ITMI20091531A1 - Attivazione continua di strutture elettrodiche mediante tecniche di deposizione in vuoto - Google Patents

Attivazione continua di strutture elettrodiche mediante tecniche di deposizione in vuoto Download PDF

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Publication number
ITMI20091531A1
ITMI20091531A1 IT001531A ITMI20091531A ITMI20091531A1 IT MI20091531 A1 ITMI20091531 A1 IT MI20091531A1 IT 001531 A IT001531 A IT 001531A IT MI20091531 A ITMI20091531 A IT MI20091531A IT MI20091531 A1 ITMI20091531 A1 IT MI20091531A1
Authority
IT
Italy
Prior art keywords
deposition
physical vapor
pressure level
chamber
noble metal
Prior art date
Application number
IT001531A
Other languages
English (en)
Italian (it)
Inventor
Antonio Lorenzo Antozzi
Luciano Iacopetti
Gian Nicola Martelli
Enrico Ramunni
Christian Urgeghe
Original Assignee
Industrie De Nora Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Industrie De Nora Spa filed Critical Industrie De Nora Spa
Priority to IT001531A priority Critical patent/ITMI20091531A1/it
Priority to KR1020127007956A priority patent/KR20120049380A/ko
Priority to AU2010291209A priority patent/AU2010291209B2/en
Priority to MX2012002713A priority patent/MX2012002713A/es
Priority to BR112012004765A priority patent/BR112012004765A2/pt
Priority to CA2769818A priority patent/CA2769818A1/en
Priority to EP10762880A priority patent/EP2473647A1/en
Priority to HK12108279.1A priority patent/HK1167691B/xx
Priority to PCT/EP2010/062902 priority patent/WO2011026914A1/en
Priority to EA201270368A priority patent/EA024663B1/ru
Priority to JP2012527326A priority patent/JP5693583B2/ja
Priority to CN201080039017.8A priority patent/CN102482770B/zh
Priority to ARP100103249A priority patent/AR078328A1/es
Publication of ITMI20091531A1 publication Critical patent/ITMI20091531A1/it
Priority to IL217803A priority patent/IL217803A0/en
Priority to ZA2012/01432A priority patent/ZA201201432B/en
Priority to EG2012030387A priority patent/EG26695A/en
Priority to US13/413,121 priority patent/US20120164344A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
    • C25B11/081—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/86—Inert electrodes with catalytic activity, e.g. for fuel cells
    • H01M4/88—Processes of manufacture
    • H01M4/8825—Methods for deposition of the catalytic active composition
    • H01M4/8867—Vapour deposition
    • H01M4/8871—Sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/50—Fuel cells

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
IT001531A 2009-09-03 2009-09-03 Attivazione continua di strutture elettrodiche mediante tecniche di deposizione in vuoto ITMI20091531A1 (it)

Priority Applications (17)

Application Number Priority Date Filing Date Title
IT001531A ITMI20091531A1 (it) 2009-09-03 2009-09-03 Attivazione continua di strutture elettrodiche mediante tecniche di deposizione in vuoto
HK12108279.1A HK1167691B (en) 2009-09-03 2010-09-02 Activation of electrode surfaces by means of vacuum deposition techniques in a continuous process
JP2012527326A JP5693583B2 (ja) 2009-09-03 2010-09-02 連続プロセスでの真空蒸着技術による電極表面の活性化
MX2012002713A MX2012002713A (es) 2009-09-03 2010-09-02 Activacion de superficies electrodicas por medio de tecnicas de deposicion al vacio en un proceso continuo.
BR112012004765A BR112012004765A2 (pt) 2009-09-03 2010-09-02 ativação de superfícies de eletrodos por meio de técnicas de deposição a vácuo em um processo contínuo
CA2769818A CA2769818A1 (en) 2009-09-03 2010-09-02 Activation of electrode surfaces by means of vacuum deposition techniques in a continuous process
EP10762880A EP2473647A1 (en) 2009-09-03 2010-09-02 Activation of electrode surfaces by means of vacuum deposition techniques in a continuous process
KR1020127007956A KR20120049380A (ko) 2009-09-03 2010-09-02 연속 프로세스에서 진공 증착 기술에 의한 전극 기판의 활성화
PCT/EP2010/062902 WO2011026914A1 (en) 2009-09-03 2010-09-02 Activation of electrode surfaces by means of vacuum deposition techniques in a continuous process
EA201270368A EA024663B1 (ru) 2009-09-03 2010-09-02 Активация поверхностей электродов с помощью методов вакуумного осаждения в непрерывном процессе
AU2010291209A AU2010291209B2 (en) 2009-09-03 2010-09-02 Activation of electrode surfaces by means of vacuum deposition techniques in a continuous process
CN201080039017.8A CN102482770B (zh) 2009-09-03 2010-09-02 通过真空沉积技术以连续工艺活化电极表面
ARP100103249A AR078328A1 (es) 2009-09-03 2010-09-03 Metodo para la produccion de electrodos para procesos electroliticos
IL217803A IL217803A0 (en) 2009-09-03 2012-01-29 Activation of electrode surfaces by means of vacuum deposition techniques in a continuous process
ZA2012/01432A ZA201201432B (en) 2009-09-03 2012-02-27 Activation of electrode surfaces by means of vacuum deposition techniques in a continuous process
EG2012030387A EG26695A (en) 2009-09-03 2012-03-04 Activation of electro surfaces with vacuum deposition techniques in a continuous process
US13/413,121 US20120164344A1 (en) 2009-09-03 2012-03-06 Activation of Electrode Surfaces by Means of Vacuum Deposition Techniques in a Continuous Process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT001531A ITMI20091531A1 (it) 2009-09-03 2009-09-03 Attivazione continua di strutture elettrodiche mediante tecniche di deposizione in vuoto

Publications (1)

Publication Number Publication Date
ITMI20091531A1 true ITMI20091531A1 (it) 2011-03-04

Family

ID=41650354

Family Applications (1)

Application Number Title Priority Date Filing Date
IT001531A ITMI20091531A1 (it) 2009-09-03 2009-09-03 Attivazione continua di strutture elettrodiche mediante tecniche di deposizione in vuoto

Country Status (16)

Country Link
US (1) US20120164344A1 (enExample)
EP (1) EP2473647A1 (enExample)
JP (1) JP5693583B2 (enExample)
KR (1) KR20120049380A (enExample)
CN (1) CN102482770B (enExample)
AR (1) AR078328A1 (enExample)
AU (1) AU2010291209B2 (enExample)
BR (1) BR112012004765A2 (enExample)
CA (1) CA2769818A1 (enExample)
EA (1) EA024663B1 (enExample)
EG (1) EG26695A (enExample)
IL (1) IL217803A0 (enExample)
IT (1) ITMI20091531A1 (enExample)
MX (1) MX2012002713A (enExample)
WO (1) WO2011026914A1 (enExample)
ZA (1) ZA201201432B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9567681B2 (en) * 2013-02-12 2017-02-14 Treadstone Technologies, Inc. Corrosion resistant and electrically conductive surface of metallic components for electrolyzers
US20150056493A1 (en) * 2013-08-21 2015-02-26 GM Global Technology Operations LLC Coated porous separators and coated electrodes for lithium batteries
KR102491154B1 (ko) * 2021-01-21 2023-01-26 주식회사 테크로스 전기분해용 이중코팅 촉매 전극 및 이의 제조방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4544473A (en) * 1980-05-12 1985-10-01 Energy Conversion Devices, Inc. Catalytic electrolytic electrode
US5236509A (en) * 1992-02-06 1993-08-17 Spire Corporation Modular ibad apparatus for continuous coating
US5879827A (en) * 1997-10-10 1999-03-09 Minnesota Mining And Manufacturing Company Catalyst for membrane electrode assembly and method of making
US20030228512A1 (en) * 2002-06-05 2003-12-11 Gayatri Vyas Ultra-low loadings of au for stainless steel bipolar plates
EP1975280A1 (en) * 2007-03-23 2008-10-01 Permelec Electrode Ltd. Electrode for generation of hydrogen

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2405662A (en) * 1941-08-30 1946-08-13 Crown Cork & Seal Co Coating
US4331523A (en) * 1980-03-31 1982-05-25 Showa Denko Kk Method for electrolyzing water or aqueous solutions
JPS6379955A (ja) * 1986-09-20 1988-04-09 Nippon Steel Corp ろう付け性に優れたステンレス鋼帯の製造方法
JPS63204726A (ja) * 1987-02-20 1988-08-24 Anelva Corp 真空処理装置
US5003428A (en) * 1989-07-17 1991-03-26 National Semiconductor Corporation Electrodes for ceramic oxide capacitors
GB9316926D0 (en) * 1993-08-13 1993-09-29 Ici Plc Electrode
AU719341B2 (en) * 1997-01-22 2000-05-04 De Nora Elettrodi S.P.A. Method of forming robust metal, metal oxide, and metal alloy layers on ion-conductive polymer membranes
US6673127B1 (en) * 1997-01-22 2004-01-06 Denora S.P.A. Method of forming robust metal, metal oxide, and metal alloy layers on ion-conductive polymer membranes
JPH1129863A (ja) * 1997-07-10 1999-02-02 Canon Inc 堆積膜製造方法
US7193934B2 (en) * 2002-06-07 2007-03-20 Carnegie Mellon University Domain position detection magnetic amplifying magneto-optical system
WO2007003363A1 (en) * 2005-07-01 2007-01-11 Basf Fuel Cell Gmbh Gas diffusion electrodes, membrane-electrode assemblies and method for the production thereof
JP4670530B2 (ja) * 2005-08-01 2011-04-13 アイテック株式会社 電解用の貴金属電極とその製造方法
DE102006057386A1 (de) * 2006-12-04 2008-06-05 Uhde Gmbh Verfahren zum Beschichten von Substraten
US7806641B2 (en) * 2007-08-30 2010-10-05 Ascentool, Inc. Substrate processing system having improved substrate transport system

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4544473A (en) * 1980-05-12 1985-10-01 Energy Conversion Devices, Inc. Catalytic electrolytic electrode
US5236509A (en) * 1992-02-06 1993-08-17 Spire Corporation Modular ibad apparatus for continuous coating
US5879827A (en) * 1997-10-10 1999-03-09 Minnesota Mining And Manufacturing Company Catalyst for membrane electrode assembly and method of making
US20030228512A1 (en) * 2002-06-05 2003-12-11 Gayatri Vyas Ultra-low loadings of au for stainless steel bipolar plates
EP1975280A1 (en) * 2007-03-23 2008-10-01 Permelec Electrode Ltd. Electrode for generation of hydrogen

Also Published As

Publication number Publication date
HK1167691A1 (en) 2012-12-07
AR078328A1 (es) 2011-11-02
BR112012004765A2 (pt) 2016-03-15
CN102482770A (zh) 2012-05-30
US20120164344A1 (en) 2012-06-28
MX2012002713A (es) 2012-04-19
EG26695A (en) 2014-06-11
CN102482770B (zh) 2015-03-25
AU2010291209B2 (en) 2014-08-28
KR20120049380A (ko) 2012-05-16
EP2473647A1 (en) 2012-07-11
JP5693583B2 (ja) 2015-04-01
CA2769818A1 (en) 2011-03-10
ZA201201432B (en) 2013-05-29
EA024663B1 (ru) 2016-10-31
EA201270368A1 (ru) 2012-09-28
AU2010291209A1 (en) 2012-03-01
IL217803A0 (en) 2012-03-29
WO2011026914A1 (en) 2011-03-10
JP2013503967A (ja) 2013-02-04

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