KR101111455B1 - 현상장치, 현상방법, 및 현상액 순환방법 - Google Patents
현상장치, 현상방법, 및 현상액 순환방법 Download PDFInfo
- Publication number
- KR101111455B1 KR101111455B1 KR1020057012944A KR20057012944A KR101111455B1 KR 101111455 B1 KR101111455 B1 KR 101111455B1 KR 1020057012944 A KR1020057012944 A KR 1020057012944A KR 20057012944 A KR20057012944 A KR 20057012944A KR 101111455 B1 KR101111455 B1 KR 101111455B1
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- KR
- South Korea
- Prior art keywords
- filtrate
- developing
- ultrafiltration
- tank
- concentrate
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 48
- 238000011161 development Methods 0.000 title description 11
- 238000000108 ultra-filtration Methods 0.000 claims abstract description 179
- 239000000706 filtrate Substances 0.000 claims abstract description 110
- 239000012141 concentrate Substances 0.000 claims abstract description 96
- 230000008569 process Effects 0.000 claims abstract description 22
- 238000012545 processing Methods 0.000 claims abstract description 3
- 238000011001 backwashing Methods 0.000 claims description 89
- 239000007788 liquid Substances 0.000 claims description 76
- 238000001914 filtration Methods 0.000 claims description 12
- 230000007246 mechanism Effects 0.000 claims description 12
- 238000011144 upstream manufacturing Methods 0.000 claims description 2
- 230000002746 orthostatic effect Effects 0.000 claims 1
- 238000011109 contamination Methods 0.000 description 18
- 230000000694 effects Effects 0.000 description 11
- 230000018109 developmental process Effects 0.000 description 8
- 238000004140 cleaning Methods 0.000 description 7
- 239000000356 contaminant Substances 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 238000012423 maintenance Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000012466 permeate Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- 238000011282 treatment Methods 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000011069 regeneration method Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000011284 combination treatment Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000012510 hollow fiber Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 230000008929 regeneration Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000001471 micro-filtration Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/145—Ultrafiltration
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/145—Ultrafiltration
- B01D61/146—Ultrafiltration comprising multiple ultrafiltration steps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
- B01D65/08—Prevention of membrane fouling or of concentration polarisation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3071—Process control means, e.g. for replenishing
Landscapes
- Engineering & Computer Science (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (17)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003367017 | 2003-10-28 | ||
JPJP-P-2003-00367017 | 2003-10-28 | ||
JP2004290909 | 2004-10-04 | ||
JPJP-P-2004-00290909 | 2004-10-04 | ||
PCT/JP2004/015920 WO2005040930A1 (ja) | 2003-10-28 | 2004-10-27 | 現像装置、現像方法、及び現像液循環方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20060123671A KR20060123671A (ko) | 2006-12-04 |
KR101111455B1 true KR101111455B1 (ko) | 2012-03-13 |
Family
ID=34525466
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020057012944A KR101111455B1 (ko) | 2003-10-28 | 2004-10-27 | 현상장치, 현상방법, 및 현상액 순환방법 |
Country Status (4)
Country | Link |
---|---|
JP (3) | JP4645449B2 (ko) |
KR (1) | KR101111455B1 (ko) |
TW (1) | TWI371651B (ko) |
WO (1) | WO2005040930A1 (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101111455B1 (ko) * | 2003-10-28 | 2012-03-13 | 도판 인사츠 가부시키가이샤 | 현상장치, 현상방법, 및 현상액 순환방법 |
KR100928175B1 (ko) | 2005-05-30 | 2009-11-25 | 파나소닉 주식회사 | 습식 프로세싱 장치 및 디스플레이 패널 제조 방법 |
US8632682B2 (en) | 2005-06-23 | 2014-01-21 | Ben-Gurion University Of The Negev Research And Development Authority | Method and apparatus for repositioning flow elements in a tapered flow structure |
JP5211431B2 (ja) * | 2006-03-10 | 2013-06-12 | 凸版印刷株式会社 | 現像装置 |
JP4998416B2 (ja) * | 2008-09-12 | 2012-08-15 | 凸版印刷株式会社 | 現像液濾過装置 |
JP5477531B2 (ja) * | 2008-12-22 | 2014-04-23 | 凸版印刷株式会社 | 現像装置および現像方法 |
JP5477532B2 (ja) * | 2008-12-22 | 2014-04-23 | 凸版印刷株式会社 | 現像装置および現像方法 |
JP5287459B2 (ja) * | 2009-04-16 | 2013-09-11 | 凸版印刷株式会社 | 限外濾過フィルタの洗浄方法及び限外濾過フィルタを用いた現像装置 |
JP5451515B2 (ja) * | 2010-05-06 | 2014-03-26 | 東京エレクトロン株式会社 | 薬液供給システム、これを備える基板処理装置、およびこの基板処理装置を備える塗布現像システム |
TWI633919B (zh) * | 2017-04-05 | 2018-09-01 | 力煒奈米科技股份有限公司 | 過濾濃縮方法 |
CN110668529A (zh) * | 2018-07-02 | 2020-01-10 | 陈俊吉 | 显影液再生系统及其正负型光刻胶分离装置 |
CN110703565B (zh) * | 2019-11-01 | 2022-11-25 | 广东威迪科技股份有限公司 | 一种线路板显影液循环回收系统 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001502847A (ja) * | 1996-10-23 | 2001-02-27 | ジャブロンスキー、ジュリアス・ジェイムズ | フォトレジスト現像液及び膜剥し液を回収するための装置及び方法 |
JP2002346348A (ja) * | 2001-05-28 | 2002-12-03 | Kurita Water Ind Ltd | 膜濾過装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0615078B2 (ja) * | 1986-07-23 | 1994-03-02 | 住友重機械工業株式会社 | フオトレジスト廃液処理方法 |
JPH021864A (ja) * | 1988-06-10 | 1990-01-08 | Fuji Photo Film Co Ltd | 感光性平版印刷版処理装置 |
JPH0343729U (ko) * | 1989-09-07 | 1991-04-24 | ||
JPH07168369A (ja) * | 1993-12-15 | 1995-07-04 | Mitsubishi Chem Corp | 感光性平版印刷版用現像機 |
JP3355837B2 (ja) * | 1993-12-27 | 2002-12-09 | 三菱化学株式会社 | 感光性材料用現像液の再生方法及び感光性材料の現像装置 |
JPH08123039A (ja) * | 1994-10-18 | 1996-05-17 | Konica Corp | 感光性平版印刷版の処理方法 |
JPH08234443A (ja) * | 1994-12-27 | 1996-09-13 | Mitsubishi Chem Corp | 顔料含有非銀塩感光性材料用現像液の処理方法、その処理装置及び自動現像装置 |
JP3579193B2 (ja) * | 1996-09-05 | 2004-10-20 | 旭化成ケミカルズ株式会社 | 濾過処理方法及び濾過装置 |
JP3601015B2 (ja) * | 1996-11-26 | 2004-12-15 | 前澤工業株式会社 | 膜を用いた濾過方法 |
JP4038702B2 (ja) * | 1998-01-29 | 2008-01-30 | 東洋紡績株式会社 | 感光性樹脂版用現像液の処理方法および処理装置 |
JP2003167358A (ja) * | 2001-11-29 | 2003-06-13 | Nagase & Co Ltd | レジスト剥離廃液の再生装置及び再生方法 |
KR101111455B1 (ko) * | 2003-10-28 | 2012-03-13 | 도판 인사츠 가부시키가이샤 | 현상장치, 현상방법, 및 현상액 순환방법 |
-
2004
- 2004-10-27 KR KR1020057012944A patent/KR101111455B1/ko active IP Right Grant
- 2004-10-27 TW TW093132556A patent/TWI371651B/zh not_active IP Right Cessation
- 2004-10-27 JP JP2005515016A patent/JP4645449B2/ja not_active Expired - Fee Related
- 2004-10-27 WO PCT/JP2004/015920 patent/WO2005040930A1/ja active Application Filing
-
2010
- 2010-10-13 JP JP2010230491A patent/JP2011018943A/ja active Pending
-
2011
- 2011-03-31 JP JP2011079095A patent/JP5182391B2/ja not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001502847A (ja) * | 1996-10-23 | 2001-02-27 | ジャブロンスキー、ジュリアス・ジェイムズ | フォトレジスト現像液及び膜剥し液を回収するための装置及び方法 |
JP2002346348A (ja) * | 2001-05-28 | 2002-12-03 | Kurita Water Ind Ltd | 膜濾過装置 |
Also Published As
Publication number | Publication date |
---|---|
WO2005040930A1 (ja) | 2005-05-06 |
TWI371651B (en) | 2012-09-01 |
JPWO2005040930A1 (ja) | 2007-04-19 |
KR20060123671A (ko) | 2006-12-04 |
JP4645449B2 (ja) | 2011-03-09 |
JP5182391B2 (ja) | 2013-04-17 |
JP2011141563A (ja) | 2011-07-21 |
JP2011018943A (ja) | 2011-01-27 |
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