DE69219405D1 - Halbleiteranordnung mit hoher Durchbruchsspannung - Google Patents
Halbleiteranordnung mit hoher DurchbruchsspannungInfo
- Publication number
- DE69219405D1 DE69219405D1 DE69219405T DE69219405T DE69219405D1 DE 69219405 D1 DE69219405 D1 DE 69219405D1 DE 69219405 T DE69219405 T DE 69219405T DE 69219405 T DE69219405 T DE 69219405T DE 69219405 D1 DE69219405 D1 DE 69219405D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor device
- breakdown voltage
- high breakdown
- voltage
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000015556 catabolic process Effects 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/408—Electrodes ; Multistep manufacturing processes therefor with an insulating layer with a particular dielectric or electrostatic property, e.g. with static charges or for controlling trapped charges or moving ions, or with a plate acting on the insulator potential or the insulator charges, e.g. for controlling charges effect or potential distribution in the insulating layer, or with a semi-insulating layer contacting directly the semiconductor surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
- H01L29/0611—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
- H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/8611—Planar PN junction diodes
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electrodes Of Semiconductors (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Element Separation (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15057691 | 1991-06-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69219405D1 true DE69219405D1 (de) | 1997-06-05 |
DE69219405T2 DE69219405T2 (de) | 1997-09-11 |
Family
ID=15499908
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69219405T Expired - Lifetime DE69219405T2 (de) | 1991-06-21 | 1992-06-19 | Halbleiteranordnung mit hoher Durchbruchsspannung |
Country Status (3)
Country | Link |
---|---|
US (1) | US5323041A (de) |
EP (1) | EP0519741B1 (de) |
DE (1) | DE69219405T2 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5597758A (en) * | 1994-08-01 | 1997-01-28 | Motorola, Inc. | Method for forming an electrostatic discharge protection device |
US5701023A (en) * | 1994-08-03 | 1997-12-23 | National Semiconductor Corporation | Insulated gate semiconductor device typically having subsurface-peaked portion of body region for improved ruggedness |
DE19820956A1 (de) | 1998-05-11 | 1999-11-18 | Daimler Chrysler Ag | Halbleiter-Bauelement und Verfahren zu seiner Herstellung sowie Verwendung des Halbleiter-Bauelements |
SE9904710L (sv) * | 1999-12-22 | 2001-06-23 | Abb Ab | Halvledaranordning |
SE0003360D0 (sv) * | 2000-09-21 | 2000-09-21 | Abb Ab | A semiconductor device |
US7071537B2 (en) * | 2002-05-17 | 2006-07-04 | Ixys Corporation | Power device having electrodes on a top surface thereof |
DE10316222B3 (de) * | 2003-04-09 | 2005-01-20 | eupec Europäische Gesellschaft für Leistungshalbleiter mbH | Verfahren zur Herstellung eines robusten Halbleiterbauelements und damit hergestelltes Halbleiterbauelement |
KR20060013397A (ko) | 2003-05-13 | 2006-02-09 | 코닌클리즈케 필립스 일렉트로닉스 엔.브이. | 전계 형성 영역을 구비한 반도체 장치 |
CN101203960B (zh) | 2005-06-22 | 2012-09-26 | Nxp股份有限公司 | 具有高击穿电压的半导体器件及其制造方法 |
CN102187466B (zh) | 2008-10-20 | 2013-09-04 | Nxp股份有限公司 | 半导体器件和这种器件的制造方法 |
KR101652403B1 (ko) * | 2010-08-13 | 2016-08-31 | 삼성전자주식회사 | 전력 전자소자 및 그 제조방법 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3686544A (en) * | 1969-02-10 | 1972-08-22 | Philips Corp | Mosfet with dual dielectric of titanium dioxide on silicon dioxide to prevent surface current migration path |
US4388635A (en) * | 1979-07-02 | 1983-06-14 | Hitachi, Ltd. | High breakdown voltage semiconductor device |
DE2944937A1 (de) * | 1979-11-07 | 1981-06-04 | Siemens AG, 1000 Berlin und 8000 München | Halbleiterbauelement |
US4890150A (en) * | 1985-12-05 | 1989-12-26 | North American Philips Corporation | Dielectric passivation |
JP2585331B2 (ja) * | 1986-12-26 | 1997-02-26 | 株式会社東芝 | 高耐圧プレーナ素子 |
US4799100A (en) * | 1987-02-17 | 1989-01-17 | Siliconix Incorporated | Method and apparatus for increasing breakdown of a planar junction |
USH665H (en) * | 1987-10-19 | 1989-08-01 | Bell Telephone Laboratories, Incorporated | Resistive field shields for high voltage devices |
US4927772A (en) * | 1989-05-30 | 1990-05-22 | General Electric Company | Method of making high breakdown voltage semiconductor device |
JPH0473970A (ja) * | 1990-07-16 | 1992-03-09 | Fuji Electric Co Ltd | Mos型半導体装置 |
-
1992
- 1992-06-19 US US07/901,111 patent/US5323041A/en not_active Expired - Lifetime
- 1992-06-19 EP EP92305660A patent/EP0519741B1/de not_active Expired - Lifetime
- 1992-06-19 DE DE69219405T patent/DE69219405T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0519741B1 (de) | 1997-05-02 |
EP0519741A2 (de) | 1992-12-23 |
US5323041A (en) | 1994-06-21 |
EP0519741A3 (en) | 1993-05-19 |
DE69219405T2 (de) | 1997-09-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
R071 | Expiry of right |
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