DE3852559D1 - Lichtempfindliche positive Flachdruckplatte. - Google Patents
Lichtempfindliche positive Flachdruckplatte.Info
- Publication number
- DE3852559D1 DE3852559D1 DE3852559T DE3852559T DE3852559D1 DE 3852559 D1 DE3852559 D1 DE 3852559D1 DE 3852559 T DE3852559 T DE 3852559T DE 3852559 T DE3852559 T DE 3852559T DE 3852559 D1 DE3852559 D1 DE 3852559D1
- Authority
- DE
- Germany
- Prior art keywords
- printing plate
- planographic printing
- positive planographic
- photosensitive positive
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62057282A JP2551943B2 (ja) | 1987-03-12 | 1987-03-12 | 感光性平版印刷版 |
JP62111413A JP2719912B2 (ja) | 1987-05-07 | 1987-05-07 | 感光性平版印刷版 |
JP12059287 | 1987-05-18 | ||
JP13914087A JPS63303343A (ja) | 1987-06-03 | 1987-06-03 | 感光性組成物及び感光性平版印刷版 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3852559D1 true DE3852559D1 (de) | 1995-02-09 |
DE3852559T2 DE3852559T2 (de) | 1995-05-24 |
Family
ID=27463477
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19883852559 Expired - Fee Related DE3852559T2 (de) | 1987-03-12 | 1988-03-11 | Lichtempfindliche positive Flachdruckplatte. |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0287212B1 (de) |
DE (1) | DE3852559T2 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0345016B1 (de) * | 1988-05-31 | 1994-08-17 | Konica Corporation | Lichtempfindliche Zusammensetzung und lichtempfindliche lithographische Druckplatte |
US5238771A (en) * | 1988-05-31 | 1993-08-24 | Konica Corporation | Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive |
DE3820699A1 (de) * | 1988-06-18 | 1989-12-21 | Hoechst Ag | Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
CA2031564A1 (en) * | 1989-12-18 | 1991-06-19 | Leonard E. Bogan, Jr. | Method of preparing high glass transition temperature novolak resin for use in high resolution photoresist compositions |
JP2890213B2 (ja) * | 1991-02-25 | 1999-05-10 | チッソ株式会社 | 感光性重合体組成物及びパターンの形成方法 |
JPH09160233A (ja) | 1995-11-17 | 1997-06-20 | Hoechst Ag | 平版印刷板製造用感放射線記録材料 |
EP1077392A1 (de) * | 1999-08-16 | 2001-02-21 | Fuji Photo Film Co., Ltd. | Lichtempfindliche lithographische Druckplatte |
EP1347014B1 (de) * | 2002-03-20 | 2007-07-11 | FUJIFILM Corporation | IR-photoempfindliche Zusammensetzung |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5024641B2 (de) * | 1972-10-17 | 1975-08-18 | ||
CA1005673A (en) * | 1972-12-22 | 1977-02-22 | Constantine C. Petropoulos | Positive printing plate incorporating diazoquinone |
US4036644A (en) * | 1973-03-16 | 1977-07-19 | International Business Machines Corporation | Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor |
JPS5228401A (en) * | 1975-08-29 | 1977-03-03 | Koken Boring Machine Co | Hydraulic percussion device |
US4009033A (en) * | 1975-09-22 | 1977-02-22 | International Business Machines Corporation | High speed positive photoresist composition |
DE3442756A1 (de) * | 1984-11-23 | 1986-05-28 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von waermebestaendigen reliefaufzeichnungen |
-
1988
- 1988-03-11 EP EP19880302171 patent/EP0287212B1/de not_active Expired - Lifetime
- 1988-03-11 DE DE19883852559 patent/DE3852559T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE3852559T2 (de) | 1995-05-24 |
EP0287212B1 (de) | 1994-12-28 |
EP0287212A1 (de) | 1988-10-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |