DE69408725T2 - Substrat mit lichtabschirmender Schicht, Verfahren zur Herstellung derselben sowie Flüssigkristallanzeige - Google Patents

Substrat mit lichtabschirmender Schicht, Verfahren zur Herstellung derselben sowie Flüssigkristallanzeige

Info

Publication number
DE69408725T2
DE69408725T2 DE69408725T DE69408725T DE69408725T2 DE 69408725 T2 DE69408725 T2 DE 69408725T2 DE 69408725 T DE69408725 T DE 69408725T DE 69408725 T DE69408725 T DE 69408725T DE 69408725 T2 DE69408725 T2 DE 69408725T2
Authority
DE
Germany
Prior art keywords
producing
substrate
light
liquid crystal
crystal display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69408725T
Other languages
English (en)
Other versions
DE69408725D1 (de
Inventor
Haruyoshi Sato
Toru Nakamura
Hitoshi Yuasa
Yutaka Otsuki
Hiroyoshi Omika
Norikatsu Ono
Tadafumi Shindo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Nippon Oil Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd, Nippon Oil Corp filed Critical Dai Nippon Printing Co Ltd
Application granted granted Critical
Publication of DE69408725D1 publication Critical patent/DE69408725D1/de
Publication of DE69408725T2 publication Critical patent/DE69408725T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Paints Or Removers (AREA)
DE69408725T 1993-05-28 1994-05-27 Substrat mit lichtabschirmender Schicht, Verfahren zur Herstellung derselben sowie Flüssigkristallanzeige Expired - Fee Related DE69408725T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP12758893 1993-05-28
JP9527594A JPH0743522A (ja) 1993-05-28 1994-05-09 遮光層を有する基板の形成方法、遮光層を有する基板、白黒表示薄膜トランジスタ（ｔｆｔ）アレイ基板用対向電極基板及び白黒表示液晶ディスプレイ装置

Publications (2)

Publication Number Publication Date
DE69408725D1 DE69408725D1 (de) 1998-04-09
DE69408725T2 true DE69408725T2 (de) 1998-09-10

Family

ID=26436531

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69408725T Expired - Fee Related DE69408725T2 (de) 1993-05-28 1994-05-27 Substrat mit lichtabschirmender Schicht, Verfahren zur Herstellung derselben sowie Flüssigkristallanzeige

Country Status (6)

Country Link
US (2) US5527649A (de)
EP (1) EP0627663B1 (de)
JP (1) JPH0743522A (de)
KR (1) KR100338428B1 (de)
DE (1) DE69408725T2 (de)
TW (2) TW460727B (de)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0743522A (ja) * 1993-05-28 1995-02-14 Nippon Oil Co Ltd 遮光層を有する基板の形成方法、遮光層を有する基板、白黒表示薄膜トランジスタ（ｔｆｔ）アレイ基板用対向電極基板及び白黒表示液晶ディスプレイ装置
WO1996027318A1 (en) * 1995-03-07 1996-09-12 Philips Electronics N.V. Apparatus for preparing a hot beverage
JPH08271880A (ja) * 1995-04-03 1996-10-18 Toshiba Corp 遮光膜，液晶表示装置および遮光膜形成用材料
JPH11504128A (ja) * 1995-04-17 1999-04-06 ブリューワー サイエンス インコーポレイテッド 色フィルターの基材用改質（無水マレイン酸−スチレン）コポリマーおよび類縁ポリマー
TW477905B (en) * 1995-06-14 2002-03-01 Hitachi Ltd Liquid crystal display device formed of high resistance black matrix with wide view angle
JPH0954203A (ja) * 1995-08-17 1997-02-25 Nippon Oil Co Ltd 遮光層、遮光層の形成方法および基板の製造方法
KR970016690A (ko) * 1995-09-30 1997-04-28 윤종용 액정 표시 장치의 블랙 매트릭스 형성 방법
TW505801B (en) * 1995-10-12 2002-10-11 Hitachi Ltd In-plane field type liquid crystal display device comprising a structure prevented from charging with electricity
JPH09124954A (ja) * 1995-11-06 1997-05-13 Nippon Oil Co Ltd 硬化性組成物
JPH09302284A (ja) * 1996-05-14 1997-11-25 Sumitomo Metal Mining Co Ltd 日射遮蔽膜用塗布液及びこれを用いた日射遮蔽膜
US6128057A (en) * 1996-03-08 2000-10-03 Canon Kabushiki Kaisha LCD with masking member having multiple portions having different characteristics
KR100244450B1 (ko) * 1996-08-30 2000-02-01 구본준 액정표시장치의 기판의 제조방법 및 그 제조방법에 의하여 제조 되는 기판의 구조
JP3692601B2 (ja) * 1996-03-27 2005-09-07 東レ株式会社 樹脂ブラックマトリックス、黒色ペースト、およびカラーフィルタ
US5658697A (en) * 1996-04-17 1997-08-19 Industrial Technology Research, Institute Method for producing color filters by the use of anionic electrocoats
KR100194926B1 (ko) * 1996-05-11 1999-06-15 구자홍 구동회로 일체형 액정표시소자 및 제조방법
US5914206A (en) * 1996-07-01 1999-06-22 Mitsubishi Chemical Corporation Color filter and black resist composition
US5780201A (en) * 1996-09-27 1998-07-14 Brewer Science, Inc. Ultra thin photolithographically imageable organic black matrix coating material
USRE38466E1 (en) 1996-11-12 2004-03-16 Seiko Epson Corporation Manufacturing method of active matrix substrate, active matrix substrate and liquid crystal display device
US6127199A (en) * 1996-11-12 2000-10-03 Seiko Epson Corporation Manufacturing method of active matrix substrate, active matrix substrate and liquid crystal display device
JP3057045B2 (ja) * 1996-12-31 2000-06-26 三星エスディアイ株式会社 Ｎ−アラルキル置換芳香族ポリアミド配向剤及びその製造方法
JP3869517B2 (ja) * 1997-03-14 2007-01-17 三菱化学株式会社 ブラックマトリクス用レジスト組成物およびそれを用いてなるブラックマトリクス
JPH1152403A (ja) * 1997-07-31 1999-02-26 Mitsubishi Electric Corp 液晶表示装置
US6897855B1 (en) * 1998-02-17 2005-05-24 Sarnoff Corporation Tiled electronic display structure
US6476783B2 (en) * 1998-02-17 2002-11-05 Sarnoff Corporation Contrast enhancement for an electronic display device by using a black matrix and lens array on outer surface of display
US6323834B1 (en) * 1998-10-08 2001-11-27 International Business Machines Corporation Micromechanical displays and fabrication method
GB2348342B (en) * 1999-03-25 2004-01-21 Roke Manor Research Improvements in or relating to telecommunication systems
US6376013B1 (en) * 1999-10-06 2002-04-23 Advanced Micro Devices, Inc. Multiple nozzles for dispensing resist
JP2001330849A (ja) * 2000-05-18 2001-11-30 Nec Corp 液晶表示装置
JP3792485B2 (ja) * 2000-06-02 2006-07-05 Ｎｅｃ液晶テクノロジー株式会社 アクティブマトリクス型液晶表示装置
JP4698815B2 (ja) 2000-10-31 2011-06-08 株式会社日立製作所 液晶表示装置及びその製造方法
DE10206781A1 (de) * 2002-02-19 2003-09-04 Altana Elec Insulation Gmbh Kresolfreie bzw. kresolarme Drahtlacke
US20040192876A1 (en) * 2002-11-18 2004-09-30 Nigel Hacker Novolac polymer planarization films with high temparature stability
JP4220796B2 (ja) * 2003-02-04 2009-02-04 富士フイルム株式会社 ブラックマトリックス作製用組成物及び感光性転写材料、ブラックマトリックス及びその製造方法、カラーフィルター、液晶表示素子並びにブラックマトリックス基板
KR101052736B1 (ko) * 2003-04-18 2011-07-29 후지필름 가부시키가이샤 표시장치용 차광막
JP4528548B2 (ja) * 2003-04-18 2010-08-18 富士フイルム株式会社 表示装置用遮光膜
AU2003286758A1 (en) 2003-07-17 2005-03-07 Honeywell International Inc Planarization films for advanced microelectronic applications and devices and methods of production thereof
JP3890333B2 (ja) * 2004-02-06 2007-03-07 キヤノン株式会社 固体撮像装置
JP4394479B2 (ja) * 2004-02-26 2010-01-06 Ｎｅｃ液晶テクノロジー株式会社 液晶表示装置及びその製造方法
US20050208319A1 (en) * 2004-03-22 2005-09-22 Finley James J Methods for forming an electrodeposited coating over a coated substrate and articles made thereby
US20050237473A1 (en) * 2004-04-27 2005-10-27 Stephenson Stanley W Coatable conductive layer
CN101688070B (zh) * 2007-04-24 2014-02-12 卡伯特公司 引入了低结构炭黑的涂料组合物和由其形成的器件
CN101295090B (zh) * 2007-04-27 2010-12-29 群康科技(深圳)有限公司 液晶显示装置
KR101499242B1 (ko) * 2008-08-29 2015-03-06 삼성디스플레이 주식회사 액정 표시 장치의 제조 방법
WO2013018495A1 (ja) * 2011-07-29 2013-02-07 シャープ株式会社 タッチパネル基板及び表示パネル

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0750381B2 (ja) * 1984-12-20 1995-05-31 キヤノン株式会社 カラー液晶表示装置
JPS63266424A (ja) * 1987-04-24 1988-11-02 Alps Electric Co Ltd 液晶表示素子
JP2669826B2 (ja) * 1987-07-17 1997-10-29 日本ペイント株式会社 着色表示装置の製造方法
JPS6426820A (en) * 1987-07-23 1989-01-30 Asahi Glass Co Ltd Liquid crystal display device
JP2678044B2 (ja) * 1989-01-25 1997-11-17 松下電器産業株式会社 アクティブマトリクス基板の製造方法
JPH0833549B2 (ja) * 1990-04-27 1996-03-29 シャープ株式会社 光書き込み型液晶表示素子
JPH04104102A (ja) * 1990-08-23 1992-04-06 Nippon Paint Co Ltd 多色表示装置の製法
JP2772405B2 (ja) * 1990-11-22 1998-07-02 株式会社日立製作所 液晶表示装置
JP2717736B2 (ja) * 1991-06-10 1998-02-25 日本石油株式会社 カラーフィルターの製造法
US5334468A (en) * 1991-07-09 1994-08-02 Nippon Oil Co., Ltd. Method for producing color filter
JPH0562976A (ja) * 1991-09-04 1993-03-12 Ricoh Co Ltd 集積回路作製方法
JPH05150232A (ja) * 1991-11-29 1993-06-18 Kojundo Chem Lab Co Ltd 液晶用遮光膜
JP2949391B2 (ja) * 1992-08-04 1999-09-13 日石三菱株式会社 カラーフィルターの製造法
JPH0743522A (ja) * 1993-05-28 1995-02-14 Nippon Oil Co Ltd 遮光層を有する基板の形成方法、遮光層を有する基板、白黒表示薄膜トランジスタ（ｔｆｔ）アレイ基板用対向電極基板及び白黒表示液晶ディスプレイ装置

Also Published As

Publication number Publication date
KR100338428B1 (ko) 2003-05-17
TW460727B (en) 2001-10-21
DE69408725D1 (de) 1998-04-09
EP0627663B1 (de) 1998-03-04
TW581905B (en) 2004-04-01
EP0627663A1 (de) 1994-12-07
JPH0743522A (ja) 1995-02-14
US5527649A (en) 1996-06-18
US5718992A (en) 1998-02-17

Similar Documents

Publication Publication Date Title
DE69408725D1 (de) Substrat mit lichtabschirmender Schicht, Verfahren zur Herstellung derselben sowie Flüssigkristallanzeige
DE69427202D1 (de) Flüssigkristall Anzeigevorrichtung, Verfahren zu ihrer Herstellung, und ein Substrat
DE69512186D1 (de) Ferroelektrische Dünnschicht, Substrat bedeckt mit einer ferroelektrischen Dünnschicht und Verfahren zur Herstellung einer ferroelektrischen Dünnschicht
DE69314197T2 (de) Reflektierendes Substrat, Verfahren zu seiner Herstellung und Flüssigkristall-Anzeigevorrichtung, die dieses benutzt
DE3875515T2 (de) Substrat und verfahren zur herstellung eines substrates.
DE69635239D1 (de) Verfahren zur Herstellung einer Flüssigkristall-Anzeige
DE69625052D1 (de) Verfahren zur herstellung einer flüssigkristall-anzeige
DE69728517D1 (de) Verfahren zur herstellung von elektrooptischen und elektroaktiven flüssigkristallvorrichtungen und dadurch hergestellte vorrichtungen
DE69423143T2 (de) Verfahren zur Herstellung einer Doppelschichtfolie
DE69621473D1 (de) Flüssigkristalltafel mit antiferroelektrischem Flüssigkristall und Verfahren zu ihrer Herstellung
DE69427668T2 (de) Verfahren zur Herstellung einer Flüssigkristall-Anzeigevorrichtung mit Orientierungsschicht für willkürliche Ausrichtung
DE69225881T2 (de) Verfahren zur Herstellung eines Substrates vom SOI-Typ mit einer uniformen dünnen Silizium-Schicht
DE69628129D1 (de) Dünne ferroelektrische Schicht, mit einer dünnen ferroelektrischen Schicht überdecktes Substrat, Anordnung mit einer Kondensatorstruktur und Verfahren zur Herstellung einer dünnen ferroelektrischen Schicht
DE69703081D1 (de) Flüssigkristallanzeigevorrichtung, kompensatorschicht und verfahren zur herstellung eines verzögerungsfilmes
DE69129145D1 (de) Transparentes Substrat mit aufgebrachtem monomolekularem Film und Verfahren zu seiner Herstellung
DE69006054T2 (de) Verfahren zur Herstellung einer Flüssigkristallanzeigevorrichtung.
DE68917911D1 (de) Verfahren zur Herstellung einer Mehrfarben-Flüssigkristallanzeige-Vorrichtung.
DE68912638T2 (de) Verfahren zur Herstellung einer Kristallschicht auf einem Substrat.
DE69426966D1 (de) Verfahren zur Herstellung einer Flüssigkristall-Anzeigetafel
DE69311159T2 (de) Methode zur Herstellung einer Flüssigkristall-Anzeige mit nur einer Orientierungsschicht
DE69109547D1 (de) Verfahren zur Herstellung eines Substrates für eine Flüssigkristall-Anzeigevorrichtung.
DE69404347D1 (de) Polykristallines Substrat aus Diamant sowie Verfahren zur dessen Herstellung
DE69224592D1 (de) Verfahren zur Herstellung einer Flüssigkristallorientierungsschicht
DE69524159T2 (de) Verfahren zur Herstellung einer Dekorscheibe ausgehend von einem transparenten Substrat
DE69020603D1 (de) Verfahren zur Herstellung einer Flüssigkristall-Anzeigevorrichtung.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: DAI NIPPON PRINTING CO., LTD., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee