CN101743785B - 使用高强度和高功率超声波增强等离子体表面改性 - Google Patents

使用高强度和高功率超声波增强等离子体表面改性 Download PDF

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Publication number
CN101743785B
CN101743785B CN2008800217393A CN200880021739A CN101743785B CN 101743785 B CN101743785 B CN 101743785B CN 2008800217393 A CN2008800217393 A CN 2008800217393A CN 200880021739 A CN200880021739 A CN 200880021739A CN 101743785 B CN101743785 B CN 101743785B
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CN
China
Prior art keywords
plasma
plasma source
intensity
sound
wave generator
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Expired - Fee Related
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CN2008800217393A
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English (en)
Chinese (zh)
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CN101743785A (zh
Inventor
尼尔斯·克雷布斯
A·巴登施泰恩
草野行弘
H·宾德斯雷弗
H·J·莫藤森
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Sanovo Biosafety
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TECHNICAL UNIVERSITY OF DENMAR
Force Technology
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321—Discharge generated by other radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4415—Acoustic wave CVD
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2475—Generating plasma using acoustic pressure discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2475—Generating plasma using acoustic pressure discharges
    • H05H1/2493—Generating plasma using acoustic pressure discharges the plasma being activated using horns
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31—Surface property or characteristic of web, sheet or block

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Acoustics & Sound (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
CN2008800217393A 2007-05-11 2008-05-09 使用高强度和高功率超声波增强等离子体表面改性 Expired - Fee Related CN101743785B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DKPA200700717 2007-05-11
DKPA200700717 2007-05-11
PCT/EP2008/055773 WO2008138901A1 (en) 2007-05-11 2008-05-09 Enhancing plasma surface modification using high intensity and high power ultrasonic acoustic waves

Publications (2)

Publication Number Publication Date
CN101743785A CN101743785A (zh) 2010-06-16
CN101743785B true CN101743785B (zh) 2012-11-14

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CN2008800217393A Expired - Fee Related CN101743785B (zh) 2007-05-11 2008-05-09 使用高强度和高功率超声波增强等离子体表面改性
CN2008800217069A Expired - Fee Related CN101731025B (zh) 2007-05-11 2008-05-13 使用高强度和高功率超声波在等离子体中增强气相反应

Family Applications After (1)

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CN2008800217069A Expired - Fee Related CN101731025B (zh) 2007-05-11 2008-05-13 使用高强度和高功率超声波在等离子体中增强气相反应

Country Status (8)

Country Link
US (3) US8399795B2 (https=)
EP (2) EP2153704B1 (https=)
CN (2) CN101743785B (https=)
DK (2) DK2153704T3 (https=)
ES (2) ES2662029T3 (https=)
NO (2) NO2153704T3 (https=)
PL (2) PL2153704T3 (https=)
WO (2) WO2008138901A1 (https=)

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CN102206866A (zh) * 2011-04-30 2011-10-05 常州天合光能有限公司 介质阻挡放电氢等离子钝化方法
KR101492175B1 (ko) 2011-05-03 2015-02-10 주식회사 엘지화학 양극 활물질 입자의 표면 처리 방법 및 이로부터 형성된 양극 활물질 입자
DE102011076806A1 (de) * 2011-05-31 2012-12-06 Leibniz-Institut für Plasmaforschung und Technologie e.V. Vorrichtung und Verfahren zur Erzeugung eines kalten, homogenen Plasmas unter Atmosphärendruckbedingungen
US9540545B2 (en) * 2011-09-02 2017-01-10 Schlumberger Technology Corporation Plasma treatment in fabricating directional drilling assemblies
CN102595756A (zh) * 2012-03-15 2012-07-18 大连海事大学 一种气液混合介质阻挡放电的发生装置及发生方法
EP2931067B1 (en) 2012-12-11 2018-02-07 Plasmology4, Inc. Method and apparatus for cold plasma food contact surface sanitation
US9567542B2 (en) * 2013-03-15 2017-02-14 Fuelina Technologies, Llc Hybrid fuel and method of making the same
US10800092B1 (en) * 2013-12-18 2020-10-13 Surfx Technologies Llc Low temperature atmospheric pressure plasma for cleaning and activating metals
CN107001033B (zh) * 2014-09-30 2020-07-10 普拉斯科转换技术有限公司 一种精炼合成气的非平衡等离子体系统和方法
CA2969688A1 (en) 2014-12-03 2016-06-09 Drexel University Direct incorporation of natural gas into hydrocarbon liquid fuels
CN105879597A (zh) * 2014-12-24 2016-08-24 苏州超等环保科技有限公司 一种螺旋式等离子高压放电管的废气处理装置
US10427129B2 (en) * 2015-04-17 2019-10-01 LLT International (Ireland) Ltd. Systems and methods for facilitating reactions in gases using shockwaves produced in a supersonic gaseous vortex
CN107529789A (zh) 2015-04-28 2018-01-02 马斯公司 制备灭菌湿宠物食品的方法
US10194672B2 (en) 2015-10-23 2019-02-05 NanoGuard Technologies, LLC Reactive gas, reactive gas generation system and product treatment using reactive gas
KR101788808B1 (ko) * 2015-11-26 2017-11-15 조선대학교산학협력단 상온 및 상압 조건하에서 이산화탄소와 수소를 이용한 메탄가스 합성방법 및 합성장치
DE102017105401B4 (de) * 2017-03-14 2019-01-31 Tdk Electronics Ag Vorrichtung zur Erzeugung eines nichtthermischen Atmosphärendruck-Plasmas
US10543457B2 (en) 2017-10-18 2020-01-28 Thrivaltech, Llc Isolated plasma array treatment systems
US12480194B2 (en) * 2017-11-17 2025-11-25 Sms Group Gmbh Method for the preoxidation of strip steel in a reaction chamber arranged in a furnace chamber
CN109030615B (zh) * 2018-11-03 2024-07-12 宁波华仪宁创智能科技有限公司 热解吸装置及质谱分析方法
US10925144B2 (en) 2019-06-14 2021-02-16 NanoGuard Technologies, LLC Electrode assembly, dielectric barrier discharge system and use thereof
CN111111581B (zh) * 2019-12-19 2021-07-02 中国科学院电工研究所 一种等离子体燃料重整装置
JP7647576B2 (ja) * 2019-12-27 2025-03-18 株式会社レゾナック フッ素ガスの製造方法及びフッ素ガス製造装置
US11896731B2 (en) 2020-04-03 2024-02-13 NanoGuard Technologies, LLC Methods of disarming viruses using reactive gas
CA3181267A1 (en) * 2020-06-17 2021-12-23 Dipen N. Sinha Destruction of airborne pathogens, and microorganisms on grains and dried food using ultrasound
CN111954360A (zh) * 2020-09-18 2020-11-17 云南电网有限责任公司电力科学研究院 基于混合气体的大面积冷等离子体发生装置及方法
US11510307B1 (en) * 2021-05-08 2022-11-22 Perriquest Defense Research Enterprises, Llc Plasma engine using reactive species
US20240141479A1 (en) * 2022-10-31 2024-05-02 Rtx Corporation Acoustic wave assisted chemical vapor iinfiltration
CN115845111B (zh) * 2022-12-15 2025-07-25 上海惠浦机电科技有限公司 一种电子消毒卡
CN116133221A (zh) * 2022-12-15 2023-05-16 上海惠浦机电科技有限公司 一种射流低温微等离子发生器及其制备方法
WO2025014870A2 (en) * 2023-07-07 2025-01-16 Rensselaer Polytechnic Institute Manipulation of gaseous ion beams with acoustic fields

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CN1498117A (zh) * 2001-03-28 2004-05-19 通过表面处理消毒物品的装置和方法
CN1511333A (zh) * 2001-03-27 2004-07-07 APIT�ɷ����޹�˾ 等离子体表面处理的方法以及实现该方法的设备

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Also Published As

Publication number Publication date
PL2153705T3 (pl) 2018-06-29
CN101731025B (zh) 2012-12-12
WO2008138915A1 (en) 2008-11-20
CN101731025A (zh) 2010-06-09
US20110048251A1 (en) 2011-03-03
EP2153704A1 (en) 2010-02-17
CN101743785A (zh) 2010-06-16
WO2008138901A1 (en) 2008-11-20
US8399795B2 (en) 2013-03-19
DK2153704T3 (en) 2018-04-23
NO2153704T3 (https=) 2018-07-14
EP2153704B1 (en) 2018-02-14
DK2153705T3 (en) 2018-03-19
EP2153705B1 (en) 2017-12-27
PL2153704T3 (pl) 2018-06-29
NO2153705T3 (https=) 2018-05-26
US20180122622A1 (en) 2018-05-03
US20100304146A1 (en) 2010-12-02
ES2662029T3 (es) 2018-04-05
ES2659714T3 (es) 2018-03-19
EP2153705A1 (en) 2010-02-17

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Effective date of registration: 20170925

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Granted publication date: 20121114