DE60326307D1 - Photodefinierbare Zusammensetzung aus einem Silsesquioxanpolymer und optischer Lichtwellenleiter, welcher daraus geformt wird - Google Patents
Photodefinierbare Zusammensetzung aus einem Silsesquioxanpolymer und optischer Lichtwellenleiter, welcher daraus geformt wirdInfo
- Publication number
- DE60326307D1 DE60326307D1 DE60326307T DE60326307T DE60326307D1 DE 60326307 D1 DE60326307 D1 DE 60326307D1 DE 60326307 T DE60326307 T DE 60326307T DE 60326307 T DE60326307 T DE 60326307T DE 60326307 D1 DE60326307 D1 DE 60326307D1
- Authority
- DE
- Germany
- Prior art keywords
- optical waveguide
- formed therefrom
- waveguide formed
- silsesquioxane polymer
- photodefinable composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title 1
- 229920000642 polymer Polymers 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
- G02B1/045—Light guides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/80—Siloxanes having aromatic substituents, e.g. phenyl side groups
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
- G02B2006/12069—Organic material
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
- Silicon Polymers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/307,904 US6842577B2 (en) | 2002-12-02 | 2002-12-02 | Photoimageable waveguide composition and waveguide formed therefrom |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60326307D1 true DE60326307D1 (de) | 2009-04-09 |
Family
ID=32312212
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60326307T Expired - Lifetime DE60326307D1 (de) | 2002-12-02 | 2003-12-01 | Photodefinierbare Zusammensetzung aus einem Silsesquioxanpolymer und optischer Lichtwellenleiter, welcher daraus geformt wird |
Country Status (7)
Country | Link |
---|---|
US (2) | US6842577B2 (de) |
EP (1) | EP1426793B1 (de) |
JP (1) | JP2004184999A (de) |
KR (1) | KR101064338B1 (de) |
CN (1) | CN1523447A (de) |
DE (1) | DE60326307D1 (de) |
TW (1) | TWI241457B (de) |
Families Citing this family (41)
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US6842577B2 (en) * | 2002-12-02 | 2005-01-11 | Shipley Company L.L.C. | Photoimageable waveguide composition and waveguide formed therefrom |
KR20040048312A (ko) * | 2002-12-02 | 2004-06-07 | 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 | 도파로의 형성방법 및 그로부터 형성된 도파로 |
JP2005092177A (ja) * | 2003-09-12 | 2005-04-07 | Rohm & Haas Electronic Materials Llc | 光学部品形成方法 |
US7072564B2 (en) * | 2003-11-25 | 2006-07-04 | Rohm And Haas Electronic Materials Llc | Waveguide compositions and waveguides formed therefrom |
JP5102428B2 (ja) * | 2003-11-25 | 2012-12-19 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 導波路組成物およびこれから形成された導波路 |
JP2005173039A (ja) * | 2003-12-09 | 2005-06-30 | Nitto Denko Corp | 光導波路の製法 |
JP2005181958A (ja) * | 2003-12-22 | 2005-07-07 | Rohm & Haas Electronic Materials Llc | レーザーアブレーションを用いる電子部品および光学部品の形成方法 |
DE602005014984D1 (de) * | 2004-04-14 | 2009-07-30 | Rohm & Haas Elect Mat | Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter |
TWI294258B (en) * | 2004-08-03 | 2008-03-01 | Rohm & Haas Elect Mat | Methods of forming devices having optical functionality |
JP2006072352A (ja) | 2004-08-19 | 2006-03-16 | Rohm & Haas Electronic Materials Llc | プリント回路板を形成する方法 |
JP4995096B2 (ja) * | 2004-12-17 | 2012-08-08 | ダウ・コーニング・コーポレイション | 反射防止膜の形成方法、レジスト画像の形成方法、パターンの形成方法、電子デバイスの製造方法及びarc組成物 |
JP2006178466A (ja) * | 2004-12-22 | 2006-07-06 | Rohm & Haas Electronic Materials Llc | 光学乾燥フィルム及び乾燥フィルムを有する光学デバイス形成方法 |
JP5243692B2 (ja) * | 2004-12-22 | 2013-07-24 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 光学乾燥フィルム及び乾燥フィルムを有する光学デバイス形成方法 |
EP1674905B1 (de) | 2004-12-22 | 2008-10-15 | Rohm and Haas Electronic Materials, L.L.C. | Verfahren zur Herstellung optischer Vorrichtungen mit Polymerschichten |
US7212723B2 (en) * | 2005-02-19 | 2007-05-01 | The Regents Of The University Of Colorado | Monolithic waveguide arrays |
TWI336716B (en) * | 2005-11-14 | 2011-02-01 | Rohm & Haas Elect Mat | Silicon-containing polymers and optical waveguides formed therefrom |
US20070202435A1 (en) * | 2005-12-29 | 2007-08-30 | Rohm And Haas Electronic Materials Llc | Methods of forming optical waveguides |
US7399573B2 (en) * | 2006-10-25 | 2008-07-15 | International Business Machines Corporation | Method for using negative tone silicon-containing resist for e-beam lithography |
EP1950587B1 (de) | 2006-12-31 | 2017-11-08 | Rohm and Haas Electronic Materials LLC | Verfahren zur Herstellung von Leiterplatten mit eingebetteten optischen Wellenleitern |
US9535215B2 (en) * | 2008-09-15 | 2017-01-03 | Brphotonics Productos Optoelectronicos Ltda. | Fluorinated sol-gel low refractive index hybrid optical cladding and electro-optic devices made therefrom |
JP5646950B2 (ja) * | 2009-11-06 | 2014-12-24 | 東京応化工業株式会社 | マスク材組成物、および不純物拡散層の形成方法 |
EP2517052B1 (de) * | 2009-12-21 | 2019-06-12 | Dow Silicones Corporation | Verfahren zur herstellung von flexiblen wellenleitern mit alkyl-funktionellen silsesquioxanharzen |
JP5680848B2 (ja) * | 2009-12-28 | 2015-03-04 | 東レ・ダウコーニング株式会社 | フェニル基含有オルガノポリシロキサン組成物、それからなる化粧料原料および光沢化粧料 |
CN102262266A (zh) * | 2010-05-27 | 2011-11-30 | 欣兴电子股份有限公司 | 光电基板的制作方法 |
WO2012040453A1 (en) * | 2010-09-22 | 2012-03-29 | Dow Corning Corporation | Thermally stable compositions containing resin-linear organosiloxane block copolymers |
EP2619249B1 (de) * | 2010-09-22 | 2014-05-14 | Dow Corning Corporation | Lineare harz-organosiloxanblockcopolymere enthaltende zusammensetzungen mit hohem brechungsindex |
EP2619245B1 (de) * | 2010-09-22 | 2017-07-12 | Dow Corning Corporation | Verfahren zur verarbeitung von linearen harz-organosiloxanblockcopolymeren |
KR101807163B1 (ko) * | 2010-09-22 | 2017-12-08 | 다우 코닝 코포레이션 | 유기실록산 블록 공중합체 |
TW201245877A (en) * | 2011-03-08 | 2012-11-16 | Daicel Corp | Method for producing composition for the production of photoresist |
EP2785767A1 (de) * | 2011-12-02 | 2014-10-08 | Dow Corning Corporation | Härtbare zusammensetzungen aus linearen organosiloxanharz-blockcopolymeren |
KR102067384B1 (ko) * | 2011-12-30 | 2020-01-17 | 다우 실리콘즈 코포레이션 | 고체 조명 장치 및 형성 방법 |
WO2013130574A1 (en) * | 2012-02-29 | 2013-09-06 | Dow Corning Corporation | Compositions of resin-linear organosiloxane block copolymers |
US9006358B2 (en) * | 2012-03-12 | 2015-04-14 | Dow Corning Corporation | Compositions of resin-linear organosiloxane block copolymers |
CN104204862B (zh) * | 2012-03-20 | 2018-04-27 | 道康宁公司 | 光导及相关光组件 |
US9150727B2 (en) * | 2012-03-21 | 2015-10-06 | Dow Corning Corporation | Compositions comprising resin-linear organosiloxane block copolymers and organopolysiloxanes |
US9175140B2 (en) * | 2012-03-21 | 2015-11-03 | Dow Corning Corporation | Compositions of resin-linear organosiloxane block copolymers |
US9051436B2 (en) * | 2012-03-21 | 2015-06-09 | Dow Corning Corporation | Compositions of resin-linear organosiloxane block copolymers |
EP2828316B1 (de) * | 2012-03-21 | 2017-02-22 | Dow Corning Corporation | Zusammensetzungen aus linearen organosiloxanharz-blockcopolymeren |
WO2013142140A1 (en) * | 2012-03-21 | 2013-09-26 | Dow Corning Corporation | Process for preparing resin- linear organosiloxane block copolymers |
CN104769059A (zh) * | 2012-11-08 | 2015-07-08 | 3M创新有限公司 | 可紫外线固化的有机硅防粘组合物 |
KR20150132380A (ko) * | 2013-03-15 | 2015-11-25 | 다우 코닝 코포레이션 | 수지-선형 유기실록산 블록 공중합체의 조성물 |
Family Cites Families (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57168246A (en) | 1981-04-09 | 1982-10-16 | Fujitsu Ltd | Formation of negative pattern |
JPS6025061B2 (ja) | 1981-12-02 | 1985-06-15 | 日立化成工業株式会社 | 感光性シリコ−ン樹脂組成物 |
JPS63279245A (ja) | 1987-05-12 | 1988-11-16 | Fujitsu Ltd | ネガ型レジスト組成物 |
FR2656617A1 (fr) * | 1989-12-28 | 1991-07-05 | Thomson Csf | Procede de synthese de polysilsesquioxanes et applications des produits contenus. |
EP0464614B1 (de) * | 1990-06-25 | 1999-09-29 | Matsushita Electronics Corporation | Licht- oder strahlungsempfindliche Zusammensetzung |
US5457003A (en) * | 1990-07-06 | 1995-10-10 | Nippon Telegraph And Telephone Corporation | Negative working resist material, method for the production of the same and process of forming resist patterns using the same |
JPH04271306A (ja) | 1991-02-27 | 1992-09-28 | Sumitomo Electric Ind Ltd | プラスチック光伝送体 |
JPH04366958A (ja) | 1991-06-14 | 1992-12-18 | Oki Electric Ind Co Ltd | 放射線感応性樹脂組成物 |
US5296332A (en) | 1991-11-22 | 1994-03-22 | International Business Machines Corporation | Crosslinkable aqueous developable photoresist compositions and method for use thereof |
JPH06148895A (ja) * | 1992-11-06 | 1994-05-27 | Toray Ind Inc | 感光性樹脂組成物およびこれを用いたパターン形成方法 |
JP3273519B2 (ja) | 1992-12-04 | 2002-04-08 | 日本電信電話株式会社 | ポリシロキサン系光導波路の製造方法 |
JPH06256523A (ja) | 1993-03-02 | 1994-09-13 | Nippon Telegr & Teleph Corp <Ntt> | 遷移金属元素を含むポリシロキサンおよびそれを用いた光導波路 |
JP3376629B2 (ja) * | 1993-03-19 | 2003-02-10 | 東レ株式会社 | 感光性樹脂組成物およびこれを使用したパターン形成方法 |
JPH08176444A (ja) * | 1994-10-26 | 1996-07-09 | Nippon Telegr & Teleph Corp <Ntt> | 高分子光学材料及びこれを用いた光導波路 |
TW397936B (en) * | 1994-12-09 | 2000-07-11 | Shinetsu Chemical Co | Positive resist comosition based on a silicone polymer containing a photo acid generator |
JPH07258604A (ja) * | 1995-02-21 | 1995-10-09 | Toray Ind Inc | 光学材料および光学材料用コーティング組成物 |
JP3724004B2 (ja) | 1995-03-28 | 2005-12-07 | 東レ株式会社 | 熱硬化性組成物、その製造方法およびカラーフィルタ |
JP3204359B2 (ja) | 1995-04-28 | 2001-09-04 | 日本電信電話株式会社 | フレキシブル高分子光導波路 |
JPH08327842A (ja) | 1995-05-29 | 1996-12-13 | Nippon Telegr & Teleph Corp <Ntt> | 光導波路 |
US5972516A (en) * | 1996-02-29 | 1999-10-26 | Kyocera Corporation | Method for manufacturing optical waveguide using siloxane polymer, and optoelectronic hybrid substrate using the optical waveguide |
JPH09311234A (ja) * | 1996-05-20 | 1997-12-02 | Tdk Corp | 有機・無機高分子複合体光導波路 |
JP3465242B2 (ja) * | 1996-06-07 | 2003-11-10 | 日本電信電話株式会社 | 高分子光学材料及びそれを用いた光導波路及びその製造方法 |
JPH10142438A (ja) * | 1996-11-15 | 1998-05-29 | Nippon Telegr & Teleph Corp <Ntt> | 高分子光導波路の製造方法 |
FR2755832B1 (fr) * | 1996-11-18 | 1999-01-15 | Picardie Lainiere | Support textile de renforcement du col de chemise ou piece analogue |
JPH10148729A (ja) | 1996-11-21 | 1998-06-02 | Nippon Telegr & Teleph Corp <Ntt> | 高分子光導波路コア部のリッジ・パターン形成方法 |
US5991493A (en) | 1996-12-13 | 1999-11-23 | Corning Incorporated | Optically transmissive bonding material |
US6144795A (en) * | 1996-12-13 | 2000-11-07 | Corning Incorporated | Hybrid organic-inorganic planar optical waveguide device |
JP3870471B2 (ja) * | 1997-03-05 | 2007-01-17 | 東レ株式会社 | 感光性樹脂組成物、およびこれを使用したパターン形成方法 |
JP3571482B2 (ja) | 1997-03-13 | 2004-09-29 | 日本電信電話株式会社 | 口径変換用高分子光導波路パターン形成方法 |
US5962067A (en) * | 1997-09-09 | 1999-10-05 | Lucent Technologies Inc. | Method for coating an article with a ladder siloxane polymer and coated article |
US6054253A (en) * | 1997-10-10 | 2000-04-25 | Mcgill University-The Royal Institute For The Advancement Of Learning | Solvent-assisted lithographic process using photosensitive sol-gel derived glass for depositing ridge waveguides on silicon |
US6087064A (en) * | 1998-09-03 | 2000-07-11 | International Business Machines Corporation | Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method |
JP3133039B2 (ja) | 1998-10-05 | 2001-02-05 | 日本電信電話株式会社 | 光導波路用感光性組成物およびその製造方法および高分子光導波路パターン形成方法 |
US6187505B1 (en) * | 1999-02-02 | 2001-02-13 | International Business Machines Corporation | Radiation sensitive silicon-containing resists |
JP2001059918A (ja) * | 1999-08-24 | 2001-03-06 | Mitsubishi Electric Corp | 高耐熱ポリマー光導波路形成材料、それを用いた光導波路およびその製造方法 |
JP2001083342A (ja) * | 1999-09-09 | 2001-03-30 | Jsr Corp | 光導波路形成用組成物、光導波路の形成方法、および光導波路 |
JP2001264562A (ja) * | 2000-03-21 | 2001-09-26 | Nippon Telegr & Teleph Corp <Ntt> | 高分子光導波路 |
JP2001288364A (ja) * | 2000-04-05 | 2001-10-16 | Jsr Corp | 放射線硬化性組成物およびそれを用いた光導波路ならびに光導波路の製造方法 |
JP4401540B2 (ja) * | 2000-06-30 | 2010-01-20 | 浜松ホトニクス株式会社 | レーザー装置及びこれを用いた光信号増幅装置 |
US6731857B2 (en) * | 2001-03-29 | 2004-05-04 | Shipley Company, L.L.C. | Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom |
US7035518B2 (en) * | 2001-04-13 | 2006-04-25 | Hitachi Cable, Ltd. | Polymer waveguides and process for producing the same |
US6751396B2 (en) * | 2001-12-26 | 2004-06-15 | Lucent Technologies Inc. | Integrated optical devices and method of fabrication therefor |
US6856745B2 (en) * | 2002-07-02 | 2005-02-15 | Lucent Technologies Inc. | Waveguide and applications therefor |
JP4162196B2 (ja) * | 2002-08-30 | 2008-10-08 | 京セラ株式会社 | 光導波路 |
KR20040048312A (ko) * | 2002-12-02 | 2004-06-07 | 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 | 도파로의 형성방법 및 그로부터 형성된 도파로 |
US6842577B2 (en) * | 2002-12-02 | 2005-01-11 | Shipley Company L.L.C. | Photoimageable waveguide composition and waveguide formed therefrom |
-
2002
- 2002-12-02 US US10/307,904 patent/US6842577B2/en not_active Expired - Lifetime
-
2003
- 2003-12-01 JP JP2003401215A patent/JP2004184999A/ja active Pending
- 2003-12-01 DE DE60326307T patent/DE60326307D1/de not_active Expired - Lifetime
- 2003-12-01 TW TW092133661A patent/TWI241457B/zh not_active IP Right Cessation
- 2003-12-01 KR KR1020030086207A patent/KR101064338B1/ko active IP Right Grant
- 2003-12-01 EP EP03257559A patent/EP1426793B1/de not_active Expired - Lifetime
- 2003-12-02 CN CNA2003101249511A patent/CN1523447A/zh active Pending
-
2005
- 2005-01-10 US US11/032,518 patent/US20050180712A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
KR101064338B1 (ko) | 2011-09-14 |
JP2004184999A (ja) | 2004-07-02 |
EP1426793B1 (de) | 2009-02-25 |
CN1523447A (zh) | 2004-08-25 |
TWI241457B (en) | 2005-10-11 |
KR20040048313A (ko) | 2004-06-07 |
US20050180712A1 (en) | 2005-08-18 |
EP1426793A1 (de) | 2004-06-09 |
US20040105652A1 (en) | 2004-06-03 |
TW200424745A (en) | 2004-11-16 |
US6842577B2 (en) | 2005-01-11 |
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