ATE70315T1 - Verfahren und vorrichtung zum behandeln von gegenstaenden in einem geschlossenen behaelter mit loesungsmittel. - Google Patents
Verfahren und vorrichtung zum behandeln von gegenstaenden in einem geschlossenen behaelter mit loesungsmittel.Info
- Publication number
- ATE70315T1 ATE70315T1 AT88111774T AT88111774T ATE70315T1 AT E70315 T1 ATE70315 T1 AT E70315T1 AT 88111774 T AT88111774 T AT 88111774T AT 88111774 T AT88111774 T AT 88111774T AT E70315 T1 ATE70315 T1 AT E70315T1
- Authority
- AT
- Austria
- Prior art keywords
- solvent
- pct
- treatment
- vessel
- objects
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44D—PAINTING OR ARTISTIC DRAWING, NOT OTHERWISE PROVIDED FOR; PRESERVING PAINTINGS; SURFACE TREATMENT TO OBTAIN SPECIAL ARTISTIC SURFACE EFFECTS OR FINISHES
- B44D3/00—Accessories or implements for use in connection with painting or artistic drawing, not otherwise provided for; Methods or devices for colour determination, selection, or synthesis, e.g. use of colour tables
- B44D3/24—Lamps for baking lacquers; Painters belts; Apparatus for dissolving dried paints, for heating paints
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44D—PAINTING OR ARTISTIC DRAWING, NOT OTHERWISE PROVIDED FOR; PRESERVING PAINTINGS; SURFACE TREATMENT TO OBTAIN SPECIAL ARTISTIC SURFACE EFFECTS OR FINISHES
- B44D3/00—Accessories or implements for use in connection with painting or artistic drawing, not otherwise provided for; Methods or devices for colour determination, selection, or synthesis, e.g. use of colour tables
- B44D3/16—Implements or apparatus for removing dry paint from surfaces, e.g. by scraping, by burning
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
- C23G5/02806—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing only chlorine as halogen atom
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Detergent Compositions (AREA)
- Paints Or Removers (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
- Treatment Of Fiber Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3725565A DE3725565A1 (de) | 1987-08-01 | 1987-08-01 | Verfahren und anlage zum entlacken von gegenstaenden mit einem tauchbehaelter mit loesungsmittel |
EP88111774A EP0302313B1 (de) | 1987-08-01 | 1988-07-21 | Verfahren und Vorrichtung zum Behandeln von Gegenständen in einem geschlossenen Behälter mit Lösungsmittel |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE70315T1 true ATE70315T1 (de) | 1991-12-15 |
Family
ID=6332876
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT88111774T ATE70315T1 (de) | 1987-08-01 | 1988-07-21 | Verfahren und vorrichtung zum behandeln von gegenstaenden in einem geschlossenen behaelter mit loesungsmittel. |
Country Status (10)
Country | Link |
---|---|
US (1) | US5011542A (de) |
EP (1) | EP0302313B1 (de) |
JP (1) | JPH02500178A (de) |
KR (1) | KR950014078B1 (de) |
AT (1) | ATE70315T1 (de) |
BR (1) | BR8807154A (de) |
DE (2) | DE3725565A1 (de) |
ES (1) | ES2027351T3 (de) |
GR (1) | GR3003993T3 (de) |
WO (1) | WO1989001057A1 (de) |
Families Citing this family (92)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1989010271A1 (en) * | 1988-04-25 | 1989-11-02 | Aga Aktiebolag | Method of removing paint |
GB8918504D0 (en) * | 1989-08-14 | 1989-09-20 | Bush Boake Allen Ltd | Methods and compositions for cleaning articles |
US5300154A (en) * | 1990-08-14 | 1994-04-05 | Bush Boake Allen Limited | Methods for cleaning articles |
US5346534A (en) * | 1990-09-12 | 1994-09-13 | Baxter International Inc. | Process for treating an article with a volatile fluid |
DE4119303A1 (de) * | 1991-06-12 | 1991-12-12 | Rolf Prof Dr Ing Germerdonk | Verfahren zum zerlegen von stueckigen abfallgemischen, die metallteile, loesliche polymere, insbes. aus (chlor-)kohlenwasserstoffen, weichmachern sowie farb- und zuschlagstoffe enthalten, in zwei bzw. drei recyclingfaehige komponenten und in einen chlorkohlenwasserstoff-freien, problemloser zu entsorgenden restabfall |
DE4138400C1 (de) * | 1991-11-22 | 1993-02-18 | Aichelin Gmbh, 7015 Korntal-Muenchingen, De | |
US5273060A (en) * | 1992-06-26 | 1993-12-28 | Martin Marietta Corporation | Alcohol spray cleaning system |
DE4317862A1 (de) * | 1993-05-28 | 1994-12-01 | Aichelin Ind Ofen | Verfahren und Vorrichtung zum Reinigen von metallischen Werkstücken |
US5377705A (en) * | 1993-09-16 | 1995-01-03 | Autoclave Engineers, Inc. | Precision cleaning system |
US5367881A (en) * | 1993-09-28 | 1994-11-29 | Liquid Carbonic Corporation | Cryogenic control of emission of solvent vapors from mixers |
DE4336704A1 (de) * | 1993-10-27 | 1995-05-04 | Wacker Chemitronic | Verfahren und Vorrichtung zur Behandlung von scheibenförmigen Werkstücken mit einer Flüssigkeit |
US6027651A (en) * | 1994-06-06 | 2000-02-22 | Cash; Alan B. | Process for regenerating spent solvent |
GB9425416D0 (en) * | 1994-12-16 | 1995-02-15 | Rotary Stripping Systems Ltd | Improved apparatus for supporting articles in liquid treatment tanks |
DE19503928A1 (de) * | 1995-02-07 | 1996-08-08 | Peter Weil | Verfahren zum Reinigen von Gegenständen mit Lösungsmitteln in einem geschlossenen Behandlungsraum |
US5876567A (en) * | 1995-04-28 | 1999-03-02 | Yamamoto; Soichiro | Solvent recycling system |
US6500605B1 (en) | 1997-05-27 | 2002-12-31 | Tokyo Electron Limited | Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
TW539918B (en) | 1997-05-27 | 2003-07-01 | Tokyo Electron Ltd | Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process |
US6306564B1 (en) | 1997-05-27 | 2001-10-23 | Tokyo Electron Limited | Removal of resist or residue from semiconductors using supercritical carbon dioxide |
US7064070B2 (en) * | 1998-09-28 | 2006-06-20 | Tokyo Electron Limited | Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process |
US6277753B1 (en) | 1998-09-28 | 2001-08-21 | Supercritical Systems Inc. | Removal of CMP residue from semiconductors using supercritical carbon dioxide process |
US6748960B1 (en) * | 1999-11-02 | 2004-06-15 | Tokyo Electron Limited | Apparatus for supercritical processing of multiple workpieces |
CA2387373A1 (en) * | 1999-11-02 | 2001-06-28 | Tokyo Electron Limited | Method and apparatus for supercritical processing of a workpiece |
US6558475B1 (en) | 2000-04-10 | 2003-05-06 | International Business Machines Corporation | Process for cleaning a workpiece using supercritical carbon dioxide |
EP1277233A2 (de) * | 2000-04-25 | 2003-01-22 | Tokyo Electron Corporation | Verfahren zur abscheidung einer metallschicht und mehrkammerreaktor mit einem superkritischen trocknungs-/reinigungsmodul zur metallabscheidung |
WO2002009147A2 (en) * | 2000-07-26 | 2002-01-31 | Tokyo Electron Limited | High pressure processing chamber for semiconductor substrate |
US6428683B1 (en) * | 2000-12-15 | 2002-08-06 | United Technologies Corporation | Feedback controlled airfoil stripping system with integrated water management and acid recycling system |
EP1573779A4 (de) * | 2001-04-10 | 2006-11-15 | Tokyo Electron Ltd | Hochdruckverarbeitungskammer für ein halbleitersubstrat mit strömungsverbesserungsmerkmalen |
US20040040660A1 (en) * | 2001-10-03 | 2004-03-04 | Biberger Maximilian Albert | High pressure processing chamber for multiple semiconductor substrates |
JP2005516405A (ja) * | 2002-01-25 | 2005-06-02 | 東京エレクトロン株式会社 | 超臨界二酸化炭素プロセス中の汚染物の形成を低減する方法 |
US7001468B1 (en) | 2002-02-15 | 2006-02-21 | Tokyo Electron Limited | Pressure energized pressure vessel opening and closing device and method of providing therefor |
AU2003215238A1 (en) * | 2002-02-15 | 2003-09-09 | Supercritical Systems Inc. | Pressure enchanced diaphragm valve |
US6924086B1 (en) | 2002-02-15 | 2005-08-02 | Tokyo Electron Limited | Developing photoresist with supercritical fluid and developer |
AU2003217547A1 (en) * | 2002-02-15 | 2003-09-09 | Supercritical Systems Inc. | Drying resist with a solvent bath and supercritical co2 |
US7387868B2 (en) | 2002-03-04 | 2008-06-17 | Tokyo Electron Limited | Treatment of a dielectric layer using supercritical CO2 |
WO2003077032A1 (en) * | 2002-03-04 | 2003-09-18 | Supercritical Systems Inc. | Method of passivating of low dielectric materials in wafer processing |
US20050227187A1 (en) * | 2002-03-04 | 2005-10-13 | Supercritical Systems Inc. | Ionic fluid in supercritical fluid for semiconductor processing |
US20040072706A1 (en) * | 2002-03-22 | 2004-04-15 | Arena-Foster Chantal J. | Removal of contaminants using supercritical processing |
US7169540B2 (en) * | 2002-04-12 | 2007-01-30 | Tokyo Electron Limited | Method of treatment of porous dielectric films to reduce damage during cleaning |
JP2004050119A (ja) * | 2002-07-23 | 2004-02-19 | Matsushita Electric Ind Co Ltd | 洗浄装置及び洗浄方法 |
DE10258490A1 (de) * | 2002-12-14 | 2004-07-08 | Daimlerchrysler Ag | Verfahren zur Entlackung von Polymersubstraten |
US20040112409A1 (en) * | 2002-12-16 | 2004-06-17 | Supercritical Sysems, Inc. | Fluoride in supercritical fluid for photoresist and residue removal |
US20040177867A1 (en) * | 2002-12-16 | 2004-09-16 | Supercritical Systems, Inc. | Tetra-organic ammonium fluoride and HF in supercritical fluid for photoresist and residue removal |
US7021635B2 (en) * | 2003-02-06 | 2006-04-04 | Tokyo Electron Limited | Vacuum chuck utilizing sintered material and method of providing thereof |
US20040154647A1 (en) * | 2003-02-07 | 2004-08-12 | Supercritical Systems, Inc. | Method and apparatus of utilizing a coating for enhanced holding of a semiconductor substrate during high pressure processing |
US7077917B2 (en) * | 2003-02-10 | 2006-07-18 | Tokyo Electric Limited | High-pressure processing chamber for a semiconductor wafer |
US7225820B2 (en) * | 2003-02-10 | 2007-06-05 | Tokyo Electron Limited | High-pressure processing chamber for a semiconductor wafer |
US7270137B2 (en) | 2003-04-28 | 2007-09-18 | Tokyo Electron Limited | Apparatus and method of securing a workpiece during high-pressure processing |
US20040231707A1 (en) * | 2003-05-20 | 2004-11-25 | Paul Schilling | Decontamination of supercritical wafer processing equipment |
US7163380B2 (en) * | 2003-07-29 | 2007-01-16 | Tokyo Electron Limited | Control of fluid flow in the processing of an object with a fluid |
US20050035514A1 (en) * | 2003-08-11 | 2005-02-17 | Supercritical Systems, Inc. | Vacuum chuck apparatus and method for holding a wafer during high pressure processing |
US20050034660A1 (en) * | 2003-08-11 | 2005-02-17 | Supercritical Systems, Inc. | Alignment means for chamber closure to reduce wear on surfaces |
US20050067002A1 (en) * | 2003-09-25 | 2005-03-31 | Supercritical Systems, Inc. | Processing chamber including a circulation loop integrally formed in a chamber housing |
US7186093B2 (en) * | 2004-10-05 | 2007-03-06 | Tokyo Electron Limited | Method and apparatus for cooling motor bearings of a high pressure pump |
US7250374B2 (en) * | 2004-06-30 | 2007-07-31 | Tokyo Electron Limited | System and method for processing a substrate using supercritical carbon dioxide processing |
US7307019B2 (en) * | 2004-09-29 | 2007-12-11 | Tokyo Electron Limited | Method for supercritical carbon dioxide processing of fluoro-carbon films |
US20060065189A1 (en) * | 2004-09-30 | 2006-03-30 | Darko Babic | Method and system for homogenization of supercritical fluid in a high pressure processing system |
US20060065288A1 (en) * | 2004-09-30 | 2006-03-30 | Darko Babic | Supercritical fluid processing system having a coating on internal members and a method of using |
US7491036B2 (en) * | 2004-11-12 | 2009-02-17 | Tokyo Electron Limited | Method and system for cooling a pump |
US20060102591A1 (en) * | 2004-11-12 | 2006-05-18 | Tokyo Electron Limited | Method and system for treating a substrate using a supercritical fluid |
US20060102208A1 (en) * | 2004-11-12 | 2006-05-18 | Tokyo Electron Limited | System for removing a residue from a substrate using supercritical carbon dioxide processing |
US20060102204A1 (en) * | 2004-11-12 | 2006-05-18 | Tokyo Electron Limited | Method for removing a residue from a substrate using supercritical carbon dioxide processing |
US20060102590A1 (en) * | 2004-11-12 | 2006-05-18 | Tokyo Electron Limited | Method for treating a substrate with a high pressure fluid using a preoxide-based process chemistry |
US20060130966A1 (en) * | 2004-12-20 | 2006-06-22 | Darko Babic | Method and system for flowing a supercritical fluid in a high pressure processing system |
US7140393B2 (en) * | 2004-12-22 | 2006-11-28 | Tokyo Electron Limited | Non-contact shuttle valve for flow diversion in high pressure systems |
US7434590B2 (en) * | 2004-12-22 | 2008-10-14 | Tokyo Electron Limited | Method and apparatus for clamping a substrate in a high pressure processing system |
US20060135047A1 (en) * | 2004-12-22 | 2006-06-22 | Alexei Sheydayi | Method and apparatus for clamping a substrate in a high pressure processing system |
US20060180174A1 (en) * | 2005-02-15 | 2006-08-17 | Tokyo Electron Limited | Method and system for treating a substrate with a high pressure fluid using a peroxide-based process chemistry in conjunction with an initiator |
US20060180572A1 (en) * | 2005-02-15 | 2006-08-17 | Tokyo Electron Limited | Removal of post etch residue for a substrate with open metal surfaces |
US7435447B2 (en) * | 2005-02-15 | 2008-10-14 | Tokyo Electron Limited | Method and system for determining flow conditions in a high pressure processing system |
US7291565B2 (en) * | 2005-02-15 | 2007-11-06 | Tokyo Electron Limited | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid |
US20060185693A1 (en) * | 2005-02-23 | 2006-08-24 | Richard Brown | Cleaning step in supercritical processing |
US20060186088A1 (en) * | 2005-02-23 | 2006-08-24 | Gunilla Jacobson | Etching and cleaning BPSG material using supercritical processing |
US20060185694A1 (en) * | 2005-02-23 | 2006-08-24 | Richard Brown | Rinsing step in supercritical processing |
US7550075B2 (en) | 2005-03-23 | 2009-06-23 | Tokyo Electron Ltd. | Removal of contaminants from a fluid |
US7380984B2 (en) * | 2005-03-28 | 2008-06-03 | Tokyo Electron Limited | Process flow thermocouple |
US7767145B2 (en) | 2005-03-28 | 2010-08-03 | Toyko Electron Limited | High pressure fourier transform infrared cell |
US20060225772A1 (en) * | 2005-03-29 | 2006-10-12 | Jones William D | Controlled pressure differential in a high-pressure processing chamber |
US20060223899A1 (en) * | 2005-03-30 | 2006-10-05 | Hillman Joseph T | Removal of porogens and porogen residues using supercritical CO2 |
US20060219268A1 (en) * | 2005-03-30 | 2006-10-05 | Gunilla Jacobson | Neutralization of systemic poisoning in wafer processing |
US7442636B2 (en) * | 2005-03-30 | 2008-10-28 | Tokyo Electron Limited | Method of inhibiting copper corrosion during supercritical CO2 cleaning |
US7399708B2 (en) * | 2005-03-30 | 2008-07-15 | Tokyo Electron Limited | Method of treating a composite spin-on glass/anti-reflective material prior to cleaning |
US7494107B2 (en) * | 2005-03-30 | 2009-02-24 | Supercritical Systems, Inc. | Gate valve for plus-atmospheric pressure semiconductor process vessels |
US20060255012A1 (en) * | 2005-05-10 | 2006-11-16 | Gunilla Jacobson | Removal of particles from substrate surfaces using supercritical processing |
US7789971B2 (en) * | 2005-05-13 | 2010-09-07 | Tokyo Electron Limited | Treatment of substrate using functionalizing agent in supercritical carbon dioxide |
US7524383B2 (en) * | 2005-05-25 | 2009-04-28 | Tokyo Electron Limited | Method and system for passivating a processing chamber |
US20070000519A1 (en) * | 2005-06-30 | 2007-01-04 | Gunilla Jacobson | Removal of residues for low-k dielectric materials in wafer processing |
US20070012337A1 (en) * | 2005-07-15 | 2007-01-18 | Tokyo Electron Limited | In-line metrology for supercritical fluid processing |
US10421124B2 (en) * | 2017-09-12 | 2019-09-24 | Desktop Metal, Inc. | Debinder for 3D printed objects |
CN109174780A (zh) * | 2018-07-20 | 2019-01-11 | 孟凡清 | 一种镜片脱膜设备 |
CN109201607B (zh) * | 2018-09-13 | 2023-05-09 | 无锡市恒利弘实业有限公司 | 一种金属基材表面uv油墨的剥离联用装置 |
CN109201605B (zh) * | 2018-09-13 | 2023-05-09 | 无锡市恒利弘实业有限公司 | 一种金属表面保护uv油墨的脱膜装置 |
CN109201606B (zh) * | 2018-09-13 | 2023-05-09 | 无锡市恒利弘实业有限公司 | 一种金属基材表面uv油墨的剥离联用工艺 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA579891A (en) * | 1959-07-21 | J. Rosenthal Arnold | Dehydration of mixtures of methylene chloride with alcohols | |
US2385564A (en) * | 1940-06-19 | 1945-09-25 | Ici Ltd | Solvent extraction |
GB550703A (en) * | 1941-07-18 | 1943-01-20 | William Edward Booth | Improvements in the degreasing of metal articles |
GB870970A (en) * | 1959-10-28 | 1961-06-21 | Du Pont | Improvements in or relating to the cleaning of articles |
US3338756A (en) * | 1963-10-28 | 1967-08-29 | Hooker Chemical Corp | Method for removing coatings |
FR2044887A5 (de) * | 1969-05-09 | 1971-02-26 | Hunter Douglas International | |
US3794524A (en) * | 1972-11-21 | 1974-02-26 | Chemed Corp | Stripping method |
CA1001934A (en) * | 1974-03-26 | 1976-12-21 | Tony G. Talana | Method of stripping paint |
US4038155A (en) * | 1976-04-05 | 1977-07-26 | Purex Corporation Ltd. | Energy saving vapor degreasing apparatus |
US4339283A (en) * | 1980-02-19 | 1982-07-13 | Mccord James W | Vapor generating and recovering apparatus |
DE3015524C2 (de) * | 1980-04-23 | 1985-05-23 | LPW-Reinigungstechnik GmbH, 7024 Filderstadt | Anlage zum Behandeln von Gegenständen mit Lösungsmitteln, lösungsmittelhaltigen Flüssigkeiten und mit Lösungsmitteldämpfen |
DE3145815C2 (de) * | 1981-11-19 | 1984-08-09 | AGA Gas GmbH, 2102 Hamburg | Verfahren zum Entfernen von ablösungsfähigen Materialschichten von beschichteten Gegenständen, |
DE3300666C3 (de) * | 1982-01-26 | 1998-04-09 | Guido Zucchini | Waschverfahren für metallhaltige und nicht-metallhaltige Teile wie Kleinteile, mechanische Komponenten und Teile für die elektronische Industrie sowie eine Maschine zur Durchführung dieses Verfahrens |
DE3205736A1 (de) * | 1982-02-18 | 1983-08-25 | Langbein-Pfanhauser Werke Ag, 4040 Neuss | Verfahren fuer die loesungsmittelbehandlung von insbesondere metallischem behandlungsgut |
DE8437870U1 (de) * | 1984-12-22 | 1986-02-13 | Wache Oberflächentechnik GmbH & Co KG, 2000 Norderstedt | Vorrichtung zum Waschen von vorzugsweise metallischen Werkstücken |
US4770197A (en) * | 1986-02-21 | 1988-09-13 | Westinghouse Electric Corp. | Apparatus for recovering solvent |
-
1987
- 1987-08-01 DE DE3725565A patent/DE3725565A1/de not_active Ceased
-
1988
- 1988-07-21 KR KR1019890700571A patent/KR950014078B1/ko active IP Right Grant
- 1988-07-21 JP JP63506557A patent/JPH02500178A/ja active Pending
- 1988-07-21 BR BR888807154A patent/BR8807154A/pt active Search and Examination
- 1988-07-21 EP EP88111774A patent/EP0302313B1/de not_active Expired - Lifetime
- 1988-07-21 AT AT88111774T patent/ATE70315T1/de not_active IP Right Cessation
- 1988-07-21 WO PCT/EP1988/000671 patent/WO1989001057A1/de unknown
- 1988-07-21 ES ES198888111774T patent/ES2027351T3/es not_active Expired - Lifetime
- 1988-07-21 US US07/332,274 patent/US5011542A/en not_active Expired - Fee Related
- 1988-07-21 DE DE8888111774T patent/DE3866820D1/de not_active Expired - Lifetime
-
1992
- 1992-03-11 GR GR910401855T patent/GR3003993T3/el unknown
Also Published As
Publication number | Publication date |
---|---|
GR3003993T3 (de) | 1993-03-16 |
DE3725565A1 (de) | 1989-02-16 |
KR950014078B1 (ko) | 1995-11-21 |
KR890701799A (ko) | 1989-12-21 |
WO1989001057A1 (fr) | 1989-02-09 |
EP0302313B1 (de) | 1991-12-11 |
EP0302313A1 (de) | 1989-02-08 |
US5011542A (en) | 1991-04-30 |
DE3866820D1 (de) | 1992-01-23 |
ES2027351T3 (es) | 1992-06-01 |
BR8807154A (pt) | 1989-10-17 |
JPH02500178A (ja) | 1990-01-25 |
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