EP0683248A1 - Procédé de post-traitement de plaques, feuilles ou bandes et son application comme support pour plaques d'impression - Google Patents

Procédé de post-traitement de plaques, feuilles ou bandes et son application comme support pour plaques d'impression Download PDF

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Publication number
EP0683248A1
EP0683248A1 EP95107331A EP95107331A EP0683248A1 EP 0683248 A1 EP0683248 A1 EP 0683248A1 EP 95107331 A EP95107331 A EP 95107331A EP 95107331 A EP95107331 A EP 95107331A EP 0683248 A1 EP0683248 A1 EP 0683248A1
Authority
EP
European Patent Office
Prior art keywords
silicate
aftertreatment
layer
solution
alkali
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP95107331A
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German (de)
English (en)
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EP0683248B1 (fr
Inventor
Wolfgang Dr. Dipl.-Chem. Wiedemann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert AG
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Hoechst AG
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Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of EP0683248A1 publication Critical patent/EP0683248A1/fr
Application granted granted Critical
Publication of EP0683248B1 publication Critical patent/EP0683248B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/03—Chemical or electrical pretreatment
    • B41N3/038—Treatment with a chromium compound, a silicon compound, a phophorus compound or a compound of a metal of group IVB; Hydrophilic coatings obtained by hydrolysis of organometallic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/03—Chemical or electrical pretreatment
    • B41N3/034—Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/20—Electrolytic after-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
    • B41N1/083—Printing plates or foils; Materials therefor metallic for lithographic printing made of aluminium or aluminium alloys or having such surface layers

Definitions

  • the invention relates to a process for the aftertreatment of plate, film or tape material based on chemically, mechanically and / or electrochemically roughened and anodically oxidized aluminum or one of its alloys, the aluminum oxide layers of which are treated with an alkali metal silicate in aqueous solution, and one Carrier made of such a material, in which the aluminum oxide layer is coated with an alkali metal silicate layer, and the use of such a carrier as a carrier for offset printing plates.
  • Carrier materials for offset printing plates are either equipped directly by the consumer or by the manufacturer of precoated printing plates or equipped on one or both sides with a radiation or light-sensitive layer, a so-called reproduction layer, with the help of which an image to be printed is created for submission in a photomechanical way.
  • the support After the radiation-sensitive layer has been exposed and developed, the support carries the image-bearing areas which later lead to color printing and, at the same time, forms the hydrophilic background for the lithographic printing process at the non-image areas during later printing, the so-called non-image areas.
  • the parts of the radiation-sensitive layer which have become relatively more soluble after exposure must be easy to remove from the support without residue by development in order to produce the hydrophilic non-image areas.
  • the carrier exposed in the non-image areas must have a high affinity for water, i.e. be highly hydrophilic in order to absorb water quickly and permanently during the lithographic printing process and to be sufficiently repellent to the bold printing ink.
  • the adhesion of the radiation-sensitive layer before or the printing parts of the layer after the irradiation must be sufficient.
  • Aluminum which is roughened on the surface by known methods by dry, wet brushing, sandblasting, chemical and / or electrochemical treatment, is used in particular as the base material for such layer supports.
  • the roughened substrate is subjected to an anodization step to build up a thin oxide layer.
  • the carrier materials in particular anodically oxidized carrier materials based on aluminum, are often used to improve the Layer adhesion, to increase the hydrophilicity and / or to facilitate the developability of the radiation-sensitive layers prior to the application of a radiation-sensitive layer, undergo a further treatment step, as described for example in EP-B 0 105 170 and EP 0 154 201.
  • EP-B 0 105 170 discloses a process for the aftertreatment of aluminum oxide layers with an aqueous alkali silicate solution, in which after the treatment a) is carried out with an aqueous alkali silicate solution, a treatment b) is also carried out with a solution containing aqueous alkaline earth metal salts.
  • the alkali silicate solution is an aqueous Na2SiO3. 5 H20 containing solution. It is then rinsed with distilled water, this intermediate cleaning can also be omitted, and then, or immediately after the silicatization, treatment is carried out in an aqueous solution of an alkaline earth metal nitrate, such as calcium, strontium or barium nitrate.
  • the intermediate rinses with distilled water show a certain influence on the alkali resistance, which is generally better for pores that have not been rinsed after the silicatization step than for rinsed pores.
  • the object of the invention is therefore to improve a process for the aftertreatment of flat aluminum layer supports which have an aluminum oxide layer in such a way that the degradation of the oxide layer by the silicating can be avoided or at least kept very slight.
  • aftertreatment stage a) is aftertreated with an aqueous solution of the ⁇ modification of layered sodium silicate Na2Si2O5.
  • the SiO2 / Na2O molar ratio of the crystalline layered sodium silicate is preferably in the range from 1.9 to 3.5 to 1.
  • the solution in the aftertreatment stage a) contains 0.1 to 10% by weight of ⁇ -Na2Si2O5.
  • the aftertreatment can be carried out as an immersion treatment or else electrochemically, the latter procedure bringing about a certain increase in the alkali resistance and / or improvement in the adsorption behavior of the material. It is assumed that a firmly adhering silicate top layer forms in the pores of the aluminum oxide layer, which protects the aluminum oxide from attacks, the surface topography previously generated, such as roughness and oxide pores, being changed practically or only insignificantly.
  • suitable base materials for the layer supports are also alloys of aluminum which, for example, have a content of more than 98.5% by weight of Al and portions of Si, Fe, Ti, Cu and Zn.
  • the crystalline layered sodium silicate which is a layered silica, has a SiO2 / Na2O molar ratio of 1.9 to 3.5 to 1.
  • the structure of this compound is almost identical to that of the mineral natrosilite, which is a ⁇ modification of Na2Si2O5 is.
  • Very pure sand and soda or sodium hydroxide solution are used as the base material in the production of layered sodium silicate, from which a water glass solution is produced. This solution is then dewatered and crystallized at high temperature into the delta modification of the disilicate.
  • the product obtained can be ground and, if necessary, compacted into granules. In aqueous solution, water penetrates between two layers and widens the distance.
  • layer silicates SKS systems from Hoechst AG, corresponding to S chicht k iesel s äure
  • SKS-6 the most important with regard to builder properties in detergents (binding capacity of Mg, Ca ions); it is also advantageously water-soluble for silicating and processing.
  • Radiation-sensitive coatings are applied to the aftertreated layer supports, and the offset printing plates thus obtained are converted into the desired printing form in a known manner by imagewise exposure and washing out of the non-image areas with a developer, preferably an aqueous developer solution.
  • a developer preferably an aqueous developer solution.
  • offset printing plates stand out, their layer support materials using the two-stage process were treated compared to those plates in which the same support material was aftertreated with aqueous solutions containing silicates, such as water glass or ⁇ - or ⁇ -Na2Si2O5, by improved alkali resistance, a lower tendency to color fog and great resistance to rubber coating the offset printing plate.
  • the time in seconds which is determined in the voltage-time diagram after passing through a minimum until a maximum occurs, serves as a measure of the alkali resistance.
  • An average value is formed from the measured values of two samples.
  • the alkali resistance with an oxide weight of 3.21 g / m2 is 112 ⁇ 10 seconds, this value being an average of 5 double measurements.
  • the support with the highest Si / Al ratio is rinsed with fully deionized water and dried and then gummed with an aqueous solution of dextrin, H3PO4, glycerol, which has a pH of 5.0, and after 16 hours with fully deionized Washed off water.
  • the Si / Al ratio does not change after this procedure and is 0.56, and the Na / Al ratio goes to 0.07 back.
  • the silication with layered sodium silicate is not attacked by the rubber coating, ie the silicate coating is not removed. Phosphorus from the rubber coating can only be detected in the ESCA spectrum, which is proof that the rubber coating does not attack the silicate coating.
  • the silicatisation of the aluminum oxide surface increases with increasing concentration of the layered sodium silicate in the aftertreatment solution, with increasing temperature of the immersion bath (see FIG. 5) and with a longer immersion time. This is expressed in particular in an increase in the Si / Al ratio.
  • the concentration of the layered sodium silicate was increased from 1 g / l to 10 g / l of fully deionized water, furthermore demineralized water, the immersion temperature of the aftertreatment solution was raised from 60 to 80 ° C. (see FIG. 5) and the immersion time was 10 s increased to 120 s.
  • the ESCA measurements show that the applied layered sodium silicate retains its ion exchange capacity, ie when sodium is rinsed with tap or city water, the sodium ions are exchanged for calcium ions.
  • the sodium ions are exchanged for calcium ions.
  • the magnesium content after such a rinse is poor due to its peak value
  • the exchange of sodium for strontium could also be determined using a strontium solution (see also Table 2).
  • Figure 3 shows the oxide degradation in the aluminum oxide layer of a layer or printing plate support.
  • the substrate is roughened electrochemically in hydrochloric acid and anodized in sulfuric acid. Its total thickness is 0.3 mm, the oxide weight is 3.21 g / m2, the thickness of the oxide layer is about 1 ⁇ m.
  • the aftertreatment is carried out in accordance with the process according to the invention in an aqueous solution with a 1% concentration of the layered sodium silicate, deionized water being used. The solution had a pH of 11.4.
  • the printing plate carrier was immersed in the immersion bath at a temperature of 60 ° C. The diving times were 10 to 120 s. As can be seen from Figure 3, the aluminum oxide is attacked only slightly.
  • the surfaces of the substrate which were treated for 10 s, 30 s, and 120 s in the 1% sodium layer silicate solution at 60 ° C, show little change in SEM images compared to the starting material, only that Porosity of the surface, ie the refinement of the pore structure increases slightly.
  • the surfaces of substrates were also investigated, in which sodium metasilicates Na2SiO3 x 5 H2O were used for silicating, under otherwise identical immersion conditions. These investigations were carried out for the diving temperatures of 25 ° C and 60 ° C. A very strong oxide degradation is found, which is still at a low diving temperature of 25 ° C is significantly higher than when silicating with layered sodium silicate.
  • the 1% sodium metasilicate solution (10 g / l Na2SiO3 x 5 H2O, whereby the crystal water is not taken into account) has a pH of 12.2.
  • Alkali resistance values were determined for the following rinse solutions: Rinse solutions: Alkali resistance: 0.4% NaHCO3 in VE-H2O 210/204 s to the maximum 1.0% NaHCO3 in VE-H2O 350 " 0.4% Na2CO3 in VE-H2O 258 " 0.4% Na2SiO3 in VE-H2O 413 " 0.4% Na3PO4 in VE-H2O 278 "
  • Table 2 shows alkali resistance values for further rinsing solutions, together with the X / Al ratios of various alkaline earth metals X in the rinsing solutions to aluminum Al, measured by the ESCA method.
  • the samples were prepared as standard, that is, siliconized in 1% sodium phyllosilicate solution in demineralized water, at an immersion temperature of 60 ° C and an immersion time of 120 s. It was rinsed with deionized water and with solutions in which 0.4% CaCl2, MgCl2, SrCl2 and dextrin were dissolved. Further Solutions were CaSO4, Na2SO4, MgSO4, NaF, LC1, NaHCO3. After drying, the alkali resistance value and the X / Al ratios were determined by ESCA measurements so as to determine the surface coverage by Si, Na, Ca, Sr and the like.
  • X / Al X Ca, Mg, Sr, F, P Si / Al Well / Al X / Al default VE water 80-120 0.46 0.20 - " 0.4% igCaCl2 / VE 145 0.47 0.02 0.07 / approx " "MgCl2 / VE 118 0.48 0.04 ?
  • FIGS. 5 and 6 The results on the temperature dependence of the silication are shown in FIGS. 5 and 6: According to FIG. 5, the Si / Al ratio is independent of the rinsing and increases sharply with increasing temperature and with increasing immersion time.
  • the layered sodium silicate on the Al / AlOOH surface largely retains its ion exchange function; the alkaline earth ions replace the Na ions in the silicated Al / AlOOH surface.
  • the positive layer supports P51 were developed for 60 s with an EP26 developer and then consumed.
  • the negative substrates N50 were treated by hand with 30 ml of DN-5 developer for 60 s without exposure and then burned off.
  • the formation of blue haze is more pronounced in the case of the positive layer supports than the formation of green haze in the case of the negative layer supports, whereby the fog formation on the layer supports in which the silicate coating has been rinsed with city water is least noticeable.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Laminated Bodies (AREA)
  • Printing Methods (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
  • Discharge By Other Means (AREA)
EP95107331A 1994-05-21 1995-05-15 Procédé de post-traitement de plaques, feuilles ou bandes et son application comme support pour plaques d'impression Expired - Lifetime EP0683248B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4417907A DE4417907A1 (de) 1994-05-21 1994-05-21 Verfahren zur Nachbehandlung von platten-, folien- oder bandförmigem Material, Träger aus derartigem Material und seine Verwendung für Offsetdruckplatten
DE4417907 1994-05-21

Publications (2)

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EP0683248A1 true EP0683248A1 (fr) 1995-11-22
EP0683248B1 EP0683248B1 (fr) 1997-12-17

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US (2) US5556531A (fr)
EP (1) EP0683248B1 (fr)
JP (1) JPH07316882A (fr)
KR (1) KR950032719A (fr)
AT (1) ATE161297T1 (fr)
BR (1) BR9502487A (fr)
DE (2) DE4417907A1 (fr)

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WO2011045423A1 (fr) * 2009-10-16 2011-04-21 Henkel Ag & Co. Kgaa Procédé à plusieurs niveaux pour fabriquer des surfaces d'aluminium anodisées et résistantes aux produits alcalins
ITMO20130129A1 (it) * 2013-05-14 2014-11-15 Italtecno S R L Metodo di fissaggio dell'ossido di alluminio.

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CN110023840A (zh) 2016-12-01 2019-07-16 爱克发有限公司 制造含有重氮化合物的平版印刷版前体的方法
EP3674796B1 (fr) 2017-08-25 2023-11-22 FUJIFILM Corporation Précurseur de plaque d'impression planographique négative et procédé de fabrication d'une plaque d'impression planographique
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0105170A2 (fr) * 1982-09-01 1984-04-11 Hoechst Aktiengesellschaft Procédé de posttraitement de couches d'oxyde d'aluminium avec des solutions aqueuses contenant du silicate alcalin et son application dans la fabrication des supports pour plaques d'impression
EP0154201B1 (fr) 1984-02-21 1987-08-19 Hoechst Aktiengesellschaft Procédé pour le traitement postérieur de couches d'oxyde d'aluminium avec solutions aqueuses contenant du silicate de métal alcalin et leur utilisation pour la fabrication de supports pour plaques d'impression offset

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2882153A (en) * 1954-02-04 1959-04-14 Polychrome Corp Planographic printing plate
US2882152A (en) * 1957-06-21 1959-04-14 Malon H Dickerson High speed developers
US3902976A (en) * 1974-10-01 1975-09-02 S O Litho Corp Corrosion and abrasion resistant aluminum and aluminum alloy plates particularly useful as support members for photolithographic plates and the like

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0105170A2 (fr) * 1982-09-01 1984-04-11 Hoechst Aktiengesellschaft Procédé de posttraitement de couches d'oxyde d'aluminium avec des solutions aqueuses contenant du silicate alcalin et son application dans la fabrication des supports pour plaques d'impression
EP0105170B1 (fr) 1982-09-01 1988-01-13 Hoechst Aktiengesellschaft Procédé de posttraitement de couches d'oxyde d'aluminium avec des solutions aqueuses contenant du silicate alcalin et son application dans la fabrication des supports pour plaques d'impression
EP0154201B1 (fr) 1984-02-21 1987-08-19 Hoechst Aktiengesellschaft Procédé pour le traitement postérieur de couches d'oxyde d'aluminium avec solutions aqueuses contenant du silicate de métal alcalin et leur utilisation pour la fabrication de supports pour plaques d'impression offset

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007057777A1 (de) * 2007-11-30 2009-06-04 Erbslöh Ag Bauteil aus Aluminium und/oder einer Aluminiumlegierung mit einer sehr hohen Korrosionsbeständigkeit sowie Verfahren zu dessen Herstellung
DE102007057777B4 (de) * 2007-11-30 2012-03-15 Erbslöh Ag Verfahren zur Herstellung eines Bauteils aus Aluminium und/oder einer Aluminiumlegierung sowie Verwendung des Verfahrens
WO2011045423A1 (fr) * 2009-10-16 2011-04-21 Henkel Ag & Co. Kgaa Procédé à plusieurs niveaux pour fabriquer des surfaces d'aluminium anodisées et résistantes aux produits alcalins
ITMO20130129A1 (it) * 2013-05-14 2014-11-15 Italtecno S R L Metodo di fissaggio dell'ossido di alluminio.

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US5556531A (en) 1996-09-17
JPH07316882A (ja) 1995-12-05
US5770315A (en) 1998-06-23
ATE161297T1 (de) 1998-01-15
DE4417907A1 (de) 1995-11-23
KR950032719A (ko) 1995-12-22
EP0683248B1 (fr) 1997-12-17
BR9502487A (pt) 1995-12-19
DE59501119D1 (de) 1998-01-29

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