TWI371651B - Developing apparatus, developing method, and method for circulating developing solution - Google Patents
Developing apparatus, developing method, and method for circulating developing solutionInfo
- Publication number
- TWI371651B TWI371651B TW093132556A TW93132556A TWI371651B TW I371651 B TWI371651 B TW I371651B TW 093132556 A TW093132556 A TW 093132556A TW 93132556 A TW93132556 A TW 93132556A TW I371651 B TWI371651 B TW I371651B
- Authority
- TW
- Taiwan
- Prior art keywords
- developing
- circulating
- solution
- developing solution
- developing apparatus
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/145—Ultrafiltration
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/145—Ultrafiltration
- B01D61/146—Ultrafiltration comprising multiple ultrafiltration steps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
- B01D65/08—Prevention of membrane fouling or of concentration polarisation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3071—Process control means, e.g. for replenishing
Landscapes
- Engineering & Computer Science (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003367017 | 2003-10-28 | ||
JP2004290909 | 2004-10-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWI371651B true TWI371651B (en) | 2012-09-01 |
Family
ID=34525466
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093132556A TWI371651B (en) | 2003-10-28 | 2004-10-27 | Developing apparatus, developing method, and method for circulating developing solution |
Country Status (4)
Country | Link |
---|---|
JP (3) | JP4645449B2 (en) |
KR (1) | KR101111455B1 (en) |
TW (1) | TWI371651B (en) |
WO (1) | WO2005040930A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI633919B (en) * | 2017-04-05 | 2018-09-01 | 力煒奈米科技股份有限公司 | Filtration and concentration method |
CN110668529A (en) * | 2018-07-02 | 2020-01-10 | 陈俊吉 | Developing solution regeneration system and positive and negative photoresist separation device thereof |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101111455B1 (en) * | 2003-10-28 | 2012-03-13 | 도판 인사츠 가부시키가이샤 | Development device, development method, and developer circulating method |
WO2006129567A1 (en) | 2005-05-30 | 2006-12-07 | Pioneer Corporation | Wet treatment apparatus and process for producing display panel |
TR201900958T4 (en) | 2005-06-23 | 2019-02-21 | Ben Gurion Univ Of The Negev Research And Development Authority | Method for repositioning flow elements in conical flow structure. |
JP5211431B2 (en) * | 2006-03-10 | 2013-06-12 | 凸版印刷株式会社 | Development device |
JP4998416B2 (en) * | 2008-09-12 | 2012-08-15 | 凸版印刷株式会社 | Developer filtration device |
JP5477531B2 (en) * | 2008-12-22 | 2014-04-23 | 凸版印刷株式会社 | Developing apparatus and developing method |
JP5477532B2 (en) * | 2008-12-22 | 2014-04-23 | 凸版印刷株式会社 | Developing apparatus and developing method |
JP5287459B2 (en) * | 2009-04-16 | 2013-09-11 | 凸版印刷株式会社 | Method for cleaning ultrafiltration filter and developing device using ultrafiltration filter |
JP5451515B2 (en) | 2010-05-06 | 2014-03-26 | 東京エレクトロン株式会社 | Chemical supply system, substrate processing apparatus including the same, and coating and developing system including the substrate processing apparatus |
CN110703565B (en) * | 2019-11-01 | 2022-11-25 | 广东威迪科技股份有限公司 | Circuit board developer solution recycling system |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0615078B2 (en) * | 1986-07-23 | 1994-03-02 | 住友重機械工業株式会社 | Photoresist waste liquid treatment method |
JPH021864A (en) * | 1988-06-10 | 1990-01-08 | Fuji Photo Film Co Ltd | Device for processing photosensitive lithographic printing plate |
JPH0343729U (en) * | 1989-09-07 | 1991-04-24 | ||
JPH07168369A (en) * | 1993-12-15 | 1995-07-04 | Mitsubishi Chem Corp | Developing machine for photosensitive planographic printing plate |
JP3355837B2 (en) * | 1993-12-27 | 2002-12-09 | 三菱化学株式会社 | Method for regenerating developer for photosensitive material and apparatus for developing photosensitive material |
JPH08123039A (en) * | 1994-10-18 | 1996-05-17 | Konica Corp | Processing method of photosensitive planographic printing plate |
JPH08234443A (en) * | 1994-12-27 | 1996-09-13 | Mitsubishi Chem Corp | Method for processing developer for pigment-containing non-silver salt photosensitive material, its processor and automatic developing device |
US5753135A (en) * | 1995-10-23 | 1998-05-19 | Jablonsky; Julius James | Apparatus and method for recovering photoresist developers and strippers |
JP3579193B2 (en) * | 1996-09-05 | 2004-10-20 | 旭化成ケミカルズ株式会社 | Filtration treatment method and filtration device |
JP3601015B2 (en) * | 1996-11-26 | 2004-12-15 | 前澤工業株式会社 | Filtration method using membrane |
JP4038702B2 (en) * | 1998-01-29 | 2008-01-30 | 東洋紡績株式会社 | Processing method and processing apparatus for developing solution for photosensitive resin plate |
JP4882164B2 (en) * | 2001-05-28 | 2012-02-22 | 栗田工業株式会社 | Membrane filtration device |
JP2003167358A (en) * | 2001-11-29 | 2003-06-13 | Nagase & Co Ltd | Equipment for regenerating used resist peeling solution and method therefor |
KR101111455B1 (en) * | 2003-10-28 | 2012-03-13 | 도판 인사츠 가부시키가이샤 | Development device, development method, and developer circulating method |
-
2004
- 2004-10-27 KR KR1020057012944A patent/KR101111455B1/en active IP Right Grant
- 2004-10-27 WO PCT/JP2004/015920 patent/WO2005040930A1/en active Application Filing
- 2004-10-27 TW TW093132556A patent/TWI371651B/en not_active IP Right Cessation
- 2004-10-27 JP JP2005515016A patent/JP4645449B2/en not_active Expired - Fee Related
-
2010
- 2010-10-13 JP JP2010230491A patent/JP2011018943A/en active Pending
-
2011
- 2011-03-31 JP JP2011079095A patent/JP5182391B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI633919B (en) * | 2017-04-05 | 2018-09-01 | 力煒奈米科技股份有限公司 | Filtration and concentration method |
CN110668529A (en) * | 2018-07-02 | 2020-01-10 | 陈俊吉 | Developing solution regeneration system and positive and negative photoresist separation device thereof |
Also Published As
Publication number | Publication date |
---|---|
KR20060123671A (en) | 2006-12-04 |
KR101111455B1 (en) | 2012-03-13 |
WO2005040930A1 (en) | 2005-05-06 |
JP5182391B2 (en) | 2013-04-17 |
JP2011018943A (en) | 2011-01-27 |
JP4645449B2 (en) | 2011-03-09 |
JP2011141563A (en) | 2011-07-21 |
JPWO2005040930A1 (en) | 2007-04-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |