DE69429324T2 - Scheibenartige Behandlung von verformbaren Spiegelvorrichtungen (DMD) nach dem Sägen - Google Patents
Scheibenartige Behandlung von verformbaren Spiegelvorrichtungen (DMD) nach dem SägenInfo
- Publication number
- DE69429324T2 DE69429324T2 DE69429324T DE69429324T DE69429324T2 DE 69429324 T2 DE69429324 T2 DE 69429324T2 DE 69429324 T DE69429324 T DE 69429324T DE 69429324 T DE69429324 T DE 69429324T DE 69429324 T2 DE69429324 T2 DE 69429324T2
- Authority
- DE
- Germany
- Prior art keywords
- holder
- devices
- disk
- vacuum
- air space
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 claims description 17
- 238000012545 processing Methods 0.000 claims description 14
- 230000001681 protective effect Effects 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 29
- 238000000926 separation method Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000428 dust Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
- B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
- B25B11/005—Vacuum work holders
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0052—Means for supporting or holding work during breaking
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
- B28D5/0094—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00865—Multistep processes for the separation of wafers into individual elements
- B81C1/00888—Multistep processes involving only mechanical separation, e.g. grooving followed by cleaving
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/028—Dicing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T225/00—Severing by tearing or breaking
- Y10T225/10—Methods
- Y10T225/12—With preliminary weakening
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Dicing (AREA)
- Micromachines (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/082,183 US5445559A (en) | 1993-06-24 | 1993-06-24 | Wafer-like processing after sawing DMDs |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69429324D1 DE69429324D1 (de) | 2002-01-17 |
| DE69429324T2 true DE69429324T2 (de) | 2002-08-08 |
Family
ID=22169571
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69429324T Expired - Fee Related DE69429324T2 (de) | 1993-06-24 | 1994-06-16 | Scheibenartige Behandlung von verformbaren Spiegelvorrichtungen (DMD) nach dem Sägen |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US5445559A (enExample) |
| EP (1) | EP0657759B1 (enExample) |
| JP (1) | JPH07153823A (enExample) |
| KR (1) | KR100276996B1 (enExample) |
| CN (1) | CN1054210C (enExample) |
| CA (1) | CA2126111A1 (enExample) |
| DE (1) | DE69429324T2 (enExample) |
| TW (1) | TW258828B (enExample) |
Families Citing this family (116)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6219015B1 (en) | 1992-04-28 | 2001-04-17 | The Board Of Directors Of The Leland Stanford, Junior University | Method and apparatus for using an array of grating light valves to produce multicolor optical images |
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| US5872046A (en) * | 1996-04-10 | 1999-02-16 | Texas Instruments Incorporated | Method of cleaning wafer after partial saw |
| US6225191B1 (en) * | 1996-04-12 | 2001-05-01 | Lucent Technologies Inc. | Process for the manufacture of optical integrated circuits |
| US6686291B1 (en) | 1996-05-24 | 2004-02-03 | Texas Instruments Incorporated | Undercut process with isotropic plasma etching at package level |
| US5803797A (en) * | 1996-11-26 | 1998-09-08 | Micron Technology, Inc. | Method and apparatus to hold intergrated circuit chips onto a chuck and to simultaneously remove multiple intergrated circuit chips from a cutting chuck |
| US5809987A (en) * | 1996-11-26 | 1998-09-22 | Micron Technology,Inc. | Apparatus for reducing damage to wafer cutting blades during wafer dicing |
| US5982553A (en) | 1997-03-20 | 1999-11-09 | Silicon Light Machines | Display device incorporating one-dimensional grating light-valve array |
| US5817569A (en) * | 1997-05-08 | 1998-10-06 | Texas Instruments Incorporated | Method of reducing wafer particles after partial saw |
| US6088102A (en) | 1997-10-31 | 2000-07-11 | Silicon Light Machines | Display apparatus including grating light-valve array and interferometric optical system |
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| US6130770A (en) | 1998-06-23 | 2000-10-10 | Silicon Light Machines | Electron gun activated grating light valve |
| US6215579B1 (en) | 1998-06-24 | 2001-04-10 | Silicon Light Machines | Method and apparatus for modulating an incident light beam for forming a two-dimensional image |
| US6303986B1 (en) | 1998-07-29 | 2001-10-16 | Silicon Light Machines | Method of and apparatus for sealing an hermetic lid to a semiconductor die |
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| JP3485816B2 (ja) * | 1998-12-09 | 2004-01-13 | 太陽誘電株式会社 | ダイシング装置 |
| JP4388640B2 (ja) * | 1999-09-10 | 2009-12-24 | 株式会社ディスコ | Csp基板保持部材及び該csp基板保持部材が載置されるcsp基板用テーブル |
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| US6690014B1 (en) | 2000-04-25 | 2004-02-10 | Raytheon Company | Microbolometer and method for forming |
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| KR100332967B1 (ko) * | 2000-05-10 | 2002-04-19 | 윤종용 | 디지털 마이크로-미러 디바이스 패키지의 제조 방법 |
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| DE60032521T2 (de) * | 2000-05-24 | 2007-11-22 | Silverbrook Research Pty. Ltd., Balmain | Verfahren zur herstellung von mikroelektromechanische vorrichtungen enthaltenden bauelementen durch verwendung von wenigstens einem uv-härtbaren band |
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| CN102447017B (zh) * | 2010-10-13 | 2014-10-15 | 展晶科技(深圳)有限公司 | 发光二极管防水治具以及发光二极管的切割方法 |
| US8765514B1 (en) | 2010-11-12 | 2014-07-01 | L-3 Communications Corp. | Transitioned film growth for conductive semiconductor materials |
| WO2015170208A1 (en) * | 2014-05-03 | 2015-11-12 | Semiconductor Energy Laboratory Co., Ltd. | Film-like member support apparatus |
| JP2017054956A (ja) * | 2015-09-10 | 2017-03-16 | 株式会社ディスコ | 被加工物の支持治具 |
| JP2017038072A (ja) * | 2016-09-29 | 2017-02-16 | 三星ダイヤモンド工業株式会社 | 脆性材料基板の搬送ヘッド |
| JP6970554B2 (ja) * | 2017-08-21 | 2021-11-24 | 株式会社ディスコ | 加工方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3809050A (en) * | 1971-01-13 | 1974-05-07 | Cogar Corp | Mounting block for semiconductor wafers |
| US3811182A (en) * | 1972-03-31 | 1974-05-21 | Ibm | Object handling fixture, system, and process |
| US3994101A (en) * | 1973-01-03 | 1976-11-30 | Coburn Optical Industries, Inc. | Vacuum chuck with sealable cavity |
| US3971170A (en) * | 1973-01-03 | 1976-07-27 | Coburn Optical Industries, Inc. | Vaccum chuck with sealable cavity |
| US3976288A (en) * | 1975-11-24 | 1976-08-24 | Ibm Corporation | Semiconductor wafer dicing fixture |
| US4138304A (en) * | 1977-11-03 | 1979-02-06 | General Electric Company | Wafer sawing technique |
| US4213698A (en) * | 1978-12-01 | 1980-07-22 | Bell Telephone Laboratories, Incorporated | Apparatus and method for holding and planarizing thin workpieces |
| US4184292A (en) * | 1978-03-24 | 1980-01-22 | Revlon, Inc. | Vacuum chuck |
| DE3463227D1 (en) * | 1984-08-03 | 1987-05-27 | Loh Kg Optikmaschf | Supporting device for vulnerable objects, in particular optical lenses and other optical elements |
| US5061049A (en) * | 1984-08-31 | 1991-10-29 | Texas Instruments Incorporated | Spatial light modulator and method |
| US5291692A (en) * | 1989-09-14 | 1994-03-08 | Olympus Optical Company Limited | Polishing work holder |
| WO1991011399A1 (fr) * | 1990-01-31 | 1991-08-08 | Bando Kiko Co., Ltd. | Machine a decouper des plaques de verre |
| US5029418A (en) * | 1990-03-05 | 1991-07-09 | Eastman Kodak Company | Sawing method for substrate cutting operations |
| JPH04276645A (ja) * | 1991-03-04 | 1992-10-01 | Toshiba Corp | 化合物半導体ウエーハのダイシング方法 |
| US5393706A (en) * | 1993-01-07 | 1995-02-28 | Texas Instruments Incorporated | Integrated partial sawing process |
-
1993
- 1993-06-24 US US08/082,183 patent/US5445559A/en not_active Expired - Fee Related
-
1994
- 1994-06-16 DE DE69429324T patent/DE69429324T2/de not_active Expired - Fee Related
- 1994-06-16 EP EP19940109280 patent/EP0657759B1/en not_active Expired - Lifetime
- 1994-06-17 CA CA 2126111 patent/CA2126111A1/en not_active Abandoned
- 1994-06-23 JP JP14187194A patent/JPH07153823A/ja not_active Ceased
- 1994-06-23 KR KR1019940014413A patent/KR100276996B1/ko not_active Expired - Fee Related
- 1994-06-24 CN CN94107015A patent/CN1054210C/zh not_active Expired - Fee Related
- 1994-08-29 TW TW83107896A patent/TW258828B/zh active
-
1995
- 1995-05-23 US US08/448,205 patent/US5605489A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0657759B1 (en) | 2001-12-05 |
| KR100276996B1 (ko) | 2001-02-01 |
| CA2126111A1 (en) | 1994-12-25 |
| EP0657759A2 (en) | 1995-06-14 |
| CN1104341A (zh) | 1995-06-28 |
| DE69429324D1 (de) | 2002-01-17 |
| JPH07153823A (ja) | 1995-06-16 |
| US5605489A (en) | 1997-02-25 |
| TW258828B (enExample) | 1995-10-01 |
| EP0657759A3 (en) | 1995-08-09 |
| KR950001989A (ko) | 1995-01-04 |
| CN1054210C (zh) | 2000-07-05 |
| US5445559A (en) | 1995-08-29 |
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