CN101731025A - 使用高强度和高功率超声波在等离子体中增强气相反应 - Google Patents
使用高强度和高功率超声波在等离子体中增强气相反应 Download PDFInfo
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- CN101731025A CN101731025A CN200880021706A CN200880021706A CN101731025A CN 101731025 A CN101731025 A CN 101731025A CN 200880021706 A CN200880021706 A CN 200880021706A CN 200880021706 A CN200880021706 A CN 200880021706A CN 101731025 A CN101731025 A CN 101731025A
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- plasma
- acoustic wave
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32321—Discharge generated by other radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4415—Acoustic wave CVD
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2475—Generating plasma using acoustic pressure discharges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2475—Generating plasma using acoustic pressure discharges
- H05H1/2493—Generating plasma using acoustic pressure discharges the plasma being activated using horns
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Acoustics & Sound (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
Abstract
Description
Claims (28)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DKPA200700717 | 2007-05-11 | ||
DKPA200700717 | 2007-05-11 | ||
PCT/EP2008/055801 WO2008138915A1 (en) | 2007-05-11 | 2008-05-13 | Enhancing gas-phase reaction in a plasma using high intensity and high power ultrasonic acoustic waves |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101731025A true CN101731025A (zh) | 2010-06-09 |
CN101731025B CN101731025B (zh) | 2012-12-12 |
Family
ID=39711085
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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CN2008800217393A Expired - Fee Related CN101743785B (zh) | 2007-05-11 | 2008-05-09 | 使用高强度和高功率超声波增强等离子体表面改性 |
CN2008800217069A Expired - Fee Related CN101731025B (zh) | 2007-05-11 | 2008-05-13 | 使用高强度和高功率超声波在等离子体中增强气相反应 |
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Application Number | Title | Priority Date | Filing Date |
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CN2008800217393A Expired - Fee Related CN101743785B (zh) | 2007-05-11 | 2008-05-09 | 使用高强度和高功率超声波增强等离子体表面改性 |
Country Status (8)
Country | Link |
---|---|
US (3) | US8399795B2 (zh) |
EP (2) | EP2153704B1 (zh) |
CN (2) | CN101743785B (zh) |
DK (2) | DK2153704T3 (zh) |
ES (2) | ES2662029T3 (zh) |
NO (2) | NO2153704T3 (zh) |
PL (2) | PL2153704T3 (zh) |
WO (2) | WO2008138901A1 (zh) |
Cited By (4)
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CN107921404A (zh) * | 2015-04-17 | 2018-04-17 | Llt国际(爱尔兰)有限公司 | 利用在超音速气体涡流中产生的冲击波促进气体中的反应的系统和方法 |
CN111111581A (zh) * | 2019-12-19 | 2020-05-08 | 中国科学院电工研究所 | 一种等离子体燃料重整装置 |
CN111954360A (zh) * | 2020-09-18 | 2020-11-17 | 云南电网有限责任公司电力科学研究院 | 基于混合气体的大面积冷等离子体发生装置及方法 |
CN113939613A (zh) * | 2019-12-27 | 2022-01-14 | 昭和电工株式会社 | 氟气的制造方法及氟气制造装置 |
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JP5458300B2 (ja) * | 2009-02-09 | 2014-04-02 | 公立大学法人横浜市立大学 | 微細構造物の蒸着装置及び方法 |
EP2455332B1 (en) * | 2010-11-19 | 2014-02-12 | Imec | Method for producing temporary cap on a MEMS device |
PL406629A1 (pl) * | 2011-03-29 | 2014-07-21 | Fuelina, Inc. | Paliwo hybrydowe i sposób jego wytwarzania |
US8603207B2 (en) | 2011-04-20 | 2013-12-10 | General Electric Company | Acoustic cleaning assembly for use in power generation systems and method of assembling same |
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DE102011076806A1 (de) * | 2011-05-31 | 2012-12-06 | Leibniz-Institut für Plasmaforschung und Technologie e.V. | Vorrichtung und Verfahren zur Erzeugung eines kalten, homogenen Plasmas unter Atmosphärendruckbedingungen |
US9540545B2 (en) * | 2011-09-02 | 2017-01-10 | Schlumberger Technology Corporation | Plasma treatment in fabricating directional drilling assemblies |
CN102595756A (zh) * | 2012-03-15 | 2012-07-18 | 大连海事大学 | 一种气液混合介质阻挡放电的发生装置及发生方法 |
EP2931067B1 (en) | 2012-12-11 | 2018-02-07 | Plasmology4, Inc. | Method and apparatus for cold plasma food contact surface sanitation |
US9567542B2 (en) * | 2013-03-15 | 2017-02-14 | Fuelina Technologies, Llc | Hybrid fuel and method of making the same |
US10800092B1 (en) | 2013-12-18 | 2020-10-13 | Surfx Technologies Llc | Low temperature atmospheric pressure plasma for cleaning and activating metals |
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US10308885B2 (en) | 2014-12-03 | 2019-06-04 | Drexel University | Direct incorporation of natural gas into hydrocarbon liquid fuels |
CN105879597A (zh) * | 2014-12-24 | 2016-08-24 | 苏州超等环保科技有限公司 | 一种螺旋式等离子高压放电管的废气处理装置 |
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US10194672B2 (en) | 2015-10-23 | 2019-02-05 | NanoGuard Technologies, LLC | Reactive gas, reactive gas generation system and product treatment using reactive gas |
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JPH11335869A (ja) | 1998-05-20 | 1999-12-07 | Seiko Epson Corp | 表面処理方法及び装置 |
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- 2008-05-09 ES ES08759500.5T patent/ES2662029T3/es active Active
- 2008-05-09 DK DK08759500.5T patent/DK2153704T3/en active
- 2008-05-09 NO NO08759500A patent/NO2153704T3/no unknown
- 2008-05-09 US US12/599,775 patent/US8399795B2/en active Active
- 2008-05-09 PL PL08759500T patent/PL2153704T3/pl unknown
- 2008-05-09 CN CN2008800217393A patent/CN101743785B/zh not_active Expired - Fee Related
- 2008-05-13 NO NO08759518A patent/NO2153705T3/no unknown
- 2008-05-13 EP EP08759518.7A patent/EP2153705B1/en active Active
- 2008-05-13 US US12/599,782 patent/US20110048251A1/en not_active Abandoned
- 2008-05-13 DK DK08759518.7T patent/DK2153705T3/en active
- 2008-05-13 WO PCT/EP2008/055801 patent/WO2008138915A1/en active Application Filing
- 2008-05-13 CN CN2008800217069A patent/CN101731025B/zh not_active Expired - Fee Related
- 2008-05-13 PL PL08759518T patent/PL2153705T3/pl unknown
- 2008-05-13 ES ES08759518.7T patent/ES2659714T3/es active Active
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2017
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN107921404A (zh) * | 2015-04-17 | 2018-04-17 | Llt国际(爱尔兰)有限公司 | 利用在超音速气体涡流中产生的冲击波促进气体中的反应的系统和方法 |
CN111111581A (zh) * | 2019-12-19 | 2020-05-08 | 中国科学院电工研究所 | 一种等离子体燃料重整装置 |
CN113939613A (zh) * | 2019-12-27 | 2022-01-14 | 昭和电工株式会社 | 氟气的制造方法及氟气制造装置 |
CN111954360A (zh) * | 2020-09-18 | 2020-11-17 | 云南电网有限责任公司电力科学研究院 | 基于混合气体的大面积冷等离子体发生装置及方法 |
Also Published As
Publication number | Publication date |
---|---|
PL2153705T3 (pl) | 2018-06-29 |
US8399795B2 (en) | 2013-03-19 |
WO2008138901A1 (en) | 2008-11-20 |
ES2662029T3 (es) | 2018-04-05 |
CN101731025B (zh) | 2012-12-12 |
EP2153705A1 (en) | 2010-02-17 |
WO2008138915A1 (en) | 2008-11-20 |
PL2153704T3 (pl) | 2018-06-29 |
NO2153705T3 (zh) | 2018-05-26 |
US20100304146A1 (en) | 2010-12-02 |
NO2153704T3 (zh) | 2018-07-14 |
EP2153705B1 (en) | 2017-12-27 |
DK2153705T3 (en) | 2018-03-19 |
US20180122622A1 (en) | 2018-05-03 |
EP2153704A1 (en) | 2010-02-17 |
CN101743785B (zh) | 2012-11-14 |
DK2153704T3 (en) | 2018-04-23 |
EP2153704B1 (en) | 2018-02-14 |
CN101743785A (zh) | 2010-06-16 |
ES2659714T3 (es) | 2018-03-19 |
US20110048251A1 (en) | 2011-03-03 |
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