EP0370843B1 - Plateau de polissage - Google Patents

Plateau de polissage Download PDF

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Publication number
EP0370843B1
EP0370843B1 EP89402889A EP89402889A EP0370843B1 EP 0370843 B1 EP0370843 B1 EP 0370843B1 EP 89402889 A EP89402889 A EP 89402889A EP 89402889 A EP89402889 A EP 89402889A EP 0370843 B1 EP0370843 B1 EP 0370843B1
Authority
EP
European Patent Office
Prior art keywords
parts
plate according
length
arcs
hard
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP89402889A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0370843A1 (fr
Inventor
Georges Broido
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dite Lam-Plan Sa Ste
Original Assignee
Dite Lam-Plan Sa Ste
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=9371247&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EP0370843(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Dite Lam-Plan Sa Ste filed Critical Dite Lam-Plan Sa Ste
Priority to AT89402889T priority Critical patent/ATE78205T1/de
Publication of EP0370843A1 publication Critical patent/EP0370843A1/fr
Application granted granted Critical
Publication of EP0370843B1 publication Critical patent/EP0370843B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/12Lapping plates for working plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/06Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor with inserted abrasive blocks, e.g. segmental
    • B24D7/063Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor with inserted abrasive blocks, e.g. segmental with segments embedded in a matrix which is rubbed away during the grinding process
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S451/00Abrading
    • Y10S451/905Metal lap

Definitions

  • the present invention relates to polishing or lapping plates, circular, on the flat surface of which are exposed tender parts and hard parts in particular those used in polishing machines comprising a plate driven in rotation about its axis, a workpiece carrier off-center with respect to the plate and driven in rotation, in particular by friction, around its own axis and an abrasive suspension interposed between the parts to be polished and the plate, the parts being applied to the plate, with interposition of the suspension, with a certain pressure.
  • a polishing plate is described on the planar surface of which are exposed tender parts in the form of islands disseminated regularly in a continuous hard part.
  • hard parts means parts that are harder than the soft parts of the tray.
  • the tender parts are distributed regularly on concentric circles of the plate. No importance is attached to the lengths of the intervals between the hard parts which, in the drawing, and in the corresponding tray sold commercially, are very large.
  • the invention therefore relates to a polishing plate whose yield is increased.
  • the tray according to the invention is characterized in that more than half of the arcs cut in the tender parts by an imaginary circle of radius equal to 9 / 20th of that of the disc and the center of which is at a distance from that of the disc equal at half the radius of the disc, have a length of between 0.5 and 8 mm.
  • the curve, on which the arcs are cut, to take into consideration is the trace of the trajectory of a point of a piece to be polished or lapped on the plate.
  • Such curves are shown in the figures. However, for the sake of simplification, they can be assimilated to the imaginary circle with an approximation sufficient for the purposes of defining the invention.
  • Preferably 80% and better still 90% of the arcs have a length of between 0.5 and 5 mm and, better still, between 1 and 4 mm.
  • the criterion laid down by the invention can only be satisfied if the hard parts form isolated islands in a soft matrix, which is continuous, that is to say in one piece. This embodiment is contrary to that known in the state of the art. It is further noted that it makes it possible to give the plate a better flatness.
  • the islands are rectangular, the ratio of the length of the long sides to that of the short sides being between 1.5 and 3.
  • the results are improved by recesses made in the long sides.
  • the hard parts of the tray can be powders of cast iron, iron, copper, stainless steel, chromium, carbide, oxides, in particular alumina oxide, preferably mixed with resins such as polyester resins, acrylic resins and phenolformaldehyde resins.
  • the soft parts can be metallic powders, for example copper, bronze, copper and lead alloys, brass, copper and aluminum alloys, aluminum, lead, antimony, tin and zinc, preferably also mixed with resins, in particular polyester, acrylic and phenolformaldehyde resins. In these mixtures of resins and metal powders, the resin advantageously represents from 20 to 40% of the total weight.
  • the abrasives used are products having on the Mosh scale a hardness of at least 9 and, on the Knoop scale, a hardness greater than 1200.
  • These abrasives, which are harder than the hard parts of the plateau, are in particular corundum, molten alumina, silicon carbide, boron carbide and diamond, the latter being preferred.
  • the abrasive is in the form of a suspension of the abrasive products mentioned above, in a binder, the particle size of the abrasives being between 1 micron and 200 microns and, preferably, between 10 microns and 40 microns and the percentage abrasives in the binder being between 0.2 and 5% by weight and the percentage of abrasives in the binder being between 0.2 and 5% by weight and preferably between 1 and 3% by weight.
  • the binder can consist of a mixture of water and glycols, the glycols representing from 10 to 60% of the total weight of the binder and, preferably, from 20 to 50% of this weight.
  • the binder can also consist of a mixture of water and kerosene, the latter representing from 40 to 60% of the total weight of the binder.
  • Figures 1 to 4 are plan views of trays according to the invention with a diameter of 230 mm
  • Figure 5 is a graph illustrating the invention.
  • the lapping plate represented in FIG. 1 consists of a matrix 1 made of a mixture of resin and copper, the resin representing 2/3 by weight of the mixture.
  • the matrix 1 is continuous and represents the tender parts.
  • the hard parts are made up of islands 2 whose faces are flush with the surface of the plate are circular, having a diameter of 25 mm.
  • curve C1 which is the trace of a point of an object to be polished on the polishing plate.
  • This curve C1 cuts, in the soft matrix, arcs of which more than 50% have a length of between 1 and 5 mm.
  • This curve with the imaginary circle C of radius equal to half that of the disc and whose center is at a distance from that of the disc equal to half of the radius of the disc.
  • This circle cuts, on the soft matrix, the arcs 3 to 13 whose respective lengths are 8, 3, 6, 12, 2, 17, 10, 7, 8, 6, 2 and 12.
  • the islands 22 have substantially the shape of a rectangle whose long sides have recesses.
  • the interval between two short sides 23 of a rectangle is 2 mm.
  • the interval between the two recessed portions 24 of the long sides of the rectangle is also 2 mm.
  • the interval between the long sides immediately adjacent to the short sides 23 is 2 mm.
  • the interval in the sections connecting the recessed parts to the rest of the long sides is only 1 mm.
  • the hard rectangular islands 32 are scattered in a matrix 33.
  • the distance separating two islands, counted along their sides, is 2 mm.
  • the hard islands 42 are disseminated in the tender matrix 41, the distance separating two islands is such that the arcs cut out in the tender parts have lengths between 0.5 and 5 mm.
  • the removal of materials is 615. This value of the removal of materials is taken as an index base equal to 100.
  • the yield is 144.
  • Table III gives the results for a plate of the same type as that of FIG. 1, but in which the diameter of the islands is 20 mm. The percentage of islets is 70%. The yield is 141.
  • Table IV gives the results for a plate of the same type as that of FIG. 1, but the islands of which have a diameter of 13 mm. The percentage of islets is 72. The yield is 135.
  • Tables V to X give the results obtained with plates conforming to FIG. 2, but the intervals between the two short sides of the hard pads and the recessed portions of the long sides of the hard pads are respectively 0.5 mm, 1 mm , 2 mm, 4 mm, 6 mm and 8 mm.
  • the hard island percentages are 95, 91, 81, 69, 57 and 51, respectively.
  • Returns are 126, 131, 148, 137, 122, 103.
  • FIG. 5 the variation in the removal of materials has been plotted as a function of the intervals between the hard parts. It is clearly seen that a maximum of material removal appears for a value close to 2 mm, the range going from 0.5 to 6 mm corresponding to material removals greater than 750. There is a close correlation between the length of the arcs cut in the tender parts and the lengths of the intervals between the hard parts.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Removal Of Insulation Or Armoring From Wires Or Cables (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Prostheses (AREA)
EP89402889A 1988-11-22 1989-10-19 Plateau de polissage Expired - Lifetime EP0370843B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT89402889T ATE78205T1 (de) 1988-11-22 1989-10-19 Polierscheibe.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8813919 1988-11-22
FR8813919A FR2639278B1 (fr) 1988-11-22 1988-11-22 Plateau de polissage

Publications (2)

Publication Number Publication Date
EP0370843A1 EP0370843A1 (fr) 1990-05-30
EP0370843B1 true EP0370843B1 (fr) 1992-07-15

Family

ID=9371247

Family Applications (1)

Application Number Title Priority Date Filing Date
EP89402889A Expired - Lifetime EP0370843B1 (fr) 1988-11-22 1989-10-19 Plateau de polissage

Country Status (13)

Country Link
US (1) US5022191A (enrdf_load_stackoverflow)
EP (1) EP0370843B1 (enrdf_load_stackoverflow)
JP (1) JPH02262957A (enrdf_load_stackoverflow)
KR (1) KR0150779B1 (enrdf_load_stackoverflow)
AT (1) ATE78205T1 (enrdf_load_stackoverflow)
CA (1) CA2003381C (enrdf_load_stackoverflow)
DE (1) DE68902131T2 (enrdf_load_stackoverflow)
DK (1) DK169061B1 (enrdf_load_stackoverflow)
ES (1) ES2033542T3 (enrdf_load_stackoverflow)
FR (1) FR2639278B1 (enrdf_load_stackoverflow)
GR (1) GR3005624T3 (enrdf_load_stackoverflow)
HU (1) HUT53001A (enrdf_load_stackoverflow)
IE (1) IE62270B1 (enrdf_load_stackoverflow)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2985490B2 (ja) * 1992-02-28 1999-11-29 信越半導体株式会社 研磨機の除熱方法
FR2740716B1 (fr) * 1995-11-08 1998-01-02 Lam Plan Sa Rodoir et son procede de fabrication
TW349896B (en) * 1996-05-02 1999-01-11 Applied Materials Inc Apparatus and chemical mechanical polishing system for polishing a substrate
CN1118354C (zh) * 1997-05-09 2003-08-20 罗德尔控股公司 镶嵌式抛光垫及其制造方法
JP3056714B2 (ja) * 1997-10-06 2000-06-26 松下電子工業株式会社 半導体基板の研磨方法
FR2786118B1 (fr) * 1998-11-19 2000-12-22 Lam Plan Sa Dispositif de rodage ou polissage
US6634929B1 (en) * 1999-04-23 2003-10-21 3M Innovative Properties Company Method for grinding glass
US6616513B1 (en) * 2000-04-07 2003-09-09 Applied Materials, Inc. Grid relief in CMP polishing pad to accurately measure pad wear, pad profile and pad wear profile
USD502378S1 (en) * 2002-11-18 2005-03-01 Ehwa Diamond Industrial Co., Ltd. Pad for grinding stone
USD538313S1 (en) 2005-09-16 2007-03-13 3M Innovative Properties Company Abrasive article with holes
USD536714S1 (en) 2005-09-16 2007-02-13 3M Innovative Properties Company Abrasive article with holes
USD538312S1 (en) * 2005-09-16 2007-03-13 3M Innovative Properties Company Abrasive article with holes
USD541317S1 (en) 2006-02-01 2007-04-24 3M Innovative Properties Company Abrasive article with holes
USD532800S1 (en) * 2006-02-01 2006-11-28 3M Innovative Properties Company Abrasive article with holes
USD533200S1 (en) * 2006-02-01 2006-12-05 3M Innovative Properties Company Abrasive article with holes
USD543562S1 (en) 2006-02-01 2007-05-29 3M Innovative Properties Company Abrasive article with holes
USD645065S1 (en) 2008-05-22 2011-09-13 3M Innovative Properties Company Abrasive article with holes
WO2017033280A1 (ja) * 2015-08-25 2017-03-02 株式会社クリスタル光学 研磨工具及び研磨工具の製造方法
CN108188945B (zh) * 2018-03-12 2023-08-01 桂林创源金刚石有限公司 一种薄片齿拼合式金刚石砂轮及制作方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US342943A (en) * 1886-06-01 Process of and apparatus for making felt boots
US1622942A (en) * 1923-01-17 1927-03-29 Elroy A Chase Buffing wheel
US1926321A (en) * 1930-10-10 1933-09-12 Turek Johann Grinding wheel
FR1104941A (fr) * 1954-05-19 1955-11-25 Perfectionnement aux meules notamment aux meules diamant
FR2203301A5 (enrdf_load_stackoverflow) * 1972-10-18 1974-05-10 Lam Plan Sa
USRE27962E (en) * 1973-03-05 1974-04-02 Abrasive disc
US3921342A (en) * 1973-12-17 1975-11-25 Spitfire Tool & Machine Co Inc Lap plate
JPS6013789B2 (ja) * 1975-07-01 1985-04-09 イプレツツ エス.エイ. 複合板状つや出し工具
US4037367A (en) * 1975-12-22 1977-07-26 Kruse James A Grinding tool
JPS5894965A (ja) * 1981-11-30 1983-06-06 Yoshiaki Hagiuda 複合ラツプ工具
US4581853A (en) * 1982-02-01 1986-04-15 Marcus Ralph S Apparatus for internal finishing of metal parts

Also Published As

Publication number Publication date
HUT53001A (en) 1990-09-28
ES2033542T3 (es) 1993-03-16
DK584189D0 (da) 1989-11-21
DE68902131T2 (de) 1993-01-14
CA2003381A1 (en) 1990-05-22
GR3005624T3 (enrdf_load_stackoverflow) 1993-06-07
HU895835D0 (en) 1990-01-28
FR2639278B1 (fr) 1991-01-11
US5022191A (en) 1991-06-11
KR900007550A (ko) 1990-06-01
CA2003381C (en) 1999-07-13
FR2639278A1 (fr) 1990-05-25
JPH02262957A (ja) 1990-10-25
KR0150779B1 (ko) 1998-10-15
DK169061B1 (da) 1994-08-08
DK584189A (da) 1990-05-23
IE893728L (en) 1990-05-22
ATE78205T1 (de) 1992-08-15
IE62270B1 (en) 1995-01-11
EP0370843A1 (fr) 1990-05-30
DE68902131D1 (de) 1992-08-20

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