EP0370843B1 - Polishing plate - Google Patents

Polishing plate Download PDF

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Publication number
EP0370843B1
EP0370843B1 EP89402889A EP89402889A EP0370843B1 EP 0370843 B1 EP0370843 B1 EP 0370843B1 EP 89402889 A EP89402889 A EP 89402889A EP 89402889 A EP89402889 A EP 89402889A EP 0370843 B1 EP0370843 B1 EP 0370843B1
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Prior art keywords
parts
plate according
length
arcs
hard
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German (de)
French (fr)
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EP0370843A1 (en
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Georges Broido
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Dite Lam-Plan Sa Ste
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Dite Lam-Plan Sa Ste
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/12—Lapping plates for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/06—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor with inserted abrasive blocks, e.g. segmental
    • B24D7/063—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor with inserted abrasive blocks, e.g. segmental with segments embedded in a matrix which is rubbed away during the grinding process
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S451/00—Abrading
    • Y10S451/905—Metal lap

Definitions

  • the present invention relates to polishing or lapping plates, circular, on the flat surface of which are exposed tender parts and hard parts in particular those used in polishing machines comprising a plate driven in rotation about its axis, a workpiece carrier off-center with respect to the plate and driven in rotation, in particular by friction, around its own axis and an abrasive suspension interposed between the parts to be polished and the plate, the parts being applied to the plate, with interposition of the suspension, with a certain pressure.
  • a polishing plate is described on the planar surface of which are exposed tender parts in the form of islands disseminated regularly in a continuous hard part.
  • hard parts means parts that are harder than the soft parts of the tray.
  • the tender parts are distributed regularly on concentric circles of the plate. No importance is attached to the lengths of the intervals between the hard parts which, in the drawing, and in the corresponding tray sold commercially, are very large.
  • the invention therefore relates to a polishing plate whose yield is increased.
  • the tray according to the invention is characterized in that more than half of the arcs cut in the tender parts by an imaginary circle of radius equal to 9 / 20th of that of the disc and the center of which is at a distance from that of the disc equal at half the radius of the disc, have a length of between 0.5 and 8 mm.
  • the curve, on which the arcs are cut, to take into consideration is the trace of the trajectory of a point of a piece to be polished or lapped on the plate.
  • Such curves are shown in the figures. However, for the sake of simplification, they can be assimilated to the imaginary circle with an approximation sufficient for the purposes of defining the invention.
  • Preferably 80% and better still 90% of the arcs have a length of between 0.5 and 5 mm and, better still, between 1 and 4 mm.
  • the criterion laid down by the invention can only be satisfied if the hard parts form isolated islands in a soft matrix, which is continuous, that is to say in one piece. This embodiment is contrary to that known in the state of the art. It is further noted that it makes it possible to give the plate a better flatness.
  • the islands are rectangular, the ratio of the length of the long sides to that of the short sides being between 1.5 and 3.
  • the results are improved by recesses made in the long sides.
  • the hard parts of the tray can be powders of cast iron, iron, copper, stainless steel, chromium, carbide, oxides, in particular alumina oxide, preferably mixed with resins such as polyester resins, acrylic resins and phenolformaldehyde resins.
  • the soft parts can be metallic powders, for example copper, bronze, copper and lead alloys, brass, copper and aluminum alloys, aluminum, lead, antimony, tin and zinc, preferably also mixed with resins, in particular polyester, acrylic and phenolformaldehyde resins. In these mixtures of resins and metal powders, the resin advantageously represents from 20 to 40% of the total weight.
  • the abrasives used are products having on the Mosh scale a hardness of at least 9 and, on the Knoop scale, a hardness greater than 1200.
  • These abrasives, which are harder than the hard parts of the plateau, are in particular corundum, molten alumina, silicon carbide, boron carbide and diamond, the latter being preferred.
  • the abrasive is in the form of a suspension of the abrasive products mentioned above, in a binder, the particle size of the abrasives being between 1 micron and 200 microns and, preferably, between 10 microns and 40 microns and the percentage abrasives in the binder being between 0.2 and 5% by weight and the percentage of abrasives in the binder being between 0.2 and 5% by weight and preferably between 1 and 3% by weight.
  • the binder can consist of a mixture of water and glycols, the glycols representing from 10 to 60% of the total weight of the binder and, preferably, from 20 to 50% of this weight.
  • the binder can also consist of a mixture of water and kerosene, the latter representing from 40 to 60% of the total weight of the binder.
  • Figures 1 to 4 are plan views of trays according to the invention with a diameter of 230 mm
  • Figure 5 is a graph illustrating the invention.
  • the lapping plate represented in FIG. 1 consists of a matrix 1 made of a mixture of resin and copper, the resin representing 2/3 by weight of the mixture.
  • the matrix 1 is continuous and represents the tender parts.
  • the hard parts are made up of islands 2 whose faces are flush with the surface of the plate are circular, having a diameter of 25 mm.
  • curve C1 which is the trace of a point of an object to be polished on the polishing plate.
  • This curve C1 cuts, in the soft matrix, arcs of which more than 50% have a length of between 1 and 5 mm.
  • This curve with the imaginary circle C of radius equal to half that of the disc and whose center is at a distance from that of the disc equal to half of the radius of the disc.
  • This circle cuts, on the soft matrix, the arcs 3 to 13 whose respective lengths are 8, 3, 6, 12, 2, 17, 10, 7, 8, 6, 2 and 12.
  • the islands 22 have substantially the shape of a rectangle whose long sides have recesses.
  • the interval between two short sides 23 of a rectangle is 2 mm.
  • the interval between the two recessed portions 24 of the long sides of the rectangle is also 2 mm.
  • the interval between the long sides immediately adjacent to the short sides 23 is 2 mm.
  • the interval in the sections connecting the recessed parts to the rest of the long sides is only 1 mm.
  • the hard rectangular islands 32 are scattered in a matrix 33.
  • the distance separating two islands, counted along their sides, is 2 mm.
  • the hard islands 42 are disseminated in the tender matrix 41, the distance separating two islands is such that the arcs cut out in the tender parts have lengths between 0.5 and 5 mm.
  • the removal of materials is 615. This value of the removal of materials is taken as an index base equal to 100.
  • the yield is 144.
  • Table III gives the results for a plate of the same type as that of FIG. 1, but in which the diameter of the islands is 20 mm. The percentage of islets is 70%. The yield is 141.
  • Table IV gives the results for a plate of the same type as that of FIG. 1, but the islands of which have a diameter of 13 mm. The percentage of islets is 72. The yield is 135.
  • Tables V to X give the results obtained with plates conforming to FIG. 2, but the intervals between the two short sides of the hard pads and the recessed portions of the long sides of the hard pads are respectively 0.5 mm, 1 mm , 2 mm, 4 mm, 6 mm and 8 mm.
  • the hard island percentages are 95, 91, 81, 69, 57 and 51, respectively.
  • Returns are 126, 131, 148, 137, 122, 103.
  • FIG. 5 the variation in the removal of materials has been plotted as a function of the intervals between the hard parts. It is clearly seen that a maximum of material removal appears for a value close to 2 mm, the range going from 0.5 to 6 mm corresponding to material removals greater than 750. There is a close correlation between the length of the arcs cut in the tender parts and the lengths of the intervals between the hard parts.

Abstract

The arcs (3 to 13) cut in the soft parts (1) by a circle of radius equal to approximately half that of the disc and the centre of which is at a distance from that of the disc equal to half the radius of the disc, have a length between 0.5 and 5 mm. Polishing of workpieces. <IMAGE>

Description

La présente invention concerne des plateaux de polissage ou de rodage, circulaire, à la surface plane duquel affleurent des parties tendres et des parties dures notamment ceux utilisés dans des machines de polissage comprenant un plateau entraîné en rotation autour de son axe, un porte-pièces décentré par rapport au plateau et entraîné en rotation, notamment par frottement, autour de son axe propre et une suspension abrasive interposée entre les pièces à polir et le plateau, les pièces étant appliquées sur le plateau, avec interposition de la suspension, avec une certaine pression.The present invention relates to polishing or lapping plates, circular, on the flat surface of which are exposed tender parts and hard parts in particular those used in polishing machines comprising a plate driven in rotation about its axis, a workpiece carrier off-center with respect to the plate and driven in rotation, in particular by friction, around its own axis and an abrasive suspension interposed between the parts to be polished and the plate, the parts being applied to the plate, with interposition of the suspension, with a certain pressure.

Au brevet US-A-3.913.279, on décrit un plateau de polissage à la surface plane duquel affleurent des parties tendres sous forme d'îlots disséminés régulièrement dans une partie dure continue. Dans le présent mémoire on entend, par parties dures, des parties plus dures que les parties tendres du plateau. Les parties tendres sont réparties régulièrement sur des cercles concentriques du plateau. On n'attache aucune importance aux longueurs des intervalles entre les parties dures qui, au dessin, et dans le plateau correspondant vendu dans le commerce, sont très grandes.In patent US-A-3,913,279, a polishing plate is described on the planar surface of which are exposed tender parts in the form of islands disseminated regularly in a continuous hard part. In the present specification, the term “hard parts” means parts that are harder than the soft parts of the tray. The tender parts are distributed regularly on concentric circles of the plate. No importance is attached to the lengths of the intervals between the hard parts which, in the drawing, and in the corresponding tray sold commercially, are very large.

Au brevet CH-A-641.396, on décrit un plateau de polissage dont les parties tendres affectent la forme d'une spirale continue. La largeur de la spirale n'est pas précisée. Elle est de l'ordre de 10 mm dans le produit correspondant vendu dans le commerce et a aussi cette longueur au dessin, en faisant l'hypothèse que le plateau représenté a le diamètre qui est courant dans la technique.In patent CH-A-641,396, a polishing plate is described, the tender parts of which assume the shape of a spiral keep on going. The width of the spiral is not specified. It is of the order of 10 mm in the corresponding product sold commercially and also has this length in the drawing, assuming that the plate shown has the diameter which is common in the art.

On a maintenant trouvé, d'une manière inattendue, que les longueurs des intervalles entre des parties dures jouent un rôle déterminant dans le rendement de polissage ou quantité de matière enlevée par unité de temps.It has now unexpectedly been found that the lengths of the intervals between hard parts play a decisive role in the polishing yield or amount of material removed per unit of time.

L'invention vise donc un plateau de polissage dont le rendement est augmenté.The invention therefore relates to a polishing plate whose yield is increased.

Le plateau suivant l'invention est caractérisé en ce que plus de la moitié des arcs découpés dans les parties tendres par un cercle imaginaire de rayon égal aux 9/20ème de celui du disque et dont le centre est à une distance de celui du disque égale a la moitié du rayon du disque, ont une longueur comprise entre 0,5 et 8 mm.The tray according to the invention is characterized in that more than half of the arcs cut in the tender parts by an imaginary circle of radius equal to 9 / 20th of that of the disc and the center of which is at a distance from that of the disc equal at half the radius of the disc, have a length of between 0.5 and 8 mm.

En toute rigueur, la courbe, sur laquelle sont découpés les arcs, à prendre en considération est la trace de la trajectoire d'un point d'une pièce à polir ou à roder sur le plateau. De telles courbes sont représentées aux figures. Mais, par souci de simplification, on peut les assimiler au cercle imaginaire avec une approximation suffisante aux fins de définition de l'invention.Strictly speaking, the curve, on which the arcs are cut, to take into consideration is the trace of the trajectory of a point of a piece to be polished or lapped on the plate. Such curves are shown in the figures. However, for the sake of simplification, they can be assimilated to the imaginary circle with an approximation sufficient for the purposes of defining the invention.

De préférence 80 % et mieux encore 90 % des arcs ont une longueur comprise entre 0,5 et 5 mm et, mieux encore, entre 1 et 4 mm.Preferably 80% and better still 90% of the arcs have a length of between 0.5 and 5 mm and, better still, between 1 and 4 mm.

Il existe une longueur des arcs, très petite au vu de l'art antérieur, qui donne le rendement optimum.There is a length of the arcs, very small in view of the prior art, which gives the optimum efficiency.

Si, pour faciliter la fabrication, on souhaite donner aux parties dures des formes identiques, on ne peut satisfaire au critère posé par l'invention que si les parties dures forment des îlots isolés dans une matrice tendre, qui est continue c'est-à-dire d'un seul tenant. Ce mode de réalisation est contraire à celui connu dans l'état de la technique. On constate en outre qu'il permet de donner au plateau une planéité meilleure.If, in order to facilitate manufacture, it is desired to give the hard parts identical shapes, the criterion laid down by the invention can only be satisfied if the hard parts form isolated islands in a soft matrix, which is continuous, that is to say in one piece. This embodiment is contrary to that known in the state of the art. It is further noted that it makes it possible to give the plate a better flatness.

De préférence, les îlots sont rectangulaires, le rapport de la longueur des grands côtés à celle des petits côtés étant compris entre 1,5 et 3. On améliore les résultats par des renfoncements ménagés dans les grands côtés.Preferably, the islands are rectangular, the ratio of the length of the long sides to that of the short sides being between 1.5 and 3. The results are improved by recesses made in the long sides.

L'art antérieur considérait que le rendement optimum était atteint pour 70 % de parties dures et 30 % de parties tendres. Mais quand on respecte le critère de longueur des arcs, des essais montrent que le rendement est le meilleur quand les parties dures représentent de 85 à 95 % de la somme des parties dures et des parties tendres.The prior art considered that the optimum yield was reached for 70% of hard parts and 30% of soft parts. But when the criterion of arc length is respected, tests show that the yield is the best when the hard parts represent from 85 to 95% of the sum of the hard parts and the soft parts.

Les parties dures du plateau peuvent être des poudres en fonte, en fer, en cuivre, en acier inoxydable, en chrome, en carbure, en oxydes, notamment en oxyde d'alumine, de préférence mélangées à des résines telles que des résines polyester, des résines acryliques et des résines phénolformaldéhyde. Les parties tendres peuvent être des poudres métalliques, par exemple de cuivre, de bronze, d'alliages de cuivre et de plomb, de laiton, d'alliages de cuivre et d'aluminium, d'aluminium, de plomb, d'antimoine, d'étain et de zinc, de préférence également mélangées à des résines, notamment des résines de polyester, acryliques et phénolformaldéhydes. Dans ces mélanges de résines et de poudres métalliques, la résine représente avantageusement de 20 à 40 % du poids total.The hard parts of the tray can be powders of cast iron, iron, copper, stainless steel, chromium, carbide, oxides, in particular alumina oxide, preferably mixed with resins such as polyester resins, acrylic resins and phenolformaldehyde resins. The soft parts can be metallic powders, for example copper, bronze, copper and lead alloys, brass, copper and aluminum alloys, aluminum, lead, antimony, tin and zinc, preferably also mixed with resins, in particular polyester, acrylic and phenolformaldehyde resins. In these mixtures of resins and metal powders, the resin advantageously represents from 20 to 40% of the total weight.

Les abrasifs utilisés sont des produits ayant sur l'échelle de Mosh une dureté d'au moins 9 et, sur l'échelle de Knoop, une dureté supérieure à 1200. Ces abrasifs, qui sont plus durs que les parties dures du plateau, sont notamment du corindon, de l'alumine fondue, du carbure de silicium, du carbure de bore et du diamant, ce dernier étant préféré. L'abrasif se présente sous la forme d'une suspension des produits abrasifs mentionnés ci-dessus, dans un liant, la granulométrie des abrasifs étant comprise entre 1 micron et 200 microns et, de préférence, entre 10 microns et 40 microns et le pourcentage des abrasifs dans le liant étant compris entre 0,2 et 5 % en poids et le pourcentage des abrasifs dans le liant étant compris entre 0,2 et 5 % en poids et, de préférence, entre 1 et 3 % en poids. Le liant peut être constitué d'un mélange d'eau et de glycols, les glycols représentant de 10 à 60 % du poids total du liant et, de préférence, de 20 à 50 % de ce poids. Le liant peut être aussi constitué d'un mélange d'eau et de kérosène, ce dernier représentant de 40 à 60 % du poids total du liant.The abrasives used are products having on the Mosh scale a hardness of at least 9 and, on the Knoop scale, a hardness greater than 1200. These abrasives, which are harder than the hard parts of the plateau, are in particular corundum, molten alumina, silicon carbide, boron carbide and diamond, the latter being preferred. The abrasive is in the form of a suspension of the abrasive products mentioned above, in a binder, the particle size of the abrasives being between 1 micron and 200 microns and, preferably, between 10 microns and 40 microns and the percentage abrasives in the binder being between 0.2 and 5% by weight and the percentage of abrasives in the binder being between 0.2 and 5% by weight and preferably between 1 and 3% by weight. The binder can consist of a mixture of water and glycols, the glycols representing from 10 to 60% of the total weight of the binder and, preferably, from 20 to 50% of this weight. The binder can also consist of a mixture of water and kerosene, the latter representing from 40 to 60% of the total weight of the binder.

Au dessin annexé, donné uniquement à titre d'exemple, les figures 1 à 4 sont des vues en plan de plateaux suivant l'invention d'un diamètre de 230 mm, et la figure 5 est un graphique illustrant l'invention.In the accompanying drawing, given solely by way of example, Figures 1 to 4 are plan views of trays according to the invention with a diameter of 230 mm, and Figure 5 is a graph illustrating the invention.

Le plateau de rodage représenté à la figure 1 est constitué d'une matrice 1 en un mélange de résine et de cuivre, la résine représentant les 2/3 en poids du mélange. La matrice 1 est continue et représente les parties tendres. Les parties dures sont constituées d'îlots 2 dont les faces affleurant à la surface du plateau sont circulaires, en ayant un diamètre de 25 mm.The lapping plate represented in FIG. 1 consists of a matrix 1 made of a mixture of resin and copper, the resin representing 2/3 by weight of the mixture. The matrix 1 is continuous and represents the tender parts. The hard parts are made up of islands 2 whose faces are flush with the surface of the plate are circular, having a diameter of 25 mm.

On a représenté également la courbe Cl qui est la trace d'un point d'un objet à polir sur le plateau de polissage. Cette courbe Cl découpe, dans la matrice tendre, des arcs dont plus de 50 % ont une longueur comprise entre 1 et 5 mm. On peut assimiler aussi cette courbe au cercle C imaginaire de rayon égal à la moitié de celui du disque et dont le centre est à une distance de celui du disque égale à la moitié du rayon du disque. Ce cercle découpe, sur la matrice tendre, les arcs 3 à 13 dont les longueurs respectives sont 8, 3, 6, 12, 2, 17, 10, 7, 8, 6, 2 et 12.Also shown is the curve C1 which is the trace of a point of an object to be polished on the polishing plate. This curve C1 cuts, in the soft matrix, arcs of which more than 50% have a length of between 1 and 5 mm. We can assimilate also this curve with the imaginary circle C of radius equal to half that of the disc and whose center is at a distance from that of the disc equal to half of the radius of the disc. This circle cuts, on the soft matrix, the arcs 3 to 13 whose respective lengths are 8, 3, 6, 12, 2, 17, 10, 7, 8, 6, 2 and 12.

A la figure 2, les îlots 22 ont sensiblement la forme d'un rectangle dont les grands côtés ont des renfoncements. L'intervalle entre deux petits côtés 23 d'un rectangle est de 2 mm. L'intervalle entre les deux parties renfoncées 24 des grands côtés du rectangle est également de 2 mm. L'intervalle entre les segments de grands côtés immédiatement adjacents aux petits côtés 23 est de 2 mm. L'intervalle dans les tronçons reliant les parties renfoncées au reste des grands côtés n'est que de 1 mm.In Figure 2, the islands 22 have substantially the shape of a rectangle whose long sides have recesses. The interval between two short sides 23 of a rectangle is 2 mm. The interval between the two recessed portions 24 of the long sides of the rectangle is also 2 mm. The interval between the long sides immediately adjacent to the short sides 23 is 2 mm. The interval in the sections connecting the recessed parts to the rest of the long sides is only 1 mm.

A la figure 3, les îlots 32 rectangulaires durs sont disséminés dans une matrice 33. La distance séparant deux îlots, décomptée le long de leurs côtés, est de 2 mm.In FIG. 3, the hard rectangular islands 32 are scattered in a matrix 33. The distance separating two islands, counted along their sides, is 2 mm.

A la figure 4, les îlots durs 42 sont disséminés dans la matrice tendre 41, la distance séparant deux îlots est telle aussi que les arcs découpés dans les parties tendres ont des longueurs comprises entre 0,5 et 5 mm.In FIG. 4, the hard islands 42 are disseminated in the tender matrix 41, the distance separating two islands is such that the arcs cut out in the tender parts have lengths between 0.5 and 5 mm.

Pour déterminer le rendement des plateaux, on rode six pièces cylindriques d'un diamètre de 20 mm en appliquant une pression de 265 g/cm² sur une machine de rodage, la vitesse de rotation de la machine étant de 150 tours/minute et la vitesse de rotation du porte-pièces de 175 tours/minute ce qui correspond à une vitesse linéaire des pièces de 0,8 m/s. On effectue six cycles d'une durée de 5 minutes chacun. On utilise comme abrasif du liquide diamant de marque MM 381 fourni par la demanderesse. Toutes les 5 minutes, on mesure l'enlèvement de matières en micron sur les six pièces. On fait également le total de l'enlèvement de matière sur toutes les pièces et sur tous les cycles.To determine the performance of the plates, six 20 mm diameter cylindrical parts are rode by applying a pressure of 265 g / cm² on a lapping machine, the machine rotation speed being 150 revolutions / minute and the speed rotation of the workpiece carrier of 175 revolutions / minute which corresponds to a linear speed of the parts of 0.8 m / s. Six cycles of 5 minutes each are carried out. The diamond liquid brand MM 381 supplied by the applicant is used as an abrasive. Every 5 minutes, the removal of micron material on the six pieces is measured. We do also the total material removal on all parts and on all cycles.

Pour un plateau de l'art antérieur de la demanderesse, tel que décrit au brevet des Etats-Unis d'Amérique mentionné ci-dessus, l'enlèvement de matières est de 615. On prend cette valeur de l'enlèvement de matières comme indice de base égal à 100.For a platter of the applicant's prior art, as described in the patent for the United States of America mentioned above, the removal of materials is 615. This value of the removal of materials is taken as an index base equal to 100.

Les résultats obtenus sont rapportés au tableau I. Au tableau II, on a remplacé les îlots tendres du plateau de l'art antérieur par des îlots durs de manière que ces îlots durs représentent 71 % de la surface du plateau, alors que les îlots tendres représentaient 70 % du plateau suivant l'art antérieur. Les résultats obtenus sont consignés au tableau II.

Figure imgb0001
Figure imgb0002
 The results obtained are reported in Table I. In Table II, the tender islets of the tray of the prior art have been replaced by hard islets so that these hard islets represent 71% of the surface of the tray, while the tender islets represented 70% of the plateau according to the prior art. The results obtained are reported in Table II.
Figure imgb0001
Figure imgb0002

Le rendement est de 144.The yield is 144.

Le tableau III donne les résultats pour un plateau du même type que celui de la figure 1, mais dans lequel le diamètre des îlots est de 20 mm. Le pourcentage des îlots est de 70 %. Le rendement est de 141. Le tableau IV donne les résultats pour un plateau de même type que celui de la figure 1, mais dont les îlots ont un diamètre de 13 mm. Le pourcentage des îlots est de 72. Le rendement est de 135.Table III gives the results for a plate of the same type as that of FIG. 1, but in which the diameter of the islands is 20 mm. The percentage of islets is 70%. The yield is 141. Table IV gives the results for a plate of the same type as that of FIG. 1, but the islands of which have a diameter of 13 mm. The percentage of islets is 72. The yield is 135.

Les tableaux V à X donnent les résultats obtenus avec des plateaux conformes à la figure 2, mais dont les intervalles entre les deux petits côtés des plots durs et les parties renfoncées des longs côtés des plots durs sont respectivement de 0,5 mm, 1 mm, 2 mm, 4 mm, 6 mm et 8 mm. Les pourcentages d'îlots durs sont 95, 91, 81, 69, 57 et 51, respectivement. Les rendements sont de 126, 131, 148, 137, 122, 103. On a tracé, à la figure 5, la variation de l'enlèvement de matières en fonction des intervalles entre les parties dures. On voit nettement qu'il apparaît un maximum d'enlèvement de matières pour une valeur voisine de 2 mm, la plage allant de 0,5 a 6 mm correspondant à des enlèvements de matières supérieurs à 750. Il y a une corrélation étroite entre la longueur des arcs découpés dans les parties tendres et les longueurs des intervalles entre les parties dures.Tables V to X give the results obtained with plates conforming to FIG. 2, but the intervals between the two short sides of the hard pads and the recessed portions of the long sides of the hard pads are respectively 0.5 mm, 1 mm , 2 mm, 4 mm, 6 mm and 8 mm. The hard island percentages are 95, 91, 81, 69, 57 and 51, respectively. Returns are 126, 131, 148, 137, 122, 103. In FIG. 5, the variation in the removal of materials has been plotted as a function of the intervals between the hard parts. It is clearly seen that a maximum of material removal appears for a value close to 2 mm, the range going from 0.5 to 6 mm corresponding to material removals greater than 750. There is a close correlation between the length of the arcs cut in the tender parts and the lengths of the intervals between the hard parts.

On constate, en outre, sur tous ces tableaux, que la différence de cote (écart) entre les pièces pour les différentes passes est d'autant plus faible que le rendement est meilleur.It can also be seen in all of these tables that the difference in dimension (difference) between the pieces for the different passes is lower the better the yield.

Au tableau XI, on donne les résultats obtenus avec un plateau suivant la figure 3 et, au tableau XII, avec un plateau suivant la figure 4. Les rendements sont de 147 et 140.

Figure imgb0003
Figure imgb0004
Figure imgb0005
Figure imgb0006
Figure imgb0007
Figure imgb0008
Figure imgb0009
Figure imgb0010
Figure imgb0011
Figure imgb0012
 In Table XI, the results obtained are given with a plate according to FIG. 3 and, in Table XII, with a plate according to FIG. 4. The yields are 147 and 140.
Figure imgb0003
Figure imgb0004
Figure imgb0005
Figure imgb0006
Figure imgb0007
Figure imgb0008
Figure imgb0009
Figure imgb0010
Figure imgb0011
Figure imgb0012

Claims (8)

1. Circular polishing plate on whose plane surface appear flush soft and hard parts, characterized in that more than half of the arcs cut in the soft parts by an imaginary circle, whose radius is equal to 9/20ths of that of the disk and whose centre is at a distance from that of the disk equal to half the radius of the disk, have a length between 0.5 and 8 mm.
2. Plate according to Claim 1, characterized in that at least 80% of the arcs hare a length between 0.5 and 5 mm.
3. Plate according to Claim 2, characterized in that at least 90% of the arcs have a length between 0.5 and 5 mm.
4. Plate according to one of Claims 1 to 3, characterized in that the length of the arcs is between 1 and 4 mm.
5. Plate according to one of the preceding Claims, characterized in that the hard parts form isolated islets in a soft matrix, which is continuous.
6. Plate according to Claim 5, characterized in that the islets are rectangular, the ratio of the length of the longer sides to that of the shorter sides being between 1.5 and 3.
7. Plate according to Claim 5 or 6, characterized by depressions formed in the longer sides.
8. Plate according to one of Claims 1 to 7, characterized in that the hard parts represent from 85 to 95% of the sum of the hard parts and soft parts.
EP89402889A 1988-11-22 1989-10-19 Polishing plate Expired - Lifetime EP0370843B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT89402889T ATE78205T1 (en) 1988-11-22 1989-10-19 POLISHING WHEEL.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8813919 1988-11-22
FR8813919A FR2639278B1 (en) 1988-11-22 1988-11-22 POLISHING TRAY

Publications (2)

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EP0370843A1 EP0370843A1 (en) 1990-05-30
EP0370843B1 true EP0370843B1 (en) 1992-07-15

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JP (1) JPH02262957A (en)
KR (1) KR0150779B1 (en)
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CA (1) CA2003381C (en)
DE (1) DE68902131T2 (en)
DK (1) DK169061B1 (en)
ES (1) ES2033542T3 (en)
FR (1) FR2639278B1 (en)
GR (1) GR3005624T3 (en)
HU (1) HUT53001A (en)
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JP2985490B2 (en) * 1992-02-28 1999-11-29 信越半導体株式会社 Heat removal method of polishing machine
FR2740716B1 (en) * 1995-11-08 1998-01-02 Lam Plan Sa RODOIR AND MANUFACTURING METHOD THEREOF
TW349896B (en) * 1996-05-02 1999-01-11 Applied Materials Inc Apparatus and chemical mechanical polishing system for polishing a substrate
WO1998050201A1 (en) * 1997-05-09 1998-11-12 Rodel Holdings, Inc. Mosaic polishing pads and methods relating thereto
JP3056714B2 (en) * 1997-10-06 2000-06-26 松下電子工業株式会社 Polishing method for semiconductor substrate
FR2786118B1 (en) * 1998-11-19 2000-12-22 Lam Plan Sa LAPPING OR POLISHING DEVICE
US6634929B1 (en) * 1999-04-23 2003-10-21 3M Innovative Properties Company Method for grinding glass
US6616513B1 (en) * 2000-04-07 2003-09-09 Applied Materials, Inc. Grid relief in CMP polishing pad to accurately measure pad wear, pad profile and pad wear profile
WO2017033280A1 (en) * 2015-08-25 2017-03-02 株式会社クリスタル光学 Grinding tool and grinding tool manufacturing method
CN108188945B (en) * 2018-03-12 2023-08-01 桂林创源金刚石有限公司 Slice tooth split type diamond grinding wheel and manufacturing method

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Publication number Priority date Publication date Assignee Title
US342943A (en) * 1886-06-01 Process of and apparatus for making felt boots
US1622942A (en) * 1923-01-17 1927-03-29 Elroy A Chase Buffing wheel
US1926321A (en) * 1930-10-10 1933-09-12 Turek Johann Grinding wheel
FR1104941A (en) * 1954-05-19 1955-11-25 Development of grinding wheels, in particular diamond wheels
FR2203301A5 (en) * 1972-10-18 1974-05-10 Lam Plan Sa
USRE27962E (en) * 1973-03-05 1974-04-02 Abrasive disc
US3921342A (en) * 1973-12-17 1975-11-25 Spitfire Tool & Machine Co Inc Lap plate
JPS6013789B2 (en) * 1975-07-01 1985-04-09 イプレツツ エス．エイ． Composite plate polishing tool
US4037367A (en) * 1975-12-22 1977-07-26 Kruse James A Grinding tool
JPS5894965A (en) * 1981-11-30 1983-06-06 Yoshiaki Hagiuda Composite lapping tool
US4581853A (en) * 1982-02-01 1986-04-15 Marcus Ralph S Apparatus for internal finishing of metal parts

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DE68902131T2 (en) 1993-01-14
ATE78205T1 (en) 1992-08-15
KR900007550A (en) 1990-06-01
IE893728L (en) 1990-05-22
FR2639278A1 (en) 1990-05-25
KR0150779B1 (en) 1998-10-15
CA2003381C (en) 1999-07-13
DE68902131D1 (en) 1992-08-20
FR2639278B1 (en) 1991-01-11
CA2003381A1 (en) 1990-05-22
DK169061B1 (en) 1994-08-08
DK584189D0 (en) 1989-11-21
DK584189A (en) 1990-05-23
HUT53001A (en) 1990-09-28
IE62270B1 (en) 1995-01-11
JPH02262957A (en) 1990-10-25
EP0370843A1 (en) 1990-05-30
US5022191A (en) 1991-06-11
ES2033542T3 (en) 1993-03-16
HU895835D0 (en) 1990-01-28
GR3005624T3 (en) 1993-06-07

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