ATE18741T1 - Verfahren und vorrichtung zum entfernen von schichten von gegenstaenden. - Google Patents
Verfahren und vorrichtung zum entfernen von schichten von gegenstaenden.Info
- Publication number
- ATE18741T1 ATE18741T1 AT82402096T AT82402096T ATE18741T1 AT E18741 T1 ATE18741 T1 AT E18741T1 AT 82402096 T AT82402096 T AT 82402096T AT 82402096 T AT82402096 T AT 82402096T AT E18741 T1 ATE18741 T1 AT E18741T1
- Authority
- AT
- Austria
- Prior art keywords
- objects
- solvent
- nitrogen
- stripping
- mixture
- Prior art date
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 4
- 239000002904 solvent Substances 0.000 abstract 3
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 abstract 2
- 238000004140 cleaning Methods 0.000 abstract 1
- 238000009833 condensation Methods 0.000 abstract 1
- 230000005494 condensation Effects 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 239000003973 paint Substances 0.000 abstract 1
- 239000011877 solvent mixture Substances 0.000 abstract 1
- 230000008719 thickening Effects 0.000 abstract 1
- 239000002966 varnish Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/04—Apparatus
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
- B08B7/0092—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by cooling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44D—PAINTING OR ARTISTIC DRAWING, NOT OTHERWISE PROVIDED FOR; PRESERVING PAINTINGS; SURFACE TREATMENT TO OBTAIN SPECIAL ARTISTIC SURFACE EFFECTS OR FINISHES
- B44D3/00—Accessories or implements for use in connection with painting or artistic drawing, not otherwise provided for; Methods or devices for colour determination, selection, or synthesis, e.g. use of colour tables
- B44D3/16—Implements or apparatus for removing dry paint from surfaces, e.g. by scraping, by burning
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3145815A DE3145815C2 (de) | 1981-11-19 | 1981-11-19 | Verfahren zum Entfernen von ablösungsfähigen Materialschichten von beschichteten Gegenständen, |
EP82402096A EP0080407B1 (de) | 1981-11-19 | 1982-11-17 | Verfahren und Vorrichtung zum Entfernen von Schichten von Gegenständen |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE18741T1 true ATE18741T1 (de) | 1986-04-15 |
Family
ID=6146705
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT82402096T ATE18741T1 (de) | 1981-11-19 | 1982-11-17 | Verfahren und vorrichtung zum entfernen von schichten von gegenstaenden. |
Country Status (9)
Country | Link |
---|---|
US (1) | US4474199A (de) |
EP (1) | EP0080407B1 (de) |
JP (1) | JPS58117883A (de) |
AT (1) | ATE18741T1 (de) |
AU (1) | AU559944B2 (de) |
CA (1) | CA1195594A (de) |
DE (1) | DE3145815C2 (de) |
ES (1) | ES8401532A1 (de) |
ZA (1) | ZA827979B (de) |
Families Citing this family (61)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3644807A1 (de) * | 1986-12-31 | 1988-07-14 | Meyer Rud Otto | Verfahren zur behandlung der abluft einer durchlaufreinigungsanlage und anlage zur durchfuehrung des verfahrens |
DE3725565A1 (de) * | 1987-08-01 | 1989-02-16 | Peter Weil | Verfahren und anlage zum entlacken von gegenstaenden mit einem tauchbehaelter mit loesungsmittel |
DE8816444U1 (de) * | 1988-05-27 | 1989-08-24 | C. Christ Abgasfreie Werkzeugreinigungsapparate Fuer Die Kunststoffindustrie, 8000 Muenchen, De | |
DE3823322A1 (de) * | 1988-07-09 | 1990-01-11 | Carl Dittmann Gmbh & Co Kg | Verfahren zum reinigen und entfetten von behandlungsgut mit loesungsmitteln |
US5051135A (en) * | 1989-01-30 | 1991-09-24 | Kabushiki Kaisha Tiyoda Seisakusho | Cleaning method using a solvent while preventing discharge of solvent vapors to the environment |
CA2003859A1 (en) * | 1989-02-01 | 1990-08-01 | David Alan Dickinson | Technique for cleaning an object with a combustible cleaning solvent |
CA2011397C (en) * | 1989-03-06 | 1994-07-12 | Michael T. Mittag | Method and apparatus for cleaning electronic and other devices |
CA2019578C (en) * | 1989-06-26 | 1999-08-03 | Masato Tanaka | Cleaning method and system using a solvent |
ATE101800T1 (de) * | 1989-12-15 | 1994-03-15 | Fluehs Drehtechnik Gmbh | Verfahren und vorrichtung zum trennen von loesemitteln und oelen. |
US5304253A (en) * | 1990-09-12 | 1994-04-19 | Baxter International Inc. | Method for cleaning with a volatile solvent |
DE4119303A1 (de) * | 1991-06-12 | 1991-12-12 | Rolf Prof Dr Ing Germerdonk | Verfahren zum zerlegen von stueckigen abfallgemischen, die metallteile, loesliche polymere, insbes. aus (chlor-)kohlenwasserstoffen, weichmachern sowie farb- und zuschlagstoffe enthalten, in zwei bzw. drei recyclingfaehige komponenten und in einen chlorkohlenwasserstoff-freien, problemloser zu entsorgenden restabfall |
GB2264045B (en) * | 1992-02-12 | 1995-10-11 | Kwik Strip | Stripping paint and varnish |
US5261965A (en) * | 1992-08-28 | 1993-11-16 | Texas Instruments Incorporated | Semiconductor wafer cleaning using condensed-phase processing |
JP3390245B2 (ja) * | 1993-06-01 | 2003-03-24 | 富士通株式会社 | 洗浄液及び洗浄方法 |
DE4324432C2 (de) * | 1993-07-21 | 1996-04-25 | Multimatic Oberflaechentechnik | Verfahren zur Reinigung verschmutzter Teile |
US5377705A (en) * | 1993-09-16 | 1995-01-03 | Autoclave Engineers, Inc. | Precision cleaning system |
DE4436425A1 (de) * | 1994-10-12 | 1996-04-18 | Wack O K Chemie Gmbh | Verfahren zur Reinigung von polierten Metallflächen |
TW539918B (en) | 1997-05-27 | 2003-07-01 | Tokyo Electron Ltd | Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process |
US6306564B1 (en) | 1997-05-27 | 2001-10-23 | Tokyo Electron Limited | Removal of resist or residue from semiconductors using supercritical carbon dioxide |
US6500605B1 (en) | 1997-05-27 | 2002-12-31 | Tokyo Electron Limited | Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
DE19809622A1 (de) * | 1998-03-06 | 1999-09-09 | Knaack & Jahn Gmbh | Anlage für die Behandlung von Gegenständen in einer definierten Gasatmosphäre, deren O¶2¶-Gehalt kleiner als der von Luft ist und bei der umweltschädliche Behandlungsgase erzeugt werden |
US6277753B1 (en) | 1998-09-28 | 2001-08-21 | Supercritical Systems Inc. | Removal of CMP residue from semiconductors using supercritical carbon dioxide process |
FI113750B (fi) | 1999-05-21 | 2004-06-15 | Kojair Tech Oy | Menetelmä ja laitteisto puolijohdeteollisuuden työvälineiden pesemiseksi |
US6748960B1 (en) | 1999-11-02 | 2004-06-15 | Tokyo Electron Limited | Apparatus for supercritical processing of multiple workpieces |
KR100744888B1 (ko) | 1999-11-02 | 2007-08-01 | 동경 엘렉트론 주식회사 | 소재를 초임계 처리하기 위한 장치 및 방법 |
IL152376A0 (en) * | 2000-04-25 | 2003-05-29 | Tokyo Electron Ltd | Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module |
DE10032109A1 (de) * | 2000-07-01 | 2002-03-28 | Bernd Blaudszun | Verfahren und Anlage zur Gewinnung von biowirksamen Bestandteilen der Aloe vera |
JP4724353B2 (ja) | 2000-07-26 | 2011-07-13 | 東京エレクトロン株式会社 | 半導体基板のための高圧処理チャンバー |
US20040040660A1 (en) * | 2001-10-03 | 2004-03-04 | Biberger Maximilian Albert | High pressure processing chamber for multiple semiconductor substrates |
US7001468B1 (en) | 2002-02-15 | 2006-02-21 | Tokyo Electron Limited | Pressure energized pressure vessel opening and closing device and method of providing therefor |
US7387868B2 (en) * | 2002-03-04 | 2008-06-17 | Tokyo Electron Limited | Treatment of a dielectric layer using supercritical CO2 |
US7021635B2 (en) * | 2003-02-06 | 2006-04-04 | Tokyo Electron Limited | Vacuum chuck utilizing sintered material and method of providing thereof |
US7077917B2 (en) | 2003-02-10 | 2006-07-18 | Tokyo Electric Limited | High-pressure processing chamber for a semiconductor wafer |
US7225820B2 (en) * | 2003-02-10 | 2007-06-05 | Tokyo Electron Limited | High-pressure processing chamber for a semiconductor wafer |
US7270137B2 (en) * | 2003-04-28 | 2007-09-18 | Tokyo Electron Limited | Apparatus and method of securing a workpiece during high-pressure processing |
US7163380B2 (en) * | 2003-07-29 | 2007-01-16 | Tokyo Electron Limited | Control of fluid flow in the processing of an object with a fluid |
US20050022850A1 (en) * | 2003-07-29 | 2005-02-03 | Supercritical Systems, Inc. | Regulation of flow of processing chemistry only into a processing chamber |
US20050035514A1 (en) * | 2003-08-11 | 2005-02-17 | Supercritical Systems, Inc. | Vacuum chuck apparatus and method for holding a wafer during high pressure processing |
US20050067002A1 (en) * | 2003-09-25 | 2005-03-31 | Supercritical Systems, Inc. | Processing chamber including a circulation loop integrally formed in a chamber housing |
US7186093B2 (en) * | 2004-10-05 | 2007-03-06 | Tokyo Electron Limited | Method and apparatus for cooling motor bearings of a high pressure pump |
US7250374B2 (en) | 2004-06-30 | 2007-07-31 | Tokyo Electron Limited | System and method for processing a substrate using supercritical carbon dioxide processing |
US7307019B2 (en) | 2004-09-29 | 2007-12-11 | Tokyo Electron Limited | Method for supercritical carbon dioxide processing of fluoro-carbon films |
US20060065189A1 (en) * | 2004-09-30 | 2006-03-30 | Darko Babic | Method and system for homogenization of supercritical fluid in a high pressure processing system |
US7491036B2 (en) | 2004-11-12 | 2009-02-17 | Tokyo Electron Limited | Method and system for cooling a pump |
US20060102282A1 (en) * | 2004-11-15 | 2006-05-18 | Supercritical Systems, Inc. | Method and apparatus for selectively filtering residue from a processing chamber |
US7434590B2 (en) | 2004-12-22 | 2008-10-14 | Tokyo Electron Limited | Method and apparatus for clamping a substrate in a high pressure processing system |
US7140393B2 (en) | 2004-12-22 | 2006-11-28 | Tokyo Electron Limited | Non-contact shuttle valve for flow diversion in high pressure systems |
US7435447B2 (en) | 2005-02-15 | 2008-10-14 | Tokyo Electron Limited | Method and system for determining flow conditions in a high pressure processing system |
US7291565B2 (en) | 2005-02-15 | 2007-11-06 | Tokyo Electron Limited | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid |
US7767145B2 (en) * | 2005-03-28 | 2010-08-03 | Toyko Electron Limited | High pressure fourier transform infrared cell |
US7380984B2 (en) * | 2005-03-28 | 2008-06-03 | Tokyo Electron Limited | Process flow thermocouple |
US20060225772A1 (en) * | 2005-03-29 | 2006-10-12 | Jones William D | Controlled pressure differential in a high-pressure processing chamber |
US7494107B2 (en) * | 2005-03-30 | 2009-02-24 | Supercritical Systems, Inc. | Gate valve for plus-atmospheric pressure semiconductor process vessels |
US7789971B2 (en) | 2005-05-13 | 2010-09-07 | Tokyo Electron Limited | Treatment of substrate using functionalizing agent in supercritical carbon dioxide |
US7524383B2 (en) | 2005-05-25 | 2009-04-28 | Tokyo Electron Limited | Method and system for passivating a processing chamber |
US9327243B2 (en) * | 2012-08-24 | 2016-05-03 | The Boeing Company | Aircraft fuel tank flammability reduction methods and systems |
US10933594B2 (en) * | 2014-10-14 | 2021-03-02 | Technical Tooling LLC | Method for forming a part using a layup tool |
US10300569B2 (en) | 2014-10-14 | 2019-05-28 | Technical Tooling L.L.C. | Method for fabricating vacuum fixturing using granular media |
GB2554857A (en) * | 2016-09-29 | 2018-04-18 | Mexichem Fluor Sa De Cv | A propellant filling apparatus |
CN109013567A (zh) * | 2018-07-18 | 2018-12-18 | 中车兰州机车有限公司 | 清理绝缘漆试样的方法 |
CN113857279B (zh) * | 2021-08-23 | 2023-01-24 | 四川纳涂科技有限公司 | 一种金刚石涂层的褪除方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE235548C (de) * | ||||
FR423281A (fr) * | 1910-12-03 | 1911-04-12 | Martini & Hueneke Maschb Aktie | Procédé et dispositif pour dégraisser les objets métalliques à galvaniser à l'aide de dissolvants volatils maintenus en circulation continue |
FR839867A (fr) * | 1937-09-18 | 1939-04-13 | Suisse D Explosifs S A Fab | Procédé et machine à nettoyer des objets |
US2466769A (en) * | 1947-05-02 | 1949-04-12 | Barry Wehmiller Mach Co | Apparatus for varying the temperatures of traveling containers |
US3085948A (en) * | 1961-07-17 | 1963-04-16 | Detrex Chem Ind | Continuous degreaser |
FR2223096B1 (de) * | 1973-03-26 | 1976-09-10 | Usinor | |
DE2541613A1 (de) * | 1975-09-18 | 1977-03-24 | Gernot Karau | Verfahren und vorrichtung zur entfettung und/oder reinigung von metallspaenen, schuettguetern, kleinteilen o.dgl. |
US4111715A (en) * | 1976-03-15 | 1978-09-05 | Westinghouse Electric Corp. | Apparatus and method for chemically removing plastics |
US4133663A (en) | 1976-03-29 | 1979-01-09 | Air Products And Chemicals, Inc. | Removing vinyl chloride from a vent gas stream |
-
1981
- 1981-11-19 DE DE3145815A patent/DE3145815C2/de not_active Expired
-
1982
- 1982-11-01 ZA ZA827979A patent/ZA827979B/xx unknown
- 1982-11-09 US US06/440,433 patent/US4474199A/en not_active Expired - Fee Related
- 1982-11-12 AU AU90434/82A patent/AU559944B2/en not_active Ceased
- 1982-11-15 CA CA000415547A patent/CA1195594A/fr not_active Expired
- 1982-11-16 ES ES82517399A patent/ES8401532A1/es not_active Expired
- 1982-11-17 AT AT82402096T patent/ATE18741T1/de not_active IP Right Cessation
- 1982-11-17 JP JP57200470A patent/JPS58117883A/ja active Pending
- 1982-11-17 EP EP82402096A patent/EP0080407B1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0080407B1 (de) | 1986-03-26 |
DE3145815A1 (de) | 1983-06-09 |
DE3145815C2 (de) | 1984-08-09 |
US4474199A (en) | 1984-10-02 |
AU9043482A (en) | 1983-05-26 |
ZA827979B (en) | 1983-09-28 |
EP0080407A2 (de) | 1983-06-01 |
CA1195594A (fr) | 1985-10-22 |
AU559944B2 (en) | 1987-03-26 |
EP0080407A3 (en) | 1983-11-23 |
JPS58117883A (ja) | 1983-07-13 |
ES517399A0 (es) | 1983-12-01 |
ES8401532A1 (es) | 1983-12-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE18741T1 (de) | Verfahren und vorrichtung zum entfernen von schichten von gegenstaenden. | |
ATE70315T1 (de) | Verfahren und vorrichtung zum behandeln von gegenstaenden in einem geschlossenen behaelter mit loesungsmittel. | |
EP0141171A3 (de) | Verfahren zur Rückgewinnung von Lackiermaterial aus dem beim Spritzlackieren entstehenden Overspray und Vorrichtung zur Durchführung de Verfahrens | |
DE3787595T2 (de) | Verfahren zum Entfernen von unerwünschten Teilchen von der Oberfläche eines Substrats. | |
DE3789120D1 (de) | Verfahren zur Trennung der Komponenten eines Flüssigkeitsgemisches voneinander. | |
DE69114877D1 (de) | Verfahren zum Entfernen einer Flüssigkeit von der Oberfläche eines Substrats in einer Schleuder. | |
AT340838B (de) | Verfahren zum entfernen von olen, losungsmitteln, lacken oder losungsmittelhaltigen lacken aus abwasser | |
ATE28413T1 (de) | Verfahren und vorrichtung zur herstellung einer zwei- oder mehrfarbigen lackierung. | |
DE69204852D1 (de) | Verfahren zum entfernen von wachs mit einem nichtchlorierten lösungsmittel. | |
ATE154894T1 (de) | Behandlung und rückgewinnung von overspray erhalten bei dem aufsprühen von wasserlöslichen überzügen | |
ATE119435T1 (de) | Verfahren und anlage zur sprühbeschichtung von hohlen werkstücken. | |
SE8201208L (sv) | Forfarande och anordning for atervinning av sprutmedel vid sprutbehandling av langstreckt valsgods | |
DE59103111D1 (de) | Verfahren und Vorrichtung zur Aufbereitung von Lack-Koagulat. | |
ES484870A1 (es) | Sistema para eliminar la pintura del aire cargado con pintu-ra. | |
ATE1377T1 (de) | Verfahren zur herstellung von ammoniak und chlorwasserstoff aus ammoniumchlorid. | |
AT279310B (de) | Verfahren und Vorrichtung zum Entfernen der Schmiermittelbeläge von den Oberflächen stranggepreßter Gegenstände | |
DD133975A1 (de) | Verfahren und anlage zum praeparieren,insbesondere zum schlichten von faeden | |
SU525482A1 (ru) | Способ получени рельефного рисунка на поверхности издели | |
ATE101800T1 (de) | Verfahren und vorrichtung zum trennen von loesemitteln und oelen. | |
DD133974A1 (de) | Verfahren und anlage zum praeparieren,insbesondere zum schlichten von faeden | |
JPS5573369A (en) | Dip coating method | |
DE59202356D1 (de) | Verfahren und vorrichtung zur overspray-rezirkulation für wasserverdünnbare lacke. | |
JPS52126059A (en) | Process and apparatus for treating booth drain containing aqueous coat ings | |
AT379374B (de) | Verfahren zur behandlung von restgasen, aus der dichloraethanherstellung | |
DE69007187T2 (de) | Verfahren zum Abtrennen eines Bauelementes von einer Reihe von Bauelementen sowie Vorrichtung zum Durchführen des Verfahrens. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |