EA024663B1 - Активация поверхностей электродов с помощью методов вакуумного осаждения в непрерывном процессе - Google Patents
Активация поверхностей электродов с помощью методов вакуумного осаждения в непрерывном процессе Download PDFInfo
- Publication number
- EA024663B1 EA024663B1 EA201270368A EA201270368A EA024663B1 EA 024663 B1 EA024663 B1 EA 024663B1 EA 201270368 A EA201270368 A EA 201270368A EA 201270368 A EA201270368 A EA 201270368A EA 024663 B1 EA024663 B1 EA 024663B1
- Authority
- EA
- Eurasian Patent Office
- Prior art keywords
- deposition
- chamber
- physical vapor
- vapor deposition
- noble metals
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 32
- 238000010924 continuous production Methods 0.000 title description 4
- 230000004913 activation Effects 0.000 title 1
- 238000001771 vacuum deposition Methods 0.000 title 1
- 238000000151 deposition Methods 0.000 claims abstract description 50
- 230000008021 deposition Effects 0.000 claims abstract description 48
- 229910052751 metal Inorganic materials 0.000 claims abstract description 25
- 239000002184 metal Substances 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 238000005240 physical vapour deposition Methods 0.000 claims abstract description 14
- 229910000510 noble metal Inorganic materials 0.000 claims abstract description 11
- 229910052707 ruthenium Inorganic materials 0.000 claims description 10
- 238000000605 extraction Methods 0.000 claims description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 8
- 230000003750 conditioning effect Effects 0.000 claims description 8
- -1 argon ions Chemical class 0.000 claims description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 5
- 229910052786 argon Inorganic materials 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 4
- 239000012071 phase Substances 0.000 claims description 4
- 238000007750 plasma spraying Methods 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 238000005520 cutting process Methods 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims description 2
- 229910052741 iridium Inorganic materials 0.000 claims description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 2
- 238000005289 physical deposition Methods 0.000 claims description 2
- 239000012808 vapor phase Substances 0.000 claims description 2
- 239000000376 reactant Substances 0.000 claims 2
- 229910000831 Steel Inorganic materials 0.000 claims 1
- 238000004140 cleaning Methods 0.000 claims 1
- 238000010790 dilution Methods 0.000 claims 1
- 239000012895 dilution Substances 0.000 claims 1
- 238000007737 ion beam deposition Methods 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 239000010959 steel Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000000126 substance Substances 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 238000004378 air conditioning Methods 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 238000011068 loading method Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000006837 decompression Effects 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 230000005672 electromagnetic field Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical group 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- IKOKHHBZFDFMJW-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-3-(2-morpholin-4-ylethoxy)pyrazol-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C(=NN(C=1)CC(=O)N1CC2=C(CC1)NN=N2)OCCN1CCOCC1 IKOKHHBZFDFMJW-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000000541 cathodic arc deposition Methods 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000010431 corundum Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000010285 flame spraying Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000004549 pulsed laser deposition Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
- C25B11/081—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/86—Inert electrodes with catalytic activity, e.g. for fuel cells
- H01M4/88—Processes of manufacture
- H01M4/8825—Methods for deposition of the catalytic active composition
- H01M4/8867—Vapour deposition
- H01M4/8871—Sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/50—Fuel cells
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Metals (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT001531A ITMI20091531A1 (it) | 2009-09-03 | 2009-09-03 | Attivazione continua di strutture elettrodiche mediante tecniche di deposizione in vuoto |
| PCT/EP2010/062902 WO2011026914A1 (en) | 2009-09-03 | 2010-09-02 | Activation of electrode surfaces by means of vacuum deposition techniques in a continuous process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EA201270368A1 EA201270368A1 (ru) | 2012-09-28 |
| EA024663B1 true EA024663B1 (ru) | 2016-10-31 |
Family
ID=41650354
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EA201270368A EA024663B1 (ru) | 2009-09-03 | 2010-09-02 | Активация поверхностей электродов с помощью методов вакуумного осаждения в непрерывном процессе |
Country Status (16)
| Country | Link |
|---|---|
| US (1) | US20120164344A1 (enExample) |
| EP (1) | EP2473647A1 (enExample) |
| JP (1) | JP5693583B2 (enExample) |
| KR (1) | KR20120049380A (enExample) |
| CN (1) | CN102482770B (enExample) |
| AR (1) | AR078328A1 (enExample) |
| AU (1) | AU2010291209B2 (enExample) |
| BR (1) | BR112012004765A2 (enExample) |
| CA (1) | CA2769818A1 (enExample) |
| EA (1) | EA024663B1 (enExample) |
| EG (1) | EG26695A (enExample) |
| IL (1) | IL217803A0 (enExample) |
| IT (1) | ITMI20091531A1 (enExample) |
| MX (1) | MX2012002713A (enExample) |
| WO (1) | WO2011026914A1 (enExample) |
| ZA (1) | ZA201201432B (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9567681B2 (en) * | 2013-02-12 | 2017-02-14 | Treadstone Technologies, Inc. | Corrosion resistant and electrically conductive surface of metallic components for electrolyzers |
| US20150056493A1 (en) * | 2013-08-21 | 2015-02-26 | GM Global Technology Operations LLC | Coated porous separators and coated electrodes for lithium batteries |
| KR102491154B1 (ko) * | 2021-01-21 | 2023-01-26 | 주식회사 테크로스 | 전기분해용 이중코팅 촉매 전극 및 이의 제조방법 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4544473A (en) * | 1980-05-12 | 1985-10-01 | Energy Conversion Devices, Inc. | Catalytic electrolytic electrode |
| US5236509A (en) * | 1992-02-06 | 1993-08-17 | Spire Corporation | Modular ibad apparatus for continuous coating |
| US5879827A (en) * | 1997-10-10 | 1999-03-09 | Minnesota Mining And Manufacturing Company | Catalyst for membrane electrode assembly and method of making |
| US20030228512A1 (en) * | 2002-06-05 | 2003-12-11 | Gayatri Vyas | Ultra-low loadings of au for stainless steel bipolar plates |
| EP1975280A1 (en) * | 2007-03-23 | 2008-10-01 | Permelec Electrode Ltd. | Electrode for generation of hydrogen |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2405662A (en) * | 1941-08-30 | 1946-08-13 | Crown Cork & Seal Co | Coating |
| US4331523A (en) * | 1980-03-31 | 1982-05-25 | Showa Denko Kk | Method for electrolyzing water or aqueous solutions |
| JPS6379955A (ja) * | 1986-09-20 | 1988-04-09 | Nippon Steel Corp | ろう付け性に優れたステンレス鋼帯の製造方法 |
| JPS63204726A (ja) * | 1987-02-20 | 1988-08-24 | Anelva Corp | 真空処理装置 |
| US5003428A (en) * | 1989-07-17 | 1991-03-26 | National Semiconductor Corporation | Electrodes for ceramic oxide capacitors |
| GB9316926D0 (en) * | 1993-08-13 | 1993-09-29 | Ici Plc | Electrode |
| AU719341B2 (en) * | 1997-01-22 | 2000-05-04 | De Nora Elettrodi S.P.A. | Method of forming robust metal, metal oxide, and metal alloy layers on ion-conductive polymer membranes |
| US6673127B1 (en) * | 1997-01-22 | 2004-01-06 | Denora S.P.A. | Method of forming robust metal, metal oxide, and metal alloy layers on ion-conductive polymer membranes |
| JPH1129863A (ja) * | 1997-07-10 | 1999-02-02 | Canon Inc | 堆積膜製造方法 |
| US7193934B2 (en) * | 2002-06-07 | 2007-03-20 | Carnegie Mellon University | Domain position detection magnetic amplifying magneto-optical system |
| WO2007003363A1 (en) * | 2005-07-01 | 2007-01-11 | Basf Fuel Cell Gmbh | Gas diffusion electrodes, membrane-electrode assemblies and method for the production thereof |
| JP4670530B2 (ja) * | 2005-08-01 | 2011-04-13 | アイテック株式会社 | 電解用の貴金属電極とその製造方法 |
| DE102006057386A1 (de) * | 2006-12-04 | 2008-06-05 | Uhde Gmbh | Verfahren zum Beschichten von Substraten |
| US7806641B2 (en) * | 2007-08-30 | 2010-10-05 | Ascentool, Inc. | Substrate processing system having improved substrate transport system |
-
2009
- 2009-09-03 IT IT001531A patent/ITMI20091531A1/it unknown
-
2010
- 2010-09-02 WO PCT/EP2010/062902 patent/WO2011026914A1/en not_active Ceased
- 2010-09-02 CA CA2769818A patent/CA2769818A1/en not_active Abandoned
- 2010-09-02 AU AU2010291209A patent/AU2010291209B2/en not_active Ceased
- 2010-09-02 KR KR1020127007956A patent/KR20120049380A/ko not_active Ceased
- 2010-09-02 EP EP10762880A patent/EP2473647A1/en not_active Withdrawn
- 2010-09-02 BR BR112012004765A patent/BR112012004765A2/pt not_active IP Right Cessation
- 2010-09-02 JP JP2012527326A patent/JP5693583B2/ja not_active Expired - Fee Related
- 2010-09-02 CN CN201080039017.8A patent/CN102482770B/zh not_active Expired - Fee Related
- 2010-09-02 MX MX2012002713A patent/MX2012002713A/es active IP Right Grant
- 2010-09-02 EA EA201270368A patent/EA024663B1/ru not_active IP Right Cessation
- 2010-09-03 AR ARP100103249A patent/AR078328A1/es not_active Application Discontinuation
-
2012
- 2012-01-29 IL IL217803A patent/IL217803A0/en unknown
- 2012-02-27 ZA ZA2012/01432A patent/ZA201201432B/en unknown
- 2012-03-04 EG EG2012030387A patent/EG26695A/en active
- 2012-03-06 US US13/413,121 patent/US20120164344A1/en not_active Abandoned
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4544473A (en) * | 1980-05-12 | 1985-10-01 | Energy Conversion Devices, Inc. | Catalytic electrolytic electrode |
| US5236509A (en) * | 1992-02-06 | 1993-08-17 | Spire Corporation | Modular ibad apparatus for continuous coating |
| US5879827A (en) * | 1997-10-10 | 1999-03-09 | Minnesota Mining And Manufacturing Company | Catalyst for membrane electrode assembly and method of making |
| US20030228512A1 (en) * | 2002-06-05 | 2003-12-11 | Gayatri Vyas | Ultra-low loadings of au for stainless steel bipolar plates |
| EP1975280A1 (en) * | 2007-03-23 | 2008-10-01 | Permelec Electrode Ltd. | Electrode for generation of hydrogen |
Also Published As
| Publication number | Publication date |
|---|---|
| HK1167691A1 (en) | 2012-12-07 |
| AR078328A1 (es) | 2011-11-02 |
| BR112012004765A2 (pt) | 2016-03-15 |
| CN102482770A (zh) | 2012-05-30 |
| US20120164344A1 (en) | 2012-06-28 |
| MX2012002713A (es) | 2012-04-19 |
| EG26695A (en) | 2014-06-11 |
| CN102482770B (zh) | 2015-03-25 |
| AU2010291209B2 (en) | 2014-08-28 |
| ITMI20091531A1 (it) | 2011-03-04 |
| KR20120049380A (ko) | 2012-05-16 |
| EP2473647A1 (en) | 2012-07-11 |
| JP5693583B2 (ja) | 2015-04-01 |
| CA2769818A1 (en) | 2011-03-10 |
| ZA201201432B (en) | 2013-05-29 |
| EA201270368A1 (ru) | 2012-09-28 |
| AU2010291209A1 (en) | 2012-03-01 |
| IL217803A0 (en) | 2012-03-29 |
| WO2011026914A1 (en) | 2011-03-10 |
| JP2013503967A (ja) | 2013-02-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20210340684A1 (en) | Diamond Coated Electrodes for Electrochemical Processing and Applications Thereof | |
| JP2006241589A (ja) | 多層コーティングを有する耐食アルミニウムコンポーネント | |
| EA024663B1 (ru) | Активация поверхностей электродов с помощью методов вакуумного осаждения в непрерывном процессе | |
| JP2019026867A (ja) | プラズマ処理装置及びプラズマ処理方法 | |
| TWI490372B (zh) | 釋氫用的電極及其製法和使用 | |
| TWI512129B (zh) | 電解製程所用電極之製法 | |
| JP3783749B2 (ja) | スパッタ膜の作製方法 | |
| HK1167691B (en) | Activation of electrode surfaces by means of vacuum deposition techniques in a continuous process | |
| CN116103607A (zh) | 离子清洗方法、涂层制备方法和涂层 | |
| CA3153271C (en) | Diamond coated electrodes for electrochemical processing and applications thereof | |
| JPH03134184A (ja) | アルミニウム材及びその製造方法 | |
| Borysiewicz et al. | Investigation of porous Zn growth mechanism during Zn reactive sputter deposition | |
| EA024356B1 (ru) | Электрод для электролитической ячейки | |
| WO2025150131A1 (ja) | アモルファスカーボン、及びその製造方法 | |
| JP2017021908A (ja) | 燃料電池用導電部材の製造方法 | |
| HK1172936B (en) | Electrode for electrolytic processes with controlled crystalline structure | |
| JP2008045153A (ja) | Ｅｃｒスパッタ装置、および成膜方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s) |
Designated state(s): AM AZ BY KZ KG MD TJ TM RU |