethyl)- ⁇ -aminopropyltrimethoxysilane, N- ⁇ - (aminoethyl)- ⁇ -aminopropylmethylditrimethoxysilane, ⁇ - aminopropyltriethoxysilane, and N-phenyl- ⁇ -aminopropyltrimethoxysilane.
  • silane coupling agents examples include ⁇ -silane, ⁇ -chloropropyltrimethoxysilane, ⁇ -chloropropylmethyldimethoxysilane, ⁇ -chloropropylmethyldimethoxy-siliane, and ⁇ -chloropropylmethyldiethoxysilane.
  • the liquid crystal display device may be constructed such that, after the formation of a colored layer and a protective layer on a transparent substrate in the same manner as used in the preparation of the liquid crystal display device shown in Fig. 1 , spacers may be formed on the protective layer followed by the formation of an ITO layer in a region including the spacers to prepare a liquid crystal display device.
  • the formation of the protective layer using the same material as used in the formation of the photocured resin layer according to the present invention enables the formation of spacers having high strength of adhesion between the spacer and the protective layer as the substrate layer.
  • the ITO layer is formed also on the spacers, leading to electrically conductive connections between the spacer and the counter electrode.
  • the electrically conductive connection between the spacer and the counter electrode may be avoided by previously masking the top of the spacers to prevent the ITO layer from being formed on the spacers, by providing short-circuit preventing means on the opposed electrode side, or by removing the formed ITO layer from the surface of the spacers by etching.
  • the liquid crystal display device may have such a construction that, after a colored layer is formed on a transparent substrate in the same manner as used in the preparation of the liquid crystal display device shown in Fig. 1 , an ITO layer is formed directly on the colored layer followed by the formation of spacers on the ITO layers.
  • the liquid crystal display device has such a construction that, after the formation of a colored layer on a transparent substrate in the same manner as used in the preparation of the liquid crystal display device shown in Fig. 1 , spacers are formed on the colored layer followed by the formation of an ITO layer in a region including the spacers to prepare a liquid crystal display device.
  • spacers on the color filter side.
  • spacers may be formed on the opposed TFT substrate, followed by cell assembling using the TFT substrate having thereon spacers and a color filter formed in the same manner as described above.
  • spacers capable of supporting both the substrates while leaving a predetermined gap therebetween and provided on at least one of the substrates. This eliminates the need to disperse spacer particles or the like in the liquid crystal.
  • Copolymer resin (1) used in Example 1 was synthesized as follows.
  • This composition together with 5 g of azobisisobutyronitrile, was dissolved in 650 g of 3-methoxybutyl acetate. The solution was then added dropwise to a polymerizer containing 1000 g of 3-methoxybutyl acetate at 100 °C over a period of 6 hr. Thus, polymerization was carried out to prepare a polymer solution.
  • the polymer solution had a solid content of 40% by weight and a viscosity of 1050 mPa ⁇ s (30°C, Brookfield viscometer).
  • the polymer had an acid value of 152 mg KOH/g, a hydroxyl value of 90 mg KOH/g, and a weight average molecular weight of 37,000 as determined using polystyrene as a standard.
  • the copolymer thus obtained comprised 15% by mole of styrene units, 37% by mole of benzyl methacrylate units, 30% by mole of acrylic acid units, and 18% by mole of 2-hydroxyethyl methacrylate units.
  • the reaction solution thus obtained had a solid content of 26% by weight and a viscosity of 500 mPa ⁇ s (30°C, Brookfield viscometer).
  • the polymer had an acid value of 120 mg KOH/g, a hydroxyl value of 5 mg KOH/g, and a weight average molecular weight of 45,000 as determined using polystyrene as a standard and contained 17% by mole of (meth)acryloyl groups.
  • a black matrix of metallic chromium having a thickness of 100 nm, a percentage opening of 50%, and each pixel size of 20 ⁇ m x 40 ⁇ m was formed by sputtering on a 1.1 mm-thick glass substrate (an AL material, manufactured by Asahi Glass Co., Ltd.).
  • a red photosensitive resin having the following composition was spin coated thereon to a coating thickness of 1.5 ⁇ m.
  • the coated substrate was dried for 30 min in an oven of 70°C.
  • the coated surface was exposed to light from a mercury lamp through a photomask having a predetermined pattern, followed by spray development with water for one min to form a red relief pattern in regions where red pixels are to be formed. Thereafter, heat curing treatment was carried out at 150°C for 30 min.
  • red photosensitive resin Pyrazolone Red (red pigment) 10 pts.wt. Polyvinyl alcohol/5% stilbazolium quinolium (photosensitive resin) 5 pts.wt. Water 85 pts.wt.
  • green photosensitive resin Lionol Green 2Y-301 (green pigment) 9 pts.wt.
  • Polyvinyl alcohol/5% stilbazolium quinolium (photosensitive resin) 5 pts.wt. Water 86 pts.wt. (Composition of blue photosensitive resin) Fastogen Blue (blue pigment) 3 pts.wt.
  • Polyvinyl alcohol/5% stilbazolium quinolium (photosensitive resin) 5 pts.wt. Water 92 pts.wt.
  • a photosensitive resin composition having the following formulation for spacers was spin coated onto the glass substrate, with the colored layers formed thereon, to a coating thickness of 5.0 ⁇ m on a dry basis.
  • Copolymer resin (1) solid content 26 wt%) 45.7 pts.wt.
  • Dipentaerythritol pentaacrylate (SR 399, manufactured by Sartomer) 9.1 pts.wt.
  • o-Cresol novolak type epoxy resin Epikote 180S70, manufactured by Yuka Shell Epoxy K.K.
  • a photomask designed so as to provide spacers having desired shape, size and intervals was disposed at a position 100 ⁇ m distant from the coating of the photosensitive resin composition.
  • Ultraviolet light was applied by a proximity aligner from a 2.0 kW ultrahigh-pressure mercury lamp for 10 sec only to spacer-forming regions on the black matrix.
  • the exposed assembly was then immersed in a 0.05% aqueous potassium hydroxide solution (liquid temperature 23°C) for one min to perform alkali development. Thus, only uncured portions in the coating of the photosensitive resin composition were removed.
  • a transparent electrode layer was formed on the color filter in its surface including the fixed spacers by DC magnetron sputtering using ITO as a target and argon and oxygen as discharge gases at a substrate temperature of 200°C.
  • Cell assembling was then carried out by joining the resultant assembly to a glass substrate, which had been treated in such a manner that an aligning film of a polyimide was formed on the glass substrate followed by the formation of TFT using an epoxy resin as a sealant, under conditions of temperature 150 °C and pressure 0.3 kg/cm 2 .
  • a TN liquid crystal was then filled into the cells to prepare a liquid crystal display device according to the present invention.
  • Colored layers were formed on a glass substrate in the same manner as in Example 1.
  • a transparent electrode layer was then formed on the colored layers by DC magnetron sputtering using ITO as a target and argon and oxygen as discharge gases at a substrate temperature of 200°C.
  • o-Cresol novolak acrylate 25 pts.wt. Aronix M-400 (DPHA: manufactured by Toa Gosei Chemical Industry Co., Ltd. 11 pts.wt.
  • o-Cresol novolak type epoxy resin (Epikote 154, NV 70%, manufactured by Yuka Shell Epoxy K.K.) 4 pts.wt. 2-Methyl-1-[(4-methylthio)phenyl]-2-morpholinopropanone-1 1 pts.wt. 3-Methoxybutyl acetate Silicon KBM 403 (a silane coupling 58 pts.wt. agent) 1 pts.wt.
  • a liquid crystal display device was prepared in the same manner as in Example 1, except that the photosensitive resin composition prepared just above was used instead of the photosensitive resin composition in Example 1.
  • Alkali-soluble binder a copolymer composed mainly of benzyl methacrylate, styrene, and acrylic acid; molecular weight 3000
  • SR 399 Dipentaerythritol pentaacrylate
  • o-Cresol novolak type epoxy resin Epikote 180S70, manufactured by Yuka Shell Epoxy K.K.
  • Diethylene glycol dimethyl ether 30 pts.wt. 3-Methoxybutyl acetate 12 pts.wt.
  • a liquid crystal display device was prepared in the same manner as in Example 1, except that the photosensitive resin composition prepared just above was used instead of the photosensitive resin composition in Example 1.
  • photocured resin films were prepared as test samples for the measurement of dynamic storage modulus, loss modulus, and loss tangent, followed by dynamic storage modulus, loss modulus, and loss tangent measurements in the same manner as described above.
  • the results of the measurement on the photosensitive resin compositions used in Examples 1 and 2 are shown in Fig. 5
  • the results of the measurement on the photosensitive resin composition used in Example 3 are shown in Fig. 6
  • the results of the measurement on the photosensitive resin composition used in Comparative Example are shown in Fig. 7 .
  • the photocured resin film as the test sample prepared from the photosensitive resin composition used in Comparative Example is different from the photocured resin films as test samples formed from the photosensitive resin compositions used in Examples 1 and 2 in loss tangent in the temperature range of -40°C to 80°C.
  • the Young's modulus (MPa) at 25°C was in the Young's modulus range specified in the present invention, that is, not more than 10,000 and the Young's modulus (MPa) at 150°C was also in the Young's modulus range specified in the present invention, that is, not less than 10 MPa, whereas for the photocured resin film as a test sample prepared from the photosensitive resin composition used in Comparative Example was outside the scope of the present invention with respect to the Young's modulus (MPa) at 150 °C.
  • the liquid crystal display devices prepared in Examples 1 to 3 and Comparative Examples were evaluated for the resistance to low-temperature foaming by cooling the devices at a temperature of -30 to -40°C for several days. As a result, the liquid crystal display devices prepared in Examples 1 to 3 did not cause any change. On the other hand, the comparative liquid crystal display device created small foams which scattered here and there in the liquid crystal layer.
  • liquid crystal display devices prepared in Examples 1 to 3 and Comparative Example a liquid crystal was filled into the cells, followed by annealing at 100 to 120 °C . As a result, the liquid crystal display devices prepared in Examples 1 to 3 remained unchanged, whereas the liquid crystal display device prepared in Comparative Example suffered from lowered contrast.
  • the liquid crystal display devices according to the present invention can assure a desired cell gap at the time of heat contact bonding involved in the assembling of cells in a liquid crystal display device and, after the preparation of liquid crystal cells, has excellent reliability, can cope with an increase in cell thickness at high temperatures, and can inhibit a foaming phenomenon in a liquid crystal layer at low temperatures.

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EP99123954.2A 1998-12-05 1999-12-06 Liquid crystal display devices and processes for producing the same Expired - Lifetime EP1006395B1 (en)

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JP6391882B1 (ja) * 2016-12-27 2018-09-19 積水化学工業株式会社 液晶表示素子用シール剤、上下導通材料、及び、液晶表示素子
JP7136536B2 (ja) * 2017-10-20 2022-09-13 日本化薬株式会社 ディスプレイ用封止剤
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JP7256939B2 (ja) * 2018-09-03 2023-04-13 日亜化学工業株式会社 発光装置
CN114641722A (zh) * 2020-02-07 2022-06-17 积水化学工业株式会社 固化性树脂组合物、液晶显示元件用密封剂、上下导通材料和液晶显示元件
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JP4100529B2 (ja) 2008-06-11
US6299949B1 (en) 2001-10-09

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