DK1169492T3 - Method of producing thin, poorly soluble coatings - Google Patents

Method of producing thin, poorly soluble coatings

Info

Publication number
DK1169492T3
DK1169492T3 DK00934914T DK00934914T DK1169492T3 DK 1169492 T3 DK1169492 T3 DK 1169492T3 DK 00934914 T DK00934914 T DK 00934914T DK 00934914 T DK00934914 T DK 00934914T DK 1169492 T3 DK1169492 T3 DK 1169492T3
Authority
DK
Denmark
Prior art keywords
layers
reactant gas
layer
oxidic
poorly soluble
Prior art date
Application number
DK00934914T
Other languages
Danish (da)
English (en)
Inventor
Christian-Herbert Fischer
Hans-Juergen Muffler
Martha Christina Lux-Steiner
Original Assignee
Hahn Meitner Inst Berlin Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hahn Meitner Inst Berlin Gmbh filed Critical Hahn Meitner Inst Berlin Gmbh
Application granted granted Critical
Publication of DK1169492T3 publication Critical patent/DK1169492T3/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10—Oxidising
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/80—After-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S501/00—Compositions: ceramic
    • Y10S501/90—Optical glass, e.g. silent on refractive index and/or ABBE number
    • Y10S501/906—Thorium oxide containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Photovoltaic Devices (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Pyridine Compounds (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Medicinal Preparation (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Chemical Vapour Deposition (AREA)
DK00934914T 1999-04-06 2000-04-06 Method of producing thin, poorly soluble coatings DK1169492T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19916403A DE19916403C1 (de) 1999-04-06 1999-04-06 Verfahren zur Herstellung dünner, schwer löslicher Beschichtungen
PCT/DE2000/001173 WO2000060135A2 (de) 1999-04-06 2000-04-06 Verfahren zur herstellung dünner, schwer löslicher beschichtungen

Publications (1)

Publication Number Publication Date
DK1169492T3 true DK1169492T3 (da) 2003-02-03

Family

ID=7904248

Family Applications (1)

Application Number Title Priority Date Filing Date
DK00934914T DK1169492T3 (da) 1999-04-06 2000-04-06 Method of producing thin, poorly soluble coatings

Country Status (16)

Country Link
US (1) US8158204B1 (de)
EP (1) EP1169492B1 (de)
JP (2) JP4275319B2 (de)
KR (1) KR20010113877A (de)
CN (1) CN1268786C (de)
AT (1) ATE224965T1 (de)
AU (1) AU757674B2 (de)
CA (1) CA2367342A1 (de)
DE (2) DE19916403C1 (de)
DK (1) DK1169492T3 (de)
ES (1) ES2183798T3 (de)
HU (1) HU222653B1 (de)
PL (1) PL193049B1 (de)
PT (1) PT1169492E (de)
RU (1) RU2250932C2 (de)
WO (1) WO2000060135A2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10142913B4 (de) 2001-08-27 2004-03-18 Hahn-Meitner-Institut Berlin Gmbh Vertikale Transistoranordnung mit einem flexiblen, aus Kunststofffolien bestehenden Substrat und Verfahren zu deren Herstellung
DE10160504C2 (de) * 2001-11-30 2003-11-13 Hahn Meitner Inst Berlin Gmbh Verfahren zur Herstellung dünner, schwer löslicher Beschichtungen
DE10258727A1 (de) * 2002-12-05 2004-06-24 Schott Glas Ofen
DE10339824B4 (de) * 2003-08-24 2005-07-07 Hahn-Meitner-Institut Berlin Gmbh Beschichtungsverfahren zur Deposition und Fixierung von Partikeln auf einer Substratoberfläche und Solarzellen mit funkionellem Schichtenaufbau
KR100863932B1 (ko) * 2007-07-10 2008-11-18 주식회사 코미코 세라믹 용사 코팅층의 수화 처리 방법과, 이를 이용한정전척 제조 방법 그리고 상기 수화 처리 방법에 형성된세라믹 용사 코팅층을 갖는 기판 구조물 및 정전척
DE102008017077B4 (de) 2008-04-01 2011-08-11 Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, 14109 Verfahren zur Herstellung einer n-halbleitenden Indiumsulfid-Dünnschicht
DE102009037371B3 (de) * 2009-08-13 2011-03-17 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh Beschichtungsvorrichtung mit Ultraschallzerstäuber
CN103489962B (zh) * 2013-10-07 2017-01-04 复旦大学 大面积制备半导体量子点的方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4242374A (en) * 1979-04-19 1980-12-30 Exxon Research & Engineering Co. Process for thin film deposition of metal and mixed metal chalcogenides displaying semi-conductor properties
JPS63103886A (ja) * 1986-10-21 1988-05-09 日本碍子株式会社 メタライズペ−ストならびにそれを使用してなるセラミツクスのメタライズ法
US5106828A (en) * 1987-07-20 1992-04-21 North American Philips Corporation Method for fabricating superconductors by sol-gel process
DE69325055T2 (de) * 1992-07-08 2000-03-09 Yeda Res & Dev Orientierte polykristalline dünne Filme aus Übergangsmetallchalcogeniden
JP2535790B2 (ja) * 1994-09-08 1996-09-18 工業技術院長 タングステンブロンズおよびその被覆複合体の製造方法
US5686368A (en) * 1995-12-13 1997-11-11 Quantum Group, Inc. Fibrous metal oxide textiles for spectral emitters
JPH10128115A (ja) * 1996-11-01 1998-05-19 Cosmo Sogo Kenkyusho:Kk 担持貴金属触媒およびその製造方法
ATE369631T1 (de) * 1998-03-19 2007-08-15 Hahn Meitner Inst Berlin Gmbh Verfahren und anordnung zur herstellung dünner metallchalkogenid-schichten
DE19831214C2 (de) * 1998-03-19 2003-07-03 Hahn Meitner Inst Berlin Gmbh Verfahren und Anordnung zur Herstellung dünner Metallchalkogenid-Schichten

Also Published As

Publication number Publication date
PT1169492E (pt) 2003-02-28
JP2003530284A (ja) 2003-10-14
CN1268786C (zh) 2006-08-09
DE50000568D1 (de) 2002-10-31
HU222653B1 (hu) 2003-09-29
CA2367342A1 (en) 2000-10-12
RU2250932C2 (ru) 2005-04-27
DE19916403C1 (de) 2000-10-12
PL193049B1 (pl) 2007-01-31
KR20010113877A (ko) 2001-12-28
EP1169492B1 (de) 2002-09-25
WO2000060135A3 (de) 2001-04-19
JP4275319B2 (ja) 2009-06-10
HUP0200790A2 (en) 2002-07-29
ES2183798T3 (es) 2003-04-01
EP1169492A2 (de) 2002-01-09
PL350799A1 (en) 2003-02-10
AU5060000A (en) 2000-10-23
AU757674B2 (en) 2003-02-27
ATE224965T1 (de) 2002-10-15
WO2000060135A2 (de) 2000-10-12
JP2009084153A (ja) 2009-04-23
CN1346412A (zh) 2002-04-24
US8158204B1 (en) 2012-04-17

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