EP0080407B1 - Verfahren und Vorrichtung zum Entfernen von Schichten von Gegenständen - Google Patents
Verfahren und Vorrichtung zum Entfernen von Schichten von Gegenständen Download PDFInfo
- Publication number
- EP0080407B1 EP0080407B1 EP82402096A EP82402096A EP0080407B1 EP 0080407 B1 EP0080407 B1 EP 0080407B1 EP 82402096 A EP82402096 A EP 82402096A EP 82402096 A EP82402096 A EP 82402096A EP 0080407 B1 EP0080407 B1 EP 0080407B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- container
- inert gas
- stripping
- inert
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 17
- 238000000034 method Methods 0.000 title claims description 31
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 40
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 19
- 239000000203 mixture Substances 0.000 claims abstract description 18
- 230000008719 thickening Effects 0.000 claims abstract description 18
- 239000011248 coating agent Substances 0.000 claims abstract description 14
- 238000009833 condensation Methods 0.000 claims abstract description 9
- 230000005494 condensation Effects 0.000 claims abstract description 9
- 238000001816 cooling Methods 0.000 claims abstract description 5
- 239000011261 inert gas Substances 0.000 claims description 41
- 239000007788 liquid Substances 0.000 claims description 16
- 238000009434 installation Methods 0.000 claims description 13
- 239000007789 gas Substances 0.000 claims description 12
- 238000001035 drying Methods 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 238000001704 evaporation Methods 0.000 claims description 4
- 230000008020 evaporation Effects 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims 1
- 239000003507 refrigerant Substances 0.000 claims 1
- 238000009834 vaporization Methods 0.000 claims 1
- 230000008016 vaporization Effects 0.000 claims 1
- 239000002904 solvent Substances 0.000 abstract description 35
- 239000002966 varnish Substances 0.000 abstract description 7
- 238000004140 cleaning Methods 0.000 abstract 1
- 239000003973 paint Substances 0.000 abstract 1
- 239000011877 solvent mixture Substances 0.000 abstract 1
- 238000005554 pickling Methods 0.000 description 22
- 239000003795 chemical substances by application Substances 0.000 description 6
- 238000000926 separation method Methods 0.000 description 4
- 238000004880 explosion Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 238000003303 reheating Methods 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/04—Apparatus
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
- B08B7/0092—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by cooling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44D—PAINTING OR ARTISTIC DRAWING, NOT OTHERWISE PROVIDED FOR; PRESERVING PAINTINGS; SURFACE TREATMENT TO OBTAIN SPECIAL ARTISTIC SURFACE EFFECTS OR FINISHES
- B44D3/00—Accessories or implements for use in connection with painting or artistic drawing, not otherwise provided for; Methods or devices for colour determination, selection, or synthesis, e.g. use of colour tables
- B44D3/16—Implements or apparatus for removing dry paint from surfaces, e.g. by scraping, by burning
Definitions
- the invention relates to a method and an installation for pickling objects provided with a coating, of the type described in the preambles of claims 1 and 9.
- the pickling liquid for example benzine
- the pickling liquid is sprayed on the objects to be stripped, in order to degrease them.
- the pickling liquid, mixed with the dissolved grease, is collected in a vase placed below the treatment tank, and pure pickling liquid is recovered from this mixture by distillation.
- an atmosphere consisting of a mixture of air and vapors of the treatment liquid prevails in the treatment tank.
- heated inert gas is introduced into the tank. The gas leaving the tank is cooled, and the condensate, essentially consisting of the treatment liquid, is separated and returned to the distillation vessel.
- the object of the invention is to provide a stripping process which does not involve any significant risk of fire, even if flammable or explosive stripping agents are used, and which does not lead to any significant pollution of the environment, any minimizing the loss of pickling agent.
- the removal of the layers takes place with a solvent which is known per se but, according to the invention, the process has therefore takes place under an inert atmosphere. This avoids any risk of fire or explosion when stripping the coating.
- the inert gas can be discharged into the atmosphere, possibly passing through an appropriate separation device, without novice substances being entrained.
- the inert gas used in the layer removal process is also used for the separation of the solvent and the material forming the protective coating.
- the inert gas evacuates the vaporized solvent and carries it to condensation in an appropriate device. The separated solvent can then be reused in the operating process, the use of polluting and expensive chemicals being therefore kept within very low limits during the implementation of the process.
- the solvent When the solvent is separated from the solvent-coating material mixture, an appropriate concentration of this mixture can be obtained in order to make it reusable. This is for example the case of removing the varnish.
- the varnish mixed in the solvent can be reused with the desired concentration for a new varnishing process, for obtaining pigments, etc. In this way, it is avoided to direct it on a particular discharge and the disadvantage which results for the environment is removed.
- nitrogen is used as inert gas.
- nitrogen can be used particularly favorably in the process which is the subject of the invention.
- the gas escaping from the bath is cooled by heat exchange with the inert gas which is introduced. If, for example, nitrogen gas is removed from a pressure tank containing liquid nitrogen, the temperature of the nitrogen gas drops, because the heat of evaporation is removed. If the nitrogen which is introduced by heat exchange is now heated, this leads to cooling of the nitrogen-vapor mixture of the solvent. Thereby the solvent vapor can condense and the liquid condensate can be collected while pure nitrogen escapes into the atmosphere.
- the pickled objects are still impregnated with solvent.
- inert gas is used to separate the solvent from the coating material.
- the tank into which the solvent-coating material mixture is pumped can be reheated is lying. If nitrogen is used as the inert gas and the usual solvent, reheating involves a temperature of around 60 ° C.
- the inert gas used for the evaporation and condensation of the solvent is preferably kept in a closed circuit, the quantity of inert gas required being thereby reduced to a minimum.
- the product circulating in the circuit will preferably be made inert by means of an inert gas.
- the process which is the subject of the invention is characterized by optimal reuse of the raw materials used. With very low operating costs, there is no production of waste. The quantities of products emitted with the process which is the subject of the invention are clearly below the authorities' recommendations. The amounts of energy necessary for implementing the process which is the subject of the invention are very low. Due to the handling of the solvent, which takes place only in an inert atmosphere, work safety is clearly better than average, the danger of fire and explosion being greatly reduced. The influences exerted on workstations with regard to noise and other nuisances are minimal. Finally, the process which is the subject of the invention can be largely automated.
- An installation according to the invention of the type comprising at least one reservoir intended to receive the objects, which can be hermetically closed and which can be connected to an inert gas reservoir via a supply pipe and a shut-off valve, a tank of pickling product connected to the tank, and a condensing device intended to separate the pickling liquid from the inert gas during drying, is characterized in that the condensing device comprises a heat exchanger followed by a separator, the inert gas tank containing this gas in cryogenic form and being connected to the tank via this exchanger.
- the installation which is the subject of the invention makes it possible to render the pickling tank inert before it is filled with solvent and drying of the pickled objects when the solvent-coating material mixture is removed. Between these stages of the process, shut-off valves are closed, which makes it possible to maintain at a relatively small value the quantity of inert gas necessary for such a process. Leakage of inert gas to the atmosphere, in particular during the drying phase, does not represent any disorder for the environment, since appropriate precautions make it possible to separate the solvent which is contained therein in the form of vapor.
- Two tanks, 10 and 11, hermetically closed by a cover 12 or 13, are provided.
- the tanks 10 and 11 can be connected to a nitrogen tank 16, via the supply lines 14 and 15, and stop valves V3 or V4.
- the outlet of the nitrogen tank 16 can be closed directly using a shut-off valve V1.
- the tanks 10 and 11 can be connected to the atmosphere by means of the valves V6 or V5, a pipe 17, an exchanger 18, a separator 19 and a pipe 20.
- In the exchanger 18 is a coil 21, which constitutes a part of the supply line 14.
- the tanks 10 and 11 are pickling tanks which are further equipped with ultrasonic generators, as indicated in 22 or 23.
- the tanks 10 and 11 can be connected to a solvent tank 27 by means of a pump 24, pipes 25 or 26 and valves V9 and V10.
- the tanks 10 and 11 can be connected to a thickening tank 31 by means of shut-off valves V8 and V7, lines 28 or 29 and a pump 30.
- the supply line 32 to the tank d thickening 31 is provided with a heating device 33.
- a fan 35 is arranged on an evacuation pipe 34, coming from the thickening tank 31. From the blowing side of the fan 35, the pipe 34 is directed towards the input of a recuperator 36, one of the outputs of which is connected to the evaporator 38 of a refrigeration unit designated, in general, by 39, by means of a pipe 37.
- An outlet pipe 40 of the evaporator 38 is connected to a separator 41.
- a line 42 leaving the separator 41 passes through the recuperator 36 and is connected to the line 32, upstream of the heating device 33.
- the line 14 is connected to the line 42 or 32, by via a line 43 and a valve V2.
- the separators 19 and 41 are provided with outlet pipes 44 or 45 which lead to a collecting pipe 46 which includes a pump 47 and which is connected to the solvent tank 27.
- a pipe 48 comprising a valve V11 is connected to the thickening tank 31.
- the stripping procedure then begins with the help of ultrasound.
- valve V2 is opened, which makes it possible to render the condensation circuit consisting of the heating device 33, the thickening tank 31, the recuperator 36, the evaporator 38, the inert separator 41 as well as corresponding pipes.
- valve V2 When a predetermined oxygen concentration is reached, the valve V2 is closed again. The heater 33 is turned on until a predetermined temperature is reached.
- valve V8 opens and the pump 30 transports the mixture consisting of dissolved varnish and solvent into the thickening tank 31.
- the mixture is designated by 46 .
- valves V3 and V6 open.
- the stream of nitrogen passing through the tank 10 dries the pickled parts.
- the solvent-nitrogen vapor mixture passes through the exchanger 18.
- the purified nitrogen escapes into the atmosphere through line 20.
- the solvent coming from the separator 19 enters the solvent tank 27 via line 44 and using the pump 47.
- the thickening phase takes place as follows in the tank 31.
- the tempered nitrogen evaporates at a temperature of for example 60 ° C part of the solvent in the thickening tank 31.
- the gaseous mixture of solvent and d nitrogen undergoes preliminary cooling in the recuperator 36 via the fan 35 and is sent to the evaporator 38 where the solvent vapor condenses.
- the separator 41 the solvent and the nitrogen are separated.
- the nitrogen is again reheated in the recuperator 36 and is brought into the heating device 33 to the desirable temperature for its introduction into the thickening tank 31.
- the thickening phase lasts until the desirable viscosity of the varnish is reached.
- the valve V11 opens so that the varnish can be transferred to suitable containers via the line 48.
Claims (15)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT82402096T ATE18741T1 (de) | 1981-11-19 | 1982-11-17 | Verfahren und vorrichtung zum entfernen von schichten von gegenstaenden. |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3145815 | 1981-11-19 | ||
DE3145815A DE3145815C2 (de) | 1981-11-19 | 1981-11-19 | Verfahren zum Entfernen von ablösungsfähigen Materialschichten von beschichteten Gegenständen, |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0080407A2 EP0080407A2 (de) | 1983-06-01 |
EP0080407A3 EP0080407A3 (en) | 1983-11-23 |
EP0080407B1 true EP0080407B1 (de) | 1986-03-26 |
Family
ID=6146705
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP82402096A Expired EP0080407B1 (de) | 1981-11-19 | 1982-11-17 | Verfahren und Vorrichtung zum Entfernen von Schichten von Gegenständen |
Country Status (9)
Country | Link |
---|---|
US (1) | US4474199A (de) |
EP (1) | EP0080407B1 (de) |
JP (1) | JPS58117883A (de) |
AT (1) | ATE18741T1 (de) |
AU (1) | AU559944B2 (de) |
CA (1) | CA1195594A (de) |
DE (1) | DE3145815C2 (de) |
ES (1) | ES517399A0 (de) |
ZA (1) | ZA827979B (de) |
Families Citing this family (61)
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---|---|---|---|---|
DE3644807A1 (de) * | 1986-12-31 | 1988-07-14 | Meyer Rud Otto | Verfahren zur behandlung der abluft einer durchlaufreinigungsanlage und anlage zur durchfuehrung des verfahrens |
DE3725565A1 (de) * | 1987-08-01 | 1989-02-16 | Peter Weil | Verfahren und anlage zum entlacken von gegenstaenden mit einem tauchbehaelter mit loesungsmittel |
DE8816444U1 (de) * | 1988-05-27 | 1989-08-24 | C. Christ Abgasfreie Werkzeugreinigungsapparate Fuer Die Kunststoffindustrie, 8000 Muenchen, De | |
DE3823322A1 (de) * | 1988-07-09 | 1990-01-11 | Carl Dittmann Gmbh & Co Kg | Verfahren zum reinigen und entfetten von behandlungsgut mit loesungsmitteln |
US5051135A (en) * | 1989-01-30 | 1991-09-24 | Kabushiki Kaisha Tiyoda Seisakusho | Cleaning method using a solvent while preventing discharge of solvent vapors to the environment |
CA2003859A1 (en) * | 1989-02-01 | 1990-08-01 | David Alan Dickinson | Technique for cleaning an object with a combustible cleaning solvent |
CA2011397C (en) * | 1989-03-06 | 1994-07-12 | Michael T. Mittag | Method and apparatus for cleaning electronic and other devices |
CA2019578C (en) * | 1989-06-26 | 1999-08-03 | Masato Tanaka | Cleaning method and system using a solvent |
ATE101800T1 (de) * | 1989-12-15 | 1994-03-15 | Fluehs Drehtechnik Gmbh | Verfahren und vorrichtung zum trennen von loesemitteln und oelen. |
US5304253A (en) * | 1990-09-12 | 1994-04-19 | Baxter International Inc. | Method for cleaning with a volatile solvent |
DE4119303A1 (de) * | 1991-06-12 | 1991-12-12 | Rolf Prof Dr Ing Germerdonk | Verfahren zum zerlegen von stueckigen abfallgemischen, die metallteile, loesliche polymere, insbes. aus (chlor-)kohlenwasserstoffen, weichmachern sowie farb- und zuschlagstoffe enthalten, in zwei bzw. drei recyclingfaehige komponenten und in einen chlorkohlenwasserstoff-freien, problemloser zu entsorgenden restabfall |
GB2264045B (en) * | 1992-02-12 | 1995-10-11 | Kwik Strip | Stripping paint and varnish |
US5261965A (en) * | 1992-08-28 | 1993-11-16 | Texas Instruments Incorporated | Semiconductor wafer cleaning using condensed-phase processing |
JP3390245B2 (ja) * | 1993-06-01 | 2003-03-24 | 富士通株式会社 | 洗浄液及び洗浄方法 |
DE4324432C2 (de) * | 1993-07-21 | 1996-04-25 | Multimatic Oberflaechentechnik | Verfahren zur Reinigung verschmutzter Teile |
US5377705A (en) * | 1993-09-16 | 1995-01-03 | Autoclave Engineers, Inc. | Precision cleaning system |
DE4436425A1 (de) * | 1994-10-12 | 1996-04-18 | Wack O K Chemie Gmbh | Verfahren zur Reinigung von polierten Metallflächen |
US6306564B1 (en) | 1997-05-27 | 2001-10-23 | Tokyo Electron Limited | Removal of resist or residue from semiconductors using supercritical carbon dioxide |
US6500605B1 (en) | 1997-05-27 | 2002-12-31 | Tokyo Electron Limited | Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
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DE19809622A1 (de) * | 1998-03-06 | 1999-09-09 | Knaack & Jahn Gmbh | Anlage für die Behandlung von Gegenständen in einer definierten Gasatmosphäre, deren O¶2¶-Gehalt kleiner als der von Luft ist und bei der umweltschädliche Behandlungsgase erzeugt werden |
US6277753B1 (en) | 1998-09-28 | 2001-08-21 | Supercritical Systems Inc. | Removal of CMP residue from semiconductors using supercritical carbon dioxide process |
FI113750B (fi) | 1999-05-21 | 2004-06-15 | Kojair Tech Oy | Menetelmä ja laitteisto puolijohdeteollisuuden työvälineiden pesemiseksi |
EP1234322A2 (de) | 1999-11-02 | 2002-08-28 | Tokyo Electron Limited | Verfahren und vorrichtungen zur überkritischen verarbeitung von werkstücken |
US6748960B1 (en) | 1999-11-02 | 2004-06-15 | Tokyo Electron Limited | Apparatus for supercritical processing of multiple workpieces |
AU2001255656A1 (en) * | 2000-04-25 | 2001-11-07 | Tokyo Electron Limited | Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module |
DE10032109A1 (de) * | 2000-07-01 | 2002-03-28 | Bernd Blaudszun | Verfahren und Anlage zur Gewinnung von biowirksamen Bestandteilen der Aloe vera |
KR100750018B1 (ko) | 2000-07-26 | 2007-08-16 | 동경 엘렉트론 주식회사 | 반도체 기판의 처리를 위한 고압 챔버 및 반도체 기판의고압 처리를 위한 장치 |
US20040040660A1 (en) * | 2001-10-03 | 2004-03-04 | Biberger Maximilian Albert | High pressure processing chamber for multiple semiconductor substrates |
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US20050022850A1 (en) * | 2003-07-29 | 2005-02-03 | Supercritical Systems, Inc. | Regulation of flow of processing chemistry only into a processing chamber |
US7163380B2 (en) * | 2003-07-29 | 2007-01-16 | Tokyo Electron Limited | Control of fluid flow in the processing of an object with a fluid |
US20050035514A1 (en) * | 2003-08-11 | 2005-02-17 | Supercritical Systems, Inc. | Vacuum chuck apparatus and method for holding a wafer during high pressure processing |
US20050067002A1 (en) * | 2003-09-25 | 2005-03-31 | Supercritical Systems, Inc. | Processing chamber including a circulation loop integrally formed in a chamber housing |
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US20060225772A1 (en) * | 2005-03-29 | 2006-10-12 | Jones William D | Controlled pressure differential in a high-pressure processing chamber |
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE235548C (de) | ||||
DE2704065A1 (de) | 1976-03-29 | 1977-10-13 | Air Prod & Chem | Verfahren zum entfernen von gasfoermigem vinylchlorid-monomer aus einem abgasstrom |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR423281A (fr) * | 1910-12-03 | 1911-04-12 | Martini & Hueneke Maschb Aktie | Procédé et dispositif pour dégraisser les objets métalliques à galvaniser à l'aide de dissolvants volatils maintenus en circulation continue |
FR839867A (fr) * | 1937-09-18 | 1939-04-13 | Suisse D Explosifs S A Fab | Procédé et machine à nettoyer des objets |
US2466769A (en) * | 1947-05-02 | 1949-04-12 | Barry Wehmiller Mach Co | Apparatus for varying the temperatures of traveling containers |
US3085948A (en) * | 1961-07-17 | 1963-04-16 | Detrex Chem Ind | Continuous degreaser |
FR2223096B1 (de) * | 1973-03-26 | 1976-09-10 | Usinor | |
DE2541613A1 (de) * | 1975-09-18 | 1977-03-24 | Gernot Karau | Verfahren und vorrichtung zur entfettung und/oder reinigung von metallspaenen, schuettguetern, kleinteilen o.dgl. |
US4111715A (en) * | 1976-03-15 | 1978-09-05 | Westinghouse Electric Corp. | Apparatus and method for chemically removing plastics |
-
1981
- 1981-11-19 DE DE3145815A patent/DE3145815C2/de not_active Expired
-
1982
- 1982-11-01 ZA ZA827979A patent/ZA827979B/xx unknown
- 1982-11-09 US US06/440,433 patent/US4474199A/en not_active Expired - Fee Related
- 1982-11-12 AU AU90434/82A patent/AU559944B2/en not_active Ceased
- 1982-11-15 CA CA000415547A patent/CA1195594A/fr not_active Expired
- 1982-11-16 ES ES82517399A patent/ES517399A0/es active Granted
- 1982-11-17 JP JP57200470A patent/JPS58117883A/ja active Pending
- 1982-11-17 AT AT82402096T patent/ATE18741T1/de not_active IP Right Cessation
- 1982-11-17 EP EP82402096A patent/EP0080407B1/de not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE235548C (de) | ||||
DE2704065A1 (de) | 1976-03-29 | 1977-10-13 | Air Prod & Chem | Verfahren zum entfernen von gasfoermigem vinylchlorid-monomer aus einem abgasstrom |
Also Published As
Publication number | Publication date |
---|---|
JPS58117883A (ja) | 1983-07-13 |
US4474199A (en) | 1984-10-02 |
DE3145815C2 (de) | 1984-08-09 |
ES8401532A1 (es) | 1983-12-01 |
ZA827979B (en) | 1983-09-28 |
CA1195594A (fr) | 1985-10-22 |
EP0080407A3 (en) | 1983-11-23 |
DE3145815A1 (de) | 1983-06-09 |
AU559944B2 (en) | 1987-03-26 |
ES517399A0 (es) | 1983-12-01 |
EP0080407A2 (de) | 1983-06-01 |
ATE18741T1 (de) | 1986-04-15 |
AU9043482A (en) | 1983-05-26 |
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