DE69614304D1 - Positiv arbeitende Fotoresistzusammensetzung - Google Patents
Positiv arbeitende FotoresistzusammensetzungInfo
- Publication number
- DE69614304D1 DE69614304D1 DE69614304T DE69614304T DE69614304D1 DE 69614304 D1 DE69614304 D1 DE 69614304D1 DE 69614304 T DE69614304 T DE 69614304T DE 69614304 T DE69614304 T DE 69614304T DE 69614304 D1 DE69614304 D1 DE 69614304D1
- Authority
- DE
- Germany
- Prior art keywords
- photoresist composition
- positive photoresist
- positive
- composition
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10430795 | 1995-04-27 | ||
JP669496 | 1996-01-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69614304D1 true DE69614304D1 (de) | 2001-09-13 |
DE69614304T2 DE69614304T2 (de) | 2002-05-08 |
Family
ID=26340891
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69614304T Expired - Lifetime DE69614304T2 (de) | 1995-04-27 | 1996-04-26 | Positiv arbeitende Fotoresistzusammensetzung |
Country Status (4)
Country | Link |
---|---|
US (1) | US5750310A (de) |
EP (1) | EP0740213B1 (de) |
KR (1) | KR100396712B1 (de) |
DE (1) | DE69614304T2 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100560021B1 (ko) * | 1996-12-11 | 2006-05-25 | 제이에스알 가부시끼가이샤 | 감방사선성수지조성물 |
US6177226B1 (en) * | 1997-05-01 | 2001-01-23 | Tokyo Ohka Kogyo Co., Ltd. | Positive photoresist composition and process for forming contact hole |
US6127087A (en) * | 1997-06-18 | 2000-10-03 | Tokyo Ohka Kogyo Co., Ltd. | Positive photoresist compositions and multilayer resist materials using same |
JP3652071B2 (ja) * | 1997-07-25 | 2005-05-25 | 東京応化工業株式会社 | ノボラック樹脂前駆体およびノボラック樹脂の製造方法 |
JP3600713B2 (ja) * | 1997-08-06 | 2004-12-15 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物 |
JP4097753B2 (ja) * | 1997-12-24 | 2008-06-11 | ローム・アンド・ハース電子材料株式会社 | ポジ型フォトレジスト組成物 |
US6506831B2 (en) | 1998-12-20 | 2003-01-14 | Honeywell International Inc. | Novolac polymer planarization films with high temperature stability |
JP3710717B2 (ja) * | 2001-03-06 | 2005-10-26 | 東京応化工業株式会社 | 厚膜用ポジ型ホトレジスト組成物、ホトレジスト膜およびこれを用いたバンプ形成方法 |
JP2003195495A (ja) * | 2001-12-26 | 2003-07-09 | Tokyo Ohka Kogyo Co Ltd | ポジ型ホトレジスト組成物 |
KR102060012B1 (ko) * | 2013-02-15 | 2019-12-30 | 삼성디스플레이 주식회사 | 감광성 수지 조성물 및 이를 이용한 패턴 형성 방법 |
TWI510517B (zh) | 2013-04-30 | 2015-12-01 | Ind Tech Res Inst | 聚酚醚寡聚物及包含其之產品 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2631744B2 (ja) * | 1989-05-11 | 1997-07-16 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
JP2761786B2 (ja) * | 1990-02-01 | 1998-06-04 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
JPH05204144A (ja) * | 1991-08-21 | 1993-08-13 | Sumitomo Chem Co Ltd | ポジ型レジスト組成物 |
US5368977A (en) * | 1992-03-23 | 1994-11-29 | Nippon Oil Co. Ltd. | Positive type photosensitive quinone diazide phenolic resin composition |
JP3094652B2 (ja) * | 1992-05-18 | 2000-10-03 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
JP3466218B2 (ja) * | 1992-06-04 | 2003-11-10 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
US5554481A (en) * | 1993-09-20 | 1996-09-10 | Fuji Photo Film Co., Ltd. | Positive working photoresist composition |
US5609982A (en) * | 1993-12-17 | 1997-03-11 | Fuji Photo Film Co., Ltd. | Positive-working photoresist composition |
JP3224115B2 (ja) * | 1994-03-17 | 2001-10-29 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
US5541033A (en) * | 1995-02-01 | 1996-07-30 | Ocg Microelectronic Materials, Inc. | Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions |
-
1996
- 1996-04-23 US US08/636,408 patent/US5750310A/en not_active Expired - Lifetime
- 1996-04-26 DE DE69614304T patent/DE69614304T2/de not_active Expired - Lifetime
- 1996-04-26 EP EP96106692A patent/EP0740213B1/de not_active Expired - Lifetime
- 1996-04-27 KR KR1019960013359A patent/KR100396712B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US5750310A (en) | 1998-05-12 |
KR960038487A (ko) | 1996-11-21 |
EP0740213A2 (de) | 1996-10-30 |
EP0740213B1 (de) | 2001-08-08 |
KR100396712B1 (ko) | 2004-05-20 |
EP0740213A3 (de) | 1998-07-01 |
DE69614304T2 (de) | 2002-05-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP |