DE68904292T2 - Gegenstand aus synthetischem quarzglas fuer den dotierungs-diffusionsprozess in halbleitern. - Google Patents

Gegenstand aus synthetischem quarzglas fuer den dotierungs-diffusionsprozess in halbleitern.

Info

Publication number
DE68904292T2
DE68904292T2 DE8989119956T DE68904292T DE68904292T2 DE 68904292 T2 DE68904292 T2 DE 68904292T2 DE 8989119956 T DE8989119956 T DE 8989119956T DE 68904292 T DE68904292 T DE 68904292T DE 68904292 T2 DE68904292 T2 DE 68904292T2
Authority
DE
Germany
Prior art keywords
semiconductors
quartz glass
diffusion process
synthetic quartz
doping diffusion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8989119956T
Other languages
English (en)
Other versions
DE68904292D1 (de
Inventor
Masatoshi Takita
Takaaki Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Publication of DE68904292D1 publication Critical patent/DE68904292D1/de
Application granted granted Critical
Publication of DE68904292T2 publication Critical patent/DE68904292T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/14—Substrate holders or susceptors
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/10—Reaction chambers; Selection of materials therefor
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/20—Wet processes, e.g. sol-gel process
    • C03C2203/26—Wet processes, e.g. sol-gel process using alkoxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Dispersion Chemistry (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
DE8989119956T 1988-10-31 1989-10-27 Gegenstand aus synthetischem quarzglas fuer den dotierungs-diffusionsprozess in halbleitern. Expired - Lifetime DE68904292T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63275297A JPH02124739A (ja) 1988-10-31 1988-10-31 合成石英ガラスおよびその製造方法

Publications (2)

Publication Number Publication Date
DE68904292D1 DE68904292D1 (de) 1993-02-18
DE68904292T2 true DE68904292T2 (de) 1993-05-06

Family

ID=17553468

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8989119956T Expired - Lifetime DE68904292T2 (de) 1988-10-31 1989-10-27 Gegenstand aus synthetischem quarzglas fuer den dotierungs-diffusionsprozess in halbleitern.

Country Status (4)

Country Link
US (1) US5063181A (de)
EP (1) EP0367127B1 (de)
JP (1) JPH02124739A (de)
DE (1) DE68904292T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5141786A (en) * 1989-02-28 1992-08-25 Shin-Etsu Chemical Co., Ltd. Synthetic silica glass articles and a method for manufacturing them
JPH0653593B2 (ja) * 1989-06-09 1994-07-20 信越石英株式会社 合成シリカガラス光学体及びその製造方法
JPH0627013B2 (ja) * 1989-06-14 1994-04-13 信越石英株式会社 紫外線レーザ用合成シリカガラス光学体及びその製造方法
JPH0627014B2 (ja) * 1989-06-19 1994-04-13 信越石英株式会社 紫外線レーザ用合成シリカガラス光学体及びその製造方法
JPH0829960B2 (ja) * 1990-08-10 1996-03-27 信越石英株式会社 紫外線レーザ用光学部材
JP2908150B2 (ja) * 1992-11-27 1999-06-21 日本電気株式会社 Ｓｏｉ基板構造及びその製造方法
JPH0826742A (ja) * 1994-07-11 1996-01-30 Mitsubishi Chem Corp 合成石英ガラス粉

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3681113A (en) * 1969-11-19 1972-08-01 Owens Illinois Inc Refractory article and method for producing same
DE2041321C3 (de) * 1970-08-20 1978-06-08 Bayer Ag, 5090 Leverkusen Verfahren zur Herstellung von SiO2 -Fasern, ihre Verwendung und kohlenstoffhaltige SiO2 -Fasern
US3666414A (en) * 1971-03-15 1972-05-30 Heraeus Schott Quarzschmelze Method of producing transparent or opaque fused silica or glass with a high silicon content
DE3067197D1 (en) * 1979-11-21 1984-04-26 Hitachi Ltd Method for producing optical glass
JPS5858292B2 (ja) * 1980-01-21 1983-12-24 株式会社日立製作所 シリカガラスの製造方法
JPS5777044A (en) * 1980-10-30 1982-05-14 Central Glass Co Ltd Manufacture of glass from metallic alcoholate
US4419115A (en) * 1981-07-31 1983-12-06 Bell Telephone Laboratories, Incorporated Fabrication of sintered high-silica glasses
GB2113200B (en) * 1982-01-08 1985-06-19 Hitachi Ltd Process for producing optical glass
DE3390375T1 (de) * 1982-12-23 1985-02-07 Suwa Seikosha Co. Ltd., Tokio/Tokyo Verfahren zur Herstellung von Siliciumdioxidglas
GB2165233B (en) * 1984-10-04 1988-03-09 Suwa Seikosha Kk Method of making a tubular silica glass member
GB2165534B (en) * 1984-10-05 1988-10-19 Suwa Seikosha Kk Method of preparing parent material for optical fibres
JPS6191024A (ja) * 1984-10-05 1986-05-09 Seiko Epson Corp 円筒状シリカ系ガラスの製造方法
DE3522194A1 (de) * 1985-06-21 1987-01-02 Philips Patentverwaltung Verfahren zur herstellung von glaskoerpern
DE3525495C1 (de) * 1985-07-17 1987-01-02 Heraeus Schott Quarzschmelze Verfahren zur Herstellung von Gegenstaenden aus synthetischem Siliziumdioxid
JPS62207711A (ja) * 1986-03-10 1987-09-12 Seiko Epson Corp シリカ球の製造方法
US4872895A (en) * 1986-12-11 1989-10-10 American Telephone And Telegraph Company, At&T Bell Laboratories Method for fabricating articles which include high silica glass bodies
JPH068181B2 (ja) * 1987-03-26 1994-02-02 信越石英株式会社 半導体工業用石英ガラス製品
US4789389A (en) * 1987-05-20 1988-12-06 Corning Glass Works Method for producing ultra-high purity, optical quality, glass articles
EP0310486B1 (de) * 1987-09-30 1992-03-18 Shin-Etsu Chemical Co., Ltd. Verfahren zur Herstellung von Kieselglas
US4943542A (en) * 1987-10-31 1990-07-24 Hitachi Chemical Company, Ltd. Process for producing silica glass
DE3739907A1 (de) * 1987-11-25 1989-06-08 Philips Patentverwaltung Verfahren zur herstellung von glaskoerpern
US4954327A (en) * 1988-08-12 1990-09-04 Blount David H Production of silica aerogels
US4979973A (en) * 1988-09-13 1990-12-25 Shin-Etsu Chemical Co., Ltd. Preparation of fused silica glass by hydrolysis of methyl silicate

Also Published As

Publication number Publication date
EP0367127A1 (de) 1990-05-09
JPH0450262B2 (de) 1992-08-13
DE68904292D1 (de) 1993-02-18
EP0367127B1 (de) 1993-01-07
JPH02124739A (ja) 1990-05-14
US5063181A (en) 1991-11-05

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