CN101743785A - 使用高强度和高功率超声波增强等离子体表面改性 - Google Patents
使用高强度和高功率超声波增强等离子体表面改性 Download PDFInfo
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- CN101743785A CN101743785A CN200880021739A CN200880021739A CN101743785A CN 101743785 A CN101743785 A CN 101743785A CN 200880021739 A CN200880021739 A CN 200880021739A CN 200880021739 A CN200880021739 A CN 200880021739A CN 101743785 A CN101743785 A CN 101743785A
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32321—Discharge generated by other radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4415—Acoustic wave CVD
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2475—Generating plasma using acoustic pressure discharges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2475—Generating plasma using acoustic pressure discharges
- H05H1/2493—Generating plasma using acoustic pressure discharges the plasma being activated using horns
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Acoustics & Sound (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
Abstract
Description
Claims (29)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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DKPA200700717 | 2007-05-11 | ||
DKPA200700717 | 2007-05-11 | ||
PCT/EP2008/055773 WO2008138901A1 (en) | 2007-05-11 | 2008-05-09 | Enhancing plasma surface modification using high intensity and high power ultrasonic acoustic waves |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101743785A true CN101743785A (zh) | 2010-06-16 |
CN101743785B CN101743785B (zh) | 2012-11-14 |
Family
ID=39711085
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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CN2008800217393A Expired - Fee Related CN101743785B (zh) | 2007-05-11 | 2008-05-09 | 使用高强度和高功率超声波增强等离子体表面改性 |
CN2008800217069A Expired - Fee Related CN101731025B (zh) | 2007-05-11 | 2008-05-13 | 使用高强度和高功率超声波在等离子体中增强气相反应 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
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CN2008800217069A Expired - Fee Related CN101731025B (zh) | 2007-05-11 | 2008-05-13 | 使用高强度和高功率超声波在等离子体中增强气相反应 |
Country Status (8)
Country | Link |
---|---|
US (3) | US8399795B2 (zh) |
EP (2) | EP2153704B1 (zh) |
CN (2) | CN101743785B (zh) |
DK (2) | DK2153704T3 (zh) |
ES (2) | ES2662029T3 (zh) |
NO (2) | NO2153704T3 (zh) |
PL (2) | PL2153704T3 (zh) |
WO (2) | WO2008138901A1 (zh) |
Cited By (1)
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CN102206866A (zh) * | 2011-04-30 | 2011-10-05 | 常州天合光能有限公司 | 介质阻挡放电氢等离子钝化方法 |
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US8603207B2 (en) | 2011-04-20 | 2013-12-10 | General Electric Company | Acoustic cleaning assembly for use in power generation systems and method of assembling same |
KR101492175B1 (ko) | 2011-05-03 | 2015-02-10 | 주식회사 엘지화학 | 양극 활물질 입자의 표면 처리 방법 및 이로부터 형성된 양극 활물질 입자 |
DE102011076806A1 (de) * | 2011-05-31 | 2012-12-06 | Leibniz-Institut für Plasmaforschung und Technologie e.V. | Vorrichtung und Verfahren zur Erzeugung eines kalten, homogenen Plasmas unter Atmosphärendruckbedingungen |
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CN102595756A (zh) * | 2012-03-15 | 2012-07-18 | 大连海事大学 | 一种气液混合介质阻挡放电的发生装置及发生方法 |
US9295280B2 (en) | 2012-12-11 | 2016-03-29 | Plasmology4, Inc. | Method and apparatus for cold plasma food contact surface sanitation |
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CA2963010A1 (en) * | 2014-09-30 | 2016-04-07 | Plasco Energy Group Inc. | A non-equilibrium plasma system and method of refining syngas |
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CN105879597A (zh) * | 2014-12-24 | 2016-08-24 | 苏州超等环保科技有限公司 | 一种螺旋式等离子高压放电管的废气处理装置 |
US10427129B2 (en) * | 2015-04-17 | 2019-10-01 | LLT International (Ireland) Ltd. | Systems and methods for facilitating reactions in gases using shockwaves produced in a supersonic gaseous vortex |
MX2017013715A (es) | 2015-04-28 | 2018-03-02 | Mars Inc | Proceso de preparacion de un producto de alimento para mascotas humedo esterilizado. |
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KR101788808B1 (ko) * | 2015-11-26 | 2017-11-15 | 조선대학교산학협력단 | 상온 및 상압 조건하에서 이산화탄소와 수소를 이용한 메탄가스 합성방법 및 합성장치 |
US10543457B2 (en) | 2017-10-18 | 2020-01-28 | Thrivaltech, Llc | Isolated plasma array treatment systems |
US20230193442A1 (en) * | 2017-11-17 | 2023-06-22 | Sms Group Gmbh | Method for the preoxidation of strip steel in a reaction chamber arranged in a furnace chamber |
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US10925144B2 (en) | 2019-06-14 | 2021-02-16 | NanoGuard Technologies, LLC | Electrode assembly, dielectric barrier discharge system and use thereof |
CN111111581B (zh) * | 2019-12-19 | 2021-07-02 | 中国科学院电工研究所 | 一种等离子体燃料重整装置 |
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JP2007512436A (ja) * | 2003-11-20 | 2007-05-17 | アピト コープ.エス.アー. | プラズマ薄膜堆積方法 |
JP2006013903A (ja) * | 2004-06-25 | 2006-01-12 | Seiko Epson Corp | 音響レンズ及びこれを用いた超音波スピーカ |
UA95486C2 (uk) * | 2006-07-07 | 2011-08-10 | Форс Текнолоджи | Спосіб та система для поліпшеного застосування високоінтенсивних акустичних хвиль |
US20080220133A1 (en) * | 2007-03-05 | 2008-09-11 | Gary Bruce Carman | Food sanitation system |
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2008
- 2008-05-09 ES ES08759500.5T patent/ES2662029T3/es active Active
- 2008-05-09 CN CN2008800217393A patent/CN101743785B/zh not_active Expired - Fee Related
- 2008-05-09 WO PCT/EP2008/055773 patent/WO2008138901A1/en active Application Filing
- 2008-05-09 PL PL08759500T patent/PL2153704T3/pl unknown
- 2008-05-09 NO NO08759500A patent/NO2153704T3/no unknown
- 2008-05-09 US US12/599,775 patent/US8399795B2/en active Active
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- 2008-05-09 DK DK08759500.5T patent/DK2153704T3/en active
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- 2008-05-13 NO NO08759518A patent/NO2153705T3/no unknown
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102206866A (zh) * | 2011-04-30 | 2011-10-05 | 常州天合光能有限公司 | 介质阻挡放电氢等离子钝化方法 |
Also Published As
Publication number | Publication date |
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US20180122622A1 (en) | 2018-05-03 |
CN101743785B (zh) | 2012-11-14 |
NO2153704T3 (zh) | 2018-07-14 |
CN101731025B (zh) | 2012-12-12 |
PL2153705T3 (pl) | 2018-06-29 |
DK2153704T3 (en) | 2018-04-23 |
NO2153705T3 (zh) | 2018-05-26 |
EP2153705B1 (en) | 2017-12-27 |
US8399795B2 (en) | 2013-03-19 |
EP2153705A1 (en) | 2010-02-17 |
ES2662029T3 (es) | 2018-04-05 |
EP2153704A1 (en) | 2010-02-17 |
CN101731025A (zh) | 2010-06-09 |
EP2153704B1 (en) | 2018-02-14 |
ES2659714T3 (es) | 2018-03-19 |
US20100304146A1 (en) | 2010-12-02 |
WO2008138901A1 (en) | 2008-11-20 |
US20110048251A1 (en) | 2011-03-03 |
DK2153705T3 (en) | 2018-03-19 |
WO2008138915A1 (en) | 2008-11-20 |
PL2153704T3 (pl) | 2018-06-29 |
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