TWI371651B - Developing apparatus, developing method, and method for circulating developing solution - Google Patents

Developing apparatus, developing method, and method for circulating developing solution

Info

Publication number
TWI371651B
TWI371651B TW093132556A TW93132556A TWI371651B TW I371651 B TWI371651 B TW I371651B TW 093132556 A TW093132556 A TW 093132556A TW 93132556 A TW93132556 A TW 93132556A TW I371651 B TWI371651 B TW I371651B
Authority
TW
Taiwan
Prior art keywords
developing
circulating
solution
developing solution
developing apparatus
Prior art date
Application number
TW093132556A
Other languages
Chinese (zh)
Inventor
Kazuma Taniwaki
Takeshi Ikeda
Tomoyuki Shukunami
Yasuaki Matsumoto
Masahiro Tada
Naoki Furutani
Shinya Kusunoki
Takahisa Matsunae
Yutaka Tenmaya
Noritaka Mihashi
Hiroyuki Chinone
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Application granted granted Critical
Publication of TWI371651B publication Critical patent/TWI371651B/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B01D61/145—Ultrafiltration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B01D61/145—Ultrafiltration
    • B01D61/146—Ultrafiltration comprising multiple ultrafiltration steps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
    • B01D65/08—Prevention of membrane fouling or of concentration polarisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071—Process control means, e.g. for replenishing

Landscapes

  • Engineering & Computer Science (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW093132556A 2003-10-28 2004-10-27 Developing apparatus, developing method, and method for circulating developing solution TWI371651B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003367017 2003-10-28
JP2004290909 2004-10-04

Publications (1)

Publication Number Publication Date
TWI371651B true TWI371651B (en) 2012-09-01

Family

ID=34525466

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093132556A TWI371651B (en) 2003-10-28 2004-10-27 Developing apparatus, developing method, and method for circulating developing solution

Country Status (4)

Country Link
JP (3) JP4645449B2 (en)
KR (1) KR101111455B1 (en)
TW (1) TWI371651B (en)
WO (1) WO2005040930A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI633919B (en) * 2017-04-05 2018-09-01 力煒奈米科技股份有限公司 Filtration and concentration method
CN110668529A (en) * 2018-07-02 2020-01-10 陈俊吉 Developing solution regeneration system and positive and negative photoresist separation device thereof

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101111455B1 (en) * 2003-10-28 2012-03-13 도판 인사츠 가부시키가이샤 Development device, development method, and developer circulating method
WO2006129567A1 (en) 2005-05-30 2006-12-07 Pioneer Corporation Wet treatment apparatus and process for producing display panel
TR201900958T4 (en) 2005-06-23 2019-02-21 Ben Gurion Univ Of The Negev Research And Development Authority Method for repositioning flow elements in conical flow structure.
JP5211431B2 (en) * 2006-03-10 2013-06-12 凸版印刷株式会社 Development device
JP4998416B2 (en) * 2008-09-12 2012-08-15 凸版印刷株式会社 Developer filtration device
JP5477531B2 (en) * 2008-12-22 2014-04-23 凸版印刷株式会社 Developing apparatus and developing method
JP5477532B2 (en) * 2008-12-22 2014-04-23 凸版印刷株式会社 Developing apparatus and developing method
JP5287459B2 (en) * 2009-04-16 2013-09-11 凸版印刷株式会社 Method for cleaning ultrafiltration filter and developing device using ultrafiltration filter
JP5451515B2 (en) 2010-05-06 2014-03-26 東京エレクトロン株式会社 Chemical supply system, substrate processing apparatus including the same, and coating and developing system including the substrate processing apparatus
CN110703565B (en) * 2019-11-01 2022-11-25 广东威迪科技股份有限公司 Circuit board developer solution recycling system

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0615078B2 (en) * 1986-07-23 1994-03-02 住友重機械工業株式会社 Photoresist waste liquid treatment method
JPH021864A (en) * 1988-06-10 1990-01-08 Fuji Photo Film Co Ltd Device for processing photosensitive lithographic printing plate
JPH0343729U (en) * 1989-09-07 1991-04-24
JPH07168369A (en) * 1993-12-15 1995-07-04 Mitsubishi Chem Corp Developing machine for photosensitive planographic printing plate
JP3355837B2 (en) * 1993-12-27 2002-12-09 三菱化学株式会社 Method for regenerating developer for photosensitive material and apparatus for developing photosensitive material
JPH08123039A (en) * 1994-10-18 1996-05-17 Konica Corp Processing method of photosensitive planographic printing plate
JPH08234443A (en) * 1994-12-27 1996-09-13 Mitsubishi Chem Corp Method for processing developer for pigment-containing non-silver salt photosensitive material, its processor and automatic developing device
US5753135A (en) * 1995-10-23 1998-05-19 Jablonsky; Julius James Apparatus and method for recovering photoresist developers and strippers
JP3579193B2 (en) * 1996-09-05 2004-10-20 旭化成ケミカルズ株式会社 Filtration treatment method and filtration device
JP3601015B2 (en) * 1996-11-26 2004-12-15 前澤工業株式会社 Filtration method using membrane
JP4038702B2 (en) * 1998-01-29 2008-01-30 東洋紡績株式会社 Processing method and processing apparatus for developing solution for photosensitive resin plate
JP4882164B2 (en) * 2001-05-28 2012-02-22 栗田工業株式会社 Membrane filtration device
JP2003167358A (en) * 2001-11-29 2003-06-13 Nagase & Co Ltd Equipment for regenerating used resist peeling solution and method therefor
KR101111455B1 (en) * 2003-10-28 2012-03-13 도판 인사츠 가부시키가이샤 Development device, development method, and developer circulating method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI633919B (en) * 2017-04-05 2018-09-01 力煒奈米科技股份有限公司 Filtration and concentration method
CN110668529A (en) * 2018-07-02 2020-01-10 陈俊吉 Developing solution regeneration system and positive and negative photoresist separation device thereof

Also Published As

Publication number Publication date
KR20060123671A (en) 2006-12-04
KR101111455B1 (en) 2012-03-13
WO2005040930A1 (en) 2005-05-06
JP5182391B2 (en) 2013-04-17
JP2011018943A (en) 2011-01-27
JP4645449B2 (en) 2011-03-09
JP2011141563A (en) 2011-07-21
JPWO2005040930A1 (en) 2007-04-19

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees