DE69308915T2 - Vorrichtung zum Planieren von Zwischenschichten von Halbleitermaterial - Google Patents

Vorrichtung zum Planieren von Zwischenschichten von Halbleitermaterial

Info

Publication number
DE69308915T2
DE69308915T2 DE69308915T DE69308915T DE69308915T2 DE 69308915 T2 DE69308915 T2 DE 69308915T2 DE 69308915 T DE69308915 T DE 69308915T DE 69308915 T DE69308915 T DE 69308915T DE 69308915 T2 DE69308915 T2 DE 69308915T2
Authority
DE
Germany
Prior art keywords
layer
polishing
psi
bar
working surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69308915T
Other languages
German (de)
English (en)
Other versions
DE69308915D1 (de
Inventor
Thomas C Hyde
John V H Roberts
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rodel Inc
Westech Inc
Original Assignee
Rodel Inc
Westech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rodel Inc, Westech Inc filed Critical Rodel Inc
Publication of DE69308915D1 publication Critical patent/DE69308915D1/de
Application granted granted Critical
Publication of DE69308915T2 publication Critical patent/DE69308915T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • H10P50/00—

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
DE69308915T 1992-01-31 1993-01-18 Vorrichtung zum Planieren von Zwischenschichten von Halbleitermaterial Expired - Lifetime DE69308915T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/829,736 US5257478A (en) 1990-03-22 1992-01-31 Apparatus for interlayer planarization of semiconductor material

Publications (2)

Publication Number Publication Date
DE69308915D1 DE69308915D1 (de) 1997-04-24
DE69308915T2 true DE69308915T2 (de) 1997-09-04

Family

ID=25255407

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69308915T Expired - Lifetime DE69308915T2 (de) 1992-01-31 1993-01-18 Vorrichtung zum Planieren von Zwischenschichten von Halbleitermaterial

Country Status (7)

Country Link
US (1) US5257478A (cg-RX-API-DMAC10.html)
EP (1) EP0555660B1 (cg-RX-API-DMAC10.html)
JP (1) JP3455556B2 (cg-RX-API-DMAC10.html)
KR (1) KR100265660B1 (cg-RX-API-DMAC10.html)
CN (1) CN1076152A (cg-RX-API-DMAC10.html)
DE (1) DE69308915T2 (cg-RX-API-DMAC10.html)
TW (1) TW222033B (cg-RX-API-DMAC10.html)

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DE69308915D1 (de) 1997-04-24
TW222033B (cg-RX-API-DMAC10.html) 1994-04-01
EP0555660A2 (en) 1993-08-18
CN1076152A (zh) 1993-09-15
JP3455556B2 (ja) 2003-10-14
US5257478A (en) 1993-11-02
EP0555660B1 (en) 1997-03-19
KR100265660B1 (ko) 2000-11-01
JPH0621028A (ja) 1994-01-28
KR930017105A (ko) 1993-08-30
EP0555660A3 (cg-RX-API-DMAC10.html) 1994-03-23

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