DE68916072D1 - Lichtempfindliche lithographische Platte, die kein Befeuchtungswasser benötigt. - Google Patents

Lichtempfindliche lithographische Platte, die kein Befeuchtungswasser benötigt.

Info

Publication number
DE68916072D1
DE68916072D1 DE68916072T DE68916072T DE68916072D1 DE 68916072 D1 DE68916072 D1 DE 68916072D1 DE 68916072 T DE68916072 T DE 68916072T DE 68916072 T DE68916072 T DE 68916072T DE 68916072 D1 DE68916072 D1 DE 68916072D1
Authority
DE
Germany
Prior art keywords
dampening water
photosensitive lithographic
lithographic plate
require dampening
require
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68916072T
Other languages
English (en)
Other versions
DE68916072T2 (de
Inventor
Yoshihiko C O Fuji Photo Urabe
Tatsuji C O Fuji Photo Higashi
Hiroshi C O Fuji Pho Takahashi
Nobuyuki C O Fuji Photo F Kita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE68916072D1 publication Critical patent/DE68916072D1/de
Application granted granted Critical
Publication of DE68916072T2 publication Critical patent/DE68916072T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE68916072T 1988-03-18 1989-03-16 Lichtempfindliche lithographische Platte, die kein Befeuchtungswasser benötigt. Expired - Fee Related DE68916072T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63065038A JP2520686B2 (ja) 1988-03-18 1988-03-18 湿し水不要感光性平版印刷板

Publications (2)

Publication Number Publication Date
DE68916072D1 true DE68916072D1 (de) 1994-07-21
DE68916072T2 DE68916072T2 (de) 1994-09-22

Family

ID=13275392

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68916072T Expired - Fee Related DE68916072T2 (de) 1988-03-18 1989-03-16 Lichtempfindliche lithographische Platte, die kein Befeuchtungswasser benötigt.

Country Status (4)

Country Link
US (1) US4874686A (de)
EP (1) EP0333186B1 (de)
JP (1) JP2520686B2 (de)
DE (1) DE68916072T2 (de)

Families Citing this family (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07111824B2 (ja) * 1986-12-15 1995-11-29 株式会社東芝 半導体メモリ
US5188032A (en) * 1988-08-19 1993-02-23 Presstek, Inc. Metal-based lithographic plate constructions and methods of making same
JP2549303B2 (ja) * 1988-09-21 1996-10-30 富士写真フイルム株式会社 感光性組成物
JPH02226249A (ja) * 1989-02-28 1990-09-07 Fuji Photo Film Co Ltd 湿し水不要感光性平版印刷版
JP2577630B2 (ja) * 1989-03-10 1997-02-05 富士写真フイルム株式会社 湿し水不要感光性平版印刷版
JPH031145A (ja) * 1989-05-29 1991-01-07 Kuraray Co Ltd 感光性樹脂組成物、それを用いたパターンおよびパターン作製法
JP2532291B2 (ja) * 1989-10-30 1996-09-11 富士写真フイルム株式会社 湿し水不要感光性平版印刷版
US5122438A (en) * 1989-11-02 1992-06-16 Konica Corporation Method for developing a waterless light-sensitive lithographic plate
JP2596850B2 (ja) * 1990-07-09 1997-04-02 富士写真フイルム株式会社 湿し水不要感光性平版印刷版
JPH04147261A (ja) * 1990-10-11 1992-05-20 Konica Corp 湿し水不要感光性平版印刷版
US5212048A (en) * 1990-11-21 1993-05-18 Presstek, Inc. Silicone coating formulations and planographic printing plates made therewith
CA2218752A1 (en) * 1995-04-27 1996-10-31 Minyu Li Negative-acting no-process printing plates
US5910395A (en) 1995-04-27 1999-06-08 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
GB9516694D0 (en) * 1995-08-15 1995-10-18 Horsell Plc Water-less lithographic plates
GB9516723D0 (en) * 1995-08-15 1995-10-18 Horsell Plc Water-less lithographic plates
JPH09146265A (ja) * 1995-11-27 1997-06-06 Fuji Photo Film Co Ltd 湿し水不要平版印刷原版
US6610808B2 (en) * 1999-03-12 2003-08-26 Arch Specialty Chemicals, Inc. Thermally cured underlayer for lithographic application
US6924339B2 (en) * 1999-03-12 2005-08-02 Arch Specialty Chemicals, Inc. Thermally cured underlayer for lithographic application
JP2004534107A (ja) * 2001-03-13 2004-11-11 アーチ・スペシャルティ・ケミカルズ・インコーポレイテッド リトグラフィーに応用するための熱硬化された下部層
US7763413B2 (en) * 2007-10-16 2010-07-27 Eastman Kodak Company Methods for imaging and processing negative-working imageable elements
EP2098367A1 (de) 2008-03-05 2009-09-09 Eastman Kodak Company Sensibilisator/Initiator-Kombination für negativ arbeitende wärmeempfindliche Zusammensetzungen für Lithografieplatten
WO2009148818A1 (en) * 2008-06-03 2009-12-10 3M Innovative Properties Company Optical films comprising phenyl ethylene (meth)acrylate monomers
US8034538B2 (en) 2009-02-13 2011-10-11 Eastman Kodak Company Negative-working imageable elements
US20100227269A1 (en) 2009-03-04 2010-09-09 Simpson Christopher D Imageable elements with colorants
US8318405B2 (en) 2009-03-13 2012-11-27 Eastman Kodak Company Negative-working imageable elements with overcoat
US8247163B2 (en) 2009-06-12 2012-08-21 Eastman Kodak Company Preparing lithographic printing plates with enhanced contrast
US8257907B2 (en) 2009-06-12 2012-09-04 Eastman Kodak Company Negative-working imageable elements
US8383319B2 (en) 2009-08-25 2013-02-26 Eastman Kodak Company Lithographic printing plate precursors and stacks
US8426104B2 (en) 2009-10-08 2013-04-23 Eastman Kodak Company Negative-working imageable elements
US8329383B2 (en) 2009-11-05 2012-12-11 Eastman Kodak Company Negative-working lithographic printing plate precursors
US20120090486A1 (en) 2010-10-18 2012-04-19 Celin Savariar-Hauck Lithographic printing plate precursors and methods of use
US20120141935A1 (en) 2010-12-03 2012-06-07 Bernd Strehmel Developer and its use to prepare lithographic printing plates
US20120141942A1 (en) 2010-12-03 2012-06-07 Domenico Balbinot Method of preparing lithographic printing plates
US20120141941A1 (en) 2010-12-03 2012-06-07 Mathias Jarek Developing lithographic printing plate precursors in simple manner
US20120199028A1 (en) 2011-02-08 2012-08-09 Mathias Jarek Preparing lithographic printing plates
US8632940B2 (en) 2011-04-19 2014-01-21 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8722308B2 (en) 2011-08-31 2014-05-13 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8703381B2 (en) 2011-08-31 2014-04-22 Eastman Kodak Company Lithographic printing plate precursors for on-press development
US9029063B2 (en) 2011-09-22 2015-05-12 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8632941B2 (en) 2011-09-22 2014-01-21 Eastman Kodak Company Negative-working lithographic printing plate precursors with IR dyes
US8679726B2 (en) 2012-05-29 2014-03-25 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8889341B2 (en) 2012-08-22 2014-11-18 Eastman Kodak Company Negative-working lithographic printing plate precursors and use
EP2735903B1 (de) 2012-11-22 2019-02-27 Eastman Kodak Company Negativ arbeitende Lithografiedruckplattenvorläufer mit hochverzweigtem Bindemittelmaterial
US9063423B2 (en) 2013-02-28 2015-06-23 Eastman Kodak Company Lithographic printing plate precursors and use
EP2778782B1 (de) 2013-03-13 2015-12-30 Kodak Graphic Communications GmbH Negativ arbeitende strahlungsempfindliche Elemente
US9201302B2 (en) 2013-10-03 2015-12-01 Eastman Kodak Company Negative-working lithographic printing plate precursor
US11633948B2 (en) 2020-01-22 2023-04-25 Eastman Kodak Company Method for making lithographic printing plates

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5612860B2 (de) * 1972-10-05 1981-03-25
JPS4968803A (de) * 1972-11-02 1974-07-03
JPS5946643A (ja) * 1982-09-09 1984-03-16 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS6021050A (ja) * 1983-07-15 1985-02-02 Toray Ind Inc 湿し水不要平版印刷用原板
JPS61123847A (ja) * 1984-11-21 1986-06-11 Toray Ind Inc 水なし平版印刷用原板
JPS61153655A (ja) * 1984-12-27 1986-07-12 Fuji Photo Film Co Ltd 湿し水不要感光性平版印刷版
JPH0789219B2 (ja) * 1986-01-10 1995-09-27 東レ株式会社 水なし平版印刷用原板

Also Published As

Publication number Publication date
EP0333186B1 (de) 1994-06-15
US4874686A (en) 1989-10-17
JPH01237663A (ja) 1989-09-22
EP0333186A2 (de) 1989-09-20
EP0333186A3 (en) 1990-04-04
DE68916072T2 (de) 1994-09-22
JP2520686B2 (ja) 1996-07-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee