EP1131186B1 - Lapping and polishing device - Google Patents
Lapping and polishing device Download PDFInfo
- Publication number
- EP1131186B1 EP1131186B1 EP99956065A EP99956065A EP1131186B1 EP 1131186 B1 EP1131186 B1 EP 1131186B1 EP 99956065 A EP99956065 A EP 99956065A EP 99956065 A EP99956065 A EP 99956065A EP 1131186 B1 EP1131186 B1 EP 1131186B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- partitions
- disc
- polishing
- lapping
- hollow portions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 43
- 238000005192 partition Methods 0.000 claims abstract description 67
- 239000000725 suspension Substances 0.000 claims abstract description 23
- 229910052751 metal Inorganic materials 0.000 claims abstract description 9
- 239000002184 metal Substances 0.000 claims abstract description 9
- 239000004744 fabric Substances 0.000 claims description 12
- 239000000843 powder Substances 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 7
- 229920005989 resin Polymers 0.000 claims description 7
- 239000011347 resin Substances 0.000 claims description 7
- 229920003002 synthetic resin Polymers 0.000 claims description 7
- 239000000057 synthetic resin Substances 0.000 claims description 7
- 239000006061 abrasive grain Substances 0.000 claims description 6
- 239000000919 ceramic Substances 0.000 claims description 5
- 229910003460 diamond Inorganic materials 0.000 claims description 3
- 239000010432 diamond Substances 0.000 claims description 3
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 239000004411 aluminium Substances 0.000 claims 1
- 238000003780 insertion Methods 0.000 claims 1
- 230000037431 insertion Effects 0.000 claims 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 1
- 239000000463 material Substances 0.000 description 19
- 238000005259 measurement Methods 0.000 description 10
- 239000002245 particle Substances 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 210000001519 tissue Anatomy 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical class [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 229940082150 encore Drugs 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229920000297 Rayon Polymers 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- -1 especially metallic Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 238000005088 metallography Methods 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/12—Lapping plates for working plane surfaces
- B24B37/16—Lapping plates for working plane surfaces characterised by the shape of the lapping plate surface, e.g. grooved
Definitions
- the invention relates, according to a first of its aspects, to a polishing or lapping device comprising a surface selectively rotated around an axis of revolution and on which parts to be polished are intended to be applied, with the interposition of a abrasive suspension and with a certain pressure, this surface comprising a plurality of recessed parts forming, for the abrasive suspension, reservoirs which are independent of each other and the parties in hollow being delimited by partitions whose walls in cooperation with the abrasive suspension, form the active areas for lapping or polishing.
- Devices of this type can in particular be presented in the form of a disc or a cylinder.
- EP-0 370 843 describes a polishing plate having a flat surface to which are exposed soft parts and hard parts. These tender parts and hard are distributed appropriately to adjust the length of the intervals between the hard parts.
- the partitions delimiting the abrasive suspension tanks have a different height depending on whether they are open or closed, side walls of these partitions form with the walls upper walls of these partitions at a right angle, and tanks and partitions are distributed so irregular both in a radial direction and in a tangential direction.
- the invention aims to overcome these drawbacks by proposing a lapping or polishing device, the manufacturing is simplified and whose yield is increases.
- the device of the invention is characterized in that the partitions have a substantially constant height over the entire said surface of the device, before using this one, in that the hollow parts are delimited by side walls forming with the walls greater than an angle less than 90 °, and in that the recessed parts and the partitions are distributed so regular on each circle centered on the axis of revolution.
- the ratio between the smallest thickness of said partitions and the largest dimension of the parts intaglio is between approximately 1: 3 and 1: 6 and, from preferably 1: 5.
- the depth of the recesses or the partition height is between 0.05 and 15 millimeters and, in particular, between 0.05 and 10 millimeters.
- the thickness of the upper walls of the partitions is advantageously between 0.5 and 15 mm.
- the angle between the side walls and the top wall of a partition is advantageously greater than or equal to 75 °.
- the recessed parts and the partitions are preferably evenly distributed throughout said device surface.
- the surface of the walls upper partitions advantageously increases since the edge of the disc toward the center of the disc.
- the lapping or polishing device according to the invention preferably consists of at least one resin synthetic mixed with at least one powder, in particular with metal or ceramic base.
- Abrasive grains in particular based on aluminum oxides, silicon carbides or natural diamond or synthetic, can be mixed with said resin.
- partitions define shapes geometric type polygonal or rounded.
- its surface corresponds to relief in positive or negative of a taffeta type fabric or satin.
- the mold consists of the negative reproduction of a grid and a plate obstructing it.
- the mold has a surface whose relief is that of a taffeta or satin type fabric or its negative.
- Figure 1 shows an embodiment of the device lapping or polishing according to the invention which is presented in the form of a disc, the flat surface of which comprises a plurality of recessed parts 1 which are delimited between them by partitions 2.
- the parts in hollow 1 here have substantially the shape of a square, the recessed parts being regularly distributed over the disk surface according to the invention.
- This disc is intended to be used with a suspension abrasive which is sprayed over the entire surface of the disc. To perform lapping or polishing, the disc is rotated and the parts to be polished are applied to its surface, with a certain pressure.
- the recessed parts 1 form a plurality of tanks for the abrasive suspension.
- the partitions 2 are defined by a wall upper 20 and two side walls 21 and 22.
- These partitions 2 have a height h which is regular over the entire surface of the disc and this, to ensure regular lapping or polishing of the parts to be polished.
- This depth h also defines the depth of each hollow part or tank 1.
- this height h is advantageously between approximately 0.05 and 15 millimeters and preferably between 0.05 and 10 millimeters.
- the parties in troughs actually act as reservoirs, while allowing the passage of part of the suspension abrasive on the upper walls of partitions 2, in while using the disc.
- the thickness of the partitions 2 or the z dimension of the upper face 20 of the partitions are between 0.5 and 15 millimeters, this to contribute to the efficiency of material removal, when using the disc according to the invention.
- the ratio between the thickness z partitions 2 and the x or y side of the hollow parts 1 is advantageously between approximately 1: 3 and 1: 6 and that this ratio is notably equal to 1: 5.
- the draft angle ⁇ , between the upper wall 20 of the partition 2 and a side wall 21 or 22 is less than 90 °. This is due the fact that the device according to the invention is advantageously obtained by molding as will be seen in the rest of the description.
- this angle is not less than 75 °, so that the active surface of the disc, consisting of all the upper walls partitions 2, is not significantly changed when the disc undergoes wear, after use extended.
- the invention is of course not limited to the form of recessed parts 1 and partitions 2 which is illustrated on the figures.
- the recessed parts 1 may have a shape any geometric, in particular polygonal and for example rectangular or hexagonal, or a rounded shape, such as a round or oval shape.
- the surface of the lapping or polishing device according to the invention can also correspond to the relief in negative or positive of a fabric, in particular of the satin type or taffeta.
- the negative relief of these fabrics defines parts in hollow forming reservoirs for the abrasive solution and raised parts forming partitions between the tanks.
- the size of the tanks depends on the dimension of the threads of the fabric as well as the armor of this latest.
- Figures 8 and 9 illustrate respectively a fabric of the taffeta type and a fabric of the satin type.
- the elements in relief 18 respectively 19 will form the reservoirs of the device according to the invention and the hollow elements 28 respectively 29, the partitions of these measures.
- FIGS. 6 and 7 illustrate alternative embodiments of the device according to the invention, also in the form of a disk.
- the recessed portions 16 have the shape of an equilateral triangle and they are delimited by partitions 26.
- the smallest dimension of the tanks 16, corresponding to the height of the triangle, is indicated by x and the largest dimension of the tanks, corresponding to one side of the triangle, by y. So, this is the z / y ratio which is advantageously between approximately 1: 3 and 1: 6.
- the recessed portions 17 have an oval or elliptical shape and are demarcated by partitions 27.
- the smallest dimension of the tanks 17 is indicated by x, corresponding to the minor axis of the ellipse, and the largest dimension of the tanks by y, corresponding to the major axis of the ellipse.
- the smaller thickness of the partitions 27 is indicated by z. In this case again, it is the z / y ratio which is advantageously between approximately 1: 3 and 1: 6.
- the invention is also not limited to a device for lapping or polishing in the form of a disc with a flat surface.
- the disc may have a concave surface or convex.
- the device can also be present in the form of a cylinder, the active surface of polishing or lapping being formed by the surface outer surface or the inner surface of the cylinder.
- the device according to the invention is a surface of revolution whose axis of revolution is the axis of rotation of the device on the lapping machine or polishing on which it is used.
- the recessed parts and the partitions are evenly distributed over any curve defining a plane perpendicular to the axis of revolution of the device and all points of which are equidistant from the axis of revolution.
- the hollow parts and the partitions are evenly distributed over the entire surface of the device which is intended to receive parts to be polished.
- the hollow parts and the partitions are distributed evenly on any circle of any radius.
- Figure 10 shows a disc of lapping or polishing according to the invention, the parts of which in the hollow have the shape of a trapezoid.
- recessed parts are distributed in seven circles concentric. All recessed parts 100, 101, 102, 104, 105, 106 respectively defining a circle of the same radius, have the same shape and the same dimensions. On the other hand, from one circle to another, these hollow parts have a different shape and dimensions.
- the surface of the upper walls of the partitions or the thickness of the partitions is greater at the level of the center of the disc only towards its edge.
- the surface tanks may be smaller towards the center of the disc only at its edge.
- FIGS. 4 and 5 reference is made to FIGS. 4 and 5.
- Figure 4 shows in plan, a detail of a variant of realization of the device illustrated in figures 1 to 3.
- FIG. 4 shows a particular distribution of the parts recessed and partitions according to a diameter of the device according to the invention, in the form of a disc.
- the right part of Figure 4 corresponds to an area of the disc closer to the center of the disc, while the left part of this figure corresponds to an area more close to the edge of the disc.
- the thickness zb of the partition 24b between the hollow parts 14c and 14b is therefore greater than the thickness za of the partition 24a between the hollow parts 14b and 14a.
- the side xc of the hollow part 14c is lower than the side xb of the recessed portion 14b which is itself lower than the side xa of the hollow part 14a.
- the thickness of the partitions is more important towards the center of the disc than towards the edge, the dimensions of the hollow parts being substantially identical.
- the device according to the invention is advantageously obtained by molding a material consisting of a pure metal or another composite metal, i.e. at least one resin synthetic mixed with at least one solid powder, in particular metallic or also based on ceramics.
- the mold has the shape of the desired counterpart, so to obtain the recessed parts and the desired partitions. So practically a mold will have domes, each dome representing a tank.
- the mold may consist of the negative reproduction of a grid whose voids represent the partitions and which is associated with a plate which obstructs it.
- this mold is advantageous when the partitions of the device according to the invention, which constitute its active part, must be made of a material relatively expensive. Indeed, with this mold, the bottom of tanks can then be realized separately in another any material.
- a mold used to make a device according to the invention can also be in the form of a stamped plate on which the tanks are reproduced.
- This mold may also have a surface whose relief is that of a taffeta or satin type fabric (see Figures 8 and 9) or the relief in negative of such tissue.
- a device according to the invention is used in combination with an abrasive suspension which is sprayed on its surface.
- This spraying supplies each reservoir with the surface of the device.
- the parts distribute the abrasive suspension on the surface of the device.
- the cleaning of the devices according to the invention is carried out periodically and manually, the abraded material largely depositing in tanks.
- test conditions are as follows:
- the tests are carried out with three samples, the dimensions are 10 x 20 millimeters, type 316 LS, coated in a resin and having a final diameter of 40 millimeters.
- Lapping is carried out in six cycles of 10 minutes each.
- Material removal is measured at the end of each cycle by measuring the difference in weight. The measurements are data in milligrams.
- the abrasive film is no longer regular and it is necessary to stop machine for cleaning the plate, lapping or polishing cannot be achieved.
- the roughness of the samples obtained after polishing on the two discs was measured with a roughness tester at MAHR PERTHEN type probe.
- the measurements carried out showed that the total roughness, or Rt, is 1.2 microns with the blue New Lam disc and 0.9 micron with the disc according to the invention.
- the average roughness, or Ra is 0.11 micron with the blue New Lam disc and 0.08 micron with the disc according to the invention.
- the disc according to the invention makes it possible to obtain a state which is improved by around 30%.
- the pieces lapped have an average roughness Ra of less than 0.10 micron.
- the disc according to the invention described above provides parts whose average roughness Ra is effectively less than 0.10 micron which is not the case for parts run in with the New Lam blue disc previously described.
- the lapping or polishing device makes it possible to reduce the running-in time or polishing compared to conventional discs, obtaining a similar roughness.
- the disc according to the invention allows a lot greater maneuverability when running in manually.
- the device according to the invention could be obtained by molding a material consisting of pure metal or composite metal, i.e. a mixture of at least one synthetic resin and minus a solid, especially metallic, powder.
- the material used to make the lapping device or polishing according to the invention can be unique. we can also plan to make the device according to the invention from two or more different materials, in the case where one wishes to obtain on the surface of the device with different hardness zones.
- a first constituent material of device according to the invention can be a mixture of resin polyester and a metallic powder
- a second constituent material may be a mixture of polyurethane resin and another metallic powder
- the material of the device according to the invention may include abrasive grains, in particular based on aluminum oxides, silicon carbides, or still natural or synthetic diamond.
- the device according to the invention can be in the form of a fixed sheet of removably on a support of suitable shape, by any suitable means.
- the device according to the invention can also form in one piece the active surface for abrasion and its support.
Abstract
Description
L'invention concerne, selon un premier de ses aspects, un dispositif de polissage ou de rodage comportant une surface sélectivement mise en rotation autour d'un axe de révolution et sur laquelle des pièces à polir sont destinées à être appliquées, avec interposition d'une suspension abrasive et avec une certaine pression, cette surface comprenant une pluralité de parties en creux formant, pour la suspension abrasive, des réservoirs qui sont indépendants les uns des autres et les parties en creux étant délimitées par des cloisons dont les parois supérieures, en coopération avec la suspension abrasive, forment les zones actives pour le rodage ou le polissage.The invention relates, according to a first of its aspects, to a polishing or lapping device comprising a surface selectively rotated around an axis of revolution and on which parts to be polished are intended to be applied, with the interposition of a abrasive suspension and with a certain pressure, this surface comprising a plurality of recessed parts forming, for the abrasive suspension, reservoirs which are independent of each other and the parties in hollow being delimited by partitions whose walls in cooperation with the abrasive suspension, form the active areas for lapping or polishing.
Les dispositifs de ce type peuvent notamment se présenter sous la forme d'un disque ou encore d'un cylindre.Devices of this type can in particular be presented in the form of a disc or a cylinder.
Le document. EP-0 370 843 décrit un plateau de polissage présentant une surface plane à laquelle affleurent des parties tendres et des parties dures. Ces parties tendres et dures sont réparties de manière appropriée pour ajuster la longueur des intervalles entre les parties dures.The document. EP-0 370 843 describes a polishing plate having a flat surface to which are exposed soft parts and hard parts. These tender parts and hard are distributed appropriately to adjust the length of the intervals between the hard parts.
Ceci permet d'augmenter de façon importante le rendement du plateau de polissage, c'est-à-dire la quantité de matière enlevée par unité de temps.This significantly increases the yield of the polishing pad, i.e. the amount of material removed per unit of time.
Cependant, il reste que la fabrication de ce plateau est relativement complexe.However, the fact remains that the manufacture of this tray is relatively complex.
Un dispositif du type précédemment défini est décrit dans le brevet US 5 297 364.A device of the previously defined type is described in U.S. Patent 5,297,364.
Selon l'enseignement de ce brevet antérieur, les cloisons délimitant les réservoirs de la suspension abrasive ont une hauteur différente selon qu'ils sont ouverts ou fermés, les parois latérales de ces cloisons forment avec les parois parois supérieures de ces cloisons un angle droit, et les réservoirs et les cloisons sont répartis de façon irrégulière à la fois suivant une direction radiale et suivant une direction tangentielle.According to the teaching of this earlier patent, the partitions delimiting the abrasive suspension tanks have a different height depending on whether they are open or closed, side walls of these partitions form with the walls upper walls of these partitions at a right angle, and tanks and partitions are distributed so irregular both in a radial direction and in a tangential direction.
Cependant, l'efficacité de ce dispositif reste limitée.However, the effectiveness of this device remains limited.
L'invention a pour but de pallier ces inconvénients en proposant un dispositif de rodage ou de polissage dont la fabrication est simplifiée et dont le rendement est augmenté.The invention aims to overcome these drawbacks by proposing a lapping or polishing device, the manufacturing is simplified and whose yield is increases.
A cette fin, le dispositif de l'invention, par ailleurs conforme à la définition générique qu'en donne le préambule ci-dessus, est caractérisé en ce que les cloisons présentent une hauteur sensiblement constante sur toute ladite surface du dispositif, avant utilisation de celui-ci, en ce que les parties en creux sont délimitées par des parois latérales formant avec les parois supérieures un angle inférieur à 90°, et en ce que les parties en creux et les cloisons sont réparties de façon régulière sur chaque cercle centré sur l'axe de révolution.To this end, the device of the invention, moreover conforms to the generic definition given in the preamble above, is characterized in that the partitions have a substantially constant height over the entire said surface of the device, before using this one, in that the hollow parts are delimited by side walls forming with the walls greater than an angle less than 90 °, and in that the recessed parts and the partitions are distributed so regular on each circle centered on the axis of revolution.
De préférence, le rapport entre la plus petite épaisseur desdites cloisons et la plus grande dimension des parties en creux est compris entre environ 1:3 et 1:6 et, de préférence, égal à 1:5.Preferably, the ratio between the smallest thickness of said partitions and the largest dimension of the parts intaglio is between approximately 1: 3 and 1: 6 and, from preferably 1: 5.
De façon préférée, la profondeur des parties en creux ou la hauteur des cloisons est comprise entre 0,05 et 15 millimètres et, notamment, entre 0,05 et 10 millimètres.Preferably, the depth of the recesses or the partition height is between 0.05 and 15 millimeters and, in particular, between 0.05 and 10 millimeters.
De plus, l'épaisseur des parois supérieures des cloisons est avantageusement comprise entre 0,5 et 15 mm.In addition, the thickness of the upper walls of the partitions is advantageously between 0.5 and 15 mm.
L'angle entre les parois latérales et la paroi supérieure d'une cloison est avantageusement supérieur ou égal à 75°. The angle between the side walls and the top wall of a partition is advantageously greater than or equal to 75 °.
Pour assurer un polissage ou un rodage régulier des pièces à polir, les parties en creux et les cloisons sont de préférence réparties de façon régulière sur toute ladite surface du dispositif.To ensure regular polishing or running-in of parts to be polished, the recessed parts and the partitions are preferably evenly distributed throughout said device surface.
Pour un dispositif de rodage ou de polissage se présentant sous la forme d'un disque, la surface des parois supérieures des cloisons augmente avantageusement depuis le bord du disque vers le centre du disque.For a lapping or polishing device that presents itself in the form of a disc, the surface of the walls upper partitions advantageously increases since the edge of the disc toward the center of the disc.
Le dispositif de rodage ou de polissage selon l'invention est de préférence constitué d'au moins une résine synthétique mélangée avec au moins une poudre, notamment à base de métal ou de céramiques.The lapping or polishing device according to the invention preferably consists of at least one resin synthetic mixed with at least one powder, in particular with metal or ceramic base.
Des grains abrasifs, notamment à base d'oxydes d'aluminium, de carbures de silicium ou de diamant naturel ou synthétique, peuvent être mélangés à ladite résine.Abrasive grains, in particular based on aluminum oxides, silicon carbides or natural diamond or synthetic, can be mixed with said resin.
Dans un mode de réalisation du dispositif selon l'invention, les cloisons définissent des formes géométriques du type polygonales ou arrondies.In one embodiment of the device according to the invention, partitions define shapes geometric type polygonal or rounded.
Dans un autre mode de réalisation du dispositif de rodage ou de polissage selon l'invention, sa surface correspond au relief en positif ou en négatif d'un tissu du type taffetas ou satin.In another embodiment of the lapping device or polishing according to the invention, its surface corresponds to relief in positive or negative of a taffeta type fabric or satin.
L'invention concerne, selon un second de ses aspects, un procédé d'obtention d'un dispositif de polissage ou de rodage tel que précédemment défini, ce procédé étant caractérisé en ce qu'il consiste :
- à verser, dans un moule de forme appropriée, un mélange d'au moins une résine synthétique et au moins une poudre, notamment à base de métal ou de céramiques, comportant éventuellement des grains abrasifs,
- à laisser durcir ledit mélange et
- à procéder au démoulage.
- pouring, into a mold of suitable shape, a mixture of at least one synthetic resin and at least one powder, in particular based on metal or ceramics, optionally comprising abrasive grains,
- allowing said mixture to harden and
- to demold.
Dans un exemple de mise en oeuvre du procédé, le moule consiste en la reproduction en négatif d'une grille et en une plaque l'obstruant.In an example of implementation of the method, the mold consists of the negative reproduction of a grid and a plate obstructing it.
Dans un autre exemple de mise en oeuvre du procédé, le moule présente une surface dont le relief est celui d'un tissu du type taffetas ou satin ou son négatif.In another example of implementation of the method, the mold has a surface whose relief is that of a taffeta or satin type fabric or its negative.
L'invention sera mieux comprise et d'autres buts, avantages et caractéristiques de celle-ci apparaítront plus clairement à la lecture de la description qui suit et qui est faite en relation avec les dessins annexés, sur lesquels :
- la figure 1 est une vue en plan d'un exemple de réalisation d'un dispositif de rodage ou de polissage selon l'invention, se présentant sous la forme d'un disque ;
- la figure 2 est un détail de la figure 1 ;
- la figure 3 est une vue en coupe selon III-III de la figure 2 ;
- la figure 4 est une vue de détail en plan d'une variante de réalisation du dispositif illustré aux figures 1 à 3 ;
- la figure 5 est une vue en coupe selon V-V de la figure 4 ;
- la figure 6 est une vue de détail en plan d'un autre exemple de réalisation du dispositif selon l'invention ;
- la figure 7 est une vue de détail en plan d'encore un autre exemple de réalisation du dispositif selon l'invention ;
- la figure 8 est une photographie d'un tissu du type taffetas, vu en plan, à une échelle de 200 µm ;
- la figure 9 est une vue photographie d'un tissu du type satin, vu en plan à une échelle de 400µm ;
- la figure 10 est une vue en plan d'un autre exemple de réalisation d'un dispositif selon l'invention, se présentant sous la forme d'un disque.
- Figure 1 is a plan view of an embodiment of a lapping or polishing device according to the invention, in the form of a disc;
- Figure 2 is a detail of Figure 1;
- Figure 3 is a sectional view along III-III of Figure 2;
- Figure 4 is a detailed plan view of an alternative embodiment of the device illustrated in Figures 1 to 3;
- Figure 5 is a sectional view along VV of Figure 4;
- Figure 6 is a detailed plan view of another embodiment of the device according to the invention;
- Figure 7 is a detailed plan view of yet another embodiment of the device according to the invention;
- FIG. 8 is a photograph of a fabric of the taffeta type, seen in plan, on a scale of 200 μm;
- FIG. 9 is a photographic view of a fabric of the satin type, seen in plan on a scale of 400 μm;
- Figure 10 is a plan view of another embodiment of a device according to the invention, in the form of a disc.
La figure 1 montre un exemple de réalisation du dispositif
de rodage ou polissage selon l'invention qui se présente
sous la forme d'un disque dont la surface plane comprend
une pluralité de parties en creux 1 qui sont délimitées
entre elles par des cloisons 2.Figure 1 shows an embodiment of the device
lapping or polishing according to the invention which is presented
in the form of a disc, the flat surface of which comprises
a plurality of recessed parts 1 which are delimited
between them by
Comme le montre plus précisément la figure 2, les parties en creux 1 présentent ici sensiblement la forme d'un carré, les parties en creux étant régulièrement réparties sur la surface du disque selon l'invention.As shown more precisely in Figure 2, the parts in hollow 1 here have substantially the shape of a square, the recessed parts being regularly distributed over the disk surface according to the invention.
Ce disque est destiné à être utilisé avec une suspension abrasive qui est pulvérisée sur la totalité de la surface du disque. Pour réaliser le rodage ou le polissage, le disque est entraíné en rotation et les pièces à polir sont appliquées sur sa surface, avec une certaine pression.This disc is intended to be used with a suspension abrasive which is sprayed over the entire surface of the disc. To perform lapping or polishing, the disc is rotated and the parts to be polished are applied to its surface, with a certain pressure.
Ainsi, les parties en creux 1 forment une pluralité de réservoirs pour la suspension abrasive.Thus, the recessed parts 1 form a plurality of tanks for the abrasive suspension.
Ces réservoirs sont indépendants les uns des autres,
puisque chaque réservoir est délimité par des cloisons 2.
En cours d'utilisation du disque selon l'invention, la
suspension abrasive, préalablement pulvérisée dans chaque
réservoir, en est régulièrement extraite.These tanks are independent of each other,
since each tank is delimited by
Par ailleurs, les cloisons 2 sont définies par une paroi
supérieure 20 et deux parois latérales 21 et 22.Furthermore, the
Ce sont les parois supérieures 20 des cloisons 2 qui, en
coopération avec la suspension abrasive pulvérisée sur le
disque, forment les zones actives du disque pour le rodage
ou le polissage.These are the
Ces cloisons 2 présentent une hauteur h qui est
régulière sur toute la surface du disque et
ceci, pour assurer un rodage ou un polissage régulier des
pièces à polir.These
Cette profondeur h définit également la profondeur de chaque partie en creux ou réservoir 1.This depth h also defines the depth of each hollow part or tank 1.
Les travaux effectués ont montré que cette hauteur h est
avantageusement comprise entre environ 0,05 et 15
millimètres et, de préférence, entre 0,05 et 10
millimètres. Dans cette gamme de valeurs, les parties en
creux jouent effectivement le rôle de réservoirs, tout en
permettant le passage d'une partie de la suspension
abrasive sur les parois supérieures des cloisons 2, en
cours d'utilisation du disque.The work carried out has shown that this height h is
advantageously between approximately 0.05 and 15
millimeters and preferably between 0.05 and 10
millimeters. In this range of values, the parties in
troughs actually act as reservoirs, while
allowing the passage of part of the suspension
abrasive on the upper walls of
Par ailleurs, il est avantageux que l'épaisseur des
cloisons 2 ou encore la dimension z de la face supérieure
20 des cloisons soient comprises entre 0,5 et 15
millimètres, ceci pour contribuer à l'efficacité de
l'enlèvement de matière, lors de l'utilisation du disque
selon l'invention.Furthermore, it is advantageous that the thickness of the
Il a également été établi que le rapport entre l'épaisseur
z des cloisons 2 et le côté x ou y des parties en creux 1
est avantageusement compris entre environ 1:3 et 1:6 et que
ce rapport est notamment égal à 1:5.It has also been established that the ratio between the
Par ailleurs, l'angle de dépouille
α, entre la paroi supérieure 20 de la cloison 2 et une
paroi latérale 21 ou 22 soit inférieur à 90°. Ceci est dû
au fait que le dispositif selon l'invention est
avantageusement obtenu par moulage comme on le verra dans
la suite de la description.Furthermore, the draft angle
α, between the
Par ailleurs, il est préférable que cet angle ne soit pas
inférieur à 75°, de façon à ce que la surface active du
disque, constituée par l'ensemble des parois supérieures
des cloisons 2, ne soit pas modifiée de façon sensible
lorsque le disque subit une usure, après une utilisation
prolongée.Furthermore, it is preferable that this angle is not
less than 75 °, so that the active surface of the
disc, consisting of all the
De plus, lorsque l'angle α est supérieur à 75°, on a pu constater que l'évacuation de la suspension abrasive et de la matière abrasée est facilitée.In addition, when the angle α is greater than 75 °, it has been possible note that the evacuation of the abrasive suspension and the abraded material is facilitated.
L'invention n'est bien sûr pas limitée à la forme des
parties en creux 1 et des cloisons 2 qui est illustrée sur
les figures.The invention is of course not limited to the form of
recessed parts 1 and
Les parties en creux 1 peuvent présenter une forme géométrique quelconque, notamment polygonale et par exemple rectangulaire ou hexagonale, ou encore une forme arrondie, telle qu'une forme ronde ou ovale.The recessed parts 1 may have a shape any geometric, in particular polygonal and for example rectangular or hexagonal, or a rounded shape, such as a round or oval shape.
La surface du dispositif de rodage ou de polissage selon l'invention peut également correspondre au relief en négatif ou en positif d'un tissu, notamment du type satin ou taffetas.The surface of the lapping or polishing device according to the invention can also correspond to the relief in negative or positive of a fabric, in particular of the satin type or taffeta.
Le relief en négatif de ces tissus définit des parties en creux formant des réservoirs pour la solution abrasive et des parties en relief formant des cloisons entre les réservoirs. La dimension des réservoirs dépend de la dimension des fils du tissu ainsi que de l'armure de ce dernier.The negative relief of these fabrics defines parts in hollow forming reservoirs for the abrasive solution and raised parts forming partitions between the tanks. The size of the tanks depends on the dimension of the threads of the fabric as well as the armor of this latest.
On se réfère aux figures 8 et 9 qui illustrent
respectivement un tissu du type taffetas et un tissu du
type satin. Les éléments en relief 18 respectivement 19
formeront les réservoirs du dispositif selon l'invention et
les éléments en creux 28 respectivement 29, les cloisons de
ce dispositif.We refer to Figures 8 and 9 which illustrate
respectively a fabric of the taffeta type and a fabric of the
satin type. The elements in
Il en est de même pour le relief en positif de ces mêmes tissus.It is the same for the positive relief of these same tissue.
Les gammes de valeurs qui ont été données précédemment pour l'épaisseur de la paroi, la profondeur des réservoirs, l'angle de dépouille des cloisons ainsi que le rapport entre l'épaisseur de la paroi et les dimensions des parties en creux sont applicables à toutes formes de parties en creux et de cloisons, en se basant sur la profondeur moyenne des réservoirs, la plus petite épaisseur des cloisons et la plus grande dimension des parties en creux.The ranges of values that were previously given for the thickness of the wall, the depth of the tanks, the clearance angle of the partitions as well as the ratio between the thickness of the wall and the dimensions of the parts in hollow are applicable to all forms of parts in hollow and bulkheads, based on depth average of the tanks, the smallest thickness of partitions and the largest dimension of the hollow parts.
Ceci va maintenant être illustré au regard des figures 6 et 7 qui illustrent des variantes de réalisation du dispositif selon l'invention, se présentant encore sous la forme d'un disque.This will now be illustrated with reference to FIGS. 6 and 7 which illustrate alternative embodiments of the device according to the invention, also in the form of a disk.
En référence à la figure 6, les parties en creux 16
présentent la forme d'un triangle équilatère et elles sont
délimitées par des cloisons 26.Referring to Figure 6, the recessed
Dans cet exemple, la plus petite dimension des réservoirs
16, correspondant à la hauteur du triangle, est indiquée
par x et la plus grande dimension des réservoirs,
correspondant à un côté du triangle, par y. Ainsi, c'est le
rapport z/y qui est compris avantageusement entre environ
1:3 et 1:6. In this example, the smallest dimension of the
En référence à la figure 7, les parties en creux 17
présentent une forme ovale ou en ellipse et elles sont
délimitées par des cloisons 27.Referring to Figure 7, the recessed
Dans cet exemple, la plus petite dimension des réservoirs
17 est indiquée par x, correspondant au petit axe de
l'ellipse, et la plus grande dimension des réservoirs par
y, correspondant au grand axe de l'ellipse. De plus, la
plus petite épaisseur des cloisons 27 est indiquée par z.
Dans ce cas encore, c'est le rapport z/y qui est
avantageusement compris entre environ 1:3 et 1:6.In this example, the smallest dimension of the
L'invention n'est pas non plus limitée à un dispositif de rodage ou de polissage présentant la forme d'un disque avec une surface plane.The invention is also not limited to a device for lapping or polishing in the form of a disc with a flat surface.
Ainsi, le disque peut présenter une surface concave ou convexe. Par ailleurs, le dispositif peut également se présenter sous la forme d'un cylindre, la surface active de polissage ou de rodage étant constituée par la surface externe ou la surface interne du cylindre.Thus, the disc may have a concave surface or convex. Furthermore, the device can also be present in the form of a cylinder, the active surface of polishing or lapping being formed by the surface outer surface or the inner surface of the cylinder.
De façon générale, le dispositif selon l'invention est une surface de révolution dont l'axe de révolution est l'axe de rotation du dispositif sur la machine de rodage ou de polissage sur laquelle il est utilisé.In general, the device according to the invention is a surface of revolution whose axis of revolution is the axis of rotation of the device on the lapping machine or polishing on which it is used.
Pour que le polissage ou le rodage soit régulier, les parties en creux et les cloisons sont réparties de façon régulière sur toute courbe définissant un plan perpendiculaire à l'axe de révolution du dispositif et dont tous les points sont équidistants de l'axe de révolution.For regular polishing or lapping, the recessed parts and the partitions are evenly distributed over any curve defining a plane perpendicular to the axis of revolution of the device and all points of which are equidistant from the axis of revolution.
Ainsi, pour un dispositif de rodage ou de polissage selon l'invention de forme cylindrique, les parties en creux et les cloisons sont réparties de façon régulière sur toute la surface du dispositif qui est destinée à recevoir des pièces à polir.Thus, for a lapping or polishing device according to the invention of cylindrical shape, the hollow parts and the partitions are evenly distributed over the entire surface of the device which is intended to receive parts to be polished.
Pour un dispositif se présentant sous la forme d'un disque, les parties en creux et les cloisons sont réparties de façon régulière sur tout cercle d'un rayon quelconque.For a device in the form of a disc, the hollow parts and the partitions are distributed evenly on any circle of any radius.
Ceci est illustré par la figure 10 qui montre un disque de rodage ou de polissage selon l'invention dont les parties en creux présentent la forme d'un trapèze.This is illustrated in Figure 10 which shows a disc of lapping or polishing according to the invention, the parts of which in the hollow have the shape of a trapezoid.
Ces parties en creux sont réparties selon sept cercles
concentriques. Toutes les parties en creux 100, 101, 102,
104, 105, 106 respectivement définissant un cercle de même
rayon, présentent la même forme et les mêmes dimensions.
Par contre, d'un cercle à l'autre, ces parties en creux
présentent une forme et des dimensions différentes.These recessed parts are distributed in seven circles
concentric. All recessed
Lorsque le dispositif selon l'invention se présente sous la forme d'un disque, son usure, lors d'une utilisation prolongée, est plus importante au centre du disque que sur le bord de celui-ci.When the device according to the invention is presented under the shape of a disc, its wear, when in use is longer in the center of the disc than on the edge of it.
Ainsi, pour diminuer l'écart d'usure entre le centre et le bord d'un disque selon l'invention, il est souhaitable que la surface des parois supérieures des cloisons ou encore l'épaisseur des cloisons soit plus importante au niveau du centre du disque que vers son bord. Dans ce cas, la surface des réservoirs peut être moins importante vers le centre du disque qu'au niveau de son bord. On peut ainsi prévoir que la surface des parois supérieures des cloisons augmente depuis le bord du disque vers le centre du disque et ceci, de façon régulière selon un diamètre du disque.To reduce the wear gap between the center and the edge of a disc according to the invention, it is desirable that the surface of the upper walls of the partitions or the thickness of the partitions is greater at the level of the center of the disc only towards its edge. In this case, the surface tanks may be smaller towards the center of the disc only at its edge. We can thus foresee that the surface of the upper walls of the partitions increases from the edge of the disc to the center of the disc and this, evenly along a diameter of the disc.
A cet égard, on se réfère aux figures 4 et 5.In this regard, reference is made to FIGS. 4 and 5.
La figure 4 montre en plan, un détail d'une variante de réalisation du dispositif illustré aux figures 1 à 3. Figure 4 shows in plan, a detail of a variant of realization of the device illustrated in figures 1 to 3.
Ce détail montre une répartition particulière des parties en creux et des cloisons selon un diamètre du dispositif selon l'invention, se présentant sous la forme d'un disque. La partie droite de la figure 4 correspond à une zone du disque plus proche du centre du disque, tandis que la partie gauche de cette figure correspond à une zone plus proche du bord du disque.This detail shows a particular distribution of the parts recessed and partitions according to a diameter of the device according to the invention, in the form of a disc. The right part of Figure 4 corresponds to an area of the disc closer to the center of the disc, while the left part of this figure corresponds to an area more close to the edge of the disc.
Ainsi, avec cette répartition, les dimensions des parties en creux en forme de carré vont en diminuant de puis le bord du disque vers le centre du disque, tandis que l'épaisseur des cloisons entre les parties en creux va en augmentant depuis le bord du disque vers le centre du disque.So, with this distribution, the dimensions of the parts in hollow in the shape of a square decreasing by then the edge of the disc toward the center of the disc, while the thickness of the partitions between the hollow parts goes increasing from the edge of the disc towards the center of the disk.
L'épaisseur zb de la cloison 24b entre les parties en creux
14c et 14b est donc supérieure à l'épaisseur za de la
cloison 24a entre les parties en creux 14b et 14a.The thickness zb of the
Dans l'exemple illustré, le côté xc de la partie en creux
14c est inférieur au côté xb de la partie en creux 14b qui
est lui-même inférieur au côté xa de la partie en creux
14a.In the example illustrated, the side xc of the hollow part
14c is lower than the side xb of the recessed
Cependant, pour compenser l'usure du disque entre le bord et le centre, il suffit que l'épaisseur des cloisons soit plus importante vers le centre du disque que vers le bord, les dimensions des parties en creux étant sensiblement identiques.However, to compensate for disc wear between the edge and the center, it is enough that the thickness of the partitions is more important towards the center of the disc than towards the edge, the dimensions of the hollow parts being substantially identical.
Le dispositif selon l'invention est avantageusement obtenu par moulage d'une matière constituée par un métal pur ou encore un métal composite, c'est-à-dire au moins une résine synthétique mélangée avec au moins une poudre solide, notamment métallique ou encore à base de céramiques. The device according to the invention is advantageously obtained by molding a material consisting of a pure metal or another composite metal, i.e. at least one resin synthetic mixed with at least one solid powder, in particular metallic or also based on ceramics.
Dans ce cas, on peut notamment utiliser une résine du type polyuréthanne ou polyester et des poudres métalliques du type fer, cuivre, plomb, étain, zinc, aluminium ou encore inox.In this case, it is possible in particular to use a resin of the type polyurethane or polyester and metallic powders iron, copper, lead, tin, zinc, aluminum or even stainless steel.
Le moule présente la forme de la contrepartie désirée, afin d'obtenir les parties en creux et les cloisons souhaitées. Ainsi, pratiquement, un moule comportera des dômes, chaque dôme représentant un réservoir.The mold has the shape of the desired counterpart, so to obtain the recessed parts and the desired partitions. So practically a mold will have domes, each dome representing a tank.
Le moule peut consister en la reproduction en négatif d'une grille dont les vides représentent les cloisons et à laquelle est associée une plaque qui l'obstrue.The mold may consist of the negative reproduction of a grid whose voids represent the partitions and which is associated with a plate which obstructs it.
L'utilisation de ce moule est avantageuse lorsque les cloisons du dispositif selon l'invention, qui constituent sa partie active, doivent être réalisées en un matériau relativement onéreux. En effet, avec ce moule, le fond des réservoirs peut alors être réalisé séparément en une autre matière quelconque.The use of this mold is advantageous when the partitions of the device according to the invention, which constitute its active part, must be made of a material relatively expensive. Indeed, with this mold, the bottom of tanks can then be realized separately in another any material.
Un moule utilisé pour réaliser un dispositif selon l'invention peut également se présenter sous la forme d'une plaque estampée sur laquelle les réservoirs sont reproduits.A mold used to make a device according to the invention can also be in the form of a stamped plate on which the tanks are reproduced.
Ce moule peut encore présenter une surface dont le relief est celui d'un tissu du type taffetas ou satin (voir les figures 8 et 9) ou encore le relief en négatif d'un tel tissu.This mold may also have a surface whose relief is that of a taffeta or satin type fabric (see Figures 8 and 9) or the relief in negative of such tissue.
Les essais qui ont été effectués ont montré que les dispositifs de rodage ou de polissage selon l'invention présentent des avantages importants par rapport aux dispositifs connus dans l'état de la technique. The tests that have been carried out have shown that the lapping or polishing devices according to the invention have significant advantages over devices known in the state of the art.
Comme indiqué plus haut, un dispositif selon l'invention est utilisé en association avec une suspension abrasive qui est pulvérisée sur sa surface.As indicated above, a device according to the invention is used in combination with an abrasive suspension which is sprayed on its surface.
Cette pulvérisation permet d'alimenter chaque réservoir de la surface du dispositif.This spraying supplies each reservoir with the surface of the device.
Lors du rodage ou du polissage lui-même, c'est-à-dire lorsque des pièces à polir ou à roder sont appliquées sur le dispositif selon l'invention, les pièces répartissent la suspension abrasive sur la surface du dispositif.During lapping or polishing itself, i.e. when parts to be polished or lapped are applied to the device according to the invention, the parts distribute the abrasive suspension on the surface of the device.
Les essais effectués ont montré que, pour des dispositifs selon l'invention, la répartition de la suspension abrasive est pratiquement immédiate.Tests have shown that for devices according to the invention, the distribution of the abrasive suspension is practically immediate.
Le nettoyage des dispositifs selon l'invention est réalisé périodiquement et de façon manuelle, la matière abrasée se déposant en grande partie dans les réservoirs.The cleaning of the devices according to the invention is carried out periodically and manually, the abraded material largely depositing in tanks.
Par ailleurs, des essais comparatifs ont été effectués entre :
- un disque commercialisé par la société demanderesse sous la dénomination "New Lam", du type disque bleu pour ébauche et conforme aux enseignements du brevet européen N° 0 370 848. Ce disque comporte donc une surface plane avec des parties dures, ici réalisées avec une résine synthétique et des particules de fer dont la granulométrie est inférieure à 50 microns et des parties tendres réalisées avec la même résine synthétique mélangées avec des particules de cuivre dont la granulométrie est inférieure à 20 microns,
- et un disque conforme à l'invention obtenu par moulage d'une matière constituée de la même résine synthétique que le disque New Lam décrit ci-dessus, mélangée avec des particules de fer dont la granulométrie est inférieure à 40 microns. La surface de ce disque selon l'invention comporte une pluralité de parties en creux présentant la forme de carrés dont les côtés x, y sont égaux à 3 millimètres, ces carrés étant séparés par des cloisons dont l'épaisseur z est de 0.6 millimètres. De plus, la hauteur h des cloisons ou encore la profondeur des parties en creux est de 0.43 millimètres, tandis que l'angle α entre la face supérieure et une paroi latérale de chaque cloison est égal à 80°. Par ailleurs, la répartition des parties en creux et des cloisons est régulière sur toute la surface du disque.
- a disc marketed by the applicant company under the name "New Lam", of the blue disc type for roughing and in accordance with the teachings of European patent No. 0 370 848. This disc therefore has a flat surface with hard parts, here produced with a synthetic resin and iron particles with a particle size less than 50 microns and soft parts made with the same synthetic resin mixed with copper particles with a particle size less than 20 microns,
- and a disc according to the invention obtained by molding a material made of the same synthetic resin as the New Lam disc described above, mixed with iron particles whose particle size is less than 40 microns. The surface of this disc according to the invention comprises a plurality of hollow parts having the shape of squares whose sides x, y are equal to 3 millimeters, these squares being separated by partitions whose thickness z is 0.6 millimeters. In addition, the height h of the partitions or the depth of the hollow parts is 0.43 millimeters, while the angle α between the upper face and a side wall of each partition is equal to 80 °. Furthermore, the distribution of the recessed parts and the partitions is regular over the entire surface of the disc.
Les conditions des essais sont les suivantes :The test conditions are as follows:
On utilise une machine de métallographie dont le plateau présente un diamètre de 200 millimètres, correspondant au diamètre du disque selon l'invention et du disque New Lam bleu décrits ci-dessus. Le plateau de la machine tourne à une vitesse de 150 t/mn.We use a metallography machine whose plate has a diameter of 200 millimeters, corresponding to the diameter of the disc according to the invention and of the New Lam disc blue described above. The machine table turns a speed of 150 rpm.
Les essais sont effectués avec trois échantillons dont les dimensions sont de 10 x 20 millimètres, du type 316 LS, enrobés dans une résine et présentant un diamètre final de 40 millimètres.The tests are carried out with three samples, the dimensions are 10 x 20 millimeters, type 316 LS, coated in a resin and having a final diameter of 40 millimeters.
Ces trois échantillons sont placés dans un porte-échantillons et lors du rodage, la pression appliquée est de 9.5 kg.These three samples are placed in a sample holder and during running-in, the pressure applied is from 9.5 kg.
Le rodage est effectué selon six cycles de- 10 minutes chacun.Lapping is carried out in six cycles of 10 minutes each.
L'enlèvement de matière est mesuré à la fin de chaque cycle en mesurant la différence de poids. Les mesures sont données en milligrammes.Material removal is measured at the end of each cycle by measuring the difference in weight. The measurements are data in milligrams.
Deux types d'essai ont été effectués :
- dans l'essai A, chaque plateau a été nettoyé à l'issue de chaque cycle de 10 minutes,
- dans l'essai B, les plateaux ne sont pas nettoyés entre les cycles.
cycle
10 minutes
(Nettoyage plateau entre chaque cycle)
(sans nettoyage plateau entre cycle )
standard
l'invention
standard
l'invention
- in test A, each tray was cleaned at the end of each 10-minute cycle,
- in test B, the plates are not cleaned between cycles.
cycle
10 minutes
(Plate cleaning between each cycle)
(without tray cleaning between cycles)
standard
the invention
standard
the invention
Les résultats obtenus montrent que le rendement du disque selon l'invention, c'est-à-dire la quantité de matière enlevée par unité de temps, est trois fois supérieur à celui du disque New Lam bleu utilisé pour les essais.The results obtained show that the performance of the disc according to the invention, that is to say the amount of material removed per unit of time, is three times greater than that of the blue New Lam disc used for the tests.
Ainsi, ces essais montrent que le disque selon l'invention permet d'augmenter de façon importante le rendement de polissage ou de rodage.Thus, these tests show that the disc according to the invention significantly increases the yield of polishing or lapping.
Les raisons suivantes peuvent être avancées pour expliquer que le dispositif selon l'invention permet d'obtenir un enlèvement de matière plus important, par rapport à un disque du type décrit dans le brevet EP-0 370 843, sans que celles-ci limitent la portée de l'invention : The following reasons can be put forward to explain that the device according to the invention makes it possible to obtain a more material removal, compared to a disc of the type described in patent EP-0 370 843, without these limit the scope of the invention:
Pour un disque du type décrit dans le brevet EP-0 370 843, toute la surface du disque constitue une surface de contact avec la pièce à polir. Au contraire, dans un disque selon l'invention, seules les faces supérieures des cloisons peuvent être en contact avec la pièce à polir.For a disc of the type described in patent EP-0 370 843, the entire surface of the disc constitutes a contact surface with the piece to be polished. On the contrary, in a disc according to the invention, only the upper faces of the partitions may be in contact with the workpiece.
Dans la mesure où la pièce à polir est appliquée, quel que soit le disque, avec la même pression, la pression au niveau des surfaces actives sera plus importante pour un disque selon l'invention que pour un disque du type décrit dans le brevet EP-0 370 843.Cette pression plus importante au niveau des surfaces actives contribue à augmenter l'enlèvement de matière.As long as the workpiece is applied, whatever either the disc, with the same pressure, the pressure at level of active surfaces will be more important for a disc according to the invention only for a disc of the type described in patent EP-0 370 843. This higher pressure at the active surfaces contributes to increase removal of material.
On peut également considérer que, pour le dispositif de rodage ou de polissage selon l'invention, la présence de parties en creux et de cloisons crée une accélération des particules abrasives présentes dans la suspension abrasive, entre les parties en creux formant des réservoirs et la partie supérieure des cloisons constituant une surface active pour le rodage.We can also consider that, for the lapping or polishing according to the invention, the presence of recessed parts and partitions creates an acceleration of abrasive particles present in the abrasive suspension, between the hollow parts forming reservoirs and the upper part of the partitions constituting a surface active for running in.
On peut à cet égard considérer que, dans la mesure où la surface de la pièce à polir ou à roder est plus importante que la surface des réservoirs, l'application de la pièce à polir sur le dispositif crée un phénomène de succion qui permet d'aspirer la suspension abrasive présente dans les réservoirs.In this respect, it can be considered that, insofar as the larger surface of the workpiece to be polished or lapped that the surface of the tanks, applying the part to polishing on the device creates a suction phenomenon which sucks the abrasive suspension present in the tanks.
Ces essais montrent également que le dispositif selon l'invention peut être utilisé sans qu'il soit nécessaire de le nettoyer entre chaque cycle de rodage ou de polissage, ce qui constitue un gain de temps important lors des opérations de rodage ou de polissage.These tests also show that the device according to the invention can be used without the need to clean it between each running-in or polishing cycle, which is a significant time saver during lapping or polishing operations.
Au contraire, pour le disque New Lam bleu, l'absence de nettoyage entraíne une dégradation du film abrasif. Cette dégradation est indiquée en grisé sur le tableau. Elle apparaít dès le quatrième cycle de rodage ou polissage.On the contrary, for the blue New Lam disc, the absence of cleaning results in degradation of the abrasive film. This degradation is indicated in gray on the table. She appears from the fourth running-in or polishing cycle.
En effet, à partir du quatrième cycle, le film abrasif n'est plus régulier et il est nécessaire d'arrêter la machine pour nettoyer le plateau, le rodage ou le polissage ne pouvant être réalisé.Indeed, from the fourth cycle, the abrasive film is no longer regular and it is necessary to stop machine for cleaning the plate, lapping or polishing cannot be achieved.
Des essais complémentaires ont été réalisés pour mesurer la régularité de la surface des échantillons, après les six cycles de rodage.Additional tests were carried out to measure the regularity of the surface of the samples, after the six running-in cycles.
La rugosité des échantillons obtenus après polissage sur les deux disques a été mesurée avec un rugosimètre à palpeur du type MAHR PERTHEN.The roughness of the samples obtained after polishing on the two discs was measured with a roughness tester at MAHR PERTHEN type probe.
Les mesures effectuées ont montré que la rugosité totale, ou Rt, est de 1.2 microns avec le disque New Lam bleu et de 0.9 micron avec le disque selon l'invention.The measurements carried out showed that the total roughness, or Rt, is 1.2 microns with the blue New Lam disc and 0.9 micron with the disc according to the invention.
Par ailleurs, la rugosité moyenne, ou Ra, est de 0.11 micron avec le disque New Lam bleu et de 0.08 micron avec le disque selon l'invention.Furthermore, the average roughness, or Ra, is 0.11 micron with the blue New Lam disc and 0.08 micron with the disc according to the invention.
Ainsi, le disque selon l'invention permet d'obtenir un état de surface qui est amélioré d'environ 30 %.Thus, the disc according to the invention makes it possible to obtain a state which is improved by around 30%.
Les échantillons rodés avec chacun des disques décrits ci-dessus ont également fait l'objet d'un contrôle de surface avec un microscope optique Leitz.Lapped samples with each of the discs described above were also subject to a surface inspection with a Leitz light microscope.
On a encore pu constater que les échantillons rodés avec le disque selon l'invention présentaient une surface dont la régularité est améliorée par rapport aux échantillons rodés avec le disque New Lam bleu précédemment décrit. We have also seen that the samples run in with the disc according to the invention had a surface whose regularity is improved compared to ground samples with the previously described blue New Lam disc.
Les résultats qui précèdent relatifs à la rugosité mettent en évidence un autre avantage des dispositifs de rodage ou de polissage selon l'invention.The above results relating to roughness show another advantage of lapping devices or polishing according to the invention.
En effet, de façon générale, on souhaite que les pièces rodées présentent une rugosité moyenne Ra inférieure à 0.10 micron.Indeed, in general, we want the pieces lapped have an average roughness Ra of less than 0.10 micron.
Avec un nombre de cycles de rodage déterminé et une suspension abrasive donnée, le disque selon l'invention décrit ci-dessus permet d'obtenir des pièces dont la rugosité moyenne Ra est effectivement inférieure à 0.10 micron ce qui n'est pas le cas des pièces rodées avec le disque New Lam bleu précédemment décrit.With a determined number of running-in cycles and a abrasive suspension given, the disc according to the invention described above provides parts whose average roughness Ra is effectively less than 0.10 micron which is not the case for parts run in with the New Lam blue disc previously described.
Ainsi, pour obtenir des pièces rodées dont la rugosité moyenne Ra est inférieure à 0.10 micron, avec le disque New Lam bleu, il sera nécessaire d'utiliser une suspension abrasive dont les grains abrasifs présentent une granulométrie inférieure à celle utilisée dans les essais précédents. En conséquence, le temps de rodage sera nécessairement plus long.Thus, to obtain lapped parts whose roughness Ra average is less than 0.10 micron, with the New disk Blue lam, it will be necessary to use a suspension abrasive whose abrasive grains have a particle size smaller than that used in the tests precedents. Consequently, the running-in time will be necessarily longer.
Ainsi, le dispositif de rodage ou de polissage selon l'invention permet de réduire le temps de rodage ou de polissage par rapport aux disques classiques, en obtenant une rugosité similaire.Thus, the lapping or polishing device according to the invention makes it possible to reduce the running-in time or polishing compared to conventional discs, obtaining a similar roughness.
De plus, le disque selon l'invention permet une beaucoup plus grande maniabilité, lorsque le rodage est effectué manuellement.In addition, the disc according to the invention allows a lot greater maneuverability when running in manually.
Un autre essai comparatif a été effectué pour mesurer l'usure des deux disques décrits ci-dessus.Another comparative test was carried out to measure the wear of the two discs described above.
Ces mesures ont été effectuées après deux heures de rodage. These measurements were taken after two hours of running-in.
Pour chaque plateau, une double mesure a été effectuée en trois points différents répartis selon le rayon de chaque disque :
- un point proche du centre du disque,
- un point situé à mi-rayon et
- un point proche de la périphérie du disque.
- a point near the center of the disc,
- a point located at mid-radius and
- a point close to the periphery of the disc.
Les mesures ont été effectuées à l'aide d'un micromètre et chaque résultat est la moyenne de deux mesures.The measurements were made using a micrometer and each result is the average of two measurements.
Ces mesures ont été confirmées, pour le disque selon l'invention, par une mesure, réalisée au microscope, de la différence de niveau entre le fond d'une partie en creux ou réservoir et la face supérieure d'une cloison ou surface de rodage.These measurements have been confirmed, for the disc according to the invention, by a measurement, carried out under a microscope, of the difference in level between the bottom of a recessed part or tank and the upper face of a partition or surface of lapping.
L'ensemble des résultats obtenus sont rassemblés dans le
tableau ci-dessous, les mesures étant données en microns.
Les résultats rapportés dans ce tableau montrent que le disque selon l'invention permet d'améliorer d'environ 10 % la résistance à l'usure, par rapport à un disque du type décrit dans le brevet EP-0 370 843. The results reported in this table show that the disc according to the invention improves by about 10% resistance to wear, compared to a disc of the type described in patent EP-0 370 843.
Il a été précédemment indiqué que le dispositif selon l'invention pouvait être obtenu par moulage d'une matière constituée par du métal pur ou du métal composite, c'est-à-dire un mélange d'au moins une résine synthétique et d'au moins une poudre solide, notamment métallique.It was previously indicated that the device according to the invention could be obtained by molding a material consisting of pure metal or composite metal, i.e. a mixture of at least one synthetic resin and minus a solid, especially metallic, powder.
La matière utilisée pour réaliser le dispositif de rodage ou de polissage selon l'invention peut être unique. on peut également prévoir de réaliser le dispositif selon l'invention à partir de deux matières ou plus différentes, dans le cas où l'on souhaite obtenir sur la surface du dispositif des zones de dureté différentes.The material used to make the lapping device or polishing according to the invention can be unique. we can also plan to make the device according to the invention from two or more different materials, in the case where one wishes to obtain on the surface of the device with different hardness zones.
A titre d'exemple, une première matière constitutive du dispositif selon l'invention peut être un mélange de résine polyester et d'une poudre métallique, tandis qu'une deuxième matière constitutive peut être un mélange de résine polyuréthanne et d'une autre poudre métallique.For example, a first constituent material of device according to the invention can be a mixture of resin polyester and a metallic powder, while a second constituent material may be a mixture of polyurethane resin and another metallic powder.
De plus, la matière constitutive du dispositif selon l'invention peut comporter des grains abrasifs, notamment à base d'oxydes d'aluminium, de carbures de silicium, ou encore de diamant naturel ou synthétique.In addition, the material of the device according to the invention may include abrasive grains, in particular based on aluminum oxides, silicon carbides, or still natural or synthetic diamond.
On peut enfin noter que le dispositif selon l'invention peut se présenter sous la forme d'une feuille fixée de manière amovible sur un support de forme appropriée, par tous moyens convenables. Le dispositif selon l'invention peut également former en une pièce la surface active pour l'abrasion et son support.Finally, it can be noted that the device according to the invention can be in the form of a fixed sheet of removably on a support of suitable shape, by any suitable means. The device according to the invention can also form in one piece the active surface for abrasion and its support.
L'invention n'est bien sûr pas limitée aux différents modes de réalisation qui viennent d'être décrits et elle comprend tous leurs équivalents techniques, ainsi que leurs combinaisons si celles-ci entrent dans le cadre des revendications. The invention is of course not limited to the different modes of realization which have just been described and it includes all their technical equivalents, as well as their combinations if these fall within the scope of claims.
Enfin, les signes de références insérés après les caractéristiques techniques figurant dans les revendications ont pour seul but de faciliter la compréhension de ces dernières et ne saurait en limiter la portée.Finally, the reference signs inserted after the technical characteristics appearing in the claims are intended only to facilitate the understanding of these and cannot limit their scope.
Claims (14)
- Polishing or lapping device comprising a surface selectively set in rotation around an axis of revolution and on which elements to be polished are to be applied with the insertion of an abrasive suspension and with a certain pressure, said surface comprising a plurality of hollow portions (1, 16, 17) forming for the abrasive suspension independent tanks, the hollow portions (1, 16, 17) being delimited by partitions (2, 26, 27) whose upper walls (20) together with the abrasive suspension form the active zones for lapping or polishing, characterised in that the partitions (2, 26, 27) have an approximately constant height on the entire said surface of the device before the latter is used, in that the hollow portions are delimited by lateral walls (21, 22) forming with the upper walls (20) an angle (α) less than 90°, and in that the hollow portions (1, 16, 17) and the partitions (2, 26, 27) are distributed evenly on each circle centered on the axis of revolution.
- Device according to claim 1, characterised in that the ratio between the smallest thickness (z) of said partitions (2, 26, 27) and the largest dimension (y) of said hollow portions (1, 16, 17) is between 1 : 3 and 1 : 6 and preferably equal to 1 : 5 .
- Device according to claim 1 or 2, characterised in that the depth of the hollow portions (1, 16, 17) or the height (h) of the partitions (2, 5, 27) is between 0.05 and 15 millimetres and preferably between 0.05 and 10 millimetres.
- Device according to one of claims 1 to 3, characterised in that the thickness (z) of the upper walls (20) of the partitions (2, 26, 27) is between 0.5 and 15 millimetres.
- Device according to one of claims 1 to 4, characterised in that the angle (α) between the lateral walls (21, 22) and the upper wall (20) of a partition (2, 26, 27) is greater than or equal to 75°.
- Device according to one of claims 1 to 5, characterised in that said hollow portions and said partitions are evenly distributed over the entire said surface of the device.
- Device according to one of the preceding claims, characterised in that it has the shape of a disk, and in that the surface of the upper walls of said partitions (24a, 24b) increases from the edge towards the centre of the disk.
- Device according to one of claims 1 to 7, characterised in that it is constituted by at least one synthetic resin mixed with at least one powder, especially a metal or ceramic-based powder.
- Device according to claim 8, characterised in that abrasive grains, in particular oxide aluminium, silicon carbide or natural or synthetic diamond-based grains are mixed with said resin.
- Device according to one of claims 1 to 9, characterised in that said partitions (2, 26, 27) define polygonal or rounded type geometrical shapes.
- Device according to one of claims 1 to 9, characterised in that said surface corresponds to the positive or negative relief of a taffeta or satin type fabric.
- Method for obtaining a polishing or lapping device according to one of the claims 1 to 11, which consists of :pouring into a suitably-shaped mould a mixture of at least one synthetic resin and at least one power, especially a ceramic or metal-based powder, possibly comprising abrasive grains,allowing said mixture to harden, andremoval from the mould.
- Method according to claim 12, characterised in that said mould consists of the negative reproduction of a grate and a plate obstructing it.
- Method according to claim 13, characterised in that said mould has a surface whose relief is that of a satin of taffeta type fabric or its negative.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9814563A FR2786118B1 (en) | 1998-11-19 | 1998-11-19 | LAPPING OR POLISHING DEVICE |
FR9814563 | 1998-11-19 | ||
PCT/FR1999/002817 WO2000030806A1 (en) | 1998-11-19 | 1999-11-17 | Lapping and polishing device |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1131186A1 EP1131186A1 (en) | 2001-09-12 |
EP1131186B1 true EP1131186B1 (en) | 2002-10-30 |
Family
ID=9532934
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP99956065A Expired - Lifetime EP1131186B1 (en) | 1998-11-19 | 1999-11-17 | Lapping and polishing device |
Country Status (7)
Country | Link |
---|---|
US (1) | US6837780B1 (en) |
EP (1) | EP1131186B1 (en) |
AT (1) | ATE226868T1 (en) |
DE (1) | DE69903748T2 (en) |
DK (1) | DK1131186T3 (en) |
FR (1) | FR2786118B1 (en) |
WO (1) | WO2000030806A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ITMC20070237A1 (en) * | 2007-12-12 | 2009-06-13 | Ghines Srl | PERFECTED ABRASIVE TOOL. |
JP6188286B2 (en) * | 2012-07-13 | 2017-08-30 | スリーエム イノベイティブ プロパティズ カンパニー | Polishing pad and glass, ceramics, and metal material polishing method |
JP7165719B2 (en) * | 2017-08-04 | 2022-11-04 | スリーエム イノベイティブ プロパティズ カンパニー | Microreplicated polished surface with improved flatness |
DE102017216033A1 (en) * | 2017-09-12 | 2019-03-14 | Carl Zeiss Smt Gmbh | Method for processing a workpiece in the manufacture of an optical element |
USD1004393S1 (en) * | 2021-11-09 | 2023-11-14 | Ehwa Diamond Industrial Co., Ltd. | Grinding pad |
USD1000928S1 (en) * | 2022-06-03 | 2023-10-10 | Beng Youl Cho | Polishing pad |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2043501B (en) * | 1979-02-28 | 1982-11-24 | Interface Developments Ltd | Abrading member |
US4866886A (en) * | 1987-11-23 | 1989-09-19 | Magnetic Peripherals Inc. | Textured lapping plate and process for its manufacture |
FR2639278B1 (en) | 1988-11-22 | 1991-01-11 | Lam Plan Sa | POLISHING TRAY |
US5020283A (en) * | 1990-01-22 | 1991-06-04 | Micron Technology, Inc. | Polishing pad with uniform abrasion |
US5441598A (en) * | 1993-12-16 | 1995-08-15 | Motorola, Inc. | Polishing pad for chemical-mechanical polishing of a semiconductor substrate |
US5888119A (en) * | 1997-03-07 | 1999-03-30 | Minnesota Mining And Manufacturing Company | Method for providing a clear surface finish on glass |
FR2761289B1 (en) * | 1997-03-25 | 1999-05-21 | Lam Plan Sa | DEFORMABLE POLISHING TOOL |
US5882251A (en) * | 1997-08-19 | 1999-03-16 | Lsi Logic Corporation | Chemical mechanical polishing pad slurry distribution grooves |
US6206759B1 (en) * | 1998-11-30 | 2001-03-27 | Micron Technology, Inc. | Polishing pads and planarizing machines for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods for making and using such pads and machines |
US6217426B1 (en) * | 1999-04-06 | 2001-04-17 | Applied Materials, Inc. | CMP polishing pad |
US6238273B1 (en) * | 1999-08-31 | 2001-05-29 | Micron Technology, Inc. | Methods for predicting polishing parameters of polishing pads and methods and machines for planarizing microelectronic substrate assemblies in mechanical or chemical-mechanical planarization |
US6328632B1 (en) * | 1999-08-31 | 2001-12-11 | Micron Technology, Inc. | Polishing pads and planarizing machines for mechanical and/or chemical-mechanical planarization of microelectronic substrate assemblies |
US6439986B1 (en) * | 1999-10-12 | 2002-08-27 | Hunatech Co., Ltd. | Conditioner for polishing pad and method for manufacturing the same |
-
1998
- 1998-11-19 FR FR9814563A patent/FR2786118B1/en not_active Expired - Lifetime
-
1999
- 1999-11-17 US US09/831,865 patent/US6837780B1/en not_active Expired - Lifetime
- 1999-11-17 AT AT99956065T patent/ATE226868T1/en not_active IP Right Cessation
- 1999-11-17 DE DE69903748T patent/DE69903748T2/en not_active Expired - Lifetime
- 1999-11-17 WO PCT/FR1999/002817 patent/WO2000030806A1/en active IP Right Grant
- 1999-11-17 EP EP99956065A patent/EP1131186B1/en not_active Expired - Lifetime
- 1999-11-17 DK DK99956065T patent/DK1131186T3/en active
Also Published As
Publication number | Publication date |
---|---|
EP1131186A1 (en) | 2001-09-12 |
FR2786118B1 (en) | 2000-12-22 |
DE69903748D1 (en) | 2002-12-05 |
WO2000030806A1 (en) | 2000-06-02 |
DE69903748T2 (en) | 2003-07-24 |
DK1131186T3 (en) | 2003-01-20 |
ATE226868T1 (en) | 2002-11-15 |
US6837780B1 (en) | 2005-01-04 |
FR2786118A1 (en) | 2000-05-26 |
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