EA200970941A1 - Способ и устройство для получения монокристалла - Google Patents
Способ и устройство для получения монокристаллаInfo
- Publication number
- EA200970941A1 EA200970941A1 EA200970941A EA200970941A EA200970941A1 EA 200970941 A1 EA200970941 A1 EA 200970941A1 EA 200970941 A EA200970941 A EA 200970941A EA 200970941 A EA200970941 A EA 200970941A EA 200970941 A1 EA200970941 A1 EA 200970941A1
- Authority
- EA
- Eurasian Patent Office
- Prior art keywords
- single crystal
- melting zone
- obtaining
- initiating
- clockwise
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/30—Mechanisms for rotating or moving either the melt or the crystal
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/26—Stirring of the molten zone
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/32—Mechanisms for moving either the charge or the heater
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/34—Single-crystal growth by zone-melting; Refining by zone-melting characterised by the seed, e.g. by its crystallographic orientation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1076—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
- Y10T117/1084—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone having details of a stabilizing feature
Abstract
Представлен способ получения монокристалла, включающий пропускание поликристаллического стержня (1) через область нагревания (12) для создания зоны (3) плавления, наложение магнитного поля на зону плавления и инициирование роста монокристалла (5) при затвердевании расплавленного материала на затравке (4) монокристалла. Растущий монокристалл вращается в режиме попеременного вращения между направлениями вращения по часовой стрелке и против часовой стрелки. Способ применим для получения кремниевых монокристаллов, имеющих однородные электрические характеристики. Также раскрыто устройство для исполнения названного способа.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/DK2007/050044 WO2008125104A1 (en) | 2007-04-13 | 2007-04-13 | Method and apparatus for producing a single crystal |
Publications (2)
Publication Number | Publication Date |
---|---|
EA200970941A1 true EA200970941A1 (ru) | 2010-04-30 |
EA017453B1 EA017453B1 (ru) | 2012-12-28 |
Family
ID=38754122
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EA200970941A EA017453B1 (ru) | 2007-04-13 | 2007-04-13 | Способ и устройство для получения монокристалла |
Country Status (9)
Country | Link |
---|---|
US (1) | US20100107968A1 (ru) |
EP (1) | EP2142686B1 (ru) |
JP (1) | JP5485136B2 (ru) |
KR (1) | KR20100016121A (ru) |
CN (1) | CN101680108A (ru) |
CA (1) | CA2688739C (ru) |
DK (1) | DK2142686T3 (ru) |
EA (1) | EA017453B1 (ru) |
WO (1) | WO2008125104A1 (ru) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4831203B2 (ja) * | 2009-04-24 | 2011-12-07 | 信越半導体株式会社 | 半導体単結晶の製造方法および半導体単結晶の製造装置 |
DK2679706T3 (en) * | 2011-02-23 | 2018-12-17 | Shinetsu Handotai Kk | PROCEDURE FOR MANUFACTURING N-TYPE SILICON MONO CRYSTAL |
JP5234148B2 (ja) * | 2011-08-04 | 2013-07-10 | 信越半導体株式会社 | 半導体単結晶の製造方法および半導体単結晶の製造装置 |
JP5594257B2 (ja) * | 2011-08-19 | 2014-09-24 | 信越半導体株式会社 | 単結晶製造方法 |
DE102011089429A1 (de) * | 2011-12-21 | 2013-06-27 | Siltronic Ag | Verfahren und Vorrichtung zur Herstellung eines Einkristalls |
CN102899716B (zh) * | 2012-09-14 | 2015-04-08 | 北京京运通科技股份有限公司 | 一种双向平动机构及区熔单晶炉 |
CN103114325A (zh) * | 2013-02-25 | 2013-05-22 | 天津市环欧半导体材料技术有限公司 | 气相掺杂区熔硅单晶的生产方法 |
CN103114326A (zh) * | 2013-02-25 | 2013-05-22 | 天津市环欧半导体材料技术有限公司 | 一种区熔气相掺杂硅单晶的生产方法 |
JP5888264B2 (ja) * | 2013-02-28 | 2016-03-16 | 信越半導体株式会社 | 半導体単結晶の製造方法 |
US9255343B2 (en) | 2013-03-08 | 2016-02-09 | Ut-Battelle, Llc | Iron-based composition for magnetocaloric effect (MCE) applications and method of making a single crystal |
CN103539136B (zh) * | 2013-10-29 | 2015-09-02 | 新疆华莎能源股份有限公司 | 一种工业化生产高纯镁橄榄石晶体材料的方法 |
DE102014226419A1 (de) * | 2014-12-18 | 2016-06-23 | Siltronic Ag | Verfahren zum Züchten eines Einkristalls durch Kristallisieren des Einkristalls aus einer Fließzone |
JP5892527B1 (ja) * | 2015-01-06 | 2016-03-23 | 信越化学工業株式会社 | 太陽電池用fzシリコン単結晶の製造方法及び太陽電池の製造方法 |
DK3414367T3 (da) | 2016-02-08 | 2020-05-25 | Topsil Globalwafers As | Fosfordoteret siliciumenkeltkrystal |
DE102017202311A1 (de) | 2017-02-14 | 2018-08-16 | Siltronic Ag | Verfahren und Anlage zum Ziehen eines Einkristalls nach dem FZ-Verfahren |
DE102017202420A1 (de) | 2017-02-15 | 2018-08-16 | Siltronic Ag | Verfahren und Anlage zum Ziehen eines Einkristalls nach dem FZ-Verfahren |
DE102017202413A1 (de) * | 2017-02-15 | 2018-08-16 | Siltronic Ag | Verfahren und Anlage zum Ziehen eines Einkristalls nach dem FZ-Verfahren |
DE102018210317A1 (de) | 2018-06-25 | 2020-01-02 | Siltronic Ag | Verfahren zur Herstellung eines Einkristalls aus Halbleitermaterial gemäß der FZ-Methode, Vorrichtung zur Durchführung des Verfahrens und Halbleiterscheibe aus Silizium |
EP4144894A1 (de) | 2021-09-07 | 2023-03-08 | Siltronic AG | Verfahren zum herstellen eines einkristalls aus silicium |
CN113943973A (zh) * | 2021-10-26 | 2022-01-18 | 中国电子科技集团公司第四十六研究所 | 一种拉制高电阻率区熔单晶硅的工艺方法 |
EP4312248A1 (en) | 2022-07-27 | 2024-01-31 | Siltronic AG | A heteroepitaxial wafer for the deposition of gallium nitride |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DD263310A1 (de) * | 1987-08-17 | 1988-12-28 | Akad Wissenschaften Ddr | Verfahren zur halbleiterkristallzuechtung aus elektrisch leitfaehigen schmelzen |
DE3805118A1 (de) * | 1988-02-18 | 1989-08-24 | Wacker Chemitronic | Verfahren zum tiegelfreien zonenziehen von halbleiterstaeben und induktionsheizspule zu seiner durchfuehrung |
EP0504929B1 (en) * | 1991-03-22 | 1996-08-28 | Shin-Etsu Handotai Company Limited | Method of growing silicon monocrystalline rod |
JP2623390B2 (ja) * | 1991-03-22 | 1997-06-25 | 信越半導体株式会社 | シリコン単結晶棒の成長方法 |
JP2874722B2 (ja) * | 1993-06-18 | 1999-03-24 | 信越半導体株式会社 | シリコン単結晶の成長方法及び装置 |
JP2820027B2 (ja) * | 1994-05-24 | 1998-11-05 | 信越半導体株式会社 | 半導体単結晶の成長方法 |
JP2002249393A (ja) * | 2001-02-15 | 2002-09-06 | Komatsu Electronic Metals Co Ltd | Fz法半導体単結晶成長方法 |
DE10137856B4 (de) * | 2001-08-02 | 2007-12-13 | Siltronic Ag | Durch tiegelloses Zonenziehen hergestellter Einkristall aus Silicium |
DE10137857B4 (de) * | 2001-08-02 | 2006-11-16 | Siltronic Ag | Verfahren zur Herstellung eines Einkristalls |
DE10216609B4 (de) * | 2002-04-15 | 2005-04-07 | Siltronic Ag | Verfahren zur Herstellung der Halbleiterscheibe |
-
2007
- 2007-04-13 CA CA2688739A patent/CA2688739C/en not_active Expired - Fee Related
- 2007-04-13 EA EA200970941A patent/EA017453B1/ru not_active IP Right Cessation
- 2007-04-13 US US12/595,647 patent/US20100107968A1/en not_active Abandoned
- 2007-04-13 KR KR1020097022849A patent/KR20100016121A/ko active IP Right Grant
- 2007-04-13 EP EP07722699.1A patent/EP2142686B1/en active Active
- 2007-04-13 JP JP2010502418A patent/JP5485136B2/ja active Active
- 2007-04-13 WO PCT/DK2007/050044 patent/WO2008125104A1/en active Application Filing
- 2007-04-13 CN CN200780052807A patent/CN101680108A/zh active Pending
- 2007-04-13 DK DK07722699.1T patent/DK2142686T3/en active
Also Published As
Publication number | Publication date |
---|---|
EP2142686B1 (en) | 2018-12-12 |
CN101680108A (zh) | 2010-03-24 |
DK2142686T3 (en) | 2019-04-08 |
KR20100016121A (ko) | 2010-02-12 |
US20100107968A1 (en) | 2010-05-06 |
CA2688739A1 (en) | 2008-10-23 |
JP5485136B2 (ja) | 2014-05-07 |
CA2688739C (en) | 2015-05-26 |
EP2142686A1 (en) | 2010-01-13 |
WO2008125104A1 (en) | 2008-10-23 |
JP2010523459A (ja) | 2010-07-15 |
EA017453B1 (ru) | 2012-12-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s) |
Designated state(s): AM AZ BY KZ KG MD TJ TM RU |