DE69533379D1 - Verbesserungen in oder in Bezug auf Elektroden für LSI - Google Patents

Verbesserungen in oder in Bezug auf Elektroden für LSI

Info

Publication number
DE69533379D1
DE69533379D1 DE69533379T DE69533379T DE69533379D1 DE 69533379 D1 DE69533379 D1 DE 69533379D1 DE 69533379 T DE69533379 T DE 69533379T DE 69533379 T DE69533379 T DE 69533379T DE 69533379 D1 DE69533379 D1 DE 69533379D1
Authority
DE
Germany
Prior art keywords
lsi
regarding electrodes
electrodes
regarding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69533379T
Other languages
English (en)
Other versions
DE69533379T2 (de
Inventor
Ken Numata
Katsuhiro Aoki
Yukio Fukuda
Akitoshi Nishimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Publication of DE69533379D1 publication Critical patent/DE69533379D1/de
Application granted granted Critical
Publication of DE69533379T2 publication Critical patent/DE69533379T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B53/00—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
DE69533379T 1994-02-14 1995-02-14 Verbesserungen in oder in Bezug auf Elektroden für LSI Expired - Lifetime DE69533379T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP03909394A JP3309260B2 (ja) 1994-02-14 1994-02-14 キャパシタ
JP3909394 1994-02-14

Publications (2)

Publication Number Publication Date
DE69533379D1 true DE69533379D1 (de) 2004-09-23
DE69533379T2 DE69533379T2 (de) 2005-08-25

Family

ID=12543473

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69533379T Expired - Lifetime DE69533379T2 (de) 1994-02-14 1995-02-14 Verbesserungen in oder in Bezug auf Elektroden für LSI

Country Status (6)

Country Link
US (1) US5654567A (de)
EP (1) EP0671768B1 (de)
JP (1) JP3309260B2 (de)
KR (1) KR100372215B1 (de)
DE (1) DE69533379T2 (de)
TW (1) TW280026B (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6051858A (en) * 1996-07-26 2000-04-18 Symetrix Corporation Ferroelectric/high dielectric constant integrated circuit and method of fabricating same
KR100226772B1 (ko) * 1996-09-25 1999-10-15 김영환 반도체 메모리 장치 및 그 제조방법
KR100234393B1 (ko) * 1996-11-05 1999-12-15 윤종용 반도체 장치의 강유전체 커패시터 및 그 제조방법
US6130124A (en) * 1996-12-04 2000-10-10 Samsung Electronics Co., Ltd. Methods of forming capacitor electrodes having reduced susceptibility to oxidation
JPH1117123A (ja) * 1997-06-23 1999-01-22 Rohm Co Ltd 不揮発性記憶素子
US6249018B1 (en) 1998-02-26 2001-06-19 Vanguard International Semiconductor Corporation Fabrication method to approach the conducting structure of a DRAM cell with straightforward bit line
US6048740A (en) * 1998-11-05 2000-04-11 Sharp Laboratories Of America, Inc. Ferroelectric nonvolatile transistor and method of making same
US6222220B1 (en) 1998-12-10 2001-04-24 Siemens Aktiengesellschaft Extended trench for preventing interaction between components of stacked capacitors
US6150707A (en) * 1999-01-07 2000-11-21 International Business Machines Corporation Metal-to-metal capacitor having thin insulator
US6724088B1 (en) * 1999-04-20 2004-04-20 International Business Machines Corporation Quantum conductive barrier for contact to shallow diffusion region
JP3977997B2 (ja) * 2001-05-11 2007-09-19 松下電器産業株式会社 半導体装置およびその製造方法
JP3920827B2 (ja) * 2003-09-08 2007-05-30 三洋電機株式会社 半導体記憶装置
JP4890804B2 (ja) * 2005-07-19 2012-03-07 富士通セミコンダクター株式会社 半導体装置及びその製造方法
WO2010120560A1 (en) * 2009-03-31 2010-10-21 Battelle Memorial Institute Supercapacitor materials and devices
JP5862290B2 (ja) * 2011-12-28 2016-02-16 富士通セミコンダクター株式会社 半導体装置とその製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS593964A (ja) * 1982-06-29 1984-01-10 Semiconductor Res Found 半導体集積回路
JPS6077447A (ja) * 1983-10-05 1985-05-02 Fujitsu Ltd 半導体装置
JPS61283153A (ja) * 1985-06-10 1986-12-13 Nec Corp 半導体装置
US4949162A (en) * 1987-06-05 1990-08-14 Hitachi, Ltd. Semiconductor integrated circuit with dummy pedestals
JP2861129B2 (ja) * 1989-10-23 1999-02-24 日本電気株式会社 半導体装置
EP0478799B1 (de) * 1990-04-24 1996-12-04 Ramtron International Corporation Halbleiteranordnung mit ferroelektrischem material und verfahren zu deren herstellung
JPH0414862A (ja) * 1990-05-08 1992-01-20 Nec Corp 半導体装置
JPH04181766A (ja) * 1990-11-16 1992-06-29 Toshiba Corp 電子部品
JPH05275711A (ja) * 1992-03-25 1993-10-22 Olympus Optical Co Ltd 強誘電体メモリ
US5434742A (en) * 1991-12-25 1995-07-18 Hitachi, Ltd. Capacitor for semiconductor integrated circuit and method of manufacturing the same
US5216572A (en) * 1992-03-19 1993-06-01 Ramtron International Corporation Structure and method for increasing the dielectric constant of integrated ferroelectric capacitors
US5191510A (en) * 1992-04-29 1993-03-02 Ramtron International Corporation Use of palladium as an adhesion layer and as an electrode in ferroelectric memory devices
US5187638A (en) * 1992-07-27 1993-02-16 Micron Technology, Inc. Barrier layers for ferroelectric and pzt dielectric on silicon
US5335138A (en) * 1993-02-12 1994-08-02 Micron Semiconductor, Inc. High dielectric constant capacitor and method of manufacture
JP3319869B2 (ja) * 1993-06-24 2002-09-03 三菱電機株式会社 半導体記憶装置およびその製造方法
US5440173A (en) * 1993-09-17 1995-08-08 Radiant Technologies High-temperature electrical contact for making contact to ceramic materials and improved circuit element using the same

Also Published As

Publication number Publication date
EP0671768A3 (de) 1997-08-20
EP0671768A2 (de) 1995-09-13
TW280026B (de) 1996-07-01
US5654567A (en) 1997-08-05
JPH07226444A (ja) 1995-08-22
KR100372215B1 (ko) 2003-09-06
EP0671768B1 (de) 2004-08-18
KR950034786A (ko) 1995-12-28
JP3309260B2 (ja) 2002-07-29
DE69533379T2 (de) 2005-08-25

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Legal Events

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8364 No opposition during term of opposition