DK0597053T3 - Apparat til varmebehandling af et magasin til systembærere med elektroniske komponenter - Google Patents

Apparat til varmebehandling af et magasin til systembærere med elektroniske komponenter

Info

Publication number
DK0597053T3
DK0597053T3 DK93909740.8T DK93909740T DK0597053T3 DK 0597053 T3 DK0597053 T3 DK 0597053T3 DK 93909740 T DK93909740 T DK 93909740T DK 0597053 T3 DK0597053 T3 DK 0597053T3
Authority
DK
Denmark
Prior art keywords
magazine
fan
pct
electronic components
heat treating
Prior art date
Application number
DK93909740.8T
Other languages
English (en)
Inventor
Claudio Meisser
Rolf Honegger
Original Assignee
Esec Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Esec Sa filed Critical Esec Sa
Application granted granted Critical
Publication of DK0597053T3 publication Critical patent/DK0597053T3/da

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/12—Heating of the reaction chamber
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F26B21/02—Circulating air or gases in closed cycles, e.g. wholly within the drying enclosure
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • F27B17/0016—Chamber type furnaces
    • F27B17/0025—Especially adapted for treating semiconductor wafers
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • F27B17/0016—Chamber type furnaces
    • F27B17/0083—Chamber type furnaces with means for circulating the atmosphere
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B5/16—Arrangements of air or gas supply devices
DK93909740.8T 1992-06-03 1993-05-21 Apparat til varmebehandling af et magasin til systembærere med elektroniske komponenter DK0597053T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH178692 1992-06-03

Publications (1)

Publication Number Publication Date
DK0597053T3 true DK0597053T3 (da) 1998-04-06

Family

ID=4218571

Family Applications (1)

Application Number Title Priority Date Filing Date
DK93909740.8T DK0597053T3 (da) 1992-06-03 1993-05-21 Apparat til varmebehandling af et magasin til systembærere med elektroniske komponenter

Country Status (11)

Country Link
US (1) US5569402A (da)
EP (1) EP0597053B1 (da)
JP (1) JPH07503529A (da)
KR (1) KR940701531A (da)
AT (1) ATE157159T1 (da)
DE (1) DE59307163D1 (da)
DK (1) DK0597053T3 (da)
ES (1) ES2109491T3 (da)
GR (1) GR3025390T3 (da)
SG (1) SG46236A1 (da)
WO (1) WO1993024801A1 (da)

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Also Published As

Publication number Publication date
ATE157159T1 (de) 1997-09-15
EP0597053A1 (de) 1994-05-18
GR3025390T3 (en) 1998-02-27
JPH07503529A (ja) 1995-04-13
EP0597053B1 (de) 1997-08-20
ES2109491T3 (es) 1998-01-16
SG46236A1 (en) 1998-02-20
KR940701531A (ko) 1994-05-28
WO1993024801A1 (de) 1993-12-09
US5569402A (en) 1996-10-29
DE59307163D1 (de) 1997-09-25

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