DK2153704T3 - AMPLIFICATION OF PLASMA SURFACE MODIFICATION BY USING HIGH-INTENSITY AND HIGH-EFFECT ULTRA WAVES - Google Patents
AMPLIFICATION OF PLASMA SURFACE MODIFICATION BY USING HIGH-INTENSITY AND HIGH-EFFECT ULTRA WAVES Download PDFInfo
- Publication number
- DK2153704T3 DK2153704T3 DK08759500.5T DK08759500T DK2153704T3 DK 2153704 T3 DK2153704 T3 DK 2153704T3 DK 08759500 T DK08759500 T DK 08759500T DK 2153704 T3 DK2153704 T3 DK 2153704T3
- Authority
- DK
- Denmark
- Prior art keywords
- plasma
- intensity
- plasma source
- gas
- power
- Prior art date
Links
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32321—Discharge generated by other radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4415—Acoustic wave CVD
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2475—Generating plasma using acoustic pressure discharges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2475—Generating plasma using acoustic pressure discharges
- H05H1/2493—Generating plasma using acoustic pressure discharges the plasma being activated using horns
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Acoustics & Sound (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DKPA200700717 | 2007-05-11 | ||
| PCT/EP2008/055773 WO2008138901A1 (en) | 2007-05-11 | 2008-05-09 | Enhancing plasma surface modification using high intensity and high power ultrasonic acoustic waves |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DK2153704T3 true DK2153704T3 (en) | 2018-04-23 |
Family
ID=39711085
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK08759500.5T DK2153704T3 (en) | 2007-05-11 | 2008-05-09 | AMPLIFICATION OF PLASMA SURFACE MODIFICATION BY USING HIGH-INTENSITY AND HIGH-EFFECT ULTRA WAVES |
| DK08759518.7T DK2153705T3 (en) | 2007-05-11 | 2008-05-13 | IMPROVING A GAS PHASE REACTION IN A PLASMA USING HIGH-INTENSITY AND HIGH-EFFECT ULTRA WAVES |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK08759518.7T DK2153705T3 (en) | 2007-05-11 | 2008-05-13 | IMPROVING A GAS PHASE REACTION IN A PLASMA USING HIGH-INTENSITY AND HIGH-EFFECT ULTRA WAVES |
Country Status (8)
| Country | Link |
|---|---|
| US (3) | US8399795B2 (https=) |
| EP (2) | EP2153704B1 (https=) |
| CN (2) | CN101743785B (https=) |
| DK (2) | DK2153704T3 (https=) |
| ES (2) | ES2662029T3 (https=) |
| NO (2) | NO2153704T3 (https=) |
| PL (2) | PL2153704T3 (https=) |
| WO (2) | WO2008138901A1 (https=) |
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| JP5458300B2 (ja) * | 2009-02-09 | 2014-04-02 | 公立大学法人横浜市立大学 | 微細構造物の蒸着装置及び方法 |
| EP2455332B1 (en) * | 2010-11-19 | 2014-02-12 | Imec | Method for producing temporary cap on a MEMS device |
| US9493709B2 (en) * | 2011-03-29 | 2016-11-15 | Fuelina Technologies, Llc | Hybrid fuel and method of making the same |
| US8603207B2 (en) | 2011-04-20 | 2013-12-10 | General Electric Company | Acoustic cleaning assembly for use in power generation systems and method of assembling same |
| CN102206866A (zh) * | 2011-04-30 | 2011-10-05 | 常州天合光能有限公司 | 介质阻挡放电氢等离子钝化方法 |
| KR101492175B1 (ko) | 2011-05-03 | 2015-02-10 | 주식회사 엘지화학 | 양극 활물질 입자의 표면 처리 방법 및 이로부터 형성된 양극 활물질 입자 |
| DE102011076806A1 (de) * | 2011-05-31 | 2012-12-06 | Leibniz-Institut für Plasmaforschung und Technologie e.V. | Vorrichtung und Verfahren zur Erzeugung eines kalten, homogenen Plasmas unter Atmosphärendruckbedingungen |
| US9540545B2 (en) * | 2011-09-02 | 2017-01-10 | Schlumberger Technology Corporation | Plasma treatment in fabricating directional drilling assemblies |
| CN102595756A (zh) * | 2012-03-15 | 2012-07-18 | 大连海事大学 | 一种气液混合介质阻挡放电的发生装置及发生方法 |
| EP2931067B1 (en) | 2012-12-11 | 2018-02-07 | Plasmology4, Inc. | Method and apparatus for cold plasma food contact surface sanitation |
| US9567542B2 (en) * | 2013-03-15 | 2017-02-14 | Fuelina Technologies, Llc | Hybrid fuel and method of making the same |
| US10800092B1 (en) * | 2013-12-18 | 2020-10-13 | Surfx Technologies Llc | Low temperature atmospheric pressure plasma for cleaning and activating metals |
| CN107001033B (zh) * | 2014-09-30 | 2020-07-10 | 普拉斯科转换技术有限公司 | 一种精炼合成气的非平衡等离子体系统和方法 |
| CA2969688A1 (en) | 2014-12-03 | 2016-06-09 | Drexel University | Direct incorporation of natural gas into hydrocarbon liquid fuels |
| CN105879597A (zh) * | 2014-12-24 | 2016-08-24 | 苏州超等环保科技有限公司 | 一种螺旋式等离子高压放电管的废气处理装置 |
| US10427129B2 (en) * | 2015-04-17 | 2019-10-01 | LLT International (Ireland) Ltd. | Systems and methods for facilitating reactions in gases using shockwaves produced in a supersonic gaseous vortex |
| CN107529789A (zh) | 2015-04-28 | 2018-01-02 | 马斯公司 | 制备灭菌湿宠物食品的方法 |
| US10194672B2 (en) | 2015-10-23 | 2019-02-05 | NanoGuard Technologies, LLC | Reactive gas, reactive gas generation system and product treatment using reactive gas |
| KR101788808B1 (ko) * | 2015-11-26 | 2017-11-15 | 조선대학교산학협력단 | 상온 및 상압 조건하에서 이산화탄소와 수소를 이용한 메탄가스 합성방법 및 합성장치 |
| DE102017105401B4 (de) * | 2017-03-14 | 2019-01-31 | Tdk Electronics Ag | Vorrichtung zur Erzeugung eines nichtthermischen Atmosphärendruck-Plasmas |
| US10543457B2 (en) | 2017-10-18 | 2020-01-28 | Thrivaltech, Llc | Isolated plasma array treatment systems |
| US12480194B2 (en) * | 2017-11-17 | 2025-11-25 | Sms Group Gmbh | Method for the preoxidation of strip steel in a reaction chamber arranged in a furnace chamber |
| CN109030615B (zh) * | 2018-11-03 | 2024-07-12 | 宁波华仪宁创智能科技有限公司 | 热解吸装置及质谱分析方法 |
| US10925144B2 (en) | 2019-06-14 | 2021-02-16 | NanoGuard Technologies, LLC | Electrode assembly, dielectric barrier discharge system and use thereof |
| CN111111581B (zh) * | 2019-12-19 | 2021-07-02 | 中国科学院电工研究所 | 一种等离子体燃料重整装置 |
| JP7647576B2 (ja) * | 2019-12-27 | 2025-03-18 | 株式会社レゾナック | フッ素ガスの製造方法及びフッ素ガス製造装置 |
| US11896731B2 (en) | 2020-04-03 | 2024-02-13 | NanoGuard Technologies, LLC | Methods of disarming viruses using reactive gas |
| CA3181267A1 (en) * | 2020-06-17 | 2021-12-23 | Dipen N. Sinha | Destruction of airborne pathogens, and microorganisms on grains and dried food using ultrasound |
| CN111954360A (zh) * | 2020-09-18 | 2020-11-17 | 云南电网有限责任公司电力科学研究院 | 基于混合气体的大面积冷等离子体发生装置及方法 |
| US11510307B1 (en) * | 2021-05-08 | 2022-11-22 | Perriquest Defense Research Enterprises, Llc | Plasma engine using reactive species |
| US20240141479A1 (en) * | 2022-10-31 | 2024-05-02 | Rtx Corporation | Acoustic wave assisted chemical vapor iinfiltration |
| CN115845111B (zh) * | 2022-12-15 | 2025-07-25 | 上海惠浦机电科技有限公司 | 一种电子消毒卡 |
| CN116133221A (zh) * | 2022-12-15 | 2023-05-16 | 上海惠浦机电科技有限公司 | 一种射流低温微等离子发生器及其制备方法 |
| WO2025014870A2 (en) * | 2023-07-07 | 2025-01-16 | Rensselaer Polytechnic Institute | Manipulation of gaseous ion beams with acoustic fields |
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| TW507858U (en) * | 2001-07-23 | 2002-10-21 | Lin Chau Tang | Energy saving lighting device with high illumination |
| US7001631B2 (en) * | 2002-07-30 | 2006-02-21 | Steris Inc. | Low temperature sanitization of human pathogens from the surfaces of food and food packaging |
| US20070065596A1 (en) * | 2003-11-20 | 2007-03-22 | Pavel Koulik | Plasma thin-film deposition method |
| JP2006013903A (ja) * | 2004-06-25 | 2006-01-12 | Seiko Epson Corp | 音響レンズ及びこれを用いた超音波スピーカ |
| UA95486C2 (uk) * | 2006-07-07 | 2011-08-10 | Форс Текнолоджи | Спосіб та система для поліпшеного застосування високоінтенсивних акустичних хвиль |
| US20080220133A1 (en) * | 2007-03-05 | 2008-09-11 | Gary Bruce Carman | Food sanitation system |
-
2008
- 2008-05-09 NO NO08759500A patent/NO2153704T3/no unknown
- 2008-05-09 PL PL08759500T patent/PL2153704T3/pl unknown
- 2008-05-09 CN CN2008800217393A patent/CN101743785B/zh not_active Expired - Fee Related
- 2008-05-09 ES ES08759500.5T patent/ES2662029T3/es active Active
- 2008-05-09 WO PCT/EP2008/055773 patent/WO2008138901A1/en not_active Ceased
- 2008-05-09 EP EP08759500.5A patent/EP2153704B1/en not_active Not-in-force
- 2008-05-09 US US12/599,775 patent/US8399795B2/en not_active Expired - Fee Related
- 2008-05-09 DK DK08759500.5T patent/DK2153704T3/en active
- 2008-05-13 NO NO08759518A patent/NO2153705T3/no unknown
- 2008-05-13 CN CN2008800217069A patent/CN101731025B/zh not_active Expired - Fee Related
- 2008-05-13 DK DK08759518.7T patent/DK2153705T3/en active
- 2008-05-13 ES ES08759518.7T patent/ES2659714T3/es active Active
- 2008-05-13 WO PCT/EP2008/055801 patent/WO2008138915A1/en not_active Ceased
- 2008-05-13 EP EP08759518.7A patent/EP2153705B1/en not_active Not-in-force
- 2008-05-13 PL PL08759518T patent/PL2153705T3/pl unknown
- 2008-05-13 US US12/599,782 patent/US20110048251A1/en not_active Abandoned
-
2017
- 2017-12-28 US US15/857,030 patent/US20180122622A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| PL2153705T3 (pl) | 2018-06-29 |
| CN101731025B (zh) | 2012-12-12 |
| WO2008138915A1 (en) | 2008-11-20 |
| CN101731025A (zh) | 2010-06-09 |
| US20110048251A1 (en) | 2011-03-03 |
| EP2153704A1 (en) | 2010-02-17 |
| CN101743785A (zh) | 2010-06-16 |
| CN101743785B (zh) | 2012-11-14 |
| WO2008138901A1 (en) | 2008-11-20 |
| US8399795B2 (en) | 2013-03-19 |
| NO2153704T3 (https=) | 2018-07-14 |
| EP2153704B1 (en) | 2018-02-14 |
| DK2153705T3 (en) | 2018-03-19 |
| EP2153705B1 (en) | 2017-12-27 |
| PL2153704T3 (pl) | 2018-06-29 |
| NO2153705T3 (https=) | 2018-05-26 |
| US20180122622A1 (en) | 2018-05-03 |
| US20100304146A1 (en) | 2010-12-02 |
| ES2662029T3 (es) | 2018-04-05 |
| ES2659714T3 (es) | 2018-03-19 |
| EP2153705A1 (en) | 2010-02-17 |
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