DE69728992D1 - Gerät und methode zur aufarbeitung von fotoresist-entwicklern und -entschichtern - Google Patents
Gerät und methode zur aufarbeitung von fotoresist-entwicklern und -entschichternInfo
- Publication number
- DE69728992D1 DE69728992D1 DE69728992T DE69728992T DE69728992D1 DE 69728992 D1 DE69728992 D1 DE 69728992D1 DE 69728992 T DE69728992 T DE 69728992T DE 69728992 T DE69728992 T DE 69728992T DE 69728992 D1 DE69728992 D1 DE 69728992D1
- Authority
- DE
- Germany
- Prior art keywords
- developing
- decoleurers
- processing
- stripping
- filters
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
- B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
- B44C1/22—Removing surface-material, e.g. by engraving, by etching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Physical Water Treatments (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/740,025 US5753135A (en) | 1995-10-23 | 1996-10-23 | Apparatus and method for recovering photoresist developers and strippers |
US740025 | 1996-10-23 | ||
PCT/US1997/019039 WO1998017483A1 (en) | 1996-10-23 | 1997-10-21 | Apparatus and method for recovering photoresist developers and strippers |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69728992D1 true DE69728992D1 (de) | 2004-06-09 |
DE69728992T2 DE69728992T2 (de) | 2005-04-07 |
Family
ID=24974734
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69728992T Expired - Lifetime DE69728992T2 (de) | 1996-10-23 | 1997-10-21 | Gerät und methode zur aufarbeitung von fotoresist-entwicklern und -entschichtern |
Country Status (12)
Country | Link |
---|---|
US (1) | US5753135A (de) |
EP (1) | EP0944482B1 (de) |
JP (1) | JP2001502847A (de) |
KR (1) | KR100386438B1 (de) |
AT (1) | ATE265944T1 (de) |
AU (1) | AU5424998A (de) |
BR (1) | BR9712358A (de) |
CA (1) | CA2268903C (de) |
DE (1) | DE69728992T2 (de) |
ES (1) | ES2221074T3 (de) |
IL (1) | IL129454A (de) |
WO (1) | WO1998017483A1 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6074561A (en) * | 1995-10-23 | 2000-06-13 | Phoenankh Corp. | Apparatus and method for recovering photoresist developers and strippers |
SG76567A1 (en) * | 1998-08-05 | 2000-11-21 | Samsung Electronics Co Ltd | Resist removing method and apparatus |
KR100419669B1 (ko) * | 2001-06-12 | 2004-02-25 | 주식회사 퓨어엔비텍 | 인쇄회로기판 제조용 현상액 리사이클링 시스템 |
KR20020094585A (ko) * | 2001-06-12 | 2002-12-18 | 주식회사 퓨어테크 | 인쇄회로기판 제조용 현상액 리사이클링 시스템 |
JP2003167358A (ja) * | 2001-11-29 | 2003-06-13 | Nagase & Co Ltd | レジスト剥離廃液の再生装置及び再生方法 |
KR101111455B1 (ko) * | 2003-10-28 | 2012-03-13 | 도판 인사츠 가부시키가이샤 | 현상장치, 현상방법, 및 현상액 순환방법 |
JP3884440B2 (ja) * | 2004-03-15 | 2007-02-21 | 株式会社東芝 | フィルタおよび半導体処理装置 |
JP4393910B2 (ja) * | 2004-04-08 | 2010-01-06 | 東京応化工業株式会社 | ホトレジスト組成物の製造方法、ろ過装置、塗布装置及びホトレジスト組成物 |
JP5125038B2 (ja) * | 2006-09-12 | 2013-01-23 | カシオ計算機株式会社 | レジスト剥離装置及びレジスト剥離方法 |
JP5165337B2 (ja) * | 2007-10-26 | 2013-03-21 | 日本リファイン株式会社 | 剥離液廃液からの剥離液の再生方法と再生装置 |
DE102007063202A1 (de) * | 2007-12-19 | 2009-06-25 | Gebr. Schmid Gmbh & Co. | Verfahren und Vorrichtung zur Behandlung von Silizium-Wafern |
JP6045283B2 (ja) * | 2012-10-11 | 2016-12-14 | 日本リファイン株式会社 | レジスト剥離液の再生方法および再生装置 |
JP6012429B2 (ja) * | 2012-11-20 | 2016-10-25 | キヤノン株式会社 | 有機溶剤の再生方法、有機溶剤の使用方法及びインクジェット記録ヘッドの製造方法 |
JP6159651B2 (ja) * | 2013-11-25 | 2017-07-05 | 東京エレクトロン株式会社 | フィルタ洗浄方法、液処理装置及び記憶媒体 |
JP6723000B2 (ja) * | 2015-11-16 | 2020-07-15 | 株式会社Screenホールディングス | 基板処理装置 |
CN109791374B (zh) * | 2017-08-23 | 2022-05-17 | 深圳市柔宇科技股份有限公司 | 显影液回收系统 |
CN110668529A (zh) * | 2018-07-02 | 2020-01-10 | 陈俊吉 | 显影液再生系统及其正负型光刻胶分离装置 |
US11189504B2 (en) * | 2020-02-11 | 2021-11-30 | Tcl China Star Optoelectronics Technology Co., Ltd. | Photoresist stripping device and photoresist stripping method |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4069157A (en) * | 1975-11-20 | 1978-01-17 | E. I. Du Pont De Nemours And Company | Ultrafiltration device |
DE3143106A1 (de) * | 1981-10-30 | 1983-05-11 | Basf Ag, 6700 Ludwigshafen | Verfahren und vorrichtung zur regenerierung waessrigerauswaschloesungen von wasserentwickelbaren photosensitiven aufzeichnungsmaterialien |
EP0254550B1 (de) * | 1986-07-23 | 1992-10-14 | Sumitomo Heavy Industries, Ltd | Behandlung einer Photoresistmaterialien enthaltenden Abfallösung |
EP0332788B1 (de) * | 1988-03-17 | 1992-07-22 | Societe Des Ceramiques Techniques | Verfahren zur Behandlung verunreinigter Öl-in-Wasser-Emulsionen oder-Mikroemulsionen |
JPH0264646A (ja) * | 1988-08-31 | 1990-03-05 | Toshiba Corp | レジストパターンの現像方法及びこの方法に使用する現像装置 |
DE3833242A1 (de) * | 1988-09-30 | 1990-04-05 | Hoellmueller Maschbau H | Verfahren zum aetzen von kupferhaltigen werkstuecken sowie aetzanlage zur durchfuehrung des verfahrens |
US5112491A (en) * | 1991-03-01 | 1992-05-12 | E. I. Du Pont De Nemours And Company | Management of waste solution containing photoresist materials |
US5354434A (en) * | 1991-07-12 | 1994-10-11 | Chlorine Engineers Corp. Ltd. | Method for regenerating tetraalkylammonium hydroxide |
US5366584A (en) * | 1992-02-11 | 1994-11-22 | Rayzist Photomask, Inc. | Removing uncured emulsion from stencils during photomask production |
US5205937A (en) * | 1992-04-30 | 1993-04-27 | U.S. Filter Membralox | Recovery and reuse of water-based cleaners |
US5536285A (en) * | 1993-07-12 | 1996-07-16 | Foster Wheeler Energia Oy | Ceramic filtering of gases |
JPH07171321A (ja) * | 1993-12-17 | 1995-07-11 | Toto Ltd | セラミックフィルター |
US5531889A (en) * | 1994-03-08 | 1996-07-02 | Atotech Usa, Inc. | Method and apparatus for removing resist particles from stripping solutions for printed wireboards |
JPH0844082A (ja) * | 1994-07-28 | 1996-02-16 | Konica Corp | 感光性材料の処理方法及び装置 |
US5686231A (en) * | 1994-12-27 | 1997-11-11 | Mitsubishi Chemical Corporation | Process for disposing of developer for pigment-containing non-silver-salt photo sensitive material, apparatus therefor and automatic developing system |
DE29517588U1 (de) * | 1995-11-06 | 1996-02-08 | Cimatec Gmbh Produkte Fuer Lei | Maschine zur Flüssigkeitsbehandlung von Gegenständen, insbesondere Platinen in der Leiterplattenfertigung |
-
1996
- 1996-10-23 US US08/740,025 patent/US5753135A/en not_active Expired - Lifetime
-
1997
- 1997-10-21 AT AT97948116T patent/ATE265944T1/de active
- 1997-10-21 AU AU54249/98A patent/AU5424998A/en not_active Abandoned
- 1997-10-21 KR KR10-1999-7003558A patent/KR100386438B1/ko not_active IP Right Cessation
- 1997-10-21 CA CA002268903A patent/CA2268903C/en not_active Expired - Fee Related
- 1997-10-21 DE DE69728992T patent/DE69728992T2/de not_active Expired - Lifetime
- 1997-10-21 ES ES97948116T patent/ES2221074T3/es not_active Expired - Lifetime
- 1997-10-21 BR BR9712358-7A patent/BR9712358A/pt not_active Application Discontinuation
- 1997-10-21 WO PCT/US1997/019039 patent/WO1998017483A1/en active IP Right Grant
- 1997-10-21 IL IL12945497A patent/IL129454A/en not_active IP Right Cessation
- 1997-10-21 EP EP97948116A patent/EP0944482B1/de not_active Expired - Lifetime
- 1997-10-21 JP JP10519584A patent/JP2001502847A/ja not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
EP0944482B1 (de) | 2004-05-06 |
IL129454A0 (en) | 2000-02-29 |
ES2221074T3 (es) | 2004-12-16 |
WO1998017483A1 (en) | 1998-04-30 |
AU5424998A (en) | 1998-05-15 |
ATE265944T1 (de) | 2004-05-15 |
KR20000052756A (ko) | 2000-08-25 |
DE69728992T2 (de) | 2005-04-07 |
CA2268903C (en) | 2006-12-05 |
EP0944482A1 (de) | 1999-09-29 |
BR9712358A (pt) | 2005-04-12 |
CA2268903A1 (en) | 1998-04-30 |
US5753135A (en) | 1998-05-19 |
JP2001502847A (ja) | 2001-02-27 |
IL129454A (en) | 2002-02-10 |
EP0944482A4 (de) | 2000-01-12 |
KR100386438B1 (ko) | 2003-06-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |