DE69220830T2 - Verfahren zur Herstellung von Halbleietervorrichtungen - Google Patents
Verfahren zur Herstellung von HalbleietervorrichtungenInfo
- Publication number
- DE69220830T2 DE69220830T2 DE69220830T DE69220830T DE69220830T2 DE 69220830 T2 DE69220830 T2 DE 69220830T2 DE 69220830 T DE69220830 T DE 69220830T DE 69220830 T DE69220830 T DE 69220830T DE 69220830 T2 DE69220830 T2 DE 69220830T2
- Authority
- DE
- Germany
- Prior art keywords
- conductor devices
- manufacturing semi
- semi
- manufacturing
- conductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
- H01L21/3081—Chemical or electrical treatment, e.g. electrolytic etching using masks characterised by their composition, e.g. multilayer masks, materials
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/680,953 US5168071A (en) | 1991-04-05 | 1991-04-05 | Method of making semiconductor devices |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69220830D1 DE69220830D1 (de) | 1997-08-21 |
DE69220830T2 true DE69220830T2 (de) | 1998-01-02 |
Family
ID=24733186
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69220830T Expired - Fee Related DE69220830T2 (de) | 1991-04-05 | 1992-02-03 | Verfahren zur Herstellung von Halbleietervorrichtungen |
Country Status (4)
Country | Link |
---|---|
US (1) | US5168071A (de) |
EP (1) | EP0507434B1 (de) |
JP (1) | JPH0773109B2 (de) |
DE (1) | DE69220830T2 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0478923B1 (de) * | 1990-08-31 | 1997-11-05 | Texas Instruments Incorporated | Verfahren zum Herstellen selbst-ausrichtender bipolarer Transistoren mit Heteroübergang |
EP0503473A3 (en) * | 1991-03-12 | 1992-10-28 | Texas Instruments Incorporated | Method of dry etching ina1as and ingaas lattice matched to inp |
JPH05152318A (ja) * | 1991-11-29 | 1993-06-18 | Nec Corp | ヘテロ接合バイポーラトランジスタとその製造方法 |
US5278083A (en) * | 1992-10-16 | 1994-01-11 | Texas Instruments Incorporated | Method for making reliable connections to small features of integrated circuits |
US5700701A (en) * | 1992-10-30 | 1997-12-23 | Texas Instruments Incorporated | Method for reducing junction capacitance and increasing current gain in collector-up bipolar transistors |
US5434091A (en) * | 1992-10-30 | 1995-07-18 | Texas Instruments Incorporated | Method for making collector up bipolar transistors having reducing junction capacitance and increasing current gain |
US5627105A (en) * | 1993-04-08 | 1997-05-06 | Varian Associates, Inc. | Plasma etch process and TiSix layers made using the process |
JP2720813B2 (ja) * | 1994-10-04 | 1998-03-04 | 日本電気株式会社 | 半導体装置の製造方法および半導体装置 |
US6010937A (en) * | 1995-09-05 | 2000-01-04 | Spire Corporation | Reduction of dislocations in a heteroepitaxial semiconductor structure |
US6083841A (en) * | 1997-05-15 | 2000-07-04 | Rohm Co., Ltd. | Method of etching gallium-nitride based compound semiconductor layer and method of manufacturing semiconductor light emitting device utilizing the same |
US6687281B2 (en) * | 2000-08-22 | 2004-02-03 | The Regents Of The University Of California | Double intracavity contacted long-wavelength VCSELs |
US7259444B1 (en) | 2004-07-20 | 2007-08-21 | Hrl Laboratories, Llc | Optoelectronic device with patterned ion implant subcollector |
JP2006073692A (ja) | 2004-09-01 | 2006-03-16 | Matsushita Electric Ind Co Ltd | ヘテロ接合バイポーラトランジスタおよびその製造方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60183726A (ja) * | 1984-03-02 | 1985-09-19 | Toshiba Corp | 半導体装置の電極パタ−ンの形成方法 |
US4541893A (en) * | 1984-05-15 | 1985-09-17 | Advanced Micro Devices, Inc. | Process for fabricating pedestal interconnections between conductive layers in an integrated circuit |
JPS63132452A (ja) * | 1986-11-24 | 1988-06-04 | Mitsubishi Electric Corp | パタ−ン形成方法 |
JPH0824123B2 (ja) * | 1987-04-17 | 1996-03-06 | 富士通株式会社 | 半導体装置の製造方法 |
JPS63276267A (ja) * | 1987-05-08 | 1988-11-14 | Fujitsu Ltd | 半導体装置の製造方法 |
US5007984A (en) * | 1987-09-28 | 1991-04-16 | Mitsubishi Denki Kabushiki Kaisha | Method for etching chromium film formed on substrate |
EP0353719A3 (de) * | 1988-08-05 | 1991-04-10 | Siemens Aktiengesellschaft | Metallkontakt mit überhängenden Kanten und Herstellungsverfahren |
JP3057679B2 (ja) * | 1988-10-05 | 2000-07-04 | ソニー株式会社 | ヘテロ接合バイポーラトランジスタ及びその製造方法 |
JP2630445B2 (ja) * | 1988-10-08 | 1997-07-16 | 富士通株式会社 | 半導体装置 |
US4917759A (en) * | 1989-04-17 | 1990-04-17 | Motorola, Inc. | Method for forming self-aligned vias in multi-level metal integrated circuits |
JPH02297942A (ja) * | 1989-05-11 | 1990-12-10 | Mitsubishi Electric Corp | 半導体装置及びその製造方法 |
FR2652200A1 (fr) * | 1989-09-21 | 1991-03-22 | Philips Lab Electronique | Procede de realisation d'un circuit semiconducteur integre incluant un transistor bipolaire a heterojonction et/ou des resistances enterrees. |
JPH03153043A (ja) * | 1989-11-10 | 1991-07-01 | Fujitsu Ltd | 高速半導体装置 |
-
1991
- 1991-04-05 US US07/680,953 patent/US5168071A/en not_active Expired - Lifetime
-
1992
- 1992-02-03 EP EP92300893A patent/EP0507434B1/de not_active Expired - Lifetime
- 1992-02-03 DE DE69220830T patent/DE69220830T2/de not_active Expired - Fee Related
- 1992-03-23 JP JP4094970A patent/JPH0773109B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69220830D1 (de) | 1997-08-21 |
US5168071A (en) | 1992-12-01 |
EP0507434B1 (de) | 1997-07-16 |
JPH0773109B2 (ja) | 1995-08-02 |
EP0507434A3 (en) | 1994-09-21 |
EP0507434A2 (de) | 1992-10-07 |
JPH05109756A (ja) | 1993-04-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |