KR100276996B1 - 디지탈 마이크로미러 디바이스 절단 후의 유사-웨이퍼 프로세싱 방법 및 디바이스 보호용 픽스처 - Google Patents
디지탈 마이크로미러 디바이스 절단 후의 유사-웨이퍼 프로세싱 방법 및 디바이스 보호용 픽스처 Download PDFInfo
- Publication number
- KR100276996B1 KR100276996B1 KR1019940014413A KR19940014413A KR100276996B1 KR 100276996 B1 KR100276996 B1 KR 100276996B1 KR 1019940014413 A KR1019940014413 A KR 1019940014413A KR 19940014413 A KR19940014413 A KR 19940014413A KR 100276996 B1 KR100276996 B1 KR 100276996B1
- Authority
- KR
- South Korea
- Prior art keywords
- fixture
- wafer
- devices
- headspace
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
- B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
- B25B11/005—Vacuum work holders
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0052—Means for supporting or holding work during breaking
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
- B28D5/0094—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00865—Multistep processes for the separation of wafers into individual elements
- B81C1/00888—Multistep processes involving only mechanical separation, e.g. grooving followed by cleaving
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/028—Dicing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T225/00—Severing by tearing or breaking
- Y10T225/10—Methods
- Y10T225/12—With preliminary weakening
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Dicing (AREA)
- Micromachines (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/082,183 | 1993-06-24 | ||
| US08/082,183 US5445559A (en) | 1993-06-24 | 1993-06-24 | Wafer-like processing after sawing DMDs |
| US8/082.183 | 1993-06-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR950001989A KR950001989A (ko) | 1995-01-04 |
| KR100276996B1 true KR100276996B1 (ko) | 2001-02-01 |
Family
ID=22169571
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019940014413A Expired - Fee Related KR100276996B1 (ko) | 1993-06-24 | 1994-06-23 | 디지탈 마이크로미러 디바이스 절단 후의 유사-웨이퍼 프로세싱 방법 및 디바이스 보호용 픽스처 |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US5445559A (enExample) |
| EP (1) | EP0657759B1 (enExample) |
| JP (1) | JPH07153823A (enExample) |
| KR (1) | KR100276996B1 (enExample) |
| CN (1) | CN1054210C (enExample) |
| CA (1) | CA2126111A1 (enExample) |
| DE (1) | DE69429324T2 (enExample) |
| TW (1) | TW258828B (enExample) |
Families Citing this family (116)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6219015B1 (en) | 1992-04-28 | 2001-04-17 | The Board Of Directors Of The Leland Stanford, Junior University | Method and apparatus for using an array of grating light valves to produce multicolor optical images |
| US5597767A (en) * | 1995-01-06 | 1997-01-28 | Texas Instruments Incorporated | Separation of wafer into die with wafer-level processing |
| US5841579A (en) | 1995-06-07 | 1998-11-24 | Silicon Light Machines | Flat diffraction grating light valve |
| US6969635B2 (en) * | 2000-12-07 | 2005-11-29 | Reflectivity, Inc. | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
| US5915370A (en) * | 1996-03-13 | 1999-06-29 | Micron Technology, Inc. | Saw for segmenting a semiconductor wafer |
| JP3663728B2 (ja) * | 1996-03-28 | 2005-06-22 | 信越半導体株式会社 | 薄板の研磨機 |
| US5872046A (en) * | 1996-04-10 | 1999-02-16 | Texas Instruments Incorporated | Method of cleaning wafer after partial saw |
| US6225191B1 (en) * | 1996-04-12 | 2001-05-01 | Lucent Technologies Inc. | Process for the manufacture of optical integrated circuits |
| US6686291B1 (en) | 1996-05-24 | 2004-02-03 | Texas Instruments Incorporated | Undercut process with isotropic plasma etching at package level |
| US5803797A (en) * | 1996-11-26 | 1998-09-08 | Micron Technology, Inc. | Method and apparatus to hold intergrated circuit chips onto a chuck and to simultaneously remove multiple intergrated circuit chips from a cutting chuck |
| US5809987A (en) * | 1996-11-26 | 1998-09-22 | Micron Technology,Inc. | Apparatus for reducing damage to wafer cutting blades during wafer dicing |
| US5982553A (en) | 1997-03-20 | 1999-11-09 | Silicon Light Machines | Display device incorporating one-dimensional grating light-valve array |
| US5817569A (en) * | 1997-05-08 | 1998-10-06 | Texas Instruments Incorporated | Method of reducing wafer particles after partial saw |
| US6088102A (en) | 1997-10-31 | 2000-07-11 | Silicon Light Machines | Display apparatus including grating light-valve array and interferometric optical system |
| US6187654B1 (en) | 1998-03-13 | 2001-02-13 | Intercon Tools, Inc. | Techniques for maintaining alignment of cut dies during substrate dicing |
| US6319075B1 (en) * | 1998-04-17 | 2001-11-20 | Fci Americas Technology, Inc. | Power connector |
| US20020098743A1 (en) * | 1998-04-17 | 2002-07-25 | Schell Mark S. | Power connector |
| US7314377B2 (en) | 1998-04-17 | 2008-01-01 | Fci Americas Technology, Inc. | Electrical power connector |
| US6271808B1 (en) | 1998-06-05 | 2001-08-07 | Silicon Light Machines | Stereo head mounted display using a single display device |
| US6101036A (en) | 1998-06-23 | 2000-08-08 | Silicon Light Machines | Embossed diffraction grating alone and in combination with changeable image display |
| US6130770A (en) | 1998-06-23 | 2000-10-10 | Silicon Light Machines | Electron gun activated grating light valve |
| US6215579B1 (en) | 1998-06-24 | 2001-04-10 | Silicon Light Machines | Method and apparatus for modulating an incident light beam for forming a two-dimensional image |
| US6303986B1 (en) | 1998-07-29 | 2001-10-16 | Silicon Light Machines | Method of and apparatus for sealing an hermetic lid to a semiconductor die |
| US6872984B1 (en) | 1998-07-29 | 2005-03-29 | Silicon Light Machines Corporation | Method of sealing a hermetic lid to a semiconductor die at an angle |
| JP3516592B2 (ja) * | 1998-08-18 | 2004-04-05 | 沖電気工業株式会社 | 半導体装置およびその製造方法 |
| JP3485816B2 (ja) * | 1998-12-09 | 2004-01-13 | 太陽誘電株式会社 | ダイシング装置 |
| JP4388640B2 (ja) * | 1999-09-10 | 2009-12-24 | 株式会社ディスコ | Csp基板保持部材及び該csp基板保持部材が載置されるcsp基板用テーブル |
| US6635512B1 (en) * | 1999-11-04 | 2003-10-21 | Rohm Co., Ltd. | Method of producing a semiconductor device by dividing a semiconductor wafer into separate pieces of semiconductor chips |
| US6521477B1 (en) | 2000-02-02 | 2003-02-18 | Raytheon Company | Vacuum package fabrication of integrated circuit components |
| US6479320B1 (en) * | 2000-02-02 | 2002-11-12 | Raytheon Company | Vacuum package fabrication of microelectromechanical system devices with integrated circuit components |
| US6956878B1 (en) | 2000-02-07 | 2005-10-18 | Silicon Light Machines Corporation | Method and apparatus for reducing laser speckle using polarization averaging |
| US6387778B1 (en) | 2000-02-11 | 2002-05-14 | Seagate Technology Llc | Breakable tethers for microelectromechanical system devices utilizing reactive ion etching lag |
| US6690014B1 (en) | 2000-04-25 | 2004-02-10 | Raytheon Company | Microbolometer and method for forming |
| US6346030B1 (en) * | 2000-05-09 | 2002-02-12 | Sandia Corporation | Microdevice having interior cavity with high aspect ratio surface features and associated methods of manufacture and use |
| US6425971B1 (en) | 2000-05-10 | 2002-07-30 | Silverbrook Research Pty Ltd | Method of fabricating devices incorporating microelectromechanical systems using UV curable tapes |
| KR100332967B1 (ko) * | 2000-05-10 | 2002-04-19 | 윤종용 | 디지털 마이크로-미러 디바이스 패키지의 제조 방법 |
| TWI228780B (en) * | 2000-05-11 | 2005-03-01 | Disco Corp | Semiconductor wafer dividing method |
| US6335224B1 (en) | 2000-05-16 | 2002-01-01 | Sandia Corporation | Protection of microelectronic devices during packaging |
| DE60032521T2 (de) * | 2000-05-24 | 2007-11-22 | Silverbrook Research Pty. Ltd., Balmain | Verfahren zur herstellung von mikroelektromechanische vorrichtungen enthaltenden bauelementen durch verwendung von wenigstens einem uv-härtbaren band |
| KR100370398B1 (ko) * | 2000-06-22 | 2003-01-30 | 삼성전자 주식회사 | 전자 및 mems 소자의 표면실장형 칩 규모 패키징 방법 |
| US7177081B2 (en) | 2001-03-08 | 2007-02-13 | Silicon Light Machines Corporation | High contrast grating light valve type device |
| US6707591B2 (en) | 2001-04-10 | 2004-03-16 | Silicon Light Machines | Angled illumination for a single order light modulator based projection system |
| US6777681B1 (en) | 2001-04-25 | 2004-08-17 | Raytheon Company | Infrared detector with amorphous silicon detector elements, and a method of making it |
| US6982184B2 (en) * | 2001-05-02 | 2006-01-03 | Silverbrook Research Pty Ltd | Method of fabricating MEMS devices on a silicon wafer |
| US6865346B1 (en) | 2001-06-05 | 2005-03-08 | Silicon Light Machines Corporation | Fiber optic transceiver |
| US6782205B2 (en) | 2001-06-25 | 2004-08-24 | Silicon Light Machines | Method and apparatus for dynamic equalization in wavelength division multiplexing |
| US6747781B2 (en) | 2001-06-25 | 2004-06-08 | Silicon Light Machines, Inc. | Method, apparatus, and diffuser for reducing laser speckle |
| US6829092B2 (en) | 2001-08-15 | 2004-12-07 | Silicon Light Machines, Inc. | Blazed grating light valve |
| US6930364B2 (en) | 2001-09-13 | 2005-08-16 | Silicon Light Machines Corporation | Microelectronic mechanical system and methods |
| US6956995B1 (en) | 2001-11-09 | 2005-10-18 | Silicon Light Machines Corporation | Optical communication arrangement |
| JP4309084B2 (ja) * | 2001-11-26 | 2009-08-05 | アピックヤマダ株式会社 | ダイシング装置 |
| US6800238B1 (en) | 2002-01-15 | 2004-10-05 | Silicon Light Machines, Inc. | Method for domain patterning in low coercive field ferroelectrics |
| US7018268B2 (en) * | 2002-04-09 | 2006-03-28 | Strasbaugh | Protection of work piece during surface processing |
| US6767751B2 (en) | 2002-05-28 | 2004-07-27 | Silicon Light Machines, Inc. | Integrated driver process flow |
| US6728023B1 (en) | 2002-05-28 | 2004-04-27 | Silicon Light Machines | Optical device arrays with optimized image resolution |
| US7054515B1 (en) | 2002-05-30 | 2006-05-30 | Silicon Light Machines Corporation | Diffractive light modulator-based dynamic equalizer with integrated spectral monitor |
| US6822797B1 (en) | 2002-05-31 | 2004-11-23 | Silicon Light Machines, Inc. | Light modulator structure for producing high-contrast operation using zero-order light |
| US6829258B1 (en) | 2002-06-26 | 2004-12-07 | Silicon Light Machines, Inc. | Rapidly tunable external cavity laser |
| US6908201B2 (en) | 2002-06-28 | 2005-06-21 | Silicon Light Machines Corporation | Micro-support structures |
| US6813059B2 (en) | 2002-06-28 | 2004-11-02 | Silicon Light Machines, Inc. | Reduced formation of asperities in contact micro-structures |
| JP2004062938A (ja) * | 2002-07-25 | 2004-02-26 | Pioneer Electronic Corp | 球面収差補正装置及び球面収差補正方法 |
| US6875257B2 (en) * | 2002-08-20 | 2005-04-05 | Memx, Inc. | Particle filter for microelectromechanical systems |
| US7057795B2 (en) | 2002-08-20 | 2006-06-06 | Silicon Light Machines Corporation | Micro-structures with individually addressable ribbon pairs |
| US6700173B1 (en) | 2002-08-20 | 2004-03-02 | Memx, Inc. | Electrically isolated support for overlying MEM structure |
| US20040036378A1 (en) * | 2002-08-20 | 2004-02-26 | Rodgers Murray Steven | Dust cover for MEM components |
| US6703675B1 (en) | 2002-08-20 | 2004-03-09 | Memx, Inc. | Particle filter for partially enclosed microelectromechanical systems |
| US6801354B1 (en) | 2002-08-20 | 2004-10-05 | Silicon Light Machines, Inc. | 2-D diffraction grating for substantially eliminating polarization dependent losses |
| US6712480B1 (en) | 2002-09-27 | 2004-03-30 | Silicon Light Machines | Controlled curvature of stressed micro-structures |
| KR100748145B1 (ko) | 2002-11-21 | 2007-08-09 | 실버브룩 리서치 피티와이 리미티드 | 하나이상의 자외선 경화 테이프를 사용한 마이크로일렉트로 메커니컬 시스템을 포함하는 장치의 제조 방법 |
| US6928207B1 (en) | 2002-12-12 | 2005-08-09 | Silicon Light Machines Corporation | Apparatus for selectively blocking WDM channels |
| US6987600B1 (en) | 2002-12-17 | 2006-01-17 | Silicon Light Machines Corporation | Arbitrary phase profile for better equalization in dynamic gain equalizer |
| US7057819B1 (en) | 2002-12-17 | 2006-06-06 | Silicon Light Machines Corporation | High contrast tilting ribbon blazed grating |
| US6934070B1 (en) | 2002-12-18 | 2005-08-23 | Silicon Light Machines Corporation | Chirped optical MEM device |
| US6927891B1 (en) | 2002-12-23 | 2005-08-09 | Silicon Light Machines Corporation | Tilt-able grating plane for improved crosstalk in 1×N blaze switches |
| JP2004221187A (ja) * | 2003-01-10 | 2004-08-05 | Toshiba Corp | 半導体装置の製造装置及びその製造方法 |
| US20040147169A1 (en) * | 2003-01-28 | 2004-07-29 | Allison Jeffrey W. | Power connector with safety feature |
| US7068372B1 (en) | 2003-01-28 | 2006-06-27 | Silicon Light Machines Corporation | MEMS interferometer-based reconfigurable optical add-and-drop multiplexor |
| US7286764B1 (en) | 2003-02-03 | 2007-10-23 | Silicon Light Machines Corporation | Reconfigurable modulator-based optical add-and-drop multiplexer |
| US6947613B1 (en) | 2003-02-11 | 2005-09-20 | Silicon Light Machines Corporation | Wavelength selective switch and equalizer |
| US6922272B1 (en) | 2003-02-14 | 2005-07-26 | Silicon Light Machines Corporation | Method and apparatus for leveling thermal stress variations in multi-layer MEMS devices |
| US6829077B1 (en) | 2003-02-28 | 2004-12-07 | Silicon Light Machines, Inc. | Diffractive light modulator with dynamically rotatable diffraction plane |
| US6806997B1 (en) | 2003-02-28 | 2004-10-19 | Silicon Light Machines, Inc. | Patterned diffractive light modulator ribbon for PDL reduction |
| US7027202B1 (en) | 2003-02-28 | 2006-04-11 | Silicon Light Machines Corp | Silicon substrate as a light modulator sacrificial layer |
| US6922273B1 (en) | 2003-02-28 | 2005-07-26 | Silicon Light Machines Corporation | PDL mitigation structure for diffractive MEMS and gratings |
| US7391973B1 (en) | 2003-02-28 | 2008-06-24 | Silicon Light Machines Corporation | Two-stage gain equalizer |
| US7042611B1 (en) | 2003-03-03 | 2006-05-09 | Silicon Light Machines Corporation | Pre-deflected bias ribbons |
| JP4566626B2 (ja) * | 2004-06-09 | 2010-10-20 | 株式会社石川製作所 | 半導体基板の分断方法および半導体チップの選択転写方法 |
| US7416984B2 (en) | 2004-08-09 | 2008-08-26 | Analog Devices, Inc. | Method of producing a MEMS device |
| US7521363B2 (en) | 2004-08-09 | 2009-04-21 | Analog Devices, Inc. | MEMS device with non-standard profile |
| US6994608B1 (en) * | 2004-11-12 | 2006-02-07 | Hitachi Global Storage Technologies Netherlands, B.V. | Methods of manufacturing sliders |
| US7109055B2 (en) * | 2005-01-20 | 2006-09-19 | Freescale Semiconductor, Inc. | Methods and apparatus having wafer level chip scale package for sensing elements |
| JP2007095780A (ja) * | 2005-09-27 | 2007-04-12 | Oki Electric Ind Co Ltd | 半導体装置製造用治具と半導体装置製造方法 |
| TW200717519A (en) * | 2005-10-28 | 2007-05-01 | Univ Nat Chiao Tung | Asynchronous first-in-first-out cell |
| US7376215B2 (en) * | 2005-12-27 | 2008-05-20 | Honeywell International Inc. | Measurement of ash composition using scanning high voltage X-ray sensor |
| US7655909B2 (en) * | 2006-01-26 | 2010-02-02 | L-3 Communications Corporation | Infrared detector elements and methods of forming same |
| US7459686B2 (en) * | 2006-01-26 | 2008-12-02 | L-3 Communications Corporation | Systems and methods for integrating focal plane arrays |
| US7462831B2 (en) * | 2006-01-26 | 2008-12-09 | L-3 Communications Corporation | Systems and methods for bonding |
| GB2434913A (en) * | 2006-02-02 | 2007-08-08 | Xsil Technology Ltd | Support for wafer singulation |
| WO2007114331A1 (ja) * | 2006-04-04 | 2007-10-11 | Miraial Co., Ltd. | 薄板収納容器 |
| JP2007281053A (ja) * | 2006-04-04 | 2007-10-25 | Miraial Kk | 薄板収納容器 |
| US7748839B2 (en) * | 2006-05-09 | 2010-07-06 | Lexmark International, Inc. | Handheld printing with reference indicia |
| US7632698B2 (en) | 2006-05-16 | 2009-12-15 | Freescale Semiconductor, Inc. | Integrated circuit encapsulation and method therefor |
| DE102006026467B4 (de) * | 2006-06-07 | 2018-06-28 | Texas Instruments Deutschland Gmbh | Vorrichtung für das Schleifen eines Wafers |
| US7718965B1 (en) | 2006-08-03 | 2010-05-18 | L-3 Communications Corporation | Microbolometer infrared detector elements and methods for forming same |
| US8153980B1 (en) | 2006-11-30 | 2012-04-10 | L-3 Communications Corp. | Color correction for radiation detectors |
| US20090061597A1 (en) * | 2007-08-30 | 2009-03-05 | Kavlico Corporation | Singulator method and apparatus |
| US7964106B2 (en) | 2008-05-30 | 2011-06-21 | Unimicron Technology Corp. | Method for fabricating a packaging substrate |
| US8323049B2 (en) * | 2009-01-30 | 2012-12-04 | Fci Americas Technology Llc | Electrical connector having power contacts |
| USD619099S1 (en) | 2009-01-30 | 2010-07-06 | Fci Americas Technology, Inc. | Electrical connector |
| JP5571331B2 (ja) * | 2009-07-07 | 2014-08-13 | 株式会社ディスコ | 切削装置 |
| CN102447017B (zh) * | 2010-10-13 | 2014-10-15 | 展晶科技(深圳)有限公司 | 发光二极管防水治具以及发光二极管的切割方法 |
| US8765514B1 (en) | 2010-11-12 | 2014-07-01 | L-3 Communications Corp. | Transitioned film growth for conductive semiconductor materials |
| WO2015170208A1 (en) * | 2014-05-03 | 2015-11-12 | Semiconductor Energy Laboratory Co., Ltd. | Film-like member support apparatus |
| JP2017054956A (ja) * | 2015-09-10 | 2017-03-16 | 株式会社ディスコ | 被加工物の支持治具 |
| JP2017038072A (ja) * | 2016-09-29 | 2017-02-16 | 三星ダイヤモンド工業株式会社 | 脆性材料基板の搬送ヘッド |
| JP6970554B2 (ja) * | 2017-08-21 | 2021-11-24 | 株式会社ディスコ | 加工方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3809050A (en) * | 1971-01-13 | 1974-05-07 | Cogar Corp | Mounting block for semiconductor wafers |
| US3811182A (en) * | 1972-03-31 | 1974-05-21 | Ibm | Object handling fixture, system, and process |
| US3994101A (en) * | 1973-01-03 | 1976-11-30 | Coburn Optical Industries, Inc. | Vacuum chuck with sealable cavity |
| US3971170A (en) * | 1973-01-03 | 1976-07-27 | Coburn Optical Industries, Inc. | Vaccum chuck with sealable cavity |
| US3976288A (en) * | 1975-11-24 | 1976-08-24 | Ibm Corporation | Semiconductor wafer dicing fixture |
| US4138304A (en) * | 1977-11-03 | 1979-02-06 | General Electric Company | Wafer sawing technique |
| US4213698A (en) * | 1978-12-01 | 1980-07-22 | Bell Telephone Laboratories, Incorporated | Apparatus and method for holding and planarizing thin workpieces |
| US4184292A (en) * | 1978-03-24 | 1980-01-22 | Revlon, Inc. | Vacuum chuck |
| DE3463227D1 (en) * | 1984-08-03 | 1987-05-27 | Loh Kg Optikmaschf | Supporting device for vulnerable objects, in particular optical lenses and other optical elements |
| US5061049A (en) * | 1984-08-31 | 1991-10-29 | Texas Instruments Incorporated | Spatial light modulator and method |
| US5291692A (en) * | 1989-09-14 | 1994-03-08 | Olympus Optical Company Limited | Polishing work holder |
| WO1991011399A1 (fr) * | 1990-01-31 | 1991-08-08 | Bando Kiko Co., Ltd. | Machine a decouper des plaques de verre |
| US5029418A (en) * | 1990-03-05 | 1991-07-09 | Eastman Kodak Company | Sawing method for substrate cutting operations |
| JPH04276645A (ja) * | 1991-03-04 | 1992-10-01 | Toshiba Corp | 化合物半導体ウエーハのダイシング方法 |
| US5393706A (en) * | 1993-01-07 | 1995-02-28 | Texas Instruments Incorporated | Integrated partial sawing process |
-
1993
- 1993-06-24 US US08/082,183 patent/US5445559A/en not_active Expired - Fee Related
-
1994
- 1994-06-16 DE DE69429324T patent/DE69429324T2/de not_active Expired - Fee Related
- 1994-06-16 EP EP19940109280 patent/EP0657759B1/en not_active Expired - Lifetime
- 1994-06-17 CA CA 2126111 patent/CA2126111A1/en not_active Abandoned
- 1994-06-23 JP JP14187194A patent/JPH07153823A/ja not_active Ceased
- 1994-06-23 KR KR1019940014413A patent/KR100276996B1/ko not_active Expired - Fee Related
- 1994-06-24 CN CN94107015A patent/CN1054210C/zh not_active Expired - Fee Related
- 1994-08-29 TW TW83107896A patent/TW258828B/zh active
-
1995
- 1995-05-23 US US08/448,205 patent/US5605489A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0657759B1 (en) | 2001-12-05 |
| CA2126111A1 (en) | 1994-12-25 |
| EP0657759A2 (en) | 1995-06-14 |
| CN1104341A (zh) | 1995-06-28 |
| DE69429324D1 (de) | 2002-01-17 |
| JPH07153823A (ja) | 1995-06-16 |
| US5605489A (en) | 1997-02-25 |
| TW258828B (enExample) | 1995-10-01 |
| EP0657759A3 (en) | 1995-08-09 |
| DE69429324T2 (de) | 2002-08-08 |
| KR950001989A (ko) | 1995-01-04 |
| CN1054210C (zh) | 2000-07-05 |
| US5445559A (en) | 1995-08-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100276996B1 (ko) | 디지탈 마이크로미러 디바이스 절단 후의 유사-웨이퍼 프로세싱 방법 및 디바이스 보호용 픽스처 | |
| JP3568980B2 (ja) | チップに切断後のicのウエハ形態での加工処理法 | |
| US5389182A (en) | Use of a saw frame with tape as a substrate carrier for wafer level backend processing | |
| US6642127B2 (en) | Method for dicing a semiconductor wafer | |
| JP4288229B2 (ja) | 半導体チップの製造方法 | |
| US6465329B1 (en) | Microcircuit die-sawing protector and method | |
| US6573156B1 (en) | Low defect method for die singulation and for structural support for handling thin film devices | |
| JP2005051007A (ja) | 半導体チップの製造方法 | |
| US20110221042A1 (en) | Semiconductor device and method of fabricating same | |
| CN100505211C (zh) | 半导体芯片和半导体晶片的制造方法 | |
| US6661080B1 (en) | Structure for backside saw cavity protection | |
| JP2004349416A (ja) | Memsの製造方法 | |
| CN110104607B (zh) | 一种用于保护mems器件敏感结构的划片方法 | |
| WO2011021981A1 (en) | Method of dicing a wafer | |
| JPH0864558A (ja) | マイクロ電子機械式デバイスを製造する方法 | |
| KR100284018B1 (ko) | 반도체웨이퍼공정 | |
| JP3221394B2 (ja) | 半導体装置におけるダイシング方法 | |
| KR19980053148A (ko) | 웨이퍼 절단 방법 | |
| KR20180072073A (ko) | 박막화 후 식각을 이용한 반도체 웨이퍼 다이싱 방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| A201 | Request for examination | ||
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U11-oth-PR1002 Fee payment year number: 1 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 5 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 6 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 7 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 8 |
|
| FPAY | Annual fee payment |
Payment date: 20080930 Year of fee payment: 9 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 9 |
|
| LAPS | Lapse due to unpaid annual fee | ||
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 20091006 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 20091006 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |